Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• approaches are quite limited. In this work, we show that nanopillars and nanoholes, and their combination with microgrooves, can be patterned on polyurethane (PU) films using a low-cost, reusable photoresist master mold prepared via nanosphere lens lithography and UV-LED photolithography, with specific

• fabrication. For instance, traditional techniques, such as electron-beam lithography, laser writing, and cleanroom photolithography, have flexibility in design but require costly equipment [13][14]. Relatively cheaper techniques, such as anodization, electroplating, and electrospinning, are limited by the

• ]. Therefore, there is still a need to develop simple and cost-effective fabrication methods applicable to a wide range of nano- and micropatterns and biomaterials. In our previous studies, we have shown how nanosphere lens lithography (NLL) can be used with a low-cost ultraviolet light-emitting diode (UV-LED

Industrial perspectives for personalized microneedles

• Remmi Danae Baker-Sediako,
• Benjamin Richter,
• Matthias Blaicher,
• Michael Thiel and
• Martin Hermatschweiler

Beilstein J. Nanotechnol. 2023, 14, 857–864, doi:10.3762/bjnano.14.70

• microoptic fabrication, grayscale lithography offers a solution to mitigate the staircase effect. Grayscale lithography is a novel approach in photolithography for 2.5D patterning (x,y,z) with ultrasmooth surfaces that exhibits improved shape accuracy [57][58]. In 2019, Nanoscribe GmbH & Co launched the

• Quantum X platform that commercialized maskless grayscale lithography for microoptics made via 2PP, a process called “Two-Photon Grayscale Lithography” (2GL®) [59][60]. 2GL® differs from traditional 2PP and 1PP lithography because the laser or exposure dosage in individual voxels is controlled in three

• on a “Quantum X shape” lithography system (Nanoscribe GmbH & Co, Karlsruhe, Germany) following printing and post-printing protocols from NanoGuide. Post-printing protocols begin by removing unpolymerized material via two-step washing with either propylene glycol methyl ether acetate or mr-Dev for 15

Silver-based SERS substrates fabricated using a 3D printed microfluidic device

• Phommachith Sonexai,
• Minh Van Nguyen,
• Bui The Huy and
• Yong-Ill Lee

Beilstein J. Nanotechnol. 2023, 14, 793–803, doi:10.3762/bjnano.14.65

• separate microreactor [12][22]. A traditional approach to producing microfluidic devices involves a three-step microfabrication process of (i) creating a channel mold using photolithography, (ii) fabricating the channels by casting the mold through soft lithography, and (iii) bonding the channel device to

Observation of multiple bulk bound states in the continuum modes in a photonic crystal cavity

• Rui Chen,
• Yi Zheng,
• Xingyu Huang,
• Qiaoling Lin,
• Chaochao Ye,
• Meng Xiong,
• Martijn Wubs,
• Yungui Ma,
• Minhao Pu and
• Sanshui Xiao

Beilstein J. Nanotechnol. 2023, 14, 544–551, doi:10.3762/bjnano.14.45

• To verify the multiple modes in the bandgap mirror-assisted BIC cavity, several samples with different sidelengths (w) were fabricated by electron beam lithography (EBL) and inductively coupled plasma (ICP) etching on 500 nm thick AlGaAs on a sapphire wafer. The parameter sweep of w around 400 nm was

A mid-infrared focusing grating coupler with a single circular arc element based on germanium on silicon

• Xiaojun Zhu,
• Shuai Li,
• Ang Sun,
• Yongquan Pan,
• Wen Liu,
• Yue Wu,
• Guoan Zhang and
• Yuechun Shi

Beilstein J. Nanotechnol. 2023, 14, 478–484, doi:10.3762/bjnano.14.38

• than that of a MIR grating coupler with conventional tapered linear gratings (5.49%). Because the proposed structure is geometrically simple, it is easy to implement experimentally. The proposed MIR FGC based on Ge-on-Si can be fabricated by electron beam lithography (EBL) and inductively coupled

Characterisation of a micrometer-scale active plasmonic element by means of complementary computational and experimental methods

• Ciarán Barron,
• Giulia Di Fazio,
• Samuel Kenny,
• Silas O’Toole,
• Robin O’Reilly and
• Dominic Zerulla

Beilstein J. Nanotechnol. 2023, 14, 110–122, doi:10.3762/bjnano.14.12

• nanomechanical operations such as lithography and machining. The high spring constant of this cantilever has the advantage of minimising the unwanted deflection of the cantilever resulting from electrostatic interaction of the potential on the surface and the probe. The tip is constructed from wear-resistant

Upper critical magnetic field in NbRe and NbReN micrometric strips

• Zahra Makhdoumi Kakhaki,
• Antonio Leo,
• Federico Chianese,
• Loredana Parlato,
• Giovanni Piero Pepe,
• Angela Nigro,
• Carla Cirillo and
• Carmine Attanasio

