Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

• Hannah Boeckers,
• Atul Chaudhary,
• Petra Martinović,
• Amy V. Walker,
• Lisa McElwee-White and
• Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

• heteroleptic precursor Fe(CO)4MA, thus, offers the possibility to suppress contributions of thermal reactions, which can compromise control over the deposit shape and size in FEBID processes. Keywords: autocatalytic growth; cryo-EBID; electron beam-induced deposition; heteroleptic iron precursor; thermal

• studied. (i) The EBID process was simulated by dosing a well-defined amount of the precursor onto the surface held at room temperature while performing electron irradiation. (ii) The cryo-EBID process was simulated by condensing the same amount of precursor onto the surface held at 100 K and subsequently

• without dosing a precursor. AES was again recorded from the Ta substrate after sputter cleaning and then after each electron irradiation step. The electron exposure was the same as also used in EBID and cryo-EBID experiments (see below). The time between two AES acquisitions was between 130 min and 160