Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• large-scale fabrication at low cost is an important issue in further enhancing the use of SERS for routine chemical analysis. Here, we systematically investigate the effect of different radio frequency (rf) plasmas (argon, hydrogen, nitrogen, air and oxygen plasma) as well as combinations of these

• provide an attractive alternative to the often used wet chemical process [75] for obtaining efficient SERS substrates from previously oxidized silver films. A 200 nm sputtered silver film was treated with oxygen plasma at a power of 200 W and a chamber pressure of 0.8 mbar for 15 min. The reduction of the

• oxidized silver film was performed with a hydrogen plasma at a power of 200 W and a chamber pressure of 0.38 mbar for 20 min in order to ensure complete reduction of the silver oxide film. Oxidation of sputtered silver films with oxygen plasma yields a polycrystalline silver oxide film with distinct grain

Electrospun one-dimensional nanostructures: a new horizon for gas sensing materials

• Muhammad Imran,
• Nunzio Motta and
• Mahnaz Shafiei

Beilstein J. Nanotechnol. 2018, 9, 2128–2170, doi:10.3762/bjnano.9.202

• fabrication strategy for synthesis of SnO2 NFs with a branch-on-stem morphology using electrospinning, oxygen plasma etching, sputtering and annealing. Electrospun PVP NFs were first etched with oxygen plasma to make a hierarchical template. Afterwards, a SnO2 film is deposited by sputtering and the PVP

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• feasible to obtain quasi-hexagonally ordered regular arrays of gold nanoparticles over large areas by simple means. For the fabrication of gold nanoparticles gold salts can be used to load the micelle core, and the copolymer can be removed afterwards with an oxygen plasma treatment [18][19][20]. For tuning

• ) chloride (KAuCl4, 0.1 wt %, Sigma-Aldrich), to grow the gold precursor particles with the electroless deposition process. Reactive ion etching (Oxford Plasmalab 80 Plus) was used to remove the polymer with an oxygen plasma treatment with the following settings: process pressure 100 mTorr, power 100 W

• with a quartz glass slide (Figure 1b). In a third step the nanoparticles are enlarged by electroless deposition (Figure 1c), and finally the polymer is removed by an oxygen plasma treatment (Figure 1d). SEM images of the primary distribution of the gold precursor particles without any size increase by

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• . Successively, reactive ion etching was used to selectively remove the portion of the gold film not protected by the nanospheres. The etch rate (2.9 nm/min) was estimated measuring the thickness of the gold film for different etching times. Finally, the nanosphere residues were removed by oxygen plasma

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• simultaneous injection of a reactive gas [25]. Also, it is demonstrated that the metal content of a Au deposit can be significantly increased by continued electron irradiation and a final boost of oxygen plasma cleaning [26] and that the purity of deposits from different metals is enhanced by thermal treatment

A simple extension of the commonly used fitting equation for oscillatory structural forces in case of silica nanoparticle suspensions

• Sebastian Schön and
• Regine von Klitzing

Beilstein J. Nanotechnol. 2018, 9, 1095–1107, doi:10.3762/bjnano.9.101

• (RCA method) [59]. The substrates were then rinsed extensively with water and dried in a nitrogen stream. Afterwards they were stored in a closed vessel in isopropanol (99.5% Geyer). Both, wafers and cantilevers were cleaned using an oxygen plasma (Diener electronics Femto) for 20 min immediately

Comparative study of antibacterial properties of polystyrene films with TiO_x and Cu nanoparticles fabricated using cluster beam technique

• Vladimir N. Popok,
• Cesarino M. Jeppesen,
• Peter Fojan,
• Anna Kuzminova,
• Jan Hanuš and
• Ondřej Kylián

Beilstein J. Nanotechnol. 2018, 9, 861–869, doi:10.3762/bjnano.9.80

• exposed to an RF capacitively coupled oxygen plasma (Figure 7b). Oxygen plasma treatment is performed at a pressure of 4 Pa, an applied RF power of 40 W and at a distance between RF electrode and a sample of 4 cm. For “type 3”, the clusters are in-flight plasma-treated prior to the deposition on a

• of (a) cluster deposition for samples of type 1, (b) treatment with oxygen plasma for samples of type 2 and (c) in-flight oxidation of the clusters for samples of type 3. Schematic picture of setup for antibacterial experiments with TiOx NPs. Survival ratio of E.coli cells deposited on TiOx and Cu