Beilstein J. Nanotechnol. 2023, 14, 45–51, doi:10.3762/bjnano.14.5

• , were reactively sputtered in a mixture of inert Ar (85%) and reactive N2 (15%) gas at a total pressure of 3.5 μbar at a rate of 0.36 nm/s. NbRe films were patterned by standard optical lithography and lift-off procedures to realize a Hall bar geometry of width w = 10 μm and a distance between the

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

• Chang-Ming Wang,
• Hong-Sheng Chan,
• Chia-Li Liao,
• Che-Wei Chang and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2023, 14, 34–44, doi:10.3762/bjnano.14.4

• alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest achieved feature dimension is 5 nm using a micrometer-scale structured stamp in a chemical lift-off lithography (CLL) process

• -off lithography; gap; self-assembled monolayer; sub-micrometer; surface patterning; Introduction The development of lithographic techniques is crucial to the advancement of the electronics and semiconductor industry, the backbones of modern technology. Advances in photolithography have pushed the

• limit of commercially available techniques down to the 10 nm scale in the form of extreme ultraviolet lithography [1][2], though equipment cost and energy consumption substantially increase with smaller desired feature dimension. On the contrary, direct-write methods like electron beam lithography can

Coherent amplification of radiation from two phase-locked Josephson junction arrays

• Mikhail A. Galin,
• Vladimir M. Krasnov,
• Ilya A. Shereshevsky,
• Nadezhda K. Vdovicheva and
• Vladislav V. Kurin

Beilstein J. Nanotechnol. 2022, 13, 1445–1457, doi:10.3762/bjnano.13.119

• self-aligning process using e-beam lithography and reactive ion etching [16][17]. Similar arrays were studied earlier in [9][12][13], where additional information about sample characterization can be found. Figure 1a,b shows the layout of “sample-1”. It has been fabricated on a 1 × 1 cm2 silicon

Double-layer symmetric gratings with bound states in the continuum for dual-band high-Q optical sensing

• Chaoying Shi,
• Jinhua Hu,
• Xiuhong Liu,
• Junfang Liang,
• Jijun Zhao,
• Haiyan Han and
• Qiaofen Zhu

Beilstein J. Nanotechnol. 2022, 13, 1408–1417, doi:10.3762/bjnano.13.116

• structure can be fabricated as follows [56]. At first, the gratings of the bottom layer are fabricated using electron beam lithography (EBL) and reactive ion etching (RIE) on a SOI chip with a single crystalline silicon device layer and a buried oxide (BOX), where this SOI chip serves as the receiving

Bending and punching characteristics of aluminum sheets using the quasi-continuum method

• Man-Ping Chang,
• Shang-Jui Lin and
• Te-Hua Fang

Beilstein J. Nanotechnol. 2022, 13, 1303–1315, doi:10.3762/bjnano.13.108

• , nanoelectromechanical systems (NEMS), environmental science, and semiconductors [1][2][3][4][5][6][7][8][9][10]. The increased requirements for advanced nanostructures simultaneously give rise to extensive researches in precision machining techniques, including nanoimprinting lithography (NIL) [11][12], mechanical nano

Enhanced electronic transport properties of Te roll-like nanostructures

• E. R. Viana,
• N. Cifuentes and
• J. C. González

Beilstein J. Nanotechnol. 2022, 13, 1284–1291, doi:10.3762/bjnano.13.106

• writing optical lithography on 1 × 1 cm2 degenerate Si(100) substrates covered by a 300 nm thick high-quality SiO2 layer. A Cr(10 nm)/Au(100 nm) bilayer was thermally evaporated on the sample to produce good ohmic contacts (see Supporting Information File 1). This procedure follows the methodology

Roll-to-roll fabrication of superhydrophobic pads covered with nanofur for the efficient clean-up of oil spills

• Patrick Weiser,
• Robin Kietz,
• Marc Schneider,
• Matthias Worgull and
• Hendrik Hölscher

Beilstein J. Nanotechnol. 2022, 13, 1228–1239, doi:10.3762/bjnano.13.102

• , too [7]. Multiple techniques exist to prepare self-cleaning surfaces. Direct laser writing and electron beam lithography have been employed successfully to create superhydrophobic surfaces. However, due to low writing speeds these approaches are not viable for surface areas larger than a few square

• millimeters [8][9]. Various (soft) lithography techniques have been employed to create superhydrophobic surfaces; however, these generally rely on copying surface information from a master (e.g., a lotus leaf) [9][10] and are therefore often limited in size. Superhydrophobic surfaces could also be prepared

• sandblasted steel-plates as mold inserts. It is an interesting feature of this procedure that a surface with nanostructures is realized without elaborate and costly lithography. Nanofur can be hot-pulled from several types of polymers [16]. Nonetheless, the surface area per process step is limited to some

