Hydrophilicity and carbon chain length effects on the gas sensing properties of chemoresistive, self-assembled monolayer carbon nanotube sensors

• Juan Casanova-Cháfer,
• Carla Bittencourt and
• Eduard Llobet

Beilstein J. Nanotechnol. 2019, 10, 565–577, doi:10.3762/bjnano.10.58

• . Experimental Functionalization of carbon nanotubes Multiwall carbon nanotubes (MWCNTs) functionalized with carboxylic acid (COOH) were purchased from Nanocyl S.A. (Belgium). These nanotubes were produced by a catalytic chemical vapor deposition (c-CVD method) and purified to greater than 95%. The average

Direct observation of the CVD growth of monolayer MoS₂ using in situ optical spectroscopy

• Claudia Beatriz López-Posadas,
• Yaxu Wei,
• Wanfu Shen,
• Daniel Kahr,
• Michael Hohage and
• Lidong Sun

Beilstein J. Nanotechnol. 2019, 10, 557–564, doi:10.3762/bjnano.10.57

• dichalcogenide (2D TMDC) materials. However, it is very challenging to carry out such studies during chemical vapor deposition (CVD). Here, we report the first, real time, in situ study of the CVD growth of 2D TMDCs. More specifically, the CVD growth of a molybdenum disulfide (MoS2) monolayer on sapphire

• the temperature distribution in the CVD reactor has been revealed. Our results demonstrate the great potential of real time, in situ optical spectroscopy to assist the precisely controlled growth of 2D semiconductor materials. Keywords: chemical vapor deposition (CVD); in situ differential optical

• synthesizing large-area 2D TMDCs have been reported, including mechanical exfoliation, sulphurization of metal thin films, mass transport, molecular beam epitaxy (MBE) and chemical vapor deposition (CVD) [6][7]. In particular, CVD is considered to be an attractive and very promising approach for large-scale

Nanocomposite–parylene C thin films with high dielectric constant and low losses for future organic electronic devices

• Marwa Mokni,
• Gianluigi Maggioni,
• Abdelkader Kahouli,
• Sara M. Carturan,
• Walter Raniero and
• Alain Sylvestre

Beilstein J. Nanotechnol. 2019, 10, 428–441, doi:10.3762/bjnano.10.42

• Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro, Viale dell’Università 2, 35020 Legnaro (PD), Italy 10.3762/bjnano.10.42 Abstract Nanocomposite–parylene C (NCPC) thin films were deposited with a new technique based on the combination of chemical vapor deposition (CVD) for parylene C

• voltages of TFTs [2]. Unfortunately these approaches can not be used when parylene C (PPXC) is chosen as gate dielectric as the only proven process for producing high-quality PPXC layers is chemical vapor deposition (CVD). Parylene C has emerged as a particularly interesting material for organic electronic

• chemical vapor deposition polymerization of parylene C combined with RF-sputtering of silver. It was demonstrated that the plasma itself induces changes in the density and semi-crystalline character of parylene C. A decrease in the density, an increase in the degree of crystallinity and an increase of

Biocompatible organic–inorganic hybrid materials based on nucleobases and titanium developed by molecular layer deposition

• Leva Momtazi,
• Henrik H. Sønsteby and
• Ola Nilsen

Beilstein J. Nanotechnol. 2019, 10, 399–411, doi:10.3762/bjnano.10.39

• enables control of cell–surface interactions, which plays a major role in controlling the bioactivity of solid surfaces. Biocompatibility can be enhanced by coating the surface using various thin film deposition techniques such as chemical vapor deposition (CVD), physical vapor deposition (PVD) or atomic

Sub-wavelength waveguide properties of 1D and surface-functionalized SnO₂ nanostructures of various morphologies

• Venkataramana Bonu,
• Binaya Kumar Sahu,
• Arindam Das,
• Sankarakumar Amirthapandian,
• Sandip Dhara and
• Harish C. Barshilia

Beilstein J. Nanotechnol. 2019, 10, 379–388, doi:10.3762/bjnano.10.37

• chemical vapor deposition (CVD) technique has been widely used for the controlled preparation of nanostructures [23]. Especially the vapor–solid (VS) process, without the involvement of catalysts, and the vapor–liquid–solid (VLS) process, with the assistance of catalysts, are utilized for the growth of

Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

• Eduardo Nery Duarte de Araujo,
• Thiago Alonso Stephan Lacerda de Sousa,
• Luciano de Moura Guimarães and
• Flavio Plentz

