Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• , a near-field photochemical process as described above is applied to bleach a SAM of dye molecules by exposure to visible light. Besides the utilization of photochemical effects, self-assembled monolayers can be structured by means of destructive irradiation and/or chemical activation with oxygen

Purification of ethanol for highly sensitive self-assembly experiments

• Kathrin Barbe,
• Martin Kind,
• Christian Pfeiffer and
• Andreas Terfort

Beilstein J. Nanotechnol. 2014, 5, 1254–1260, doi:10.3762/bjnano.5.139

• 10.3762/bjnano.5.139 Abstract Ethanol is the preferred solvent for the formation of self-assembled monolayers (SAMs) of thiolates on gold. By applying a thin film sensor system, we could demonstrate that even the best commercial qualities of ethanol contain surface-active contaminants, which can compete

• fully regenerated via a simple pyrolysis protocol. Keywords: ethanol; gold nanoparticles; purification; self-assembled monolayers; solvent; Introduction Thirty years after their introduction [1][2][3], self-assembled monolayers (SAMs) of organothiolates have matured to an established tool for surface

Topology assisted self-organization of colloidal nanoparticles: application to 2D large-scale nanomastering

• Hind Kadiri,
• Serguei Kostcheev,
• Daniel Turover,
• Rafael Salas-Montiel,
• Komla Nomenyo,
• Anisha Gokarna and
• Gilles Lerondel

Beilstein J. Nanotechnol. 2014, 5, 1203–1209, doi:10.3762/bjnano.5.132

• other methods (e.g., the auto-organization technique) have been demonstrated for the 2D and 3D auto-organization of micro-particles on solid substrates [4][5][6][7][8][9][10]. The formation of self-assembled monolayers of polystyrene beads on a silicon surface has been achieved by this technique [11][12

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

• [70]. Recently, Prasittichai et al. [71] achieved a GPC of 5.3 Å per cycle when growing PDIC+ED films at room temperature. In their study self-assembled monolayers fabricated by using octadecyltrichlorosilane were used to prevent the growth of the PDIC+ED polymer, enabling the growth of patterned 3D

Classical molecular dynamics investigations of biphenyl-based carbon nanomembranes

• Andreas Mrugalla and
• Jürgen Schnack

Beilstein J. Nanotechnol. 2014, 5, 865–871, doi:10.3762/bjnano.5.98

• that form from highly excited randomized self-assembled monolayers. This suggests that the electron exposition (dose, time, energy) as well as the cooling dynamics play an important role for the actual structure. To mention just one aspect: In the real crosslinking process hydrogens are removed one by

Fullerenes as adhesive layers for mechanical peeling of metallic, molecular and polymer thin films

• Maria B. Wieland,
• Anna G. Slater,
• Barry Mangham,
• Neil R. Champness and
• Peter H. Beton

Beilstein J. Nanotechnol. 2014, 5, 394–401, doi:10.3762/bjnano.5.46

• ][6] for the study of thiolate self-assembled monolayers (SAMs). This is achieved by applying epoxy to the top surface of a gold thin film grown on a mica substrate. The combined epoxy/gold layer can then be detached by mechanical peeling, and the roughness of the resulting free surface is comparable

• metal to a dielectric substrate has also been demonstrated for cross-linked self-assembled monolayers (SAM) using a polymeric ‘glue’ to first peel off a Au/SAM/polymer layer, followed by an etch process to remove the gold, thus isolating the SAM/polymer film for subsequent processing [9]. Most recently

Nanoscale patterning of a self-assembled monolayer by modification of the molecule–substrate bond

• Cai Shen and
• Manfred Buck

Beilstein J. Nanotechnol. 2014, 5, 258–267, doi:10.3762/bjnano.5.28

• for the electrodeposition of metals range from tuning the chemistry [1][2] to templating [3][4]. Contrasting the former where random assemblies are used, the latter relies on highly organised layers that comprise supramolecular networks [5][6] or self-assembled monolayers (SAMs) [3][4][7][8][9][10][11

Fabrication of carbon nanomembranes by helium ion beam lithography

• Xianghui Zhang,
• Henning Vieker,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2014, 5, 188–194, doi:10.3762/bjnano.5.20

