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Search for "substrate temperature" in Full Text gives 110 result(s) in Beilstein Journal of Nanotechnology.

Scanning probe microscopy studies on the adsorption of selected molecular dyes on titania

  • Jakub S. Prauzner-Bechcicki,
  • Lukasz Zajac,
  • Piotr Olszowski,
  • Res Jöhr,
  • Antoine Hinaut,
  • Thilo Glatzel,
  • Bartosz Such,
  • Ernst Meyer and
  • Marek Szymonski

Beilstein J. Nanotechnol. 2016, 7, 1642–1653, doi:10.3762/bjnano.7.156

Graphical Abstract
  • influence of the substrate temperature on the ordering in the formed molecular layers (see Figure 2), showing that it is possible to obtain homogeneous molecular islands by annealing PTCDA/TiO2(110) at 100 °C [31]. There are also reports concerning the adsorption of PTCDA molecules on the (011) face of
  • the molecules to the formation of a chemical bond via the dehydrogenation of the eight H atoms of the isoindole ligands, as a result of the increased substrate temperature during the deposition. Next, Ishida and Fujita investigated the electronic properties of individual molecules. The immobilized
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Published 09 Nov 2016

Nanostructured germanium deposited on heated substrates with enhanced photoelectric properties

  • Ionel Stavarache,
  • Valentin Adrian Maraloiu,
  • Petronela Prepelita and
  • Gheorghe Iordache

Beilstein J. Nanotechnol. 2016, 7, 1492–1500, doi:10.3762/bjnano.7.142

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  • ], implantation [26], RF magnetron sputtering [27]. However, for most of these approaches, thermal treatments were necessary after the deposition process in order to obtain high-quality nanostructures based on crystalline Ge [28]. The most important parameter to be finely tuned is the substrate temperature during
  • smaller gap difference is observed between the curves corresponding to structures obtained at 400 and 500 °C. This suggests that the optimum substrate temperature is around 500 °C. For all the investigated test structures voltages between −1 V to 1 V with 20 mV steps were applied on the ITO contact while
  • AW−1 depending on the substrate temperature when fabricating the photodetector test structures. The calculated quantum efficiencies, QE, plotted in Figure 7a with dotted lines, have values from 430% for structures prepared at 300 °C to 900% for 500 °C. As a reference, an analogous structure Al/n-Si
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Published 21 Oct 2016

Microscopic characterization of Fe nanoparticles formed on SrTiO3(001) and SrTiO3(110) surfaces

  • Miyoko Tanaka

Beilstein J. Nanotechnol. 2016, 7, 817–824, doi:10.3762/bjnano.7.73

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  • reconstructions and buffer layers, and using ion bombardment [11][12][13][14][15]. For example, Silly et al. successfully controlled shapes of nanoparticles by tuning the reconstruction of a STO(001) substrate and the substrate temperature during deposition [12]. Sun et al. also controlled shapes of nanoparticles
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Published 07 Jun 2016

Distribution of Pd clusters on ultrathin, epitaxial TiOx films on Pt3Ti(111)

  • Christian Breinlich,
  • Maria Buchholz,
  • Marco Moors,
  • Tobias Pertram,
  • Conrad Becker and
  • Klaus Wandelt

Beilstein J. Nanotechnol. 2015, 6, 2007–2014, doi:10.3762/bjnano.6.204

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  • in this work, is certainly achievable. This could be accomplished by varying the impact rate of Pd atoms and their mobility on the surface (i.e., the deposition rate and the substrate temperature), as was the case for Pd cluster growth on the Al2O3/Ni3Al(111) surface. Summary Pd clusters were grown
  • reasonable steps would be (a) to attempt to achieve a hexagonal cluster distribution on the w'-TiOx phase by varying the metal deposition rate and/or the substrate temperature as was the case for metal clusters on Al2O3/Ni3Al(111), and (b) the investigation of the electronic as well as the adsorption and
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Published 09 Oct 2015

Continuum models of focused electron beam induced processing

  • Milos Toth,
  • Charlene Lobo,
  • Vinzenz Friedli,
  • Aleksandra Szkudlarek and
  • Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

