Electron-beam induced deposition and autocatalytic decomposition of Co(CO)₃NO

• Florian Vollnhals,
• Martin Drost,
• Fan Tu,
• Esther Carrasco,
• Andreas Späth,
• Rainer H. Fink,
• Hans-Peter Steinrück and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

• gas phase, the decomposition proceeds through direct ionization or dissociative electron attachment depending on the kinetic energy of the involved electrons. Dissociative electron attachment is mainly observed for low-energy secondary electrons (<10 eV) and yields incompletely decomposed fragments

Fabrication of carbon nanomembranes by helium ion beam lithography

• Xianghui Zhang,
• Henning Vieker,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2014, 5, 188–194, doi:10.3762/bjnano.5.20

• times smaller than the corresponding electron irradiation dose. Most likely, this is due to the energy distribution of secondary electrons shifted to lower energies, which results in a more efficient dissociative electron attachment (DEA) process. Keywords: carbon nanomembranes; dissociative electron

• complementary spectroscopic techniques and they suggested a dissociative electron attachment (DEA) as the dominating process to which both primary electrons and secondary electrons contribute [13]. However, a detailed picture of how the spatial distribution of cross-links evolves until a complete CNM has been

• could be related to different activation energies of dissociative electron attachment process as well as different entropic barriers encountered by the growth fronts. The irradiation dose for a complete cross-linking with helium ions is roughly 60 times smaller than that with electrons. Most likely

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• around 10 eV for the first mechanistic step of the CEBL process (DEA, dissociative electron attachment) [15][16], the area that is effectively irradiated (i.e., where thiol groups are generated) is approximately 5–6 nm in diameter. Assuming that the immobilisation of a AuNP is most stable with a maximum

Radiation-induced nanostructures: Formation processes and applications

• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 533–534, doi:10.3762/bjnano.3.61

• . Different processes, such as dissociative electron attachment, neutral dissociation or dissociative ionization act together in breaking selected bonds in (mostly) metal–organic precursor molecules. On the other hand, low-energy electrons also play a role in the radiation damage induced by ionizing radiation

Femtosecond time-resolved photodissociation dynamics of methyl halide molecules on ultrathin gold films

• Mihai E. Vaida,
• Robert Tchitnga and
• Thorsten M. Bernhardt

Beilstein J. Nanotechnol. 2011, 2, 618–627, doi:10.3762/bjnano.2.65

• the power dependences of the pump and the probe laser, which support a single-photon excitation followed by a two-photon ionization [18][38][39]. Dissociative electron attachment according to excitation mechanism (1) in Figure 2 might be possible. In this way transient CH3I− ions would be generated

• excitation was found to lead to the decomposition of the molecules on the gold surface. This was interpreted as an indication for a considerable red-shift of the A-band excitation of methyl bromide due to the interaction with the substrate. The alternative mechanism of dissociative electron attachment was