Fabrication and characterization of Si_1−xGe_x nanocrystals in as-grown and annealed structures: a comparative study

• Muhammad Taha Sultan,
• Adrian Valentin Maraloiu,
• Ionel Stavarache,
• Jón Tómas Gudmundsson,
• Andrei Manolescu,
• Valentin Serban Teodorescu,
• Magdalena Lidia Ciurea and
• Halldór Gudfinnur Svavarsson

Beilstein J. Nanotechnol. 2019, 10, 1873–1882, doi:10.3762/bjnano.10.182

• annealing. A rather recent variation of the magnetron sputtering technique, the so-called high-power impulse magnetron sputtering (HiPIMS), provides an alternative approach. It is an ionized physical vapor deposition method and has shown great promise in thin-film processing [25][26]. During HiPIMS the

Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering

• Petronela Prepelita,
• Ionel Stavarache,
• Doina Craciun,
• Florin Garoi,
• Catalin Negrila,
• Beatrice Gabriela Sbarcea and
• Valentin Craciun

Beilstein J. Nanotechnol. 2019, 10, 1511–1522, doi:10.3762/bjnano.10.149

• of ITO in various applications increases when the electrical properties are improved. Various deposition techniques have been used to obtain TCO thin films, such as: vacuum thermal evaporation [15][16], chemical vapor deposition [17], sol–gel [18], pyrolysis spray techniques [5][19], magnetron

Hierarchically structured 3D carbon nanotube electrodes for electrocatalytic applications

• Pei Wang,
• Katarzyna Kulp and
• Michael Bron

Beilstein J. Nanotechnol. 2019, 10, 1475–1487, doi:10.3762/bjnano.10.146

• a glassy carbon (GC) substrate in a sequence of electrodeposition and chemical vapor deposition (CVD) steps as follows: Primary CNTs are grown over electrodeposited iron by CVD followed by a second Fe deposition and finally the CVD growth of secondary CNTs. The prepared 3-dimensional CNT structures

• structures demonstrate an exceptionally high poisoning tolerance. Keywords: chemical vapor deposition; CNTs; CO stripping; hierarchically structured electrodes; methanol oxidation; platinum; poisoning tolerance; Introduction Carbon nanotubes (CNTs) have attracted considerable attention since their

• the preparation of hierarchically structured CNTs on glassy carbon (GC) based on a sequential CNT growth over electrodeposited Fe nanoparticles via chemical vapor deposition (CVD) with cyclohexane as the carbon precursor. Pt electrodeposition onto these hierarchical structures leads to active

A biomimetic nanofluidic diode based on surface-modified polymeric carbon nitride nanotubes

• Kai Xiao,
• Baris Kumru,
• Lu Chen,
• Lei Jiang,
• Bernhard V. K. J. Schmidt and
• Markus Antonietti

Beilstein J. Nanotechnol. 2019, 10, 1316–1323, doi:10.3762/bjnano.10.130

• systems and the generation of blue energy from salinity gradients [23][24]. We fabricated a carbon nitride nanotube membrane (CNNM) via an anodic aluminium oxide (AAO)-templated vapor deposition–polymerization process. Subsequently, the CNNMs were modified with 3-allyloxy-2-hydroxy-1-propanesulfonic acid

• nitrogen. Moreover, it meets our requirements to fabricate negatively charged carbon nitride nanotubes and a fully condensed conjugated structure that stabilizes the π-electron system for a high charge mobility [25]. The g-CN nanotube membrane (CNNM) was fabricated through vapor deposition–polymerization

• and the choice of grafted molecules. Conclusion We fabricated a carbon nitride nanotube membrane by simple vapor deposition–polymerization and modified it via a photo-induced functionalization process to alter the ion transport properties. The carbon nitride nanotube membrane showed ion transport that

Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping

• Lukas Grünewald,
• Dagmar Gerthsen and
• Simon Hettler

Beilstein J. Nanotechnol. 2019, 10, 1290–1302, doi:10.3762/bjnano.10.128

• ) were fabricated with a DWL66 laser lithography system (Heidelberg Instruments). After illumination of the unmasked regions, the resist was developed in AZ 726 MIF (Microchemicals GmbH). To deposit Cr, Pt and aC, electron-beam physical vapor deposition (PVD, PVD75 by Kurt J. Lesker Company) was used

Alloyed Pt₃M (M = Co, Ni) nanoparticles supported on S- and N-doped carbon nanotubes for the oxygen reduction reaction

• Stéphane Louisia,
• Yohann R. J. Thomas,
• Pierre Lecante,
• Marie Heitzmann,
• M. Rosa Axet,
• Pierre-André Jacques and
• Philippe Serp

Beilstein J. Nanotechnol. 2019, 10, 1251–1269, doi:10.3762/bjnano.10.125

• , 31055 Toulouse Cedex 4, France 10.3762/bjnano.10.125 Abstract Sulfur- (S-CNT) and nitrogen-doped (N-CNT) carbon nanotubes have been produced by catalytic chemical vapor deposition (c-CVD) and were subject to an annealing treatment. These CNTs were used as supports for small (≈2 nm) Pt3M (M = Co or Ni

• performance has been aged following a recommended accelerated stress test (AST) cycle for catalyst support corrosion. Results and Discussion Synthesis and characterization of the CNTs and Pt3M/CNT Three kinds of CNTs have been produced by catalytic chemical vapor deposition (c-CVD): undoped (CNTs), N-doped (N

Electroluminescence and current–voltage measurements of single-(In,Ga)N/GaN-nanowire light-emitting diodes in a nanowire ensemble

• David van Treeck,
• Johannes Ledig,
• Gregor Scholz,
• Jonas Lähnemann,
• Mattia Musolino,
• Abbes Tahraoui,
• Oliver Brandt,
• Andreas Waag,
• Henning Riechert and
• Lutz Geelhaar

Beilstein J. Nanotechnol. 2019, 10, 1177–1187, doi:10.3762/bjnano.10.117

• -based core–shell NW structures grown by metalorganic chemical vapor deposition it was found that the FWHM increases with decreasing emission energy [13]. In order to better understand the charge-carrier transport in single-NW LEDs, in Figure 5a we analyze the I–V curves for the NWs C, E, and G, as well

Quantitative analysis of annealing-induced instabilities of photo-leakage current and negative-bias-illumination-stress in a-InGaZnO thin-film transistors

• Dapeng Wang and
• Mamoru Furuta

Beilstein J. Nanotechnol. 2019, 10, 1125–1130, doi:10.3762/bjnano.10.112

• TFT devices comprise several functional layers and their respective contact interfaces. Generally, the individual layer fabrication process follows a number of thin film deposition and photolithographic patterning steps. During the film growth through plasma-enhanced chemical vapor deposition or

Revisiting semicontinuous silver films as surface-enhanced Raman spectroscopy substrates

• Malwina Liszewska,
• Bogusław Budner,
• Małgorzata Norek,
• Bartłomiej J. Jankiewicz and
• Piotr Nyga

Beilstein J. Nanotechnol. 2019, 10, 1048–1055, doi:10.3762/bjnano.10.105

• nanostructures fabricated using physical methods, such as semicontinuous metal films obtained via electron beam physical vapor deposition. In these studies, we investigate the influence of morphology of semicontinuous silver films on their SERS properties. The morphologies studied ranged from isolated particles

• nanostructures can be a source of additional SERS signals [15], which may complicate SERS analysis with their use. Various physical methods may be used to fabricate SERS substrates. Usually in these techniques silver or gold is deposited by physical vapor deposition (PVD) techniques. Nanostructures are obtained

Features and advantages of flexible silicon nanowires for SERS applications

• Hrvoje Gebavi,
• Vlatko Gašparić,
• Dubravko Risović,
• Nikola Baran,
• Paweł Henryk Albrycht and
• Mile Ivanda