Graphical Abstract
  • term (−σEfNa) to Equation 12 [52]. Equation 15 can be used to calculate FEBIP growth rates as a function of experimental parameters such as the precursor gas pressure, electron flux and the substrate temperature. For example, Figure 8 shows a set of spatially resolved steady-state vertical growth rates
  • of adsorbate diffusion can be investigated using a version of the above model that incorporates diffusion (discussed below). Multiple adsorption states: Thermally activated chemisorption The FEBID growth rate typically decreases with increasing substrate temperature (as illustrated by Figure 8) due
  • -wall deposition technique, whereby Tg is dominated by the temperature of the capillary used to deliver the precursor gas, and the substrate temperature T is used to control growth kinetics. The thermal desorption rates of physisorbed (kp) and chemisorbed species (kc) are given by: Activated
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Published 14 Jul 2015

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

  • Aleksandra Szkudlarek,
  • Alfredo Rodrigues Vaz,
  • Yucheng Zhang,
  • Andrzej Rudkowski,
  • Czesław Kapusta,
  • Rolf Erni,
  • Stanislav Moshkalev and
  • Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

Graphical Abstract
  • atom % of Au (rt) to 24 atom % of Au (at 100 °C). Increasing the substrate temperature during FEBID also favors the desorption of non-metallic dissociation by-products as it was observed by Mulders et al. [31] for various precursors: TEOS (tetraethylorthosilicate), Co(CO)3NO, Co2(CO)8, and Me2Au(acac
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Published 13 Jul 2015

Transformations of PTCDA structures on rutile TiO2 induced by thermal annealing and intermolecular forces

  • Szymon Godlewski,
  • Jakub S. Prauzner-Bechcicki,
  • Thilo Glatzel,
  • Ernst Meyer and
  • Marek Szymoński

Beilstein J. Nanotechnol. 2015, 6, 1498–1507, doi:10.3762/bjnano.6.155

Graphical Abstract
  • differently ordered structures either due to additional energy provided by thermal annealing or when the influence of intermolecular forces is increased by the enlarged amount of deposited molecules. Proper adjustment of molecular coverage and substrate temperature during deposition allows for fabrication of
  • well-ordered molecular layer obtained when the substrate temperature during deposition was maintained at 100 °C. We see that the ordered layer is formed for a closed layer (Figure 6a,b) as well as for sub-monolayer coverage (Figure 6c, coverage of approx. 0.6 ML). Further experiments showed that the
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Published 10 Jul 2015

Magnetic properties of self-organized Co dimer nanolines on Si/Ag(110)

  • Lisa Michez,
  • Kai Chen,
  • Fabien Cheynis,
  • Frédéric Leroy,
  • Alain Ranguis,
  • Haik Jamgotchian,
  • Margrit Hanbücken and
  • Laurence Masson

Beilstein J. Nanotechnol. 2015, 6, 777–784, doi:10.3762/bjnano.6.80

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  • from a complex balance of many competing processes occurring at the atomic scale. Each of these processes is thermally activated and characterized by an activation energy. By tuning the growth parameters, such as the substrate temperature or the deposition rate during the deposition of matter
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Published 19 Mar 2015

Si/Ge intermixing during Ge Stranski–Krastanov growth

  • Alain Portavoce,
  • Khalid Hoummada,
  • Antoine Ronda,
  • Dominique Mangelinck and
  • Isabelle Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246

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  • pressure in the 10–11 mbar range. The Si(001) substrate was chemically cleaned using a modified Radio Corporation of America (RCA) process before introduction in the MBE setup. First, the disilane gas was introduced into the growth chamber while increasing the substrate temperature (T) up to 850 °C in
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Published 09 Dec 2014

Gas sensing properties of nanocrystalline diamond at room temperature

  • Marina Davydova,
  • Pavel Kulha,
  • Alexandr Laposa,
  • Karel Hruska,
  • Pavel Demo and
  • Alexander Kromka