Beilstein J. Nanotechnol. 2019, 10, 349–355, doi:10.3762/bjnano.10.34

• electrical properties to surface phenomena and the existence of several routes for its surface functionalization, grant this 2D material plenty of application possibilities [1][2][3][4][5][6][7][8]. Among the several synthesis methods of high-quality graphene, chemical vapor deposition (CVD) stands out as

Study of silica-based intrinsically emitting nanoparticles produced by an excimer laser

• Imène Reghioua,
• Mattia Fanetti,
• Sylvain Girard,
• Diego Di Francesca,
• Simonpietro Agnello,
• Layla Martin-Samos,
• Marco Cannas,
• Matjaz Valant,
• Melanie Raine,
• Marc Gaillardin,
• Nicolas Richard,
• Philippe Paillet,
• Aziz Boukenter,
• Youcef Ouerdane and
• Antonino Alessi

Beilstein J. Nanotechnol. 2019, 10, 211–221, doi:10.3762/bjnano.10.19

• . The first one is doped with 20 wt % Ge, produced by plasma-activated chemical vapor deposition (PCVD) [23][30]. The second one is a pure silica synthetic commercial sample containing high OH content [31], similar to the one irradiated with a 500 fs 248 nm laser in [15]. The nanoparticle synthesis was

Zn/F-doped tin oxide nanoparticles synthesized by laser pyrolysis: structural and optical properties

• Florian Dumitrache,
• Iuliana P. Morjan,
• Elena Dutu,
• Ion Morjan,
• Claudiu Teodor Fleaca,
• Monica Scarisoreanu,
• Alina Ilie,
• Marius Dumitru,
• Cristian Mihailescu,
• Adriana Smarandache and
• Gabriel Prodan

Beilstein J. Nanotechnol. 2019, 10, 9–21, doi:10.3762/bjnano.10.2

• [17]. Highly conductive films based on amorphous Co-doped SnO2 were also synthesized using a pulsed spray evaporation chemical vapor deposition (CVD) technique [18]. One of the most reported cationic dopants for tin oxide is Zn2+, where the obtained zinc-doped tin oxide (ZTO) films show lower bandgap

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

• Diana El Khoury,
• Richard Arinero,
• Jean-Charles Laurentie,
• Mikhaël Bechelany,
• Michel Ramonda and
• Jérôme Castellon

Beilstein J. Nanotechnol. 2018, 9, 2999–3012, doi:10.3762/bjnano.9.279

• . ALD is a smooth chemical vapor deposition technique, expected to leave hydroxide OH groups on the surface. Conversely, PSD might induce a more homogeneous ionic surface state; O− and O2− could be typically introduced due to the small amount of reactive oxygen gas that is added to the neutral argon gas

Investigation of CVD graphene as-grown on Cu foil using simultaneous scanning tunneling/atomic force microscopy

• Majid Fazeli Jadidi,
• Umut Kamber,
• Oğuzhan Gürlü and
• H. Özgür Özer

Beilstein J. Nanotechnol. 2018, 9, 2953–2959, doi:10.3762/bjnano.9.274

• an inequivalent electronic structure in HOPG or multilayer graphene due to the presence of a carbon atom or a hollow site underneath. In this work, we report small-amplitude, simultaneous STM/AFM imaging using a metallic (tungsten) tip, of the graphene surface as-grown by chemical vapor deposition

• surface, and A is the measured amplitude during tip–surface interactions [34]. Graphene layers were grown on Cu foils using chemical vapor deposition (CVD) [35]. A custom-built atmospheric CVD system was used. Cu foils were heated under H2 + Ar atmosphere up to 950 °C. Upon reaching the process

Site-controlled formation of single Si nanocrystals in a buried SiO₂ matrix using ion beam mixing

• Xiaomo Xu,
• Thomas Prüfer,
• Daniel Wolf,
• Hans-Jürgen Engelmann,
• Lothar Bischoff,
• René Hübner,
• Karl-Heinz Heinig,
• Wolfhard Möller,
• Stefan Facsko,
• Johannes von Borany and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2018, 9, 2883–2892, doi:10.3762/bjnano.9.267

• -oxide-semiconductor (CMOS) technology and thus have yet to be integrated into a cost-efficient Si-based technology. Multiple methods have been proposed and optimized for Si NC fabrication, including plasma-enhanced chemical vapor deposition (PECVD) [4][10], magnetron sputtering [11][12], laser-induced

Near-infrared light harvesting of upconverting NaYF₄:Yb³⁺/Er³⁺-based amorphous silicon solar cells investigated by an optical filter