A super-oscillatory step-zoom metalens for visible light

• Yi Zhou,
• Chao Yan,
• Peng Tian,
• Zhu Li,
• Yu He,
• Bin Fan,
• Zhiyong Wang,
• Yao Deng and
• Dongliang Tang

Beilstein J. Nanotechnol. 2022, 13, 1220–1227, doi:10.3762/bjnano.13.101

• of 0.5 λ/NA, where λ is the wavelength and NA is the numerical aperture [1]. Super-resolution optical imaging is of significant scientific and application value, which may lead to a revolution in various fields, such as optical microscopy, optical remote sensing, subwavelength lithography, and ultra

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

• Jānis Sniķeris,
• Vjačeslavs Gerbreders,
• Andrejs Bulanovs and
• Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

• surfaces undergoing irradiation by a focused electron beam. Keywords: atomic force microscopy; electron beam; lithography; nanostructure; silver; sputtering; surface; Introduction Metallic nanostructures have various uses, including in nano-electro-mechanical systems [1], plasmonic biosensors [2], and

• nanophotonics [3]. They can also serve as catalysts for controlled chemical vapour deposition [4]. While gold is the most widely used material for fabrication of plasmonic nanostructures, silver can offer a less expensive alternative [5][6][7]. Electron beam (EB) lithography is a popular method for the

• nanopatterning of metal surfaces, but it is a complicated and expensive multistep process [8]. Electron beam induced deposition (EBID) is a direct-write lithography technique, which is capable of creating 2D and free-standing 3D nanostructures by using electron irradiation to dissociate volatile precursor

Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

• Chun-Da Liao,
• Andrea Capasso,
• Tiago Queirós,
• Telma Domingues,
• Fatima Cerqueira,
• Nicoleta Nicoara,
• Jérôme Borme,
• Paulo Freitas and
• Pedro Alpuim

Beilstein J. Nanotechnol. 2022, 13, 796–806, doi:10.3762/bjnano.13.70

• : C4 PMMA; Wafer 2: B2 PMMA). Both wafers started with the patterning of Cr/Au contacts (deposited by magnetron sputtering) using direct-write laser lithography and ion milling. The fabrication of the two wafers followed slightly different steps, as described below. Wafer 1: A stopping layer (Al2O3

• films were then transferred onto the patterned wafer until all device areas were covered. After removing the PMMA, graphene was patterned using optical lithography and oxygen plasma etching. Finally, the sacrificial layer was removed by wet etching. Wafer 2: An additional layer of Al2O3 was deposited on

• to the surface of the chips. A stopping layer (Cu/AlSiCu/TiW) for the reactive ion etching (RIE) process was sputtered, and the SiO2/SiNx multistack passivation layer was deposited by CVD. The passivation layer was patterned by lithography and etched by RIE until revealing the stopping layer on the

Experimental and theoretical study of field-dependent spin splitting at ferromagnetic insulator–superconductor interfaces

• Peter Machon,
• Michael J. Wolf,
• Detlef Beckmann and
• Wolfgang Belzig

Beilstein J. Nanotechnol. 2022, 13, 682–688, doi:10.3762/bjnano.13.60

• a Si(111) substrate heated to 800 °C. In a second fabrication step, aluminium/aluminium oxide/copper tunnel junctions were fabricated on the EuS film using e-beam lithography and shadow evaporation. The nominal aluminium film thickness was d = 10 nm. The differential conductance g = dI/dV of the

Tunable high-quality-factor absorption in a graphene monolayer based on quasi-bound states in the continuum

• Jun Wu,
• Yasong Sun,
• Feng Wu,
• Biyuan Wu and
• Xiaohu Wu

Beilstein J. Nanotechnol. 2022, 13, 675–681, doi:10.3762/bjnano.13.59

• traditional lithography, and then employ the conventional wet-base transfer method to transfer a CVD-grown graphene monolayer onto the grating structure. Conclusion In summary, an active graphene absorber, consisting of a graphene monolayer and a substrate spaced by a dielectric grating, is proposed and

Fabrication and testing of polymer microneedles for transdermal drug delivery

• Vahid Ebrahiminejad,
• Zahra Faraji Rad,
• Philip D. Prewett and
• Graham J. Davies

Beilstein J. Nanotechnol. 2022, 13, 629–640, doi:10.3762/bjnano.13.55

• multistage fabrication processes with high production costs [7]. Similarly, laser ablation and lithography techniques are costly, requiring extended production time [8]. To overcome the current manufacturing limitations, MNs might be fabricated cost-effectively, with high precision and accuracy, using 3D

• photoresist was drop cast onto an indium tin oxide (ITO) glass substrate prior to starting the printing process. A dip-in laser lithography (DiLL) objective (25× magnification, NA = 0.8) was used for printing, after which the MN array was washed in propylene glycol methyl ether acetate (PGMEA) for 10 minutes

