Changes of structural, magnetic and spectroscopic properties of microencapsulated iron sucrose nanoparticles in saline

• Sabina Lewińska,
• Pavlo Aleshkevych,
• Roman Minikayev,
• Anna Bajorek,
• Mateusz Dulski,
• Krystian Prusik,
• Tomasz Wojciechowski and
• Anna Ślawska-Waniewska

Beilstein J. Nanotechnol. 2025, 16, 762–784, doi:10.3762/bjnano.16.59

• various shapes and dimensions of several dozens of micrometers. The surfaces of the grains are notably rough and torn, and during the measurement displayed high susceptibility to electron beam charging, which is a characteristic of organic compounds. Consequently, these grains were recognized as

Synthesis of a multicomponent cellulose-based adsorbent for tetracycline removal from aquaculture water

• Uyen Bao Tran,
• Ngoc Thanh Vo-Tran,
• Khai The Truong,
• Dat Anh Nguyen,
• Quang Nhat Tran,
• Huu-Quang Nguyen,
• Jaebeom Lee and
• Hai Son Truong-Lam

Beilstein J. Nanotechnol. 2025, 16, 728–739, doi:10.3762/bjnano.16.56

• the lateral bonding effect of GA and PVA, as well as the dissolution of cellulose by Zn2+. The rough, wrinkled surface and cracks are likely due to the focused high-energy electron beam during the FE-SEM imaging process [22]. Larger agglomerates, possibly ZnSO4 residues, are also apparent, which

Focused ion and electron beams for synthesis and characterization of nanomaterials

• Aleksandra Szkudlarek

Beilstein J. Nanotechnol. 2025, 16, 613–616, doi:10.3762/bjnano.16.47

• the best of times, it was the worst of times" [2] – onto a 200 × 200 micron square of plastic using an electron beam. This achievement prompts a reflection: is nowadays the best or the worst of times for the development of electron and ion beam technologies? With the hope to contribute addressing this

• question, the co-guest editors Dr. Ivo Utke, Dr. Katja Höflich, Dr. Gregor Hlawacek, Dr. Nico Klingner, and myself organized a thematic issue in connection with the work presented at the joint meeting of the FIT4NANO (fit4nano – Focused Ion Technology for Nanomaterials) and FEBIP (Focused Electron Beam

• by Oddur Ingólfsson’s group [6], supported by quantum chemical calculations, revealed that chlorine removal during focused electron beam induced deposition (FEBID) was nearly complete, in contrast to the limited chlorine loss observed in gas-phase experiments. Previous studies have shown that gas

Retrieval of B1 phase from high-pressure B2 phase for CdO nanoparticles by electronic excitations in Cd_xZn_1−xO composite thin films

• Arkaprava Das,
• Marcin Zając and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2025, 16, 551–560, doi:10.3762/bjnano.16.43

• spectrometer (Bruker), equipped with an Ar ion laser (532 nm) with 0.2 mW laser operating power. Scanning electron microscopy (SEM) analysis was carried out with a HITACHI SU8020 model, using an electron beam energy of 3.0 keV. X-ray photoelectron spectroscopy (XPS) was performed using an ESCA-5000 Versa Probe

Electron beam-based direct writing of nanostructures using a palladium β-ketoesterate complex

• Chinmai Sai Jureddy,
• Krzysztof Maćkosz,
• Aleksandra Butrymowicz-Kubiak,
• Iwona B. Szymańska,
• Patrik Hoffmann and
• Ivo Utke

Beilstein J. Nanotechnol. 2025, 16, 530–539, doi:10.3762/bjnano.16.41

• Rennes, CNRS, IPR (Institut de Physique de Rennes) - UMR 6251, Rennes, France Faculty of Chemistry, Nicolaus Copernicus University in Toruń (NCU), Toruń, Poland 10.3762/bjnano.16.41 Abstract Gas-assisted focused electron beam-induced deposition (FEBID) as a direct, minimally invasive 3D nanopatterning

