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Search for "magnetron" in Full Text gives 143 result(s) in Beilstein Journal of Nanotechnology.

Nonmonotonous temperature dependence of Shapiro steps in YBCO grain boundary junctions

  • Leonid S. Revin,
  • Dmitriy V. Masterov,
  • Alexey E. Parafin,
  • Sergey A. Pavlov and
  • Andrey L. Pankratov

Beilstein J. Nanotechnol. 2021, 12, 1279–1285, doi:10.3762/bjnano.12.95

Graphical Abstract
  • discussed, and the measurement results are compared with the results of numerical calculations. Experimental Setup and Numerical Model The samples of grain boundary Josephson junctions were fabricated by on-axis dc magnetron sputtering [28][29][30][31] of YBa2Cu3O7−δ (YBCO) film on the surface of 24°[001
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Published 23 Nov 2021

Plasmon-enhanced photoluminescence from TiO2 and TeO2 thin films doped by Eu3+ for optoelectronic applications

  • Marcin Łapiński,
  • Jakub Czubek,
  • Katarzyna Drozdowska,
  • Anna Synak,
  • Wojciech Sadowski and
  • Barbara Kościelska

Beilstein J. Nanotechnol. 2021, 12, 1271–1278, doi:10.3762/bjnano.12.94

Graphical Abstract
  • thermal annealing of the gold thin film. Thermal dewetting of gold film results in spherical gold nanostructures with average dimensions of 50 nm. Both, luminescent TiO2:Eu and TeO2:Eu films were deposited by RF magnetron sputtering from mosaic targets. The morphology of the gold nanostructures was
  • ethanol and dried at 50 °C. Plasmonic nanostructures were prepared by thermal dewetting of gold thin films. Thin Au films with a thickness of 2.8 nm were deposited using a tabletop DC magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products, 99.999%) at a pressure of 0.2 Pa
  • was conducted at 200 °C. The second kind of dielectric layer was TiO2. It was prepared by radio frequency (RF) reactive magnetron sputtering using an Omicron Nanotechnology four targets sputter system. A Ti target (99.9%) was sputtered in an argon–oxygen atmosphere (Ar/O2 flow ratio: 5 sccm:30 sccm
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Published 22 Nov 2021

Uniform arrays of gold nanoelectrodes with tuneable recess depth

  • Elena O. Gordeeva,
  • Ilya V. Roslyakov,
  • Alexey P. Leontiev,
  • Alexey A. Klimenko and
  • Kirill S. Napolskii

Beilstein J. Nanotechnol. 2021, 12, 957–964, doi:10.3762/bjnano.12.72

Graphical Abstract
  • deposited by magnetron sputtering onto the bottom side of the AAO template. Electrodeposition of metals into channels of the AAO template was performed in a three-electrode cell with an electrodeposition area of 0.2 cm2 and a volume of 50 mL at room temperature in a potentiostatic mode. A platinum ring
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Published 30 Aug 2021

In situ transport characterization of magnetic states in Nb/Co superconductor/ferromagnet heterostructures

  • Olena M. Kapran,
  • Roman Morari,
  • Taras Golod,
  • Evgenii A. Borodianskyi,
  • Vladimir Boian,
  • Andrei Prepelita,
  • Nikolay Klenov,
  • Anatoli S. Sidorenko and
  • Vladimir M. Krasnov

Beilstein J. Nanotechnol. 2021, 12, 913–923, doi:10.3762/bjnano.12.68

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  • layers composing a single pseudo spin valve. A more complex S2, Nb(50 nm)/[Co(1.5 nm)/Nb(6 nm)/Co(2.5 nm)/Nb(6 mn)]3Co(1.5 nm)/Nb(6 nm)/Si (the structure in square brackets is repeated three times) has five Co layers. MLs are deposited by magnetron sputtering in a single deposition cycle without breaking
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Published 17 Aug 2021

9.1% efficient zinc oxide/silicon solar cells on a 50 μm thick Si absorber

  • Rafal Pietruszka,
  • Bartlomiej S. Witkowski,
  • Monika Ozga,
  • Katarzyna Gwozdz,
  • Ewa Placzek-Popko and
  • Marek Godlewski