A review of carbon-based and non-carbon-based catalyst supports for the selective catalytic reduction of nitric oxide

• Shahreen Binti Izwan Anthonysamy,
• Syahidah Binti Afandi,
• Mehrnoush Khavarian and
• Abdul Rahman Bin Mohamed

Beilstein J. Nanotechnol. 2018, 9, 740–761, doi:10.3762/bjnano.9.68

• after being treated at 500 °C. Meanwhile, Zhu et al. [96] modified ACF through low-temperature oxygen plasma and nitric acid, which are respectively denoted as activated carbon modified by plasma (ACFP) and activated carbon modified by nitric acid (ACFN). The results indicate that the CeO2 species on

Synthesis and characterization of two new TiO₂-containing benzothiazole-based imine composites for organic device applications

• Anna Różycka,
• Agnieszka Iwan,
• Krzysztof Artur Bogdanowicz,
• Michal Filapek,
• Natalia Górska,
• Damian Pociecha,
• Marek Malinowski,
• Patryk Fryń,
• Agnieszka Hreniak,
• Jakub Rysz,
• Paweł Dąbczyński and
• Monika Marzec

Beilstein J. Nanotechnol. 2018, 9, 721–739, doi:10.3762/bjnano.9.67

• )/Au multilayer structures. First, the ITO-coated glass substrate was cleaned by ultrasonication in acetone and isopropanol for ≈20 min and oxygen plasma for 30 s. TiO2 (3Dnano P25, average particle size 21 ± 5 nm, mixed rutile (20%)/anatase (80%) phases, and a surface area of 50 m2/g) was mixed with

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• activated by 40 s of oxygen plasma exposure at a power of 18 W with 0.5 mbar oxygen flow. Thereafter, the stamps were conformally sealed onto the SAM-modified substrates to initiate a contact-induced reaction for typically 60 min. After separating the contact-sealed stamps from the Au substrates, 0.5 μM

• deionized water between single steps. Multiplexed biological probe-anchored platform. After 40 s of oxygen plasma treatment, a flat PDMS stamp was conformally sealed onto a MCU SAM modified Au substrate for 60 min. After the stamp removal, the Au substrate was conformally sealed to another plasma-treated

• recognition. Hydrophilic group-terminated alkanethiol molecules provide a strong interaction toward an oxygen-plasma-treated PDMS surface, which is the best option for generating SAM ruptures by substrate top layer Au–Au bond breakage [11][28][29][30][31][32]. Another important task in the CLL operation is

Bombyx mori silk/titania/gold hybrid materials for photocatalytic water splitting: combining renewable raw materials with clean fuels

• Stefanie Krüger,
• Michael Schwarze,
• Otto Baumann,
• Christina Günter,
• Michael Bruns,
• Christian Kübel,
• Dorothée Vinga Szabó,
• Rafael Meinusch,
• Verónica de Zea Bermudez and
• Andreas Taubert

Beilstein J. Nanotechnol. 2018, 9, 187–204, doi:10.3762/bjnano.9.21

• et al. used tetrabutylorthotitanate, Ti(OBu)4, and bis(P,P-bis-ethylhexyldiphosphato)ethanediolatotitanate (BPET, C34H74O16P4Ti) in a cold oxygen plasma to coat B. mori silk fabrics with TiO2 to produce a UV resistant material [36]. The current study also focuses on B. mori silk rather than cotton as

Atomic layer deposition and properties of ZrO₂/Fe₂O₃ thin films

• Kristjan Kalam,
• Helina Seemen,
• Peeter Ritslaid,
• Mihkel Rähn,
• Aile Tamm,
• Kaupo Kukli,
• Aarne Kasikov,
• Joosep Link,
• Raivo Stern,
• Salvador Dueñas,
• Helena Castán and
• Héctor García

Beilstein J. Nanotechnol. 2018, 9, 119–128, doi:10.3762/bjnano.9.14

• ferromagnetic properties. The ferroelectric properties of ALD-grown undoped zirconia have also been investigated [20]. ZrO2 thin films were deposited by remote plasma ALD from tetrakis(dimethylamido)zirconium(IV) and oxygen plasma, and were found to exhibit ferroelectric behavior. ALD and physical vapor