Zinc oxide nanostructures for fluorescence and Raman signal enhancement: a review

• Ioana Marica,
• Fran Nekvapil,
• Maria Ștefan,
• Cosmin Farcău and
• Alexandra Falamaș

Beilstein J. Nanotechnol. 2022, 13, 472–490, doi:10.3762/bjnano.13.40

• ordered hybrid nanostructured substrates, ranging from more expensive and laborious ones, such as pulsed laser deposition or hydrothermal growth, followed by sputtering processes [31] or electron beam lithography to more cost-efficient and simple ones, such as photochemical deposition of metallic NPs or a

• metallic layer [32], chemical synthesis [33], or nanosphere lithography. Usually, ZnO nanostructures are fabricated first, followed by the decoration with metallic nanostructures or a metallic layer, which is added by physical vapour deposition, including sputtering processes [6][34], ion sputtering, which

• needed to develop efficient SERS substrates. The combination of several methods including nanosphere lithography, atomic layer deposition, electrodeposition, and electron-beam evaporation resulted in Au-covered hollow urchin-like ZnO structures (Figure 2e–k) [16]. The ZnO layer was deposited on a

Investigation of electron-induced cross-linking of self-assembled monolayers by scanning tunneling microscopy

• Patrick Stohmann,
• Sascha Koch,
• Yang Yang,
• Christopher David Kaiser,
• Julian Ehrens,
• Jürgen Schnack,
• Niklas Biere,
• Dario Anselmetti,
• Armin Gölzhäuser and
• Xianghui Zhang

Beilstein J. Nanotechnol. 2022, 13, 462–471, doi:10.3762/bjnano.13.39

• role in science and technology. A highly focused electron beam is employed to create nanostructures via electron-beam lithography [1], and has been further developed to produce three-dimensional structures through controlled dissociation of precursor molecules [2]. Electron-induced chemistry has also

Micro- and nanotechnology in biomedical engineering for cartilage tissue regeneration in osteoarthritis

• Zahra Nabizadeh,
• Mahmoud Nasrollahzadeh,
• Hamed Daemi,
• Mohamadreza Baghaban Eslaminejad,
• Ali Akbar Shabani,
• Mehdi Dadashpour,
• Majid Mirmohammadkhani and
• Davood Nasrabadi

Beilstein J. Nanotechnol. 2022, 13, 363–389, doi:10.3762/bjnano.13.31

Impact of device design on the electronic and optoelectronic properties of integrated Ru-terpyridine complexes

• Max Mennicken,
• Sophia Katharina Peter,
• Corinna Kaulen,
• Ulrich Simon and
• Silvia Karthäuser

Beilstein J. Nanotechnol. 2022, 13, 219–229, doi:10.3762/bjnano.13.16

• nanoelectrodes separated by gaps of 8 to 20 nm. They are fabricated by electron beam lithography (EBL) in a lift-off process while using a self-aligned Al2O3 hard mask to define the nanogap size [20][21]. The resulting nanoelectrode pairs are used for the on-chip preparation of Ru(TP)2-complex wires according to

• using electron beam lithography and lift-off [21]. These nanoelectrode samples with gap sizes of 8 to 20 nm between the electrodes were used in order to fabricate Ru(TP)2-complex wire devices. According to the Ru-complex wire growth procedure described above, the samples were treated first with MPTP

• lithography according to the recently developed routine that enables the assembly of the molecular building blocks on solid surfaces at room-temperature under mild conditions and, thus, represents an on-chip preparation method [19]. In parallel, the first steps of the consecutive wire growth on Au substrates

Engineered titania nanomaterials in advanced clinical applications

• Padmavati Sahare,
• Paulina Govea Alvarez,
• Juan Manual Sanchez Yanez,
• Gabriel Luna-Bárcenas,
• Samik Chakraborty,
• Sujay Paul and
• Miriam Estevez

Beilstein J. Nanotechnol. 2022, 13, 201–218, doi:10.3762/bjnano.13.15

• /titanium dioxide nanocomposites against biofilm-forming and methicillin-resistant strains of Staphylococcus aureus and Pseudomonas aeruginosa [95]. In another novel approach, dip pen nanolithography and soft lithography were used to form a micropattern of a silica sol modified with TiO2 (5% and 10

Morphology-driven gas sensing by fabricated fractals: A review

• Vishal Kamathe and
• Rupali Nagar

Beilstein J. Nanotechnol. 2021, 12, 1187–1208, doi:10.3762/bjnano.12.88

• experimental approaches. Here, lithography techniques can be implemented to write fractals of different fractal dimensions and their response under identical test conditions can be studied. Such structures can also be explored as substrates for surface-enhanced Raman spectroscopy, which finds applications in