Observation of collective excitation of surface plasmon resonances in large Josephson junction arrays

• Roger Cattaneo,
• Mikhail A. Galin and
• Vladimir M. Krasnov

Beilstein J. Nanotechnol. 2022, 13, 1578–1588, doi:10.3762/bjnano.13.132

• using photolithography and reactive ion etching. The JJ sensor with variable thickness and a width of ≈100 nm is made by Ga+ focused ion beam etching. The JJ is made small in order to increase its resistance Rn to approx. 50 Ω, which is needed for a good impedance matching with the antenna. In order to

Laser-processed antiadhesive bionic combs for handling nanofibers inspired by nanostructures on the legs of cribellate spiders

• Sebastian Lifka,
• Kristóf Harsányi,
• Erich Baumgartner,
• Lukas Pichler,
• Dariya Baiko,
• Karsten Wasmuth,
• Johannes Heitz,
• Marco Meyer,
• Anna-Christin Joel,
• Jörn Bonse and
• Werner Baumgartner

Beilstein J. Nanotechnol. 2022, 13, 1268–1283, doi:10.3762/bjnano.13.105

• gold-sputtered (S150B, Edwards). The metatarsi were examined using a focused ion beam scanning electron microscope (FIB-SEM) tomography (Strata 400 STEM, FEI Company, Oregon, USA) at the Central Facility for Electron Microscopy at the RWTH Aachen University. Measurements were performed using the

Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations

• Grégoire R. N. Defoort-Levkov,
• Alan Bahm and
• Patrick Philipp

Beilstein J. Nanotechnol. 2022, 13, 986–1003, doi:10.3762/bjnano.13.86

• nanoprinting. For many of these applications, a precise control of ion-beam-induced processes is essential. The effect of contaminations on these processes has not been thoroughly explored but can often be substantial, especially for ultralow impact energies in the sub-keV range. In this paper we investigate

• probe tomography (APT) [5], and ion beam analysis used for life sciences applications [6][7]), surface patterning [8], nanolithography [9], nanomachining [10][11], and nanoprinting at room [12] and cryogenic temperatures [13]. The development of nanotechnology relies on lower ion beam energies and

• . Depending on the application, the ion beam energy is in the range of 10 to 30 keV when small spot sizes are required (i.e., spot sizes in the nanometre range) and at a few keV or even in the sub-keV range when low surface damage or minimized atomic mixing is required. One example is low-energy depth

Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

• Chun-Da Liao,
• Andrea Capasso,
• Tiago Queirós,
• Telma Domingues,
• Fatima Cerqueira,
• Nicoleta Nicoara,
• Jérôme Borme,
• Paulo Freitas and
• Pedro Alpuim

Beilstein J. Nanotechnol. 2022, 13, 796–806, doi:10.3762/bjnano.13.70

• B2 samples. This result again supports that employing B2 PMMA yields fewer residues and may help in avoiding post-transfer treatments for advanced PMMA residue cleaning of graphene, such as annealing and ion beam irradiation [32]. The graph of the G band shift (Supporting Information File 1, Figure

Topographic signatures and manipulations of Fe atoms, CO molecules and NaCl islands on superconducting Pb(111)

• Carl Drechsel,
• Philipp D’Astolfo,
• Jung-Ching Liu,
• Thilo Glatzel,
• Rémy Pawlak and
• Ernst Meyer

Beilstein J. Nanotechnol. 2022, 13, 1–9, doi:10.3762/bjnano.13.1

• [47] operated in the frequency-modulation mode (resonance frequency f0 ≈ 25 kHz, spring constant k ≈ 1800 N/m, quality factor Q ≈ 14000, and oscillation amplitude A ≈ 0.5 Å). The tip mounted to the qPlus sensor consists of a 25 μm-thick PtIr wire, shortened and sharpened with a focused ion beam. A

Measurement of polarization effects in dual-phase ceria-based oxygen permeation membranes using Kelvin probe force microscopy

• Kerstin Neuhaus,
• Christina Schmidt,
• Liudmila Fischer,
• Wilhelm Albert Meulenberg,
• Ke Ran,
• Joachim Mayer and
• Stefan Baumann