• Xianghui Zhang Henning Vieker Andre Beyer Armin Golzhauser Department of Physics, Physics of Supramolecular Systems and Surfaces, Bielefeld University, 33615 Bielefeld, Germany 10.3762/bjnano.5.20 Abstract The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a

• attachment; helium ion microscopy; ion beam-organic molecules interactions; self-assembled monolayers; Introduction Carbon nanomembranes (CNMs) with monomolecular thickness and macroscopic lateral size represent a new type of functional two-dimensional (2D) materials [1]. A universal scheme to fabricate

• CNMs is the irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs), which allows for creating a variety of functional nanomembranes by using different molecular precursors as building blocks [2]. The properties of CNMs, such as stiffness, chemical functionality and porosity, can

Surface assembly and nanofabrication of 1,1,1-tris(mercaptomethyl)heptadecane on Au(111) studied with time-lapse atomic force microscopy

• Tian Tian,
• Burapol Singhana,
• Lauren E. Englade-Franklin,
• Xianglin Zhai,
• T. Randall Lee and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2014, 5, 26–35, doi:10.3762/bjnano.5.3

• , Texas 77204-5003, USA 10.3762/bjnano.5.3 Abstract The solution self-assembly of multidentate organothiols onto Au(111) was studied in situ using scanning probe nanolithography and time-lapse atomic force microscopy (AFM). Self-assembled monolayers (SAMs) prepared from dilute solutions of multidentate

• –Au bonds to the substrate. Keywords: liquid AFM; multidentate; nanografting; nanolithography; self-assembly; Introduction Multidentate thiol-based adsorbates attach to gold surfaces through multiple bonds that provide enhanced stability to self-assembled monolayers (SAMs) [1][2]. Although detailed

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

• Burcin Özdemir,
• Axel Seidenstücker,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

• following. Alkyltrimethoxysilanes are known to form self-assembled monolayers (SAM) on substrates after immersion into the corresponding solutions and were reported to act stabilizing on the location of nanoparticles [17][18]. Following this idea, in the present work octadecyltrimethoxysilane (OTMS) SAMs

New hybrid materials based on poly(ethyleneoxide)-grafted polysilazane by hydrosilylation and their anti-fouling activities

• Thi Dieu Hang Nguyen,
• François-Xavier Perrin and
• Dinh Lam Nguyen

Beilstein J. Nanotechnol. 2013, 4, 671–677, doi:10.3762/bjnano.4.75

• been widely studied [12][13][14]. Several methods to modify surfaces with PEO chains were investigated. These include the covalent grafting [15][16], the chemical adsorption [17], the formation of self-assembled monolayers [18][19], plasma treatment [12][20] or the use of supercritical CO2 [21][22

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

• Tatjana Ladnorg,
• Alexander Welle,
• Stefan Heißler,
• Christof Wöll and
• Hartmut Gliemann

Beilstein J. Nanotechnol. 2013, 4, 638–648, doi:10.3762/bjnano.4.71

• the orientation of the SURMOF. Here, we demonstrate for the first time the site-selective growth of the SURMOF HKUST-1 on thiol-based self-assembled monolayers patterned by the nanografting technique, with an atomic force microscope as a structuring tool. Two different approaches were applied: The

Mapping of plasmonic resonances in nanotriangles

• Simon Dickreuter,
• Julia Gleixner,
• Andreas Kolloch,
• Johannes Boneberg,
• Elke Scheer and
• Paul Leiderer

Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66

• beam lithography. The material used was exclusively gold. Figure 3a and Figure 3b present an example for the first and Figure 3c and Figure 3d for the second technique, respectively. In colloid lithography, self-assembled monolayers of meso- or nanoscopic spherical particles are produced by self

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• formation of electrically conducting nanopatterns formed by chemical EBL (CEBL) [13]. Therefore, we formed a chemically patterned surface by local reduction of the terminal SO2X groups of self-assembled monolayers (SAMs) by means of an electron beam [14]. These structured SAMs guided AuNP immobilisation

Selective surface modification of lithographic silicon oxide nanostructures by organofunctional silanes

