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Search for "focused ion beam" in Full Text gives 130 result(s) in Beilstein Journal of Nanotechnology.
Nanoporous Ge thin film production combining Ge sputtering and dopant implantation
Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32
- for the fabrication of nanocrystals by dewetting, such as metals or semiconductors. In addition, the structure of the dewetted layers can be controlled using several techniques such as pulsed laser annealing [35][36] or a substrate patterned by focused ion beam. The study of Ge dewetting on SiO2 [37
Bright photoluminescence from ordered arrays of SiGe nanowires grown on Si(111)
Beilstein J. Nanotechnol. 2014, 5, 2498–2504, doi:10.3762/bjnano.5.259
- in the substrate by focused ion beam patterning for the preferential nucleation and growth of these well-organized NWs. The NWs thus produced have a diameter of 200 nm, a length of 200 nm, and a Ge concentration x = 0.15. Their photoluminescence (PL) spectra were measured at low temperatures (from 6
- positioned [28]. We have evolved an efficient and simple electrochemical process that joins focused-ion-beam (FIB) lithography and galvanic reaction to selectively prepare gold nanoparticles in well-defined locations. Afterwards these nanoparticles are used for the molecular beam epitaxy (MBE) growth of
PVP-coated, negatively charged silver nanoparticles: A multi-center study of their physicochemical characteristics, cell culture and in vivo experiments
Beilstein J. Nanotechnol. 2014, 5, 1944–1965, doi:10.3762/bjnano.5.205
- dissolution process in cells (including the localization of low concentrations of small nanoparticles as well as silver ions) imaging at the Ag L3,2 edges is a promising option for future work. Focused ion beam (FIB) and optical microscopy (phase contrast microscopy; fluorescence microscopy; confocal laser
- reveal any formation of silver agglomerates (Figure 6A). In order to prove that the silver agglomerates are located inside the cells, focused ion beam milling (FIB) was applied which permits the view on cross sections of various materials by a beam of high-energy gallium ions [77][78]. After culturing
Patterning a hydrogen-bonded molecular monolayer with a hand-controlled scanning probe microscope
Beilstein J. Nanotechnol. 2014, 5, 1926–1932, doi:10.3762/bjnano.5.203
- used a qPlus sensor [17] manufactured by CREATEC. The AFM/STM tip was made from a 0.3 mm long and 15 μm thick PtIr wire glued to the tuning fork of the qPlus sensor, and sharpened with a gallium focused ion beam (FIB). The resulting resonance frequency of the qPlus sensor was f0 = 30,300 Hz with a
Nanocrystalline ceria coatings on solid oxide fuel cell anodes: the role of organic surfactant pretreatments on coating microstructures and sulfur tolerance
Beilstein J. Nanotechnol. 2014, 5, 1712–1724, doi:10.3762/bjnano.5.181
- same procedures as for the nickel-GDC anodes. Then cross-sections were prepared by using a focused ion beam unit, and EDXS maps were superimposed on the cross-sectional images (Figure 6). With YSZ replacing the GDC as the ionically conducting phase in the anode, the ceria coating could easily be
- obtained by using the focused ion beam unit of the Nova Nanolab. Output voltage and ASR at low current density, showing sulfur tolerance. Yellow shading denotes 24 h periods of H2S exposure in the anode stream at the concentration indicated. (Treatment-1 cell (no ceria coating) with no interlayer.) Output
Probing the electronic transport on the reconstructed Au/Ge(001) surface
Beilstein J. Nanotechnol. 2014, 5, 1463–1471, doi:10.3762/bjnano.5.159
- source software GSxM [17] and data processing was done by using WxSM [18]. For the transmission electron microscope (TEM) measurements lamellas of the Au/Ge(001) of the very same sample were prepared with the use of an FEI Quanta 3D FEG scanning electron microscope equipped with a 30 keV Ga+ focused ion
- beam gun (FIB). In order to preserve the surface of the Au/Ge sample against the standard FIB operation during the lamella preparation, the sample surface at first was covered (capped) with a 20 nm layer of thermally evaporated carbon. Then, on top of the cap layer, a platinum layer was deposited using
Nanocavity crossbar arrays for parallel electrochemical sensing on a chip
Beilstein J. Nanotechnol. 2014, 5, 1137–1143, doi:10.3762/bjnano.5.124
- sections of the nanocavity sensor, cut by a focused ion beam (FIB), can be found in Figure 6. Fabrication Devices are structured by means of optical lithography and are processed in class-100 cleanroom facilities. Nanocavities at the intersections between platinum electrodes are formed via the deposition
Nanoforging – Innovation in three-dimensional processing and shaping of nanoscaled structures
Beilstein J. Nanotechnol. 2014, 5, 1066–1070, doi:10.3762/bjnano.5.118
- . The technique used, called nanoforging, is very similar to the macroscopic forging process. Results: With spring actuated tools produced by focused ion beam milling, controlled forging is demonstrated. With only three steps, a conical bar stock is transformed to a flat- and semicircular bent bar stock