Beilstein J. Nanotechnol. 2021, 12, 1380–1391, doi:10.3762/bjnano.12.102

• , KPFM measurements were started with an imaging velocity of 1 image per minute to measure the relaxation of the introduced gradient. Electron microscopy The TEM specimens were cut from 60CSO20-FC2O pellets by focused ion beam (FIB) milling using a FEI Strata400 system with Ga ion beam. Further thinning

• and cleaning were performed with an Ar ion beam in a Fischione Nanomill 1040 at 900 eV and 500 eV beam energy, respectively. TEM and energy-filtered TEM (EFTEM) imaging were performed with a FEI Tecnai F20 at 200 kV. High-resolution HAADF imaging and energy-dispersive X-ray (EDX) chemical mapping were

Chemical vapor deposition of germanium-rich CrGe_x nanowires

• Vladislav Dřínek,
• Stanislav Tiagulskyi,
• Roman Yatskiv,
• Jan Grym,
• Radek Fajgar,
• Věra Jandová,
• Martin Koštejn and
• Jaroslav Kupčík

Beilstein J. Nanotechnol. 2021, 12, 1365–1371, doi:10.3762/bjnano.12.100

• transfer single NWs onto contact lithographic pads (Supporting Information File 1, Figure S9) to measure their conductivity. The NWs, however, turned out to be fragile and were destroyed when an attempt was made to cut them from the tungsten tip using a focused ion beam (FIB). Therefore, a method to

• with the Ga+ focused ion beam (FIB), gas injection system (GIS), and nanomanipulator OmniProbe 400 (Oxford Instruments) with a tungsten tip. The nanomanipulator enabled a direct contact of single as-grown NWs. The current–voltage (I–V) characteristics were measured using a Keithley 237 source

Is the Ne operation of the helium ion microscope suitable for electron backscatter diffraction sample preparation?

• Annalena Wolff

Beilstein J. Nanotechnol. 2021, 12, 965–983, doi:10.3762/bjnano.12.73

• commonly used approach is the focused ion beam (FIB) polishing. Unfortunately, artefacts that can be easily induced by Ga FIB polishing approaches are seldom published. This work aims to provide a better understanding of the underlying causes for artefact formation and to assess if the helium ion

• here looks at the ion-beam-induced artefacts when polishing copper for EBSD measurements for different ion species (Ga, Ne) as well as polishing protocols. EBSD is a characterization technique in scanning electron microscopes (SEMs) that allows for the study of microstructure, local texture, grain size

• elsewhere [31]. Throughout the past years, Ga-focused ion beam/scanning electron microscopes (Ga FIB/SEMs) have been used to polish samples [32][33]. Although it is recognized within the FIB community that Ga can induce artefacts in the sample [34][35][36][37], many of the encountered artefacts, which can

Uniform arrays of gold nanoelectrodes with tuneable recess depth

• Elena O. Gordeeva,
• Ilya V. Roslyakov,
• Alexey P. Leontiev,
• Alexey A. Klimenko and
• Kirill S. Napolskii

Beilstein J. Nanotechnol. 2021, 12, 957–964, doi:10.3762/bjnano.12.72

• direct-writing using electron beam lithography [11][12] or ion beam milling [13][14]) are limited by the ensemble area and expensive in mass production, but allow one to precisely tune the parameters of an array (a geometry of individual electrodes and the distance between them) over a wide range. An

Recent progress in actuation technologies of micro/nanorobots

• Ke Xu and
• Bing Liu

Beilstein J. Nanotechnol. 2021, 12, 756–765, doi:10.3762/bjnano.12.59

• towards the platinum end, and a maximum movement speed of 4 μm/s was achieved. After that, Chen et al. [40] designed a Z-shaped platinum hybrid nanorobot in order to meet the growing demand for micro/nanorobots in the biomedical field. It was manufactured using a combination of focused ion beam and plasma

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

• multifaceted instrument enabling a broad range of applications beyond imaging in which the finely focused helium ion beam is used for a variety of defect engineering, ion implantation, and nanofabrication tasks. Operation of the ion source with neon has extended the reach of this technology even further. This

• ; focused helium ion beam-induced deposition; focused helium ion beam milling; helium ion beam lithography; helium ion implantation; Introduction Since the helium ion microscope (HIM) was introduced 15 years ago [1][2][3], over one hundred HIMs have been installed worldwide and over one thousand research