Beilstein J. Nanotechnol. 2021, 12, 766–774, doi:10.3762/bjnano.12.60

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  • environmentally friendly solar cells are cells based on zinc oxide (ZnO). ZnO thin films can be obtained using many technologies, including molecular beam epitaxy, RF magnetron sputtering, pulsed laser deposition, chemical vapor deposition, and atomic layer deposition (ALD) [3]. ALD attracts the attention of many
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Published 21 Jul 2021

Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films

  • Petronela Prepelita,
  • Florin Garoi and
  • Valentin Craciun

Beilstein J. Nanotechnol. 2021, 12, 354–365, doi:10.3762/bjnano.12.29

Graphical Abstract
  • dioxide (SiO2) and zinc oxide (ZnO) thin films deposited by radio frequency magnetron sputtering on quartz substrates was investigated. The deposition conditions were optimized to achieve stoichiometric thin films. The orientation of crystallites, structure, and composition were investigated by X-ray
  • calculated from the absorption spectra. The influence of thickness on the structural and optical properties of the oxide films was investigated. Good optical quality and performance were noticed, which makes these thin films worthy of integration into metamaterial structures. Keywords: magnetron sputtering
  • -frequency magnetron sputtering (rfMS) [27][28][29][30], vacuum thermal evaporation (VTE) [31][32][33], chemical methods [34], reactive ion beam sputter deposition [35], among others. For example, SiO2 and ZnO films obtained by rfMS can be either used as dielectric materials in metasurface structures or as
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Published 19 Apr 2021

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

  • Victor Deinhart,
  • Lisa-Marie Kern,
  • Jan N. Kirchhof,
  • Sabrina Juergensen,
  • Joris Sturm,
  • Enno Krauss,
  • Thorsten Feichtner,
  • Sviatoslav Kovalchuk,
  • Michael Schneider,
  • Dieter Engel,
  • Bastian Pfau,
  • Bert Hecht,
  • Kirill I. Bolotin,
  • Stephanie Reich and
  • Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

Graphical Abstract
  • ]. The fabrication of the samples starts by depositing the magnetic multilayer onto 150 nm thick silicon nitride membranes via magnetron sputtering. The membranes are almost transparent for soft X-rays, which are later employed for imaging of the samples. Subsequently, the multilayer film is locally
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Published 06 Apr 2021

Piezotronic effect in AlGaN/AlN/GaN heterojunction nanowires used as a flexible strain sensor

  • Jianqi Dong,
  • Liang Chen,
  • Yuqing Yang and
  • Xingfu Wang

Beilstein J. Nanotechnol. 2020, 11, 1847–1853, doi:10.3762/bjnano.11.166

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  • /GaN NW was transferred to a flexible PET substrate, and ITO electrodes were prepared by magnetron sputtering on both ends of the NW to form an ohmic contact. Measurements The selective EC etching process and the morphology of the NWs were imaged using an optical microscope (Leica DM2500M), an SEM
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Published 10 Dec 2020

Molecular dynamics modeling of the influence forming process parameters on the structure and morphology of a superconducting spin valve

  • Alexander Vakhrushev,
  • Aleksey Fedotov,
  • Vladimir Boian,
  • Roman Morari and
  • Anatolie Sidorenko

Beilstein J. Nanotechnol. 2020, 11, 1776–1788, doi:10.3762/bjnano.11.160

Graphical Abstract
  • being issued [38][39][40]. The general scheme of the investigated nanosystem is presented in Figure 3. The numbers in Figure 3 next to the elements in the layers represent their thickness in nanometers. The sample production is carried out by the magnetron deposition method in vacuum. In general, a
  • layered nanostructure consisting of Nb, CuNi, CoOx and Co layers, prepared by magnetron sputtering. High-resolution transmission electron microscopy (HR-TEM) image of a layered Co, CoOx and CuNi nanostructure prepared by magnetron sputtering. Sketch of a Nb/Co spin-valve nanosystem. The numbers next to
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Published 24 Nov 2020

Piezoelectric sensor based on graphene-doped PVDF nanofibers for sign language translation

  • Shuai Yang,
  • Xiaojing Cui,
  • Rui Guo,
  • Zhiyi Zhang,
  • Shengbo Sang and
  • Hulin Zhang