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• trimmed with a diamond scribe to ≈1 × 1 cm sample size. The substrates were annealed with a hydrogen flame and incubated in 1.0 mM ethanolic solutions of mercaptoundecanol overnight at room temperature and ambient pressure to form SAMs. The patterned PDMS stamps were treated with oxygen plasma (Harrick

• and degassed for an additional 5–10 min. Flat PDMS films were physically attached to glass slide pieces to minimize damage to their surfaces during handling. Dry glass slide pieces were treated with an oxygen plasma for 40 s. Upon removing the silicon pieces with PDMS from the desiccator, a small drop

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• . Carbon contamination had a pronounced negative influence on the activity of the EBID deposits. The CNT yield on these deposits was low and post-treatment with oxygen plasma was necessary to clean the EBID Co deposits before the corresponding CVD experiment could be successfully conducted with sufficient

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• atom %, depending on the sustained electron beam dose. As a second step, oxygen-plasma treatment is established to further enhance the Au content in the structures, while preserving their morphology to a high degree. This two-step process represents a simple, feasible and high-throughput method for

• direct writing of purer gold nanostructures that can enable their future use for demanding applications. Keywords: FEBID; gold nanostructures; oxygen plasma; postdeposition purification; Introduction Focused electron beam induced deposition (FEBID) is an additive direct-write method for making complex

• issue. For that reason, this study focuses on the optimization of deposition mechanism using a commercially available metal-organic gold precursor and explores oxygen-plasma treatment as a potentially viable large-scale postdeposition purification method for 2D and 3D nanostructures. Over the last few

Strategy to discover full-length amyloid-beta peptide ligands using high-efficiency microarray technology

• Clelia Galati,
• Natalia Spinella,
• Lucio Renna,
• Danilo Milardi,
• Francesco Attanasio,
• Michele Francesco Maria Sciacca and
• Corrado Bongiorno

Beilstein J. Nanotechnol. 2017, 8, 2446–2453, doi:10.3762/bjnano.8.243

• slides were properly prepared. Oxygen-plasma treatment was utilized to remove surface contaminations. This cleaning processing is useful to obtain slides with low fluorescence background, becoming a mandatory path when no wet cleaning protocol can be applied, such as in innovative integrated technologies

A systematic study of the controlled generation of crystalline iron oxide nanoparticles on graphene using a chemical etching process

• Peter Krauß,
• Jörg Engstler and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2017, 8, 2017–2025, doi:10.3762/bjnano.8.202

• ). After synthesis, the copper foil was rapidly removed from the heating zone of the setup under reduced pressure in a pure hydrogen atmosphere. Modified chemical etching The backside of the copper foil was etched in oxygen plasma (Diener Electronics, Plasma System Femto, 300 W power limited to 200 W). The

Bi-layer sandwich film for antibacterial catheters

• Gerhard Franz,
• Florian Schamberger,
• Hamideh Heidari Zare,
• Sara Felicitas Bröskamp and
• Dieter Jocham

Beilstein J. Nanotechnol. 2017, 8, 1982–2001, doi:10.3762/bjnano.8.199

• temperatures, typically at 70 °C. Of paramount importance is the pre-treatment of the hydrophobic substrates (polyurethane and polysilicon), which can be carried out with an oxygen plasma, either by microwave generation (100 E TechnicsPlasma, Kirchheim, Germany), or by RF generation (PlasmaLab 80, Oxford

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

• Laura Evangelio,
• Federico Gramazio,
• Matteo Lorenzoni,
• Michaela Gorgoi,
• Francisco Miguel Espinosa,
• Ricardo García,
• Francesc Pérez-Murano and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

• silicon wafer, left in the Figure) and the block copolymer domains. The first DSA (two steps) process uses electron beam lithography (EBL) [12] on a poly(methyl methacrylate) (PMMA) resist with a subsequent substrate functionalization with oxygen plasma of the uncovered areas (top of Figure 1). The two

• the brush surface while applying a voltage under high humidity conditions. Details on the preparation methods can be found in the Experimental section. Results and Discussion Two-step electron beam and oxygen plasma modification Figure 2 shows SEM images of directed self-assembled films of PS-b-PMMA