- as complex shapes can be more readily achieved. Single crystalline silicon, processed by focused ion beam milling, is used for durable spring actuated forging tools. Furthermore, high strength metals can be processed and high deformation degrees of the bar stock can be realized without heating. This
- axis [13]. The forging tools were machined by focused ion beam milling at the corner of a single crystalline Si-substrate. Varying tools in different positions were produced to allow several forging steps after each other (Figure 1). All of these tools are based on a spring principle similar to so
A nanometric cushion for enhancing scratch and wear resistance of hard films
Beilstein J. Nanotechnol. 2014, 5, 1005–1015, doi:10.3762/bjnano.5.114
- compensated by a thin Au coating (8 nm). NDFv9.4e software was used to fit the data [48]. Focused Ion Beam (FIB). The PDMS thickness was obtained using a dual beam FIB (FEI, Helios 600), with electron and ion beams operating simultaneously and independently at energies up to 30 kV (52 degrees between the
Integration of ZnO and CuO nanowires into a thermoelectric module
Beilstein J. Nanotechnol. 2014, 5, 927–936, doi:10.3762/bjnano.5.106
- , it is possible to use focused ion beam (FIB) lithography to deposit actively each gold nanoparticles, but it is very time consuming and there is no demonstration of improved performances of the device. The ability to control the size and dispersion of the catalyst is a key parameter to control both
Scale effects of nanomechanical properties and deformation behavior of Au nanoparticle and thin film using depth sensing nanoindentation
Beilstein J. Nanotechnol. 2014, 5, 822–836, doi:10.3762/bjnano.5.94
- operating pressure of about 0.001 Pa, substrate temperature of 100 °C at a rate of approximately 0.4 nm/s. To observe the grains within the Au film and nanoparticles, focused ion beam (FIB) milling and transmission electron microscopy (TEM) were employed. Cross-sections of samples were cut out by FIB
Optical near-fields & nearfield optics
Beilstein J. Nanotechnol. 2014, 5, 186–187, doi:10.3762/bjnano.5.19
- “optical antenna”. Since the fabrication of suitable structures with electron beam or focused ion beam lithography is a tedious and time-consuming task, the experiments are more and more supported by modeling with numerical methods such as Finite Difference Time Domain (FDTD) and Discrete Dipole
Synthesis of embedded Au nanostructures by ion irradiation: influence of ion induced viscous flow and sputtering
Beilstein J. Nanotechnol. 2014, 5, 105–110, doi:10.3762/bjnano.5.10
- ) measurements were performed on pristine and irradiated samples by using a 200 kV field emission TEM (JEM 2100F from JEOL) at TEM station, NIMS, Japan. XTEM samples are prepared by the focused ion beam (FIB) method by using a 30 keV Ga beam in a JEOL JEM 9320 FIB. Results and Discussions The XTEM image of
- preparation of the XTEM sample by using focused ion beam. Since the cohesive energy of the metal (Au) is higher than the cohesive energy of the substrate (glass) plus the adhesive energy of the metal on glass, a discontinuous film of Au is formed because of dewetting. The XTEM image (Figure 2) of the sample
Ultramicrosensors based on transition metal hexacyanoferrates for scanning electrochemical microscopy
Beilstein J. Nanotechnol. 2013, 4, 649–654, doi:10.3762/bjnano.4.72
- deposited onto a microelectrode using a focused ion beam gas-assisted process (Quanta 3D FEG, FEI Eindhoven). The circular Pt/C composite were deposited on 10 µm Pt electrodes and had a radius of approx. 6.5 µm and a thickness of approx. 150 nm (ion beam current: 300 pA and a dwell time of 200 ns) with a
k-space imaging of the eigenmodes of sharp gold tapers for scanning near-field optical microscopy
Beilstein J. Nanotechnol. 2013, 4, 603–610, doi:10.3762/bjnano.4.67
- experimental setup. Tapers as shown in Figure 1 are produced from single-crystalline gold wire by an electrochemical AC-etching technique followed by focused ion beam milling of a grating coupler [11]. Typical cone opening angles are between 20 and 30° and apex radii are well below 30 nm. These tips have a
- ion beam milling of the grating couplers. Field enhancement at the taper apex was much more pronounced for the tip shown in panel a). Propagation constants kz of the three lowest eigenmodes of an infinitely long gold wire as a function of wire radius R. Displayed are the real (solid blue lines) and
- method to spectroscopic studies of the coupling between nano-localized fields and single quantum objects. Such experiments are currently underway in our laboratory. Scanning electron micrographs of two gold tapers that were obtained by electrochemical AC-etching of annealed gold wires followed by focused
Deformation-induced grain growth and twinning in nanocrystalline palladium thin films
Beilstein J. Nanotechnol. 2013, 4, 554–566, doi:10.3762/bjnano.4.64