Beilstein J. Nanotechnol. 2020, 11, 1655–1662, doi:10.3762/bjnano.11.148

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  • piezoelectric sensor. Ti3C2 MXene and Ag NWs maintain the good conductivity of the electrode and avoid possible short-circuit problems occurring after magnetron sputtering. Also, a stable flexibility of the structure is maintained. GR is added with six different mass fractions, that is, 0, 0.2, 0.4, 0.6, 0.8
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Published 02 Nov 2020

A self-powered, flexible ultra-thin Si/ZnO nanowire photodetector as full-spectrum optical sensor and pyroelectric nanogenerator

  • Liang Chen,
  • Jianqi Dong,
  • Miao He and
  • Xingfu Wang

Beilstein J. Nanotechnol. 2020, 11, 1623–1630, doi:10.3762/bjnano.11.145

Graphical Abstract
  • deposited onto 45 μm p-Si by radio frequency (RF) magnetron sputtering. Next, the sample was placed into a solution of 0.877 g hexamethylenetetramine, 1.372 g Zn(CH3COO)2, and 13 mL ammonium hydroxide to grow ZnO NWs for half an hour via a hydrothermal method in a mechanical convection oven at 90 °C
  • . Finally, by RF magnetron sputtering, a 200 nm thick layers of ITO and Cu were deposited on ZnO NWs and p-Si, respectively. Electrical measurements: the measurement setup includes a source meter, an optical platform, a chopper, sample, and a light source. Sample, chopper and light source must be in the
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Published 27 Oct 2020

Oxidation of Au/Ag films by oxygen plasma: phase separation and generation of nanoporosity

  • Abdel-Aziz El Mel,
  • Said A. Mansour,
  • Mujaheed Pasha,
  • Atef Zekri,
  • Janarthanan Ponraj,
  • Akshath Shetty and
  • Yousef Haik

Beilstein J. Nanotechnol. 2020, 11, 1608–1614, doi:10.3762/bjnano.11.143

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  • a high specific surface area. Experimental The Au/Ag films were deposited by magnetron co-sputtering of gold and silver targets (99.99% in purity). The electrical power applied to the gold and silver targets was fixed to 25 and 100 W, respectively. This yielded Au/Ag films with 75 atom % and 25 atom
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Published 22 Oct 2020

Walking energy harvesting and self-powered tracking system based on triboelectric nanogenerators

  • Mingliang Yao,
  • Guangzhong Xie,
  • Qichen Gong and
  • Yuanjie Su

Beilstein J. Nanotechnol. 2020, 11, 1590–1595, doi:10.3762/bjnano.11.141

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  • . Fabrication of the u-TENG The u-TENG fabrication procedure was adapted, with modifications, from [34]. The back electrode was formed by depositing a Cu layer on the unmodified surface of a PTFE film via magnetron sputtering. A poly(dimethylsiloxane) (PDMS)-coated PTFE film was mounted onto a poly(ethylene
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Published 20 Oct 2020

Antimicrobial metal-based nanoparticles: a review on their synthesis, types and antimicrobial action

  • Matías Guerrero Correa,
  • Fernanda B. Martínez,
  • Cristian Patiño Vidal,
  • Camilo Streitt,
  • Juan Escrig and
  • Carol Lopez de Dicastillo

Beilstein J. Nanotechnol. 2020, 11, 1450–1469, doi:10.3762/bjnano.11.129

Graphical Abstract
  • subsections. Physical methods Examples of physical methods used to synthesize NPs are the evaporation/condensation method, magnetron sputtering, mechanochemical processing (MCP), microwave-thermal method, photoreduction process, and pulsed laser ablation, among others. The evaporation/condensation method
  • setup [23]. Magnetron sputtering is a high-rate vacuum-coating technique generally used to synthesize films, multilayer or hybrid systems based on substrate coating. For example, Piedade et al. obtained ZnO, ZnO–C and ZnO–Cu films with thickness values ranging from 385 to 1635 nm. In addition, Galstyan
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Published 25 Sep 2020

Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir

  • Mathias Franz,
  • Romy Junghans,
  • Paul Schmitt,
  • Adriana Szeghalmi and
  • Stefan E. Schulz

Beilstein J. Nanotechnol. 2020, 11, 1439–1449, doi:10.3762/bjnano.11.128

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  • PVD methods. The deposition of gold and palladium was done by magnetron sputtering. The film thickness has been adjusted by the use of a calibrated deposition rate. Ion beam sputter deposition (IBSD) has been used to deposit platinum and copper. For copper deposition, the thickness has been controlled
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Published 23 Sep 2020