Beilstein J. Nanotechnol. 2014, 5, 2339–2345, doi:10.3762/bjnano.5.243

Graphical Abstract
  • substrate and the linear antenna (i.e., 7–10 cm) [11]. An NCD film was grown from hydrogen-rich gas mixtures of methane and carbon dioxide. A microwave pulse of 2 kW was used for each antenna side. A total gas pressure of 0.1 mbar was used and the substrate temperature was kept at 450 °C. Figure 4 shows the
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Published 04 Dec 2014

The influence of molecular mobility on the properties of networks of gold nanoparticles and organic ligands

  • Edwin J. Devid,
  • Paulo N. Martinho,
  • M. Venkata Kamalakar,
  • Úna Prendergast,
  • Christian Kübel,
  • Tibebe Lemma,
  • Jean-François Dayen,
  • Tia. E. Keyes,
  • Bernard Doudin,
  • Mario Ruben and
  • Sense Jan van der Molen

Beilstein J. Nanotechnol. 2014, 5, 1664–1674, doi:10.3762/bjnano.5.177

Graphical Abstract
  • (1.2 mW illuminating power on the sample); b) Room temperature Raman spectrum of 2D (single layer) Au-NP–S-BPP array obtained by microcontact printing on a quartz substrate. Temperature-dependent Raman spectra of 2D Au-NP–S-BPP arrays microcontact printed on a quartz substrate excited at 633 nm
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Published 29 Sep 2014

On the structure of grain/interphase boundaries and interfaces

  • K. Anantha Padmanabhan and
  • Herbert Gleiter

Beilstein J. Nanotechnol. 2014, 5, 1603–1615, doi:10.3762/bjnano.5.172

Graphical Abstract
  • . The processing route seems to be important: Metallic nano-glasses are made by using physical vapor deposition or sputtering, while polymeric nano-glasses are made by using vapor deposition or laser-assisted vapor deposition. In polymeric nano-glasses there is also some evidence that the substrate
  • temperature has a significant effect on properties. From structural studies and the measurements of interfacial properties (e.g., density, Young’s modulus) of metallic nano-glasses it is known that the atomic arrangements and electronic structures are different from what is found in the interface of relaxed
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Published 22 Sep 2014

Probing the electronic transport on the reconstructed Au/Ge(001) surface

  • Franciszek Krok,
  • Mark R. Kaspers,
  • Alexander M. Bernhart,
  • Marek Nikiel,
  • Benedykt R. Jany,
  • Paulina Indyka,
  • Mateusz Wojtaszek,
  • Rolf Möller and
  • Christian A. Bobisch

Beilstein J. Nanotechnol. 2014, 5, 1463–1471, doi:10.3762/bjnano.5.159

Graphical Abstract
  • reconstructed Ge(001) from a resistively heated crucible. The deposition rate of 0.2 ML/min is monitored by using a quartz crystal microbalance and the substrate temperature during the deposition of Au is kept at 150 K. After the deposition, no ordered structure is observed until the sample is annealed. After
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Published 05 Sep 2014

Fringe structures and tunable bandgap width of 2D boron nitride nanosheets

  • Peter Feng,
  • Muhammad Sajjad,
  • Eric Yiming Li,
  • Hongxin Zhang,
  • Jin Chu,
  • Ali Aldalbahi and
  • Gerardo Morell

Beilstein J. Nanotechnol. 2014, 5, 1186–1192, doi:10.3762/bjnano.5.130

Graphical Abstract
  • away from the target. Substrate temperature was controlled by using a thermocouple and heater. Prior to laser irradiation, substrates were rinsed in acetone and methanol in sequence. The duration for each deposition was few minutes. The as-grown samples were then characterized by using SEM, Raman
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Published 31 Jul 2014

Electron-beam induced deposition and autocatalytic decomposition of Co(CO)3NO

  • Florian Vollnhals,
  • Martin Drost,
  • Fan Tu,
  • Esther Carrasco,
  • Andreas Späth,
  • Rainer H. Fink,
  • Hans-Peter Steinrück and
  • Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

Graphical Abstract
  • substrate temperature [23]. A more detailed study addressed the temperature dependence for various precursors. For Co(CO)3NO and Co2(CO)8 three distinct regimes were proposed: (1) EBID only, (2) seeded growth, i.e., enhancement of deposition rate and autocatalytic growth, and (3) spontaneous decomposition
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Published 30 Jul 2014

