Fabrication of nano/microstructures for SERS substrates using an electrochemical method

• Jingran Zhang,
• Tianqi Jia,
• Xiaoping Li,
• Junjie Yang,
• Zhengkai Li,
• Guangfeng Shi,
• Xinming Zhang and
• Zuobin Wang

Beilstein J. Nanotechnol. 2020, 11, 1568–1576, doi:10.3762/bjnano.11.139

• machined by using lithography-based method [15][16][17][18][19][20]. Additionally, nanostructures are also fabricated by hybrid lithography [21][22][23][24][25][26] methods combined with dry etching or wet etching. For example, the commercial Klarite substrate [21][22][23] machined by electron beam

Effect of localized helium ion irradiation on the performance of synthetic monolayer MoS₂ field-effect transistors

• Jakub Jadwiszczak,
• Pierce Maguire,
• Conor P. Cullen,
• Georg S. Duesberg and
• Hongzhou Zhang

Beilstein J. Nanotechnol. 2020, 11, 1329–1335, doi:10.3762/bjnano.11.117

• synthesized using a CVD microreactor method, described in detail in [33], directly on 285 nm SiO2/Si substrates, which also served as the back-gate in the FET configuration. MoS2 flakes were contacted with electrodes using standard electron beam lithography on polymethyl methacrylate (PMMA) resist, followed

An atomic force microscope integrated with a helium ion microscope for correlative nanoscale characterization

• Santiago H. Andany,
• Gregor Hlawacek,
• Stefan Hummel,
• Charlène Brillard,
• Mustafa Kangül and
• Georg E. Fantner

Beilstein J. Nanotechnol. 2020, 11, 1272–1279, doi:10.3762/bjnano.11.111

• technique with electron beam and ion beam techniques for correlative nanoscale characterization and nanoscale fabrication. The motivation was driven by the new opportunity to investigate and transform features in situ with complementary techniques, thus revealing maximum information without breaking the

• correlative imaging on electrically insulating samples. In this first attempt, the readout of cantilever deflection was achieved using the electron beam itself. Shortly after, better performing combined setups were described utilizing more conventional self-sensing [5] and optical [6] techniques for the

• sensitivities to helium ion irradiation than to electron irradiation in terms of charge per area [14]. Patterning resolution down to 4 nm has been demonstrated on HSQ resist [15], surpassing electron beam lithography, which greatly suffers from the proximity effect. In a combined AFM–HIM setup, the AFM could be

Proximity effect in [Nb(1.5 nm)/Fe(x)]₁₀/Nb(50 nm) superconductor/ferromagnet heterostructures

• Yury Khaydukov,
• Sabine Pütter,
• Laura Guasco,
• Roman Morari,
• Gideok Kim,
• Thomas Keller,
• Anatolie Sidorenko and
• Bernhard Keimer

Beilstein J. Nanotechnol. 2020, 11, 1254–1263, doi:10.3762/bjnano.11.109

• thermal evaporation from an effusion cell while Nb and Pt were grown by electron beam evaporation. Reflection high-energy electron diffraction (RHEED) was measured in situ during deposition to trace the structure of the atomic layer being deposited. For the RHEED experiment, an electron beam of 15 keV

Magnetic-field-assisted synthesis of anisotropic iron oxide particles: Effect of pH

• Andrey V. Shibaev,
• Petr V. Shvets,
• Darya E. Kessel,
• Roman A. Kamyshinsky,
• Anton S. Orekhov,
• Sergey S. Abramchuk,
• Alexei R. Khokhlov and
• Olga E. Philippova

Beilstein J. Nanotechnol. 2020, 11, 1230–1241, doi:10.3762/bjnano.11.107

• areas of all peaks from the experimental samples coincide with the reference sample, indicating an absence of texturing in the rod-like nanoparticles. Consequently, since most of the rods are oriented perpendicular to the electron beam, it can be assumed that there is no preferential crystal plane

Gram-scale synthesis of splat-shaped Ag–TiO₂ nanocomposites for enhanced antimicrobial properties

• Mohammad Jaber,
• Asim Mushtaq,
• Kebiao Zhang,
• Jindan Wu,
• Dandan Luo,
• Zihan Yi,
• M. Zubair Iqbal and
• Xiangdong Kong

Beilstein J. Nanotechnol. 2020, 11, 1119–1125, doi:10.3762/bjnano.11.96

• , antimicrobial and photocatalytic activities [3]. The main challenges of using the nanocomposites in the biomedical and textile-coating fields are to keep the synthesis processes at a low cost and to control for yield and stability issues. Currently, a number of techniques such as electron beam evaporation

Transition from freestanding SnO₂ nanowires to laterally aligned nanowires with a simulation-based experimental design