• promising precursor for nanoprinting 3D structures with finely focused electron beams. Keywords: 3D nanoprinting; electron-induced molecule dissociation; focused electron beam-induced deposition; metal nanostructures; metalorganic complexes; Introduction Direct fabrication of nanostructures without the

• ][11][12] properties at the nanometer scale. One method that is capable of creating such nanostructures is focused electron beam-induced deposition (FEBID) [13][14][15][16][17][18][19][20][21][22][23]. In this technique, a focused electron beam decomposes adsorbed molecules on a substrate in vacuum

N₂⁺-implantation-induced tailoring of structural, morphological, optical, and electrical characteristics of sputtered molybdenum thin films

• Usha Rani,
• Kafi Devi,
• Divya Gupta and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 495–509, doi:10.3762/bjnano.16.38

• electron beam evaporation [10] have been reported in the literature. RF sputtering is the predominant technique for thin film deposition because of its benefits regarding layer adhesion, uniformity, composition, and deposition rate compared to other methods [11]. In the deposition of molybdenum films, RF

Tailoring of physical properties of RF-sputtered ZnTe films: role of substrate temperature

• Kafi Devi,
• Usha Rani,
• Arun Kumar,
• Divya Gupta and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 333–348, doi:10.3762/bjnano.16.25

• physical and chemical methods such as molecular beam epitaxy [8], electron-beam evaporation [9], thermal evaporation [10], pulsed laser deposition (PLD) [11], and RF sputtering [12]. RF sputtering is a versatile technique because various process parameters such as RF power, deposition time, substrate

Precursor sticking coefficient determination from indented deposits fabricated by electron beam induced deposition

• Alexander Kuprava and
• Michael Huth

Beilstein J. Nanotechnol. 2025, 16, 35–43, doi:10.3762/bjnano.16.4

• Alexander Kuprava Michael Huth Physics Institute, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany 10.3762/bjnano.16.4 Abstract A fast simulation approach for focused electron beam induced deposition (FEBID) numerically solves the diffusion–reaction equation

• the center region of an intentionally defocused electron beam. We employ the method to determine the precursor sticking coefficient for bis(benzene)chromium, Cr(C6H6)2, and trimethyl(methylcyclopentadienyl)platinum(IV), Me3CpPtMe, and find a value of about 10−2 for both precursors, which is

• density, τ is the average precursor residence time, σ is the energy-averaged dissociation cross section, and D is the surface diffusion coefficient. This rate equation makes up the balance between all processes that contribute to replenishment and depletion of precursor molecules. The electron beam is

Fabrication of hafnium-based nanoparticles and nanostructures using picosecond laser ablation

• Abhishek Das,
• Mangababu Akkanaboina,
• Jagannath Rathod,
• R. Sai Prasad Goud,
• Kanaka Ravi Kumar,
• Raghu C. Reddy,
• Ratheesh Ravendran,
• Katia Vutova,
• S. V. S. Nageswara Rao and
• Venugopal Rao Soma

Beilstein J. Nanotechnol. 2024, 15, 1639–1653, doi:10.3762/bjnano.15.129

• mbar) using an electron beam melting furnace having a beam power of 60 kW (ELIT 60) at an accelerating voltage of 24 kV in a water-cooled crucible with feeding mechanism and an extraction system [32]. All operations were conducted at the Centre for Materials for Electronics Technology (CMET), Hyderabad

Ion-induced surface reactions and deposition from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

• Mohammed K. Abdel-Rahman,
• Patrick M. Eckhert,
• Atul Chaudhary,
• Johnathon M. Johnson,
• Jo-Chi Yu,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2024, 15, 1427–1439, doi:10.3762/bjnano.15.115

• Focused ion beam-induced deposition (FIBID) and focused electron beam-induced deposition (FEBID) are vacuum-based, charged-particle bottom-up nanofabrication techniques that directly fabricate metal containing nanostructures as a consequence of the reactions between ions or electrons and organometallic

Out-of-plane polarization induces a picosecond photoresponse in rhombohedral stacked bilayer WSe₂

• Guixian Liu,
• Yufan Wang,
• Zhoujuan Xu,
• Zhouxiaosong Zeng,
• Lanyu Huang,
• Cuihuan Ge and
• Xiao Wang