- -mortem TEM analysis were prepared either by focused ion beam (FIB) using a FEI Strata 400S DualBeam at 5 kV and 8 pA beam current for final polishing (sample ncPd 1) or by mechanical dimpling and Argon ion milling from the polyimide side at 2.5 kV in a PIPS (Gatan) (sample ncPd 2). FIB prepared samples
Digging gold: keV He+ ion interaction with Au
Beilstein J. Nanotechnol. 2013, 4, 453–460, doi:10.3762/bjnano.4.53
- open. As helium ions are light particles, sputtering processes are much less effective with HIM as compared to other focused ion beam (FIB) techniques that typically use gallium ions. Nevertheless, helium ion beam imaging can lead to considerable sample and, in particular surface, modifications. The
Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM
Beilstein J. Nanotechnol. 2013, 4, 77–86, doi:10.3762/bjnano.4.9
- -selectively decorated on the CNTs by using a focused ion beam (FIB) and subsequent chemical treatment [9]. However, these approaches either involve several steps or require masks to perform the site-specific deposition. Therefore, a more straightforward strategy to perform site-specific metal deposition is
Diamond nanophotonics
Beilstein J. Nanotechnol. 2012, 3, 895–908, doi:10.3762/bjnano.3.100
- other hand, one can use a focused ion beam (FIB) to fabricate a micrometer-sized hemisphere around a preselected diamond color center. In the following, both approaches are discussed. We first focus on a macroscopic solid immersion lens. Figure 6a shows a photograph of a macroscopic hemispherical lens
- surface of a standard diamond sample. Due to the small size, thousands of microscopic lenses could be fabricated into a single diamond sample, and moreover, each lens could be fabricated precisely around a single fluorescent color center. A suitable fabrication technique is focused ion beam milling. We
- with about 100 nm precision. Thereafter, a solid immersion lens with a radius corresponding to the depth of the color center is fabricated by using the focused ion beam. Figure 7c shows an example of such a microfabricated SIL. Note the cone around the SIL, which is fabricated in order not to cause
Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices
Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98
- integration into spin-photo-electronic devices. Electron-beam and focused-ion-beam techniques are typically limited to feature sizes of tens of nanometres, if the features are to be well defined, and are rather inefficient for large-area nanopatterning since both methods employ series point-by-point pattern
Characterization and properties of micro- and nanowires of controlled size, composition, and geometry fabricated by electrodeposition and ion-track technology
Beilstein J. Nanotechnol. 2012, 3, 860–883, doi:10.3762/bjnano.3.97
- two areas of fabrication and characterization, great advances have been reported in recent years. Methods to fabricate nanowires include top-down approaches such as optical and electron-beam lithography, and focused ion beam. More commonly applied bottom-up approaches are, e.g., vapour–liquid–solid
Ordered arrays of nanoporous gold nanoparticles
Beilstein J. Nanotechnol. 2012, 3, 651–657, doi:10.3762/bjnano.3.74
- by using laser interference lithography [15], focused ion beam (FIB) [17], or substrate conformal imprint lithography (SCIL) [19]. During the dewetting of metal films onto prepatterned substrates, the periodic structure of the prepatterned substrates modulates the local excess chemical potential by
Nano-structuring, surface and bulk modification with a focused helium ion beam
Beilstein J. Nanotechnol. 2012, 3, 579–585, doi:10.3762/bjnano.3.67
- mechanical [4] properties. The gallium focused ion beam (FIB) microscope has been commercially available for twenty years. FIB microscopes have proven themselves as versatile tools with applications in a range of fields including biology [5], geology [6], materials science [7][8] and the semiconductor
- microscope (HIM) is a new type of focused ion beam microscope. The HIM uses helium ions instead of gallium ions. Helium ions have a lower mass and therefore are less destructive than gallium ions. Helium ions are effectively non-contaminating. The source is a gas field ion source which does not suffer the
The morphology of silver nanoparticles prepared by enzyme-induced reduction
Beilstein J. Nanotechnol. 2012, 3, 404–414, doi:10.3762/bjnano.3.47
- the TEM investigations thin cross sections were prepared by means of the focused-ion-beam etching technique. For the cross-section images, samples were prepared on glass substrates with DNA concentrations of 10 µM. The silver reaction time was 5 min. Rutherford backscattering spectrometry (RBS) RBS is
Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off
Beilstein J. Nanotechnol. 2012, 3, 101–113, doi:10.3762/bjnano.3.11
- deposition by the cross-linked MBP0-SAM, inducing defects by means of a focused ion beam seems like a promising strategy. An advantage of the scheme is that the metal surface exposed after lift-off is very smooth and, thus, very similar to template-stripped uniform films but with the additional feature of
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