• Jasmin-Clara Bürger,
• Sebastian Gutsch and
• Margit Zacharias

Beilstein J. Nanotechnol. 2020, 11, 843–853, doi:10.3762/bjnano.11.69

• laterally aligned NWs in sensor or electronic devices, control of the NW length is highly desired. Longer NWs can be contacted by means of standard lithography processes and do not require electron-beam lithography [12][28]. In the experiments presented in Figure 6, the process time was increased from 8 min

Hexagonal boron nitride: a review of the emerging material platform for single-photon sources and the spin–photon interface

• Stefania Castelletto,
• Faraz A. Inam,
• Shin-ichiro Sato and
• Alberto Boretti

Beilstein J. Nanotechnol. 2020, 11, 740–769, doi:10.3762/bjnano.11.61

Electromigration-induced directional steps towards the formation of single atomic Ag contacts

• Atasi Chatterjee,
• Christoph Tegenkamp and
• Herbert Pfnür

Beilstein J. Nanotechnol. 2020, 11, 680–687, doi:10.3762/bjnano.11.55

• ultrathin Ag films. Experimental Low-doped Si(100) substrates (1000 Ω·cm at 300 K), which are good insulators at temperatures around 100 K, were used. Structuring was carried out by a three-step process. As a first step, we patterned the contact pads by photolithography. Secondly, electron beam lithography

Atomic-resolution imaging of rutile TiO₂(110)-(1 × 2) reconstructed surface by non-contact atomic force microscopy

• Daiki Katsube,
• Shoki Ojima,
• Eiichi Inami and
• Masayuki Abe

Beilstein J. Nanotechnol. 2020, 11, 443–449, doi:10.3762/bjnano.11.35

• obtained with an energy of 100 eV. (a) LEED pattern of rutile TiO2(110)-(1 × 2) reconstructed surface. The electron beam energy was 100 eV. (b), (c) STM image of rutile TiO2(110)-(1 × 2) reconstructed surface (200 × 200 nm2 for (b), 20 × 20 nm2 for (c)). The sample bias and current set point were 1.5 V and

Electrochemically derived functionalized graphene for bulk production of hydrogen peroxide

• Munaiah Yeddala,
• Pallavi Thakur,
• Anugraha A and
• Tharangattu N. Narayanan

Beilstein J. Nanotechnol. 2020, 11, 432–442, doi:10.3762/bjnano.11.34

• Supporting Information File 1) and scanning electron microscopy (SEM) images indicate the formation of randomly oriented exfoliated graphene nanosheets [43]. However, the TEM images show that the thickness of the graphene increases from G-M1 to G-M4, where the G-M4 is found to block the electron beam despite

High dynamic resistance elements based on a Josephson junction array

• Konstantin Yu. Arutyunov and
• Janne S. Lehtinen

Beilstein J. Nanotechnol. 2020, 11, 417–420, doi:10.3762/bjnano.11.32

• ), while at finite current values, the corresponding singularities were not so pronounced. The purpose of this paper is to provide an in-depth analysis of the I–V dependence of the same JJ chains used in the current-biasing elements in [12]. Experimental Conventional lift-off electron-beam lithography

Formation of metal/semiconductor Cu–Si composite nanostructures

• Natalya V. Yumozhapova,
• Andrey V. Nomoev,
• Vyacheslav V. Syzrantsev and
• Erzhena C. Khartaeva

Beilstein J. Nanotechnol. 2019, 10, 2497–2504, doi:10.3762/bjnano.10.240

• nanoclusters of various morphologies. Experimental Technique We used an installation based on a relativistic electron accelerator with an energy of 1.4 MeV and a current in the range of 5–25 mA as the heating source (Figure 1) to obtain composite nanoparticles. At the first step, the electron beam from the

• cohesive energy (4.63 eV) than copper (3.54 eV). Experimental results Experimentally obtained Cu–SiOx Janus-like and the Cu@SiOx core–shell composite nanoparticles from evaporating the raw materials with a relativistic electron beam are shown in Figure 6 and Figure 7. The average size was obtained from the

• temperature of the sample in the evaporation chamber under irradiation by a relativistic electron beam. A rough estimate of the cooling rate based on the experimental parameters is 105 K/s, which is significantly less than the modelled value of 1012 K/s. This is most likely due to the strong nonequilibrium of

Label-free highly sensitive probe detection with novel hierarchical SERS substrates fabricated by nanoindentation and chemical reaction methods

• Jingran Zhang,
• Tianqi Jia,
• Yongda Yan,
• Li Wang,
• Peng Miao,
• Yimin Han,
• Xinming Zhang,
• Guangfeng Shi,
• Yanquan Geng,
• Zhankun Weng,
• Daniel Laipple and
• Zuobin Wang