Beilstein J. Nanotechnol. 2024, 15, 1362–1368, doi:10.3762/bjnano.15.109

• monolayers of WSe2 were aligned at a 0° angle to form the 3R phase. The graphene/3R WSe2/graphene heterojunctions were aligned and assembled onto a SiO2/Si substrate by the all-dry transfer method. Au/Cr (50/10 nm) electrodes were patterned using standard electron-beam lithography (EBL, Raith 150 Two) and

Investigation of Hf/Ti bilayers for the development of transition-edge sensor microcalorimeters

• Victoria Y. Safonova,
• Anna V. Gordeeva,
• Anton V. Blagodatkin,
• Dmitry A. Pimanov,
• Anton A. Yablokov and
• Andrey L. Pankratov

Beilstein J. Nanotechnol. 2024, 15, 1353–1361, doi:10.3762/bjnano.15.108

• samples with bridges of different shapes and lengths were fabricated simultaneously in an electron beam evaporator at a vacuum of 5 × 10−8 Torr. The sample with the film was made separately but with the same parameters, including the thickness and evaporation rates. On the bridged samples

• , photolithography was performed on a Karl Suss MJB3 lithography aligner before deposition. We used AZ5214E photoresist, which was subsequently developed with MIF726. We then deposited 85 nm of hafnium and 5 nm of titanium onto the substrates through developed areas in the resist, using an electron beam evaporator

New design of operational MEMS bridges for measurements of properties of FEBID-based nanostructures

• Bartosz Pruchnik,
• Krzysztof Kwoka,
• Ewelina Gacka,
• Dominik Badura,
• Piotr Kunicki,
• Andrzej Sierakowski,
• Paweł Janus,
• Tomasz Piasecki and
• Teodor Gotszalk

Beilstein J. Nanotechnol. 2024, 15, 1273–1282, doi:10.3762/bjnano.15.103

• Photonics, Łukasiewicz Research Network, Lotników 32/46, 02-668, Warsaw, Poland 10.3762/bjnano.15.103 Abstract Focused electron beam-induced deposition (FEBID) is a novel technique for the development of multimaterial nanostructures. More importantly, it is applicable to the fabrication of free-standing

• emission occur [3][4][5]. There are only a few processes with resolution and repeatability suitable for creating nanostructures, and even fewer are available for self-standing nanostructures. That includes epitaxial techniques as well as focused electron beam-induced deposition (FEBID) [6][7]. Integration

• effect using operational microelectromechanical systems” (Grant No. 2020/37/B/ST7/03792) and PRELUDIUM-21 grant “Nanometrology of field emission phenomena from electron beam deposited nanowires operating as nano- and picodeflection sensors – FEmet” (Grant No. 2022/45/N/ST7/03049) with help from the

A low-kiloelectronvolt focused ion beam strategy for processing low-thermal-conductance materials with nanoampere currents

• Annalena Wolff,
• Nico Klingner,
• William Thompson,
• Yinghong Zhou,
• Jinying Lin and
• Yin Xiao

Beilstein J. Nanotechnol. 2024, 15, 1197–1207, doi:10.3762/bjnano.15.97

• light interactions with biological tissue [18] as well as focused electron beam-induced deposition (FEBID) [19]. The general approach to assess the beam-induced heat damage and undesired artifacts, regardless if working with ions [17], photons [18], or electrons [19], compares experiments to models

• based on heat transfer and to Monte Carlo or finite element simulations [17][18][19]. Open source programs that assess heat deposition and diffusion are readily available to assess damage in light–tissue interactions [18]. For electron beams, multidimensional models predicting electron beam-induced

Direct electron beam writing of silver using a β-diketonate precursor: first insights

• Katja Höflich,
• Krzysztof Maćkosz,
• Chinmai S. Jureddy,
• Aleksei Tsarapkin and
• Ivo Utke