Controlling the proximity effect in a Co/Nb multilayer: the properties of electronic transport

  • Sergey Bakurskiy,
  • Mikhail Kupriyanov,
  • Nikolay V. Klenov,
  • Igor Soloviev,
  • Andrey Schegolev,
  • Roman Morari,
  • Yury Khaydukov and
  • Anatoli S. Sidorenko

Beilstein J. Nanotechnol. 2020, 11, 1336–1345, doi:10.3762/bjnano.11.118

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  • prepared by using the magnetron sputtering system Leybold Heraeus Z-400 during a single deposition cycle without depressurization of the chamber. Only three targets were used for the structure preparation: niobium (99.95% purity) was used as a superconducting Cooper pair generator and interlayer separator
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Published 07 Sep 2020

Structural and electronic properties of SnO2 doped with non-metal elements

  • Jianyuan Yu,
  • Yingeng Wang,
  • Yan Huang,
  • Xiuwen Wang,
  • Jing Guo,
  • Jingkai Yang and
  • Hongli Zhao

Beilstein J. Nanotechnol. 2020, 11, 1321–1328, doi:10.3762/bjnano.11.116

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  • . Nguyen successfully prepared p-type N-doped SnO2 films using magnetron sputtering [9]. The results show that the SnO2 films were n-type semiconductors, and the concentration of free carriers in the film increased as the temperature for sedimentation increased. Also, p-type semiconductors were
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Published 03 Sep 2020

Gram-scale synthesis of splat-shaped Ag–TiO2 nanocomposites for enhanced antimicrobial properties

  • Mohammad Jaber,
  • Asim Mushtaq,
  • Kebiao Zhang,
  • Jindan Wu,
  • Dandan Luo,
  • Zihan Yi,
  • M. Zubair Iqbal and
  • Xiangdong Kong

Beilstein J. Nanotechnol. 2020, 11, 1119–1125, doi:10.3762/bjnano.11.96

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  • , magnetron sputtering, molecular precursor techniques and photo-deposition techniques have been applied to the preparation of nanocomposites [6][21][22]. However, these techniques are very sophisticated and not optimized for synthesis on a large scale. Herein, a simple hydrothermal process was employed to
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Published 29 Jul 2020

Electrochemical nanostructuring of (111) oriented GaAs crystals: from porous structures to nanowires

  • Elena I. Monaico,
  • Eduard V. Monaico,
  • Veaceslav V. Ursaki,
  • Shashank Honnali,
  • Vitalie Postolache,
  • Karin Leistner,
  • Kornelius Nielsch and
  • Ion M. Tiginyanu

Beilstein J. Nanotechnol. 2020, 11, 966–975, doi:10.3762/bjnano.11.81

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  • followed by 250 nm Au layer was sputtered using a magnetron from Torr International Inc model No: CRC622-2G2-RF-DC and lift-off was performed with Microposit remover 1165 at 50 °C. Photoelectrical characterization. To excite photoconductivity in the GaAs nanowires, the radiation from a Xenon lamp DKSS-150
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Published 29 Jun 2020

Band tail state related photoluminescence and photoresponse of ZnMgO solid solution nanostructured films

  • Vadim Morari,
  • Aida Pantazi,
  • Nicolai Curmei,
  • Vitalie Postolache,
  • Emil V. Rusu,
  • Marius Enachescu,
  • Ion M. Tiginyanu and
  • Veaceslav V. Ursaki

Beilstein J. Nanotechnol. 2020, 11, 899–910, doi:10.3762/bjnano.11.75

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  • radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE) [2][7][10][11], DC [12][13] and RF [1][3][6] magnetron sputtering, pulsed laser deposition (PLD) [14][15], plasma-enhanced atomic layer deposition (PE-ALD) [16], chemical vapor deposition (CVD) [17], metal–organic chemical vapor deposition
  • –0.78 for Zn1−xMgxO thin films grown by reactive DC magnetron co-sputtering [12]. It was shown that this investigation technique is highly sensitive for the detection of embedded structural inhomogeneities, and it was found that the phase segregation occurs in the range of x = 0.35–0.65 with coexistence
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Published 12 Jun 2020

Epitaxial growth and superconducting properties of thin-film PdFe/VN and VN/PdFe bilayers on MgO(001) substrates

  • Wael M. Mohammed,
  • Igor V. Yanilkin,
  • Amir I. Gumarov,
  • Airat G. Kiiamov,
  • Roman V. Yusupov and
  • Lenar R. Tagirov

Beilstein J. Nanotechnol. 2020, 11, 807–813, doi:10.3762/bjnano.11.65

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  • analysis system. The VN layers were reactively magnetron sputtered from a metallic vanadium target in Ar/N2 plasma, while the Pd1−xFex layers were deposited by co-evaporation of metallic Pd and Fe pellets from calibrated effusion cells in a molecular beam epitaxy chamber. The VN stoichiometry and Pd1−xFex
  • ) and Fe (99.97% purity, ChemPur GmbH, Germany) were co-evaporated from the pre-calibrated high-temperature effusion cells to obtain the desired Pd1−xFex composition. Vanadium nitride layers were synthesized by using reactive DC magnetron sputtering (MS) in the UHV chamber with a base pressure of p ≤ 5
  • synthesis of VN. During the deposition process, the pressure of the Ar/N2 gas mixture in the chamber was automatically kept at 6 × 10−3 mbar. A metallic vanadium disk of 99.95% purity (GIRMET Ltd, Russia) was used as a target. The magnetron power was 50 W, the distance between the target and the substrate
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Published 15 May 2020

A set of empirical equations describing the observed colours of metal–anodic aluminium oxide–Al nanostructures

  • Cristina V. Manzano,
  • Jakob J. Schwiedrzik,
  • Gerhard Bürki,
  • Laszlo Pethö,
  • Johann Michler and
  • Laetitia Philippe

Beilstein J. Nanotechnol. 2020, 11, 798–806, doi:10.3762/bjnano.11.64

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  • Alliance-Concept DP 650 DC magnetron sputtering equipment. 25, 17.5 and 10 nm thin films of gold were deposited on top of the AAO films using a Leica EM ACE600 sputtering equipment. The Au layers were deposited using a sputtering pressure and intensity of 5 × 10−2 mbar and 30 mA, respectively, and the Cr
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Published 13 May 2020

Effect of Ag loading position on the photocatalytic performance of TiO2 nanocolumn arrays

  • Jinghan Xu,
  • Yanqi Liu and
  • Yan Zhao

Beilstein J. Nanotechnol. 2020, 11, 717–728, doi:10.3762/bjnano.11.59

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  • photolithography and the template method by Sung et al. [30]. In this case, Ag particles were loaded on the outside of the nanocolumns by magnetron sputtering, and the catalysis was carried out at a sputtering time of 30 min. Besides, Jani et al. [31] studied the preparation of TiO2 nanotube arrays by anodization
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Published 05 May 2020

Structural optical and electrical properties of a transparent conductive ITO/Al–Ag/ITO multilayer contact

  • Aliyu Kabiru Isiyaku,
  • Ahmad Hadi Ali and
  • Nafarizal Nayan

Beilstein J. Nanotechnol. 2020, 11, 695–702, doi:10.3762/bjnano.11.57

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  • enhanced optical transmittance. Conclusion ITO/Al-Ag/ITO (IAAI) multilayer films were deposited by RF and DC magnetron sputtering at room temperature. The inclusion of the Al–Ag bilayer coupled with annealing at 400 °C significantly enhanced the microstructural, optical and electrical properties of the
  • measurements) were used as substrates. Decon90 glass cleaner was used for glass substrate cleansing. Thin film preparation A SNTEK Korea magnetron sputtering system with a dual radio frequency (RF)/direct current (DC) sputtering source with a main deposition chamber 15.7 inches in height and 23.6 inches in
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Published 27 Apr 2020

Evolution of Ag nanostructures created from thin films: UV–vis absorption and its theoretical predictions

  • Robert Kozioł,
  • Marcin Łapiński,
  • Paweł Syty,
  • Damian Koszelow,
  • Wojciech Sadowski,
  • Józef E. Sienkiewicz and
  • Barbara Kościelska

Beilstein J. Nanotechnol. 2020, 11, 494–507, doi:10.3762/bjnano.11.40

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  • thickness) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products 99.999%). The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1, and the incident power was in the range of 30–40 W. The layer thickness was
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Published 25 Mar 2020
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