Beilstein J. Nanotechnol. 2019, 10, 2483–2496, doi:10.3762/bjnano.10.239

• beam lithography and self-assembly methods to fabricate gold clusters of micrometer size and regular spacing. Subsequently, the detection resolution of 4-acetamidothiophenol was 0.05 g/L using the substrate. Nanoparticle cluster array structures with a size of 40 nm were fabricated by electron beam

• the template-assisted assembly of gold nanospheres with patterned PDMS molds featuring square array geometries with lattice parameters of 400 to 1600 nm and hole diameters of 230 to 960 nm. Then 4-acetamidothiophenol at 10−4 mol/L was detected using this substrate. Domenici et al. [22] used electron

Integration of sharp silicon nitride tips into high-speed SU8 cantilevers in a batch fabrication process

• Nahid Hosseini,
• Matthias Neuenschwander,
• Oliver Peric,
• Santiago H. Andany,
• Jonathan D. Adams and
• Georg E. Fantner

Beilstein J. Nanotechnol. 2019, 10, 2357–2363, doi:10.3762/bjnano.10.226

• by low-pressure chemical vapor deposition. Circular openings (20 µm diameter) are then cut into the layer by electron-beam lithography. The LSNT mask is dry-etched before the moulds are structured by anisotropic KOH (40% at 60 °C) etching. The formation of {111} facets results in four-sided pyramidal

Atomic force acoustic microscopy reveals the influence of substrate stiffness and topography on cell behavior

• Yan Liu,
• Li Li,
• Xing Chen,
• Ying Wang,
• Meng-Nan Liu,
• Jin Yan,
• Liang Cao,
• Lu Wang and
• Zuo-Bin Wang

Beilstein J. Nanotechnol. 2019, 10, 2329–2337, doi:10.3762/bjnano.10.223

• able to characterize materials at high lateral resolution. To produce substrates of tunable stiffness and topography, we imprint nanostripe patterns on undeveloped and developed SU-8 photoresist films using electron-beam lithography (EBL). Elastic deformations of the substrate surfaces and the cells

• mechanical strength [25][26]. The patterned stiffness of the SU-8 films was induced by electron beam lithography (EBL). The approach to control the stiffness and the topography of the substrate is shown in Figure 1. The rigidity of the film was tuned by varying the electron beam dosage, while the surface

• (Supporting Information File 1, Figure S1), as measured by SEM (FEI Quanta 250 FEG, USA). The SU-8 films were then patterned by EBL using a nanopattern generation system (NPGS, V9.1, from JC Nabity Lithography Systems). The SU-8 films were exposed to the 30 kV electron beam at a beam current of 63 pA and a

The importance of design in nanoarchitectonics: multifractality in MACE silicon nanowires

• Stefania Carapezzi and
• Anna Cavallini

Beilstein J. Nanotechnol. 2019, 10, 2094–2102, doi:10.3762/bjnano.10.204

• the cleaned surfaces by electron beam evaporation. These gold films do not coat the substrates uniformly. The uncovered parts of the Si surfaces become the seeds of the NWs in the subsequent etching step. For the etching step, the substrates are immersed in an aqueous solution of HF (5 M) and H2O2

• Si substrate by electron beam evaporation. The conditions during the growth of the gold thin film were similar to the ones during the growth of the samples SiNW1 and SiNW2. The black regions correspond to the uncovered silicon areas, while the white region represents the deposited Au. It is evident

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

• Hamidreza Hajihoseini,
• Movaffaq Kateb,
• Snorri Þorgeir Ingvarsson and
• Jon Tomas Gudmundsson

Beilstein J. Nanotechnol. 2019, 10, 1914–1921, doi:10.3762/bjnano.10.186

• microscope. The acceleration voltage of the electron beam was set to 20 kV and the working distance was kept at 3.5 mm for all images presented here. Magnetic hysteresis was characterized using a custom-made high-sensitivity magneto-optical Kerr effect (MOKE) looper using a laser source with 632.8 nm

• ) conditions analogous with electron beam and thermal evaporation methods. However, at our working gas pressure the mean free path is around 11 mm which is remarkably shorter than target to substrate distance (250 mm). Besides, Elofsson et al. [55] show that the melting point of the deposited materials impacts

Synthesis of nickel/gallium nanoalloys using a dual-source approach in 1-alkyl-3-methylimidazole ionic liquids

• Ilka Simon,
• Julius Hornung,
• Juri Barthel,
• Jörg Thomas,
• Maik Finze,
• Roland A. Fischer and
• Christoph Janiak

Beilstein J. Nanotechnol. 2019, 10, 1754–1767, doi:10.3762/bjnano.10.171

• metal under the energy of the electron beam in the TEM. Thus, the orthorhombic Ga phase probably contains a few percent of metallic nickel. Similarly, Ni(COD)2 and GaCp* were dispersed in equimolar ratio in [BMIm][NTf2] for 12 h prior to the thermal decomposition. Through microwave irradiation at 230 °C