• focused ion beam as it is scanned across the sample. Compared with the scanning electron microscope (SEM), the HIM offers enhanced surface sensitivity, greater topographic contrast, and a larger depth of field [4][5]. A charge-neutralization system based on flooding the scanned region with low-energy

Spontaneous shape transition of Mn_xGe_1−x islands to long nanowires

• S. Javad Rezvani,
• Luc Favre,
• Gabriele Giuli,
• Yiming Wubulikasimu,
• Isabelle Berbezier,
• Augusto Marcelli,
• Luca Boarino and
• Nicola Pinto

Beilstein J. Nanotechnol. 2021, 12, 366–374, doi:10.3762/bjnano.12.30

• and 25 mA with a graphite monochromator. Step-scan diffractograms were collected in the 2θ range of 3–70° with 0.02° step and 3 s/step counting time. For HRTEM analysis, focused ion beam (FIB) lamellae were prepared using a dual-beam FIB. The lamellae were oriented along the elongation direction. The

Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films

• Petronela Prepelita,
• Florin Garoi and
• Valentin Craciun

Beilstein J. Nanotechnol. 2021, 12, 354–365, doi:10.3762/bjnano.12.29

• -frequency magnetron sputtering (rfMS) [27][28][29][30], vacuum thermal evaporation (VTE) [31][32][33], chemical methods [34], reactive ion beam sputter deposition [35], among others. For example, SiO2 and ZnO films obtained by rfMS can be either used as dielectric materials in metasurface structures or as

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

• Victor Deinhart,
• Lisa-Marie Kern,
• Jan N. Kirchhof,
• Sabrina Juergensen,
• Joris Sturm,
• Enno Krauss,
• Thorsten Feichtner,
• Sviatoslav Kovalchuk,
• Michael Schneider,
• Dieter Engel,
• Bastian Pfau,
• Bert Hecht,
• Kirill I. Bolotin,
• Stephanie Reich and
• Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

• geometry and raster settings. It also offers low-level beam path creation, providing full control over the beam movement and including sophisticated optimization tools. Three applications showcasing the potential of He ion beam nanofabrication for two-dimensional material systems and devices using FIB-o

• -mat are presented. Keywords: automated patterning; focused He ion beam; graphene; magnetic multilayers; mechanical resonator; pattern generation; plasmonic antennas; two-dimensional materials; Introduction Future breakthroughs in nanotechnology will rely on the ability to fabricate materials and

• nanometer range is heavily sought after. One promising candidate for ultraprecise nanofabrication is focused ion beam (FIB) machining. Focused ion beams locally remove material based on physical sputtering with a large degree of flexibility due to advanced beam control. FIB patterning is a direct single

Scanning transmission helium ion microscopy on carbon nanomembranes

• Daniel Emmrich,
• Annalena Wolff,
• Nikolaus Meyerbröker,
• Jörg K. N. Lindner,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2021, 12, 222–231, doi:10.3762/bjnano.12.18

• detector in the dark field [20]. Kavanagh et al. used a silicon diode array as a pixelated sensor for transmission imaging to observe ion beam scattering with a static beam and as an end-point detection for pore milling into graphite sheets [21]. This work presents the design and capabilities of a dark

• the set. Figure 4a shows a freestanding membrane that was intentionally ruptured by a high-flux helium ion beam prior to imaging. The image shows the rupture, the membrane, and a folded layer of the CNM. At small acceptance angles, the membrane yields a high-intensity signal, while the overall

Imaging of SARS-CoV-2 infected Vero E6 cells by helium ion microscopy

• Natalie Frese,
• Patrick Schmerer,
• Martin Wortmann,
• Matthias Schürmann,
• Matthias König,
• Michael Westphal,
• Friedemann Weber,
• Holger Sudhoff and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2021, 12, 172–179, doi:10.3762/bjnano.12.13

• of its sub-nanometer imaging and ion-beam nanofabrication capabilities in materials science and engineering [1]. Although HIM soon proved to be a promising tool in the life sciences, the examination of biological samples by HIM proceeded at a much slower pace. In recent years, it has been used in the