• Daiming Liu,
• Qingkang Wang and
• Qing Wang

Beilstein J. Nanotechnol. 2018, 9, 2788–2793, doi:10.3762/bjnano.9.260

• and ethanol for several times, and dried at 70 °C. The a-Si:H solar cell with an intrinsic p–i–n configuration was deposited on a 3 mm glass substrate by plasma-enhanced chemical vapor deposition. The front and back contact electrodes were deposited as AZO transparent conductive films. Then, the

Oriented zinc oxide nanorods: A novel saturable absorber for lasers in the near-infrared

• Pavel Loiko,
• Tanujjal Bora,
• Josep Maria Serres,
• Haohai Yu,
• Magdalena Aguiló,
• Francesc Díaz,
• Uwe Griebner,
• Valentin Petrov,
• Xavier Mateos and
• Joydeep Dutta

Beilstein J. Nanotechnol. 2018, 9, 2730–2740, doi:10.3762/bjnano.9.255

• epitaxy, metal-organic chemical vapor deposition, pulsed laser deposition), or by wet-chemical processes (e.g., the hydrothermal method, electrochemical deposition) [4]. The hydrothermal growth of ZnO NRs is a relatively simple, versatile and low temperature process [5]. ZnO NRs are used in gas sensors

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• -resistance and magneto-thermopower measurements on single Co–Ni alloy nanowires have been reported [10]. Several methods have been reported for the controlled fabrication of magnetic nanowires including lithographical techniques, chemical vapor deposition and hydrothermal growth [11][12][13]. The main

Metal–dielectric hybrid nanoantennas for efficient frequency conversion at the anapole mode

• Valerio F. Gili,
• Lavinia Ghirardini,
• Davide Rocco,
• Giuseppe Marino,
• Ivan Favero,
• Iännis Roland,
• Giovanni Pellegrini,
• Lamberto Duò,
• Marco Finazzi,
• Luca Carletti,
• Andrea Locatelli,
• Aristide Lemaître,
• Dragomir Neshev,
• Costantino De Angelis,
• Giuseppe Leo and
• Michele Celebrano

Beilstein J. Nanotechnol. 2018, 9, 2306–2314, doi:10.3762/bjnano.9.215

• SiOx are deposited on the surface via plasma-enhanced chemical vapor deposition (PECVD) to later improve the adhesion of the negative-tone HSQ resist on the III–V layer. A first positive-tone lithography step with PMMA resist is performed to realize the alignment structures, followed by electron beam

Metal-free catalysis based on nitrogen-doped carbon nanomaterials: a photoelectron spectroscopy point of view

• Mattia Scardamaglia and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2018, 9, 2015–2031, doi:10.3762/bjnano.9.191

• -synthetic treatments. The most common technique for doping during the synthesis is chemical vapor deposition (CVD), similar to the synthesis of the pristine material [36][69][70], albeit using nitrogen-containing precursors such as benzylamine [71], acetonitrile [72][73], phthalocyanines [74][75] or ammonia

Synthesis of carbon nanowalls from a single-source metal-organic precursor

• André Giese,
• Sebastian Schipporeit,
• Volker Buck and
• Nicolas Wöhrl

Beilstein J. Nanotechnol. 2018, 9, 1895–1905, doi:10.3762/bjnano.9.181

• vapor deposition (ICP-PECVD) is investigated. The CNWs are electrically conducting and show a large specific surface area, which is a key characteristic to make them interesting for sensors, catalytic applications or energy-storage systems. It was recently discovered that CNW films can be deposited by

• Andre Giese Sebastian Schipporeit Volker Buck Nicolas Wohrl Faculty of Physics and CENIDE, University Duisburg Essen, Carl-Benz-Straße 199, 47057 Duisburg, Germany 10.3762/bjnano.9.181 Abstract In this work, the deposition of carbon nanowalls (CNWs) by inductively coupled plasma enhanced chemical

SO₂ gas adsorption on carbon nanomaterials: a comparative study

• Deepu J. Babu,
• Divya Puthusseri,
• Frank G. Kühl,
• Sherif Okeil,
• Michael Bruns,
• Manfred Hampe and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 1782–1792, doi:10.3762/bjnano.9.169

• vapor deposition [56][57]. The bimetallic catalyst system for the VACNT growth was prepared by depositing a thin layer of aluminum (13–15 nm) over the substrate through thermal evaporation in a vacuum of 10−6 mbar, followed by the sputter deposition of 1.2 nm of an iron catalyst layer. The synthesis was

• with a total length of 5–20 μm. SWNTs have a diameter of ca. 1.5 nm, a length of 1–5 µm and were produced by using CVD with a purity of >95%. Vertically aligned carbon nanotubes (VACNTs) were synthesized in our lab over a Si/SiO2 (600 nm) substrate in a quartz furnace using water-assisted chemical