• Thomas Baumgärtel,
• Christian von Borczyskowski and
• Harald Graaf

Beilstein J. Nanotechnol. 2013, 4, 218–226, doi:10.3762/bjnano.4.22

• selectively immobilized on the structures in order to provide them with an adjustable functionality. A combination of LAO with a treatment of the substrate surface by organic self-assembled monolayers (SAM) is a promising approach for a versatile combined top-down/bottom-up process towards the fabrication of

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters

• growth of ZnO nanostructures [1]. Keywords: breath figure; nanopatterned template; polymer blend lithography (PBL); self-assembled monolayer (SAM); self assembly; spin coating; vapor phase; Introduction Self-assembled monolayers (SAMs) are well-known and have been intensively studied for many years

• [8]. Patterning of self-assembled monolayers on the nanometer scale is easily performed by sequential lithographic techniques that are well-established in the literature. Electron beam lithography allows the desorption or destruction of molecules of a SAM layer, line by line [9][10]. Advanced

The oriented and patterned growth of fluorescent metal–organic frameworks onto functionalized surfaces

• Jinliang Zhuang,
• Jasmin Friedel and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 570–578, doi:10.3762/bjnano.3.66

• , dabco = 1,4-diazabicyclo[2.2.2]­octane), the fluorescence of which depends on the loading of its nanopores, was synthesized in two forms: as free-flowing nanocrystals with different shapes and as surface-attached MOFs (SURMOFs). For the latter, we used self-assembled monolayers (SAMs) bearing functional

• orientation, which also determines the orientation and accessibility of their pores, or their lateral distribution, which is a necessity for the fabrication of, e.g., sensor arrays. In this project, we demonstrated the feasibility of self-assembled monolayers for both purposes, since these monolayers are able

• films on specific surfaces, gains significant importance [25][26][27]. Several methods have been developed to control the growth of such surface-attached MOFs (so-called SURMOFs) on various substrates [28][29][30][31][32][33][34][35]. To adjust the surface chemistry of such substrates, self-assembled

Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism

• Gregor Hlawacek,
• Vasilisa Veligura,
• Stefan Lorbek,
• Tijs F. Mocking,
• Antony George,
• Raoul van Gastel,
• Harold J. W. Zandvliet and
• Bene Poelsema

Beilstein J. Nanotechnol. 2012, 3, 507–512, doi:10.3762/bjnano.3.58

• demonstrate how thin organic and inorganic layers as well as self-assembled monolayers can be visualized on heavier element substrates by changes in the backscatter yield. Thin layers of light elements on heavy substrates should have a negligible direct influence on backscatter yields. However, using simple

• , the BSHe data presented here was recorded with lower PEs between 10 keV and 20 keV. This results in a better signal-to-noise ratio for the BSHe images. Patterns of self-assembled monolayers (SAM) were created by using a PDMS stamp and gas-phase silanization. Orthogonal stripes with an identical width

Mapping mechanical properties of organic thin films by force-modulation microscopy in aqueous media

• Jianming Zhang,
• Zehra Parlak,
• Carleen M. Bowers,
• Terrence Oas and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 464–474, doi:10.3762/bjnano.3.53

• properties of self-assembled monolayers and end-tethered protein thin films in aqueous media. Furthermore, we describe a simple analysis of the contact mechanics that enables the selection of FMM imaging parameters and thus yields a reliable interpretation of the FMM image contrast. Keywords: acoustic

• atomic force microscopy; biomolecules; elastic modulus mapping; nanomechanical characterization; self-assembled monolayers; Introduction Mapping the mechanical properties, such as elastic modulus, friction, and adhesion of surfaces and thin films in aqueous (or liquid) environments with nanoscale

• in aqueous solution. Future work to quantify these properties requires additional analytical models that capture the interaction of the cantilever beam with the liquid environment. FMM on patterned EG3-thiol monolayers The properties and applications of alkanethiol self-assembled monolayers (SAMs) on

Functionalised zinc oxide nanowire gas sensors: Enhanced NO₂ gas sensor response by chemical modification of nanowire surfaces

• Eric R. Waclawik,
• Jin Chang,
• Andrea Ponzoni,
• Isabella Concina,
• Dario Zappa,
• Elisabetta Comini,
• Nunzio Motta,
• Guido Faglia and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2012, 3, 368–377, doi:10.3762/bjnano.3.43

• often avoided due to the possibility of poisoning effects which may occur, akin to poisoning of heterogeneous catalyst surfaces, functionalisation can sometimes have a positive effect [6]. Self-assembled monolayers (SAMs) have been shown to effectively modify the surface physics and chemical properties

Variations in the structure and reactivity of thioester functionalized self-assembled monolayers and their use for controlled surface modification

• Inbal Aped,
• Yacov Mazuz and
• Chaim N. Sukenik

Beilstein J. Nanotechnol. 2012, 3, 213–220, doi:10.3762/bjnano.3.24

• Inbal Aped Yacov Mazuz Chaim N. Sukenik Department of Chemistry and Institute for Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat-Gan, Israel 52900 10.3762/bjnano.3.24 Abstract Thioester-functionalized, siloxane-anchored, self-assembled monolayers provide a powerful tool for

• sulfonate-bearing surface to constitute an important approach to systematic surface modification. Keywords: siloxane-anchored self-assembled monolayers; sulfonated interfaces; surface chemistry; Introduction Functionalized self-assembled monolayers (SAMs) provide powerful tools for conveniently adjusting

Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

• ChaMarra K. Saner,
• Kathie L. Lusker,
• Zorabel M. LeJeune,
• Wilson K. Serem and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2012, 3, 114–122, doi:10.3762/bjnano.3.12

• capabilities for the high-throughput fabrication of nanopatterns from organosilane self-assembled monolayers, which offers the opportunity to study surface-based chemical reactions at the molecular level. Nanopatterns of octadecyltrichlorosilane (OTS) were prepared on surfaces of Si(111) using designed

• ; nanopatterning; nanostructures; octadecyltrichlorosilane; particle lithography; self-assembled monolayer; self-assembly; Introduction Self-assembled monolayers (SAMs) of organosilanes have become important as surface resists and functional coatings for micro- and nanopatterning applications [1][2][3][4][5][6][7

Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

• Zhe She,
• Andrea DiFalco,
• Georg Hähner and
• Manfred Buck

Beilstein J. Nanotechnol. 2012, 3, 101–113, doi:10.3762/bjnano.3.11

• Zhe She Andrea DiFalco Georg Hahner Manfred Buck EaStCHEM School of Chemistry, University of St. Andrews, KY16 9ST, U.K School of Physics and Astronomy, University of St. Andrews, KY16 9ST, U.K 10.3762/bjnano.3.11 Abstract Self-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0

• ; lithography; metallic nanostructures; self-assembled monolayers; thiols; Introduction Covering the range from tens of micrometers down to nanometers, the scope of applications of metal structures in electronics [1][2], sensing [3][4][5][6][7], electrochemical analysis [8], optics and imaging [9][10][11][12

• . The electrochemical approach combines favourably with self-assembled monolayers (SAMs) as it enables the scheme illustrated in Figure 1a [15]. On the one hand, metal can be selectively deposited by using patterned SAMs, which act as template by defining electrochemically active and passive areas of an

Substrate-mediated effects in photothermal patterning of alkanethiol self-assembled monolayers with microfocused continuous-wave lasers

• Anja Schröter,
• Mark Kalus and
• Nils Hartmann

Beilstein J. Nanotechnol. 2012, 3, 65–74, doi:10.3762/bjnano.3.8

• Anja Schroter Mark Kalus Nils Hartmann Fakultät für Chemie, Universität Duisburg-Essen, 45117 Essen, Germany Center for Nanointegration Duisburg-Essen (CENIDE), Universität Duisburg-Essen, 47048 Duisburg, Germany 10.3762/bjnano.3.8 Abstract In recent years, self-assembled monolayers (SAMs) have

• substrate on the overall patterning process and provide new perspectives in photothermal laser patterning of ultrathin organic coatings. Keywords: femtosecond lasers; nonlinear laser processing; self-assembled monolayers; subwavelength patterning; ultrathin resists; Introduction In the past decades, self

• -assembled monolayers (SAMs) have developed into a particularly versatile means to tailor the surface properties of technologically important materials, such as gold, silicon and glass [1][2][3]. Because of the self-limiting growth mechanism, well-defined coating with a layer of monomolecular thickness is