• addition to the improved conductivity of the specimen, the deposited layer may contribute to the electron density of the surface, thus increasing secondary electron yield. This effect, commonly referred to as electron- and/or ion beam-induced deposition, is commonly observed in charged-particle microscopes

Mapping the local dielectric constant of a biological nanostructured system

• Wescley Walison Valeriano,
• Rodrigo Ribeiro Andrade,
• Juan Pablo Vasco,
• Angelo Malachias,
• Bernardo Ruegger Almeida Neves,
• Paulo Sergio Soares Guimarães and
• Wagner Nunes Rodrigues

Beilstein J. Nanotechnol. 2021, 12, 139–150, doi:10.3762/bjnano.12.11

• . The scanning electron microscopy (SEM) image presented in Figure 2 shows the nanostructured section of a fragment of the red region indicated in Figure 1a. The section was partially polished using a focused ion beam (FIB) and the multilayered structure is clearly visible. The corrugated surface is the

Bio-imaging with the helium-ion microscope: A review

• Matthias Schmidt,
• James M. Byrne and
• Ilari J. Maasilta

Beilstein J. Nanotechnol. 2021, 12, 1–23, doi:10.3762/bjnano.12.1

• that HIM is compatible with the powerful technique of immunogold labelling. Secondly, Joens et al. introduced the ion-beam milling capabilities of the HIM to biological applications when they opened up the mouth cavity of a nematode [6]. In the same paper, Joens et al. furthermore demonstrated on

• published in 2018 by Sato et al., who used the ionoluminescense generated by the He ion beam to detect ZnO nanoparticles which were incubated with COS7 cells [25]. Today HIM-SIMS is possible via two different approaches. The first, a sector-field mass-spectrometer SIMS, was developed by Dowsett, Wirtz, et

• contrast mechanism occurs when HIM is used to study insulating or poorly conducting materials such as most biological specimens. Here, differences in local conductivity result in the accumulation of positive charges under the ion beam, which hampers the emission of secondary electrons and results in a

Scanning transmission imaging in the helium ion microscope using a microchannel plate with a delay line detector

• Eduardo Serralta,
• Nico Klingner,
• Olivier De Castro,
• Michael Mousley,
• Santhana Eswara,
• Serge Duarte Pinto,
• Tom Wirtz and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2020, 11, 1854–1864, doi:10.3762/bjnano.11.167

• Eduardo Serralta Nico Klingner Olivier De Castro Michael Mousley Santhana Eswara Serge Duarte Pinto Tom Wirtz Gregor Hlawacek Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstr. 400, 01328 Dresden, Germany Technische Universität Dresden

• temporal resolution, is sensitive to both ions and neutral particles over a wide energy range, and shows robustness against ion beam-induced damage. A special in-vacuum movable support gives the possibility of moving the detector vertically, placing the detector closer to the sample for the detection of

• microscopy; scanning transmission ion microscopy; Introduction The helium ion microscope (HIM) is an instrument that has already proven its value for high-resolution imaging, compositional analysis, nanofabrication, and materials modification [1][2]. It generates a focused helium (or neon) ion beam with sub

Imaging and milling resolution of light ion beams from helium ion microscopy and FIBs driven by liquid metal alloy ion sources

• Nico Klingner,
• Gregor Hlawacek,
• Paul Mazarov,
• Wolfgang Pilz,
• Fabian Meyer and
• Lothar Bischoff

Beilstein J. Nanotechnol. 2020, 11, 1742–1749, doi:10.3762/bjnano.11.156

• Nico Klingner Gregor Hlawacek Paul Mazarov Wolfgang Pilz Fabian Meyer Lothar Bischoff Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstrasse 400, 01328 Dresden, Germany Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany 10.3762

• /bjnano.11.156 Abstract While the application of focused ion beam (FIB) techniques has become a well-established technique in research and development for patterning and prototyping on the nanometer scale, there is still a large underused potential with respect to the usage of ion species other than

• resolution of Ne+ from a gas field ion source. The comparison allows one to select the best possible ion species for the specific demands in terms of resolution, beam current, and volume to be drilled. Keywords: focused ion beam; gas field ion source; liquid metal alloy ion source; resolution; Introduction

Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

• Serguei Chiriaev,
• Luciana Tavares,
• Vadzim Adashkevich,
• Arkadiusz J. Goszczak and
• Horst-Günter Rubahn

Beilstein J. Nanotechnol. 2020, 11, 1693–1703, doi:10.3762/bjnano.11.151

• Southern Denmark, Alsion 2, Sønderborg, 6400, Denmark 10.3762/bjnano.11.151 Abstract This work explores a new technique for the out-of-plane patterning of metal thin films prefabricated on the surface of a polymer substrate. This technique is based on an ion-beam-induced material modification in the bulk

• of the polymer. Effects of subsurface and surface processes on the surface morphology have been studied for three polymer materials: poly(methyl methacrylate), polycarbonate, and polydimethylsiloxane, by using focused ion beam irradiation with He+, Ne+, and Ga+. Thin films of a Pt60Pd40 alloy and of

• irradiation-induced mechanical strain in the patterning process are elaborated and discussed. Keywords: direct patterning; focused helium ion beam; out-of-plane nanopatterning; polymers; thin films; Introduction Micro- and nanofabrication with focused ion beams (FIBs) is currently a subject of strong

Oxidation of Au/Ag films by oxygen plasma: phase separation and generation of nanoporosity

• Abdel-Aziz El Mel,
• Said A. Mansour,
• Mujaheed Pasha,
• Atef Zekri,
• Janarthanan Ponraj,
• Akshath Shetty and
• Yousef Haik

Beilstein J. Nanotechnol. 2020, 11, 1608–1614, doi:10.3762/bjnano.11.143

• increased in size (Figure 3e,f). To investigate whether the formed nanoporous microspheres have a hollow interior or not, a cross-section SEM specimen from the sample oxidized for 30 min was prepared using focused ion beam (FIB) (Figure 3e). According to the results, the microspheres were not hollow and the

Fabrication of nano/microstructures for SERS substrates using an electrochemical method

• Jingran Zhang,
• Tianqi Jia,
• Xiaoping Li,
• Junjie Yang,
• Zhengkai Li,
• Guangfeng Shi,
• Xinming Zhang and
• Zuobin Wang

Beilstein J. Nanotechnol. 2020, 11, 1568–1576, doi:10.3762/bjnano.11.139

• ion beam (FIB) technology can also be used to directly fabricate high-precision nanostructures on surfaces made of silicon, silicon dioxide and metal [27][28][29][30][31][32][33]. FIB technology is therefore used as a processing method for SERS substrates. Using the FIB method, Lin et al. [29

Helium ion microscope – secondary ion mass spectrometry for geological materials

• Matthew R. Ball,
• Richard J. M. Taylor,
• Joshua F. Einsle,
• Fouzia Khanom,
• Christelle Guillermier and
• Richard J. Harrison

Beilstein J. Nanotechnol. 2020, 11, 1504–1515, doi:10.3762/bjnano.11.133

• Carl Zeiss SMT Inc., Peabody, MA, USA 10.3762/bjnano.11.133 Abstract The helium ion microscope (HIM) is a focussed ion beam instrument with unprecedented spatial resolution for secondary electron imaging but has traditionally lacked microanalytical capabilities. With the addition of the secondary ion

• focussed ion beam (FIB) instrument, which uses a gas field ion source (GFIS) to create highly focussed beams of noble gas ions, utilising the same working principle as the field ion microscope (FIM). This was originally used to form a primary helium beam [1], but the principle of the GFIS has since been

• extended to the heavier noble gas neon [2] and may be applicable for even heavier noble gases such as argon. Whilst the HIM was shown to achieve exceptional imaging resolution using secondary electrons generated by the primary ion beam [3][4][5][6], it lacked microanalytical capabilities. There were

Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir

• Mathias Franz,
• Romy Junghans,
• Paul Schmitt,
• Adriana Szeghalmi and
• Stefan E. Schulz

Beilstein J. Nanotechnol. 2020, 11, 1439–1449, doi:10.3762/bjnano.11.128

• PVD methods. The deposition of gold and palladium was done by magnetron sputtering. The film thickness has been adjusted by the use of a calibrated deposition rate. Ion beam sputter deposition (IBSD) has been used to deposit platinum and copper. For copper deposition, the thickness has been controlled