Electron beam-based direct writing of nanostructures using a palladium β-ketoesterate complex

• Chinmai Sai Jureddy,
• Krzysztof Maćkosz,
• Aleksandra Butrymowicz-Kubiak,
• Iwona B. Szymańska,
• Patrik Hoffmann and
• Ivo Utke

Beilstein J. Nanotechnol. 2025, 16, 530–539, doi:10.3762/bjnano.16.41

• promising precursor for nanoprinting 3D structures with finely focused electron beams. Keywords: 3D nanoprinting; electron-induced molecule dissociation; focused electron beam-induced deposition; metal nanostructures; metalorganic complexes; Introduction Direct fabrication of nanostructures without the

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2591–2591, doi:10.3762/bjnano.8.259

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.259 Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• 2D and 3D nanostructures [1][2][3][4][5] with an ultimate resolution of less than 1 nm [6][7]. It is frequently referred to as "3D nanoprinting" because of its capabilities that are similar to the increasingly popular 3D printers that operate on the micrometer scale. FEBID has been only recently

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• deposition; 3D nanoprinting; Langmuir model; Introduction Focused electron beam induced deposition (FEBID) is a direct-write nanolithography technique, based on the local decomposition of gas molecules adsorbed on a substrate and induced by the interaction with a focused beam of electrons [1][2][3]. FEBID

• ], just to cite a few. Moreover, significant effort is now dedicated to enhance the predictability of FEBID processes by means of modelling, which means a shift from a trial-and-error approach, to a quantitative, model-guided 3D nanoprinting method. This progress includes the development of a Monte Carlo

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• File 160: 3D Nanoprinting via LAEBID supplement. This supplement describes the details of the shape fidelity of the in situ anneal, the bridge patterning strategy, the thermal simulation methods and variable, the STEM images of as-deposited wires, and the elemental mapping of the nanowires