Beilstein J. Nanotechnol. 2019, 10, 725–734, doi:10.3762/bjnano.10.72

• commercially available substrates and that our intention is not to rate or evaluate, but rather the presentation of the first results. Experimental Horizontal silicon nanowires were fabricated by vapor–liquid–solid (VLS) synthesis in a low-pressure chemical vapor deposition (LPCVD) reactor as described in [23

Ultrathin hydrophobic films based on the metal organic framework UiO-66-COOH(Zr)

• Miguel A. Andrés,
• Clemence Sicard,
• Christian Serre,
• Olivier Roubeau and
• Ignacio Gascón

Beilstein J. Nanotechnol. 2019, 10, 654–665, doi:10.3762/bjnano.10.65

• homogeneity [11]. Therefore, several strategies have been used for the deposition of MOF films [12], including direct growth [13][14], electrochemical deposition [15], inkjet-printing [16], dip-coating [17], layer-by-layer [18][19][20], Langmuir–Blodgett [21][22], chemical vapor deposition [23], spin-coating

Hydrophilicity and carbon chain length effects on the gas sensing properties of chemoresistive, self-assembled monolayer carbon nanotube sensors

• Juan Casanova-Cháfer,
• Carla Bittencourt and
• Eduard Llobet

Beilstein J. Nanotechnol. 2019, 10, 565–577, doi:10.3762/bjnano.10.58

• . Experimental Functionalization of carbon nanotubes Multiwall carbon nanotubes (MWCNTs) functionalized with carboxylic acid (COOH) were purchased from Nanocyl S.A. (Belgium). These nanotubes were produced by a catalytic chemical vapor deposition (c-CVD method) and purified to greater than 95%. The average

Direct observation of the CVD growth of monolayer MoS₂ using in situ optical spectroscopy

• Claudia Beatriz López-Posadas,
• Yaxu Wei,
• Wanfu Shen,
• Daniel Kahr,
• Michael Hohage and
• Lidong Sun

Beilstein J. Nanotechnol. 2019, 10, 557–564, doi:10.3762/bjnano.10.57

• dichalcogenide (2D TMDC) materials. However, it is very challenging to carry out such studies during chemical vapor deposition (CVD). Here, we report the first, real time, in situ study of the CVD growth of 2D TMDCs. More specifically, the CVD growth of a molybdenum disulfide (MoS2) monolayer on sapphire

• the temperature distribution in the CVD reactor has been revealed. Our results demonstrate the great potential of real time, in situ optical spectroscopy to assist the precisely controlled growth of 2D semiconductor materials. Keywords: chemical vapor deposition (CVD); in situ differential optical

• synthesizing large-area 2D TMDCs have been reported, including mechanical exfoliation, sulphurization of metal thin films, mass transport, molecular beam epitaxy (MBE) and chemical vapor deposition (CVD) [6][7]. In particular, CVD is considered to be an attractive and very promising approach for large-scale

Nanocomposite–parylene C thin films with high dielectric constant and low losses for future organic electronic devices

• Marwa Mokni,
• Gianluigi Maggioni,
• Abdelkader Kahouli,
• Sara M. Carturan,
• Walter Raniero and
• Alain Sylvestre

Beilstein J. Nanotechnol. 2019, 10, 428–441, doi:10.3762/bjnano.10.42

• Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro, Viale dell’Università 2, 35020 Legnaro (PD), Italy 10.3762/bjnano.10.42 Abstract Nanocomposite–parylene C (NCPC) thin films were deposited with a new technique based on the combination of chemical vapor deposition (CVD) for parylene C

• voltages of TFTs [2]. Unfortunately these approaches can not be used when parylene C (PPXC) is chosen as gate dielectric as the only proven process for producing high-quality PPXC layers is chemical vapor deposition (CVD). Parylene C has emerged as a particularly interesting material for organic electronic