Beilstein J. Nanotechnol. 2024, 15, 1117–1124, doi:10.3762/bjnano.15.90

• , Feuerwerkerstrasse 39, CH 3602 Thun, Switzerland 10.3762/bjnano.15.90 Abstract Direct electron beam writing is a powerful tool for fabricating complex nanostructures in a single step. The electron beam locally cleaves the molecules of an adsorbed gaseous precursor to form a deposit, similar to 3D printing but

• without the need for a resist or development step. Here, we employ for the first time a silver β-diketonate precursor for focused electron beam-induced deposition (FEBID). The used compound (hfac)AgPMe3 operates at an evaporation temperature of 70–80 °C and is compatible with commercially available gas

• injection systems used in any standard scanning electron microscope. Growth of smooth 3D geometries could be demonstrated for tightly focused electron beams, albeit with low silver content in the deposit volume. The electron beam-induced deposition proved sensitive to the irradiation conditions, leading to

Interface properties of nanostructured carbon-coated biological implants: an overview

• Mattia Bartoli,
• Francesca Cardano,
• Erik Piatti,
• Stefania Lettieri,
• Andrea Fin and
• Alberto Tagliaferro

Beilstein J. Nanotechnol. 2024, 15, 1041–1053, doi:10.3762/bjnano.15.85

• which the deposition occurs. During electron beam evaporation, an electron beam is used to vaporize the target material, while during sputtering, a high-energy ion beam is used to bombard the target. In both cases, atoms are ejected from the target and subsequently condense onto the substrate. The

Recent progress on field-effect transistor-based biosensors: device perspective

• Billel Smaani,
• Fares Nafa,
• Mohamed Salah Benlatrech,
• Ismahan Mahdi,
• Hamza Akroum,
• Mohamed walid Azizi,
• Khaled Harrar and
• Sayan Kanungo

Beilstein J. Nanotechnol. 2024, 15, 977–994, doi:10.3762/bjnano.15.80

• -care diagnostic systems. This device was realized using a top-to-down approach with an anisotropic and cost-effective self-stop etching method [85][86]. A novel CMOS anisotropic technique was implemented for the etching process, combining classical optical and electron beam lithography with anisotropic

Water-assisted purification during electron beam-induced deposition of platinum and gold

• Cristiano Glessi,
• Fabian A. Polman and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 884–896, doi:10.3762/bjnano.15.73

• microscope using commercially available components and chemicals, which paves the way for a broader application of direct etching-assisted FEBID to obtain pure metallic structures. Keywords: FEBID; gold; nanofabrication; platinum; purification; Introduction Focused electron beam-induced deposition (FEBID

• focused electron beam. As a result, a solid deposit is formed, and organic and inorganic volatile fragments are removed by the vacuum pumps of the chamber. In the case of an organometallic precursor gas, in an ideal scenario, only metal is deposited, and all fragments arising from organic and inorganic

• , during electron beam exposure, successful purification of the deposited material occurs only if the deposited metal is inherently resistant to oxidation, such as Au, Pt, and Ru [34]. In the case of iron [35], the removal of carbon is accompanied by a large incorporation of oxygen in the deposit

Synthesis of silver–palladium Janus nanoparticles using co-sputtering of independent sources: experimental and theorical study

• Maria J. Martínez-Carreón,
• Francisco Solís-Pomar,
• Abel Fundora,
• Claudio D. Gutiérrez-Lazos,
• Sergio Mejía-Rosales,
• Hector N. Fernández-Escamilla,
• Jonathan Guerrero-Sánchez,
• Manuel F. Meléndrez and
• Eduardo Pérez-Tijerina

Beilstein J. Nanotechnol. 2024, 15, 808–816, doi:10.3762/bjnano.15.67

• -defined regions in the TEM micrographs. In STEM, the main differences in intensity are expected to occur when two elements with notably different atomic numbers interact with the electron beam; in this case, the two elements involved have very similar atomic numbers (46 for Pd and 47 for Ag); thus the

Electron-induced ligand loss from iron tetracarbonyl methyl acrylate

• Hlib Lyshchuk,
• Atul Chaudhary,
• Thomas F. M. Luxford,
• Miloš Ranković,
• Jaroslav Kočišek,
• Juraj Fedor,
• Lisa McElwee-White and
• Pamir Nag