Scale effects of nanomechanical properties and deformation behavior of Au nanoparticle and thin film using depth sensing nanoindentation

  • Dave Maharaj and
  • Bharat Bhushan

Beilstein J. Nanotechnol. 2014, 5, 822–836, doi:10.3762/bjnano.5.94

Graphical Abstract
  • operating pressure of about 0.001 Pa, substrate temperature of 100 °C at a rate of approximately 0.4 nm/s. To observe the grains within the Au film and nanoparticles, focused ion beam (FIB) milling and transmission electron microscopy (TEM) were employed. Cross-sections of samples were cut out by FIB
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Published 11 Jun 2014

Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

  • Federico Baiutti,
  • Georg Christiani and
  • Gennady Logvenov

Beilstein J. Nanotechnol. 2014, 5, 596–602, doi:10.3762/bjnano.5.70

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  • oxygen resistive heater provides a maximum temperature of the heater element up to 1200 °C and the substrate temperature is controlled by a radiation pyrometer. The oxidation during the film growth is ensured by the delivery of pure ozone. Distilled ozone is collected from an ozone generator system and
  • on the corners implemented in a custom-built DC measurements setup. Both films were grown under the same conditions: substrate temperature 620 °C and chamber pressure 2.5·10−5 Torr. The difference was in the cooling process after the growth. The insulating film was cooled down to 200 °C with a
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Published 08 May 2014

Synthesis of embedded Au nanostructures by ion irradiation: influence of ion induced viscous flow and sputtering

  • Udai B. Singh,
  • D. C. Agarwal,
  • S. A. Khan,
  • S. Mohapatra,
  • H. Amekura,
  • D. P. Datta,
  • Ajay Kumar,
  • R. K. Choudhury,
  • T. K. Chan,
  • Thomas Osipowicz and
  • D. K. Avasthi

Beilstein J. Nanotechnol. 2014, 5, 105–110, doi:10.3762/bjnano.5.10

Graphical Abstract
  • as ion energy, ion dose, dose rate, and substrate temperature. One of the biggest drawbacks for this procedure is the requirement of a specific ion source to generate ion beams of the desired element. Recoil implantation overcomes this difficulty and is an alternative way to introduce foreign atoms
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Published 29 Jan 2014

In situ growth optimization in focused electron-beam induced deposition

  • Paul M. Weirich,
  • Marcel Winhold,
  • Christian H. Schwalb and
  • Michael Huth

Beilstein J. Nanotechnol. 2013, 4, 919–926, doi:10.3762/bjnano.4.103

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  • , can be a difficult task. This can be exemplified for the commonly used precursor W(CO)6. Rosenberg and co-workers recently studied the electron-dose and substrate-temperature dependence on the final deposit in electron-induced dissociation experiments with 500 eV electron energy for this precursor [14
  • desorption, which results in an average composition of the deposit of [W]/[C] ≈ 1/4. By increasing the electron dose and/or the substrate temperature, which causes changes in the coverage and average residence time of the precursor molecules on the surface, the metal content can be increased to above 40 atom
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Published 17 Dec 2013

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

  • Burcin Özdemir,
  • Axel Seidenstücker,
  • Alfred Plettl and
  • Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

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  • optimized. Anisotropic reactive ion etching (RIE): A mixture of CHF3 and CF4 (20:2 sccm, 10 mTorr) plasma was applied to form uniform columnar structures on the substrates. Radio frequency (RF) power of 40 W, and a substrate temperature of 25 °C was used and the etching was carried out in Oxford PlasmaLab
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Published 12 Dec 2013

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

  • Jörg Haeberle,
  • Karsten Henkel,
  • Hassan Gargouri,
  • Franziska Naumann,
  • Bernd Gruska,
  • Michael Arens,
  • Massimo Tallarida and
  • Dieter Schmeißer

Beilstein J. Nanotechnol. 2013, 4, 732–742, doi:10.3762/bjnano.4.83

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  • deposited at 200 °C, for the PE-ALD films we varied the substrate temperature range between room temperature (rt) and 200 °C. We show data from spectroscopic ellipsometry (thickness, refractive index, growth rate) over 4” wafers and correlate them to X-ray photoelectron spectroscopy (XPS) results. The 200
  • ]. Herein the typical parameters like growth rate per cycle (GPC), density and refractive index were determined by ellipsometry whereas the elemental composition was mostly deduced from Rutherford Backscattering Spectrometry (RBS). The influence of the substrate temperature onto these parameters was
  • discussed, also when a commercial 200 mm ALD reactor was used [20]. However characterizations based X-ray photoelectron spectroscopy (XPS) in dependence of the substrate temperature are not shown in that reviews. Furthermore to our knowledge there seems to be a lack in reports about dielectric parameters in
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Published 08 Nov 2013

Optimization of solution-processed oligothiophene:fullerene based organic solar cells by using solvent additives

  • Gisela L. Schulz,
  • Marta Urdanpilleta,
  • Roland Fitzner,
  • Eduard Brier,
  • Elena Mena-Osteritz,
  • Egon Reinold and
  • Peter Bäuerle

Beilstein J. Nanotechnol. 2013, 4, 680–689, doi:10.3762/bjnano.4.77

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  • that during vacuum deposition the evaporation rate and substrate temperature can be precisely controlled and may be optimized to create highly ordered domains of donor and acceptor material [41]. These crystalline domains allow for higher exciton diffusion lengths [42] and thus higher charge generation
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Published 24 Oct 2013

The role of electron-stimulated desorption in focused electron beam induced deposition

  • Willem F. van Dorp,
  • Thomas W. Hansen,
  • Jakob B. Wagner and
  • Jeff T. M. De Hosson

Beilstein J. Nanotechnol. 2013, 4, 474–480, doi:10.3762/bjnano.4.56

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  • , Denmark 10.3762/bjnano.4.56 Abstract We present the results of our study about the deposition rate of focused electron beam induced processing (FEBIP) as a function of the substrate temperature with the substrate being an electron-transparent amorphous carbon membrane. When W(CO)6 is used as a precursor
  • , since (amongst others) it determines the residence time of the precursor molecules on the surface, which in turn affects the growth rate. The activation energy for desorption can be determined from FEBIP experiments by measuring the deposition rate as a function of substrate temperature and constructing
  • forces for FEBIP, the amount of desorption from the surface may be significant during electron irradiation. We determined the growth rate for W(CO)6 as a function of substrate temperature and compare the extracted energies Edes with values found in the literature. Results and Discussion Arrays of dots
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Published 14 Aug 2013

Ni nanocrystals on HOPG(0001): A scanning tunnelling microscope study

  • Michael Marz,
  • Keisuke Sagisaka and
  • Daisuke Fujita

Beilstein J. Nanotechnol. 2013, 4, 406–417, doi:10.3762/bjnano.4.48

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  • substrate temperature was estimated to be lower than 200 K.), but we confirm that any influence of the substrate warmup on the clusters was not detected within the deposition times used in this study, cf. section “Influence of annealing on the clusters”. A subsequent annealing process was performed in
  • substrate temperature (for temperatures estimated to be between 100 K and 200 K), deposition time and rate. After the annealing process, the coverage of the surface is reduced with increasing annealing temperature. Mild annealing slightly above room temperature already results in a change of the cluster
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Published 28 Jun 2013

Grating-assisted coupling to nanophotonic circuits in microcrystalline diamond thin films

  • Patrik Rath,
  • Svetlana Khasminskaya,
  • Christoph Nebel,
  • Christoph Wild and
  • Wolfram H.P. Pernice

Beilstein J. Nanotechnol. 2013, 4, 300–305, doi:10.3762/bjnano.4.33

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  • % hydrogen at a base pressure of 80 mbar and a substrate temperature of 850 °C. Substrate rotation is applied to avoid angular nonuniformities arising from the gas flow. Growth rates are typically in the range of 1–2 µm/h. The diamond film thickness is controlled by timed growth combined with in situ
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Published 07 May 2013
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