• BCP prepared on substrates modified with EBL and oxygen plasma and annealed using the two selected annealing processes described above: (Figure 2a) 230 °C in nitrogen atmosphere for 5 min and cooling in nitrogen and (Figure 2b) 260 °C in nitrogen atmosphere for 5 min and cooling in air. A scheme with

Parylene C as a versatile dielectric material for organic field-effect transistors

• Tomasz Marszalek,
• Maciej Gazicki-Lipman and
• Jacek Ulanski

Beilstein J. Nanotechnol. 2017, 8, 1532–1545, doi:10.3762/bjnano.8.155

• , namely charge trapping caused by mechanical bending [33]. In another work, ultra-thin Parylene C insulating layers were fabricated on Au gate electrodes by reducing the parylene film thickness to 18 nm with the help of oxygen plasma etching [33]. This procedure enabled the manufacturing of OFET devices

• ]. It appears that adhesion forces of Parylene C not only depend on the type of substrate, but they can also be easily modified by surface processing, such as oxygen plasma treatment or thermal annealing [64]. Which procedure is to be applied strongly depends on the material used and on the further

A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls

• Carlos Angulo Barrios and
• Víctor Canalejas-Tejero

Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124

• on conventional microelectronic fabrication processes and exploits the permeability of thin metal films to hollow-out polymer-filled metal nanocages through an oxygen-plasma process. The technique is used for fabricating arrays of cylindrical nanocages made of thin Al shells on silicon substrates

• template by means of an oxygen-plasma treatment (ashing). The latter is enabled by the permeability and thinness of the metal film deposited on the nanopatterned resist sidewalls, which allows oxygen species to react with the organic polymer template. The technique is demonstrated through the fabrication

• nanopillar slope favors metal deposition on the sidewalls, as evidenced by the granular appearance of these surfaces. Finally, an oxygen-plasma treatment is applied to the structure leading to the result shown in Figure 1c. The pillars look transparent to the electron beam, revealing the thinness of the Al

Hierarchically structured nanoporous carbon tubes for high pressure carbon dioxide adsorption

• Julia Patzsch,
• Deepu J. Babu and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2017, 8, 1135–1144, doi:10.3762/bjnano.8.115

• functionalization was carried out on a radio frequency (13.56 MHz) parallel plate plasma setup (Femto, Diener electronic GmbH, Germany) with a maximum power rating of 300 W. After the chamber was evacuated to low-pressure residual air (0.3 mbar), the PS fibre samples (1) were treated with an oxygen plasma generated

Ultrasmall magnetic field-effect and sign reversal in transistors based on donor/acceptor systems

• Thomas Reichert and
• Tobat P. I. Saragi

Beilstein J. Nanotechnol. 2017, 8, 1104–1114, doi:10.3762/bjnano.8.112

• laboratory. Prior to the deposition of Spiro-TTB and HAT-CN, the predefined substrates were cleaned with acetone, 2-propanol and deionized water, followed by oxygen-plasma treatment and exposure to hexamethyldisilazane to replace the natural hydroxyl end group of SiO2 with an apolar methoxy group. Finally

Optical response of heterogeneous polymer layers containing silver nanostructures

• Miriam Carlberg,
• Florent Pourcin,
• Olivier Margeat,
• Judikaël Le Rouzo,
• Gérard Berginc,
• Rose-Marie Sauvage,
• Jörg Ackermann and
• Ludovic Escoubas

Beilstein J. Nanotechnol. 2017, 8, 1065–1072, doi:10.3762/bjnano.8.108

• optical index difference between the substrate and the thin film layer, thus a silicon wafer was chosen. The substrates were cleaned in an ultrasonic bath in acetone and ethanol, dried by nitrogen flow and an oxygen plasma. The latter step also increased the wettability of the substrate. The deposition of

The integration of graphene into microelectronic devices

• Guenther Ruhl,
• Sebastian Wittmann,
• Matthias Koenig and
• Daniel Neumaier

Beilstein J. Nanotechnol. 2017, 8, 1056–1064, doi:10.3762/bjnano.8.107

• etch the hardmask by a selective plasma etch or wet etch, followed by a second highly substrate-selective oxygen-plasma etch step to remove graphene. Both methods are schematically depicted in Figure 8a. The first method seems to be more suitable for the fabrication of side contacts. However, it needs