• chemical vapor deposition polymerization of parylene C combined with RF-sputtering of silver. It was demonstrated that the plasma itself induces changes in the density and semi-crystalline character of parylene C. A decrease in the density, an increase in the degree of crystallinity and an increase of

Biocompatible organic–inorganic hybrid materials based on nucleobases and titanium developed by molecular layer deposition

• Leva Momtazi,
• Henrik H. Sønsteby and
• Ola Nilsen

Beilstein J. Nanotechnol. 2019, 10, 399–411, doi:10.3762/bjnano.10.39

• enables control of cell–surface interactions, which plays a major role in controlling the bioactivity of solid surfaces. Biocompatibility can be enhanced by coating the surface using various thin film deposition techniques such as chemical vapor deposition (CVD), physical vapor deposition (PVD) or atomic

Sub-wavelength waveguide properties of 1D and surface-functionalized SnO₂ nanostructures of various morphologies

• Venkataramana Bonu,
• Binaya Kumar Sahu,
• Arindam Das,
• Sankarakumar Amirthapandian,
• Sandip Dhara and
• Harish C. Barshilia

Beilstein J. Nanotechnol. 2019, 10, 379–388, doi:10.3762/bjnano.10.37

• chemical vapor deposition (CVD) technique has been widely used for the controlled preparation of nanostructures [23]. Especially the vapor–solid (VS) process, without the involvement of catalysts, and the vapor–liquid–solid (VLS) process, with the assistance of catalysts, are utilized for the growth of

Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

• Eduardo Nery Duarte de Araujo,
• Thiago Alonso Stephan Lacerda de Sousa,
• Luciano de Moura Guimarães and
• Flavio Plentz

Beilstein J. Nanotechnol. 2019, 10, 349–355, doi:10.3762/bjnano.10.34

• electrical properties to surface phenomena and the existence of several routes for its surface functionalization, grant this 2D material plenty of application possibilities [1][2][3][4][5][6][7][8]. Among the several synthesis methods of high-quality graphene, chemical vapor deposition (CVD) stands out as

Study of silica-based intrinsically emitting nanoparticles produced by an excimer laser

• Imène Reghioua,
• Mattia Fanetti,
• Sylvain Girard,
• Diego Di Francesca,
• Simonpietro Agnello,
• Layla Martin-Samos,
• Marco Cannas,
• Matjaz Valant,
• Melanie Raine,
• Marc Gaillardin,
• Nicolas Richard,
• Philippe Paillet,
• Aziz Boukenter,
• Youcef Ouerdane and
• Antonino Alessi

Beilstein J. Nanotechnol. 2019, 10, 211–221, doi:10.3762/bjnano.10.19

• . The first one is doped with 20 wt % Ge, produced by plasma-activated chemical vapor deposition (PCVD) [23][30]. The second one is a pure silica synthetic commercial sample containing high OH content [31], similar to the one irradiated with a 500 fs 248 nm laser in [15]. The nanoparticle synthesis was

Zn/F-doped tin oxide nanoparticles synthesized by laser pyrolysis: structural and optical properties

• Florian Dumitrache,
• Iuliana P. Morjan,
• Elena Dutu,
• Ion Morjan,
• Claudiu Teodor Fleaca,
• Monica Scarisoreanu,
• Alina Ilie,
• Marius Dumitru,
• Cristian Mihailescu,
• Adriana Smarandache and
• Gabriel Prodan

Beilstein J. Nanotechnol. 2019, 10, 9–21, doi:10.3762/bjnano.10.2

• [17]. Highly conductive films based on amorphous Co-doped SnO2 were also synthesized using a pulsed spray evaporation chemical vapor deposition (CVD) technique [18]. One of the most reported cationic dopants for tin oxide is Zn2+, where the obtained zinc-doped tin oxide (ZTO) films show lower bandgap

Femtosecond laser-assisted fabrication of chalcopyrite micro-concentrator photovoltaics