Toward the use of CVD-grown MoS₂ nanosheets as field-emission source

• Geetanjali Deokar,
• Nitul S. Rajput,
• Junjie Li,
• Francis Leonard Deepak,
• Wei Ou-Yang,
• Nicolas Reckinger,
• Carla Bittencourt,
• Jean-Francois Colomer and
• Mustapha Jouiad

Beilstein J. Nanotechnol. 2018, 9, 1686–1694, doi:10.3762/bjnano.9.160

• the fabricated MoS2 NSs could have a great potential as robust high-performance electron-emitter material for various applications such as microelectronics and nanoelectronics, flat-panel displays and electron-microscopy emitter tips. Keywords: chemical vapor deposition (CVD); field emission

• ][16] and the number of layers [16]. Various methods have been used to synthesize vertically aligned MoS2 NSs: liquid-phase exfoliation [17], hydrothermal synthesis [8] or chemical vapor deposition (CVD) [15][17][18]. CVD is regarded as the most promising method to synthesize high-quality MoS2 with

Light extraction efficiency enhancement of flip-chip blue light-emitting diodes by anodic aluminum oxide

• Yi-Ru Huang,
• Yao-Ching Chiu,
• Kuan-Chieh Huang,
• Shao-Ying Ting,
• Po-Jui Chiang,
• Chih-Ming Lai,
• Chun-Ping Jen,
• Snow H. Tseng and
• Hsiang-Chen Wang

Beilstein J. Nanotechnol. 2018, 9, 1602–1612, doi:10.3762/bjnano.9.152

• reflected by the surface roughness of LEDs. RCWA analysis indicated that surface plasmon waves are not involved in LEE enhancement. Experimental To produce a typical LED chip with a single-sided PSS, InGaN/GaN MQW LEDs were grown on c-plane (0001)-oriented PSSs using a metal–organic chemical vapor

• deposition apparatus. An inductively coupled plasma etcher was used to prepare periodic arrays with a depth of 1.5 μm on the PSS. Trimethylgallium, trimethylindium, ammonia, bicyclopentadienyl magnesium, and silane served as the precursors of Ga, In, N, Mg, and Si, respectively. The epitaxial structure of

Electrostatically actuated encased cantilevers

• Benoit X. E. Desbiolles,
• Gabriela Furlan,
• Adam M. Schwartzberg,
• Paul D. Ashby and
• Dominik Ziegler

Beilstein J. Nanotechnol. 2018, 9, 1381–1389, doi:10.3762/bjnano.9.130

• . Beginning with gold-coated silicon cantilevers (NSC 19, Mikromasch) (1), we use chemical vapor deposition to coat a 11 μm thick sacrificial polymer layer followed by a 2 μm thick parylene layer. The first layer serves as sacrificial film that defines the air gap and the parylene builds the encasement. Next

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• chemical vapor deposition (CVD), which is a thermally driven process [6]. Consequently, these precursors are optimized with respect to thermal chemistry and do not necessarily perform well in the electron-driven FEBID process. In fact, they often experience incomplete fragmentation so that material from

Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• at rates comparable to conventional techniques such as laser-induced chemical vapor deposition. The deposition rate and stoichiometry of boron oxide fabricated by EBID using trimethyl borate (TMB) as precursor is found to be critically dependent on the substrate temperature. By comparing the

• and undergoes subsequent reaction with an electron beam. The process has major advantages over thermal chemical vapor deposition (CVD) processes one of which being that the substrate is not exposed to the elevated temperatures required for the thermal decomposition of precursor molecules. To date, the

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• deposition should furthermore provide for conductive deposits with a preferably high copper content. Here, the metal-organic precursor bis(tert-butylacetoacetato)Cu(II) (CAS: 23670-45-3, C16H26CuO6) is introduced as a fluorine-free alternative. This precursor is known from chemical vapor deposition (CVD

Review on nanoparticles and nanostructured materials: history, sources, toxicity and regulations

• Jaison Jeevanandam,
• Ahmed Barhoum,
• Yen S. Chan,
• Alain Dufresne and
• Michael K. Danquah

Beilstein J. Nanotechnol. 2018, 9, 1050–1074, doi:10.3762/bjnano.9.98

• morphologies such as hollow tubes, ellipsoids or spheres. Fullerenes (C60), carbon nanotubes (CNTs), carbon nanofibers, carbon black, graphene (Gr), and carbon onions are included under the carbon-based NMs category. Laser ablation, arc discharge, and chemical vapor deposition (CVD) are the important