The impact of crystal size and temperature on the adsorption-induced flexibility of the Zr-based metal–organic framework DUT-98

• Simon Krause,
• Volodymyr Bon,
• Hongchu Du,
• Rafal E. Dunin-Borkowski,
• Ulrich Stoeck,
• Irena Senkovska and
• Stefan Kaskel

Beilstein J. Nanotechnol. 2019, 10, 1737–1744, doi:10.3762/bjnano.10.169

• (Supporting Information File 1, Figure S9). Interestingly, DUT-98(Hf) showed enhanced stability towards the electron beam allowing for detailed microscopic analysis of the nanocrystals and their structure. HRTEM analysis shows uniform pore channels along the rod-shaped nanocrystals with a spacing of the Hf

Stationary beam full-field transmission helium ion microscopy using sub-50 keV He⁺: Projected images and intensity patterns

• Michael Mousley,
• Santhana Eswara,
• Olivier De Castro,
• Olivier Bouton,
• Nico Klingner,
• Christoph T. Koch,
• Gregor Hlawacek and
• Tom Wirtz

Beilstein J. Nanotechnol. 2019, 10, 1648–1657, doi:10.3762/bjnano.10.160

• (MEM), where dark “bubbles” are formed in the image where the sample becomes negatively charged [31]. In MEM, when the electron beam goes through the focus, the contrast in the image can invert and dark bubbles become bright stars. The variation of the deflection pattern to a spot pattern in this

Materials nanoarchitectonics at two-dimensional liquid interfaces

• Katsuhiko Ariga,
• Michio Matsumoto,
• Taizo Mori and
• Lok Kumar Shrestha

Beilstein J. Nanotechnol. 2019, 10, 1559–1587, doi:10.3762/bjnano.10.153

Development of a new hybrid approach combining AFM and SEM for the nanoparticle dimensional metrology

• Loïc Crouzier,
• Alexandra Delvallée,
• Sébastien Ducourtieux,
• Laurent Devoille,
• Guillaume Noircler,
• Christian Ulysse,
• Olivier Taché,
• Elodie Barruet,
• Christophe Tromas and
• Nicolas Feltin

Beilstein J. Nanotechnol. 2019, 10, 1523–1536, doi:10.3762/bjnano.10.150

• can be used for an accurate determination of the NP diameter by just measuring their heights because the convolution has no effect on the measurement of the highest point of the NP [1]. In SEM, an electron beam scans the sample and several interactions can occur between the incident electrons and the

• silicon wafers. The technique is based on using a direct-writing system (Raith-Vistec EBPG 5000+ electron-beam lithography system) and PMMA resist. After developing, the mask is transferred using RIE (reactive-ion etching). The P900H60 grating is used as a transfer standard and was calibrated by means of

• both kinds of NP. Moreover, these measurements have been carried out by maintaining the adjustment parameters constant, that is, with the same dimensional properties of the electron beam. Consequently, the difference in behavior observed between AFM and SEM measurements performed on PSL and silica NPs

Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering

• Petronela Prepelita,
• Ionel Stavarache,
• Doina Craciun,
• Florin Garoi,
• Catalin Negrila,
• Beatrice Gabriela Sbarcea and
• Valentin Craciun

Beilstein J. Nanotechnol. 2019, 10, 1511–1522, doi:10.3762/bjnano.10.149

• deposited by rfMS, the thermal treatments show superior performance in terms of the optical properties, such as an increase of the bandgap by 0.41 eV. On the other hand, ITO films deposited by electron beam evaporation do not exhibit an improvement of their optical properties even after thermal treatment

Direct observation of oxygen-vacancy formation and structural changes in Bi₂WO₆ nanoflakes induced by electron irradiation

• Hong-long Shi,
• Bin Zou,
• Zi-an Li,
• Min-ting Luo and
• Wen-zhong Wang

Beilstein J. Nanotechnol. 2019, 10, 1434–1442, doi:10.3762/bjnano.10.141

• be a fundamental step for controllable engineering of defects. Electron-beam irradiation is a powerful technique to fabricate or modify materials at the nanoscale [21][22]. For example, electron irradiation can induce a phase transformation from crystalline to amorphous or vice versa [23][24]; the

• knock-on effect of electron-beam irradiation will break chemical bonds and or knock off atoms directly from the surface of the irradiated material. Generally, it is thought that electron irradiation of materials containing heavy atoms by using a traditional transmission electron microscope (TEM) is not

• effective. Considering that the atomic escape energies are relatively small [25][26], Bi2WO6 nanoflakes with a thickness below 10 nm will be favorable when defects are to be induced through electron irradiation. When subjected to intense electron-beam irradiation, various types of crystal defects, including