• Franziska Ringleb,
• Stefan Andree,
• Berit Heidmann,
• Jörn Bonse,
• Katharina Eylers,
• Owen Ernst,
• Torsten Boeck,
• Martina Schmid and
• Jörg Krüger

Beilstein J. Nanotechnol. 2018, 9, 3025–3038, doi:10.3762/bjnano.9.281

• and opportunities of the novel approaches to realize this cell concept. The first approach for microabsorber fabrication summarized here is based on the growth of metallic precursors (indium islands) on laser-structured substrates (molybdenum on glass) by means of physical vapor deposition (nucleation

• -structured substrates. Indium has a strong tendency towards island growth during physical vapor deposition (PVD) on molybdenum substrates. On smooth molybdenum surfaces, indium islands nucleate with random spatial distribution. Indium prefers to accumulate on rough areas. Hence, preferential island

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

• Diana El Khoury,
• Richard Arinero,
• Jean-Charles Laurentie,
• Mikhaël Bechelany,
• Michel Ramonda and
• Jérôme Castellon

Beilstein J. Nanotechnol. 2018, 9, 2999–3012, doi:10.3762/bjnano.9.279

• . ALD is a smooth chemical vapor deposition technique, expected to leave hydroxide OH groups on the surface. Conversely, PSD might induce a more homogeneous ionic surface state; O− and O2− could be typically introduced due to the small amount of reactive oxygen gas that is added to the neutral argon gas

Investigation of CVD graphene as-grown on Cu foil using simultaneous scanning tunneling/atomic force microscopy

• Majid Fazeli Jadidi,
• Umut Kamber,
• Oğuzhan Gürlü and
• H. Özgür Özer

Beilstein J. Nanotechnol. 2018, 9, 2953–2959, doi:10.3762/bjnano.9.274

• an inequivalent electronic structure in HOPG or multilayer graphene due to the presence of a carbon atom or a hollow site underneath. In this work, we report small-amplitude, simultaneous STM/AFM imaging using a metallic (tungsten) tip, of the graphene surface as-grown by chemical vapor deposition

• surface, and A is the measured amplitude during tip–surface interactions [34]. Graphene layers were grown on Cu foils using chemical vapor deposition (CVD) [35]. A custom-built atmospheric CVD system was used. Cu foils were heated under H2 + Ar atmosphere up to 950 °C. Upon reaching the process

Site-controlled formation of single Si nanocrystals in a buried SiO₂ matrix using ion beam mixing

• Xiaomo Xu,
• Thomas Prüfer,
• Daniel Wolf,
• Hans-Jürgen Engelmann,
• Lothar Bischoff,
• René Hübner,
• Karl-Heinz Heinig,
• Wolfhard Möller,
• Stefan Facsko,
• Johannes von Borany and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2018, 9, 2883–2892, doi:10.3762/bjnano.9.267

• -oxide-semiconductor (CMOS) technology and thus have yet to be integrated into a cost-efficient Si-based technology. Multiple methods have been proposed and optimized for Si NC fabrication, including plasma-enhanced chemical vapor deposition (PECVD) [4][10], magnetron sputtering [11][12], laser-induced

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• ], anisotropically etched single-crystal silicon [47], plasma-treated plastic [48] and anodic aluminum oxide films [49][50][51][52]. Some methods aim at the fabrication of three -dimensional silver or gold structures, such as oblique-angle vapor deposition used for the fabrication of silver nanorod arrays [53][54

Near-infrared light harvesting of upconverting NaYF₄:Yb³⁺/Er³⁺-based amorphous silicon solar cells investigated by an optical filter

• Daiming Liu,
• Qingkang Wang and
• Qing Wang

Beilstein J. Nanotechnol. 2018, 9, 2788–2793, doi:10.3762/bjnano.9.260

• and ethanol for several times, and dried at 70 °C. The a-Si:H solar cell with an intrinsic p–i–n configuration was deposited on a 3 mm glass substrate by plasma-enhanced chemical vapor deposition. The front and back contact electrodes were deposited as AZO transparent conductive films. Then, the