Beilstein J. Nanotechnol. 2024, 15, 797–807, doi:10.3762/bjnano.15.66

• . Interesting differences also appear when this precursor is compared to structurally similar iron pentacarbonyl. The present findings shed light on the recent electron-induced chemistry of Fe(CO)4MA on a surface under ultrahigh vacuum. Keywords: electron collision; focused electron beam-induced deposition

• (FEBID); FEBID precursor; iron tetracarbonyl methyl acrylate; Introduction In recent years, a wave of interest in the electron-induced loss of ligands from organometallic and coordination compounds appeared, which has been motivated by the need to understand focused electron beam-induced deposition

• (FEBID). FEBID is an emerging method for the fabrication of 3D nanostructures. It relies on the local decomposition of precursors in the focal area of an electron beam [1][2][3][4]. In the case of deposition of metals, the interaction with the electrons should ideally lead to a cleavage of all metal

Effect of repeating hydrothermal growth processes and rapid thermal annealing on CuO thin film properties

• Monika Ozga,
• Eunika Zielony,
• Aleksandra Wierzbicka,
• Anna Wolska,
• Marcin Klepka,
• Marek Godlewski,
• Bogdan J. Kowalski and
• Bartłomiej S. Witkowski

Beilstein J. Nanotechnol. 2024, 15, 743–754, doi:10.3762/bjnano.15.62

• cracking. This phenomenon was manifested, for example, during SEM measurements, when the sample was locally heated by an electron beam, as shown in Figure 1. Simultaneously, exposing the samples to thermal processing results in a reduction of the content of carbon atoms. On this basis, it is postulated

• films surface prior to (left) and after exposure of the indicated area to an electron beam for 30 s (right). The C 1s peaks in high-resolution XPS spectra of as-grown films (left) and processed using the HT+RTA procedure (2×) (right). SEM and AFM images of the surface of the as-grown, 1×, 2×, and 3

Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

• Hannah Boeckers,
• Atul Chaudhary,
• Petra Martinović,
• Amy V. Walker,
• Lisa McElwee-White and
• Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

• new precursor for focused electron beam-induced deposition (FEBID), was investigated by surface science experiments under UHV conditions. Auger electron spectroscopy was used to monitor deposit formation. The comparison between Fe(CO)4MA and Fe(CO)5 revealed the effect of the modified ligand

• heteroleptic precursor Fe(CO)4MA, thus, offers the possibility to suppress contributions of thermal reactions, which can compromise control over the deposit shape and size in FEBID processes. Keywords: autocatalytic growth; cryo-EBID; electron beam-induced deposition; heteroleptic iron precursor; thermal

• surface reactions; Introduction Focused electron beam-induced deposition (FEBID) is a state-of-the-art direct-write process for the fabrication of nanoscale materials and devices with arbitrary shape and size down to the sub-10 nm regime [1][2][3]. In FEBID, precursor molecules that contain the element

Superconducting spin valve effect in Co/Pb/Co heterostructures with insulating interlayers

• Andrey A. Kamashev,
• Nadir N. Garif’yanov,
• Aidar A. Validov,
• Vladislav Kataev,
• Alexander S. Osin,
• Yakov V. Fominov and
• Ilgiz A. Garifullin

Beilstein J. Nanotechnol. 2024, 15, 457–464, doi:10.3762/bjnano.15.41

• the magnetization of the Co1 layer. The layers were deposited using electron beam evaporation (Co, Pb) and AC sputtering (Si3N4). The deposition setup had a load-lock station with vacuum shutters, allowing one to transfer the sample holder without breaking the ultrahigh vacuum in the deposition

Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• ., Delftechpark 37j, 2628 XJ, Delft, Netherlands Thermo Fisher Scientific, Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands 10.3762/bjnano.15.40 Abstract Structures fabricated using focused electron beam-induced deposition (FEBID) have sloped sidewalls because of the very nature of the deposition process. For

• applications this is highly undesirable, especially when neighboring structures are interconnected. A new technique combining FEBID and focused electron beam-induced etching (FEBIE) has been developed to fabricate structures with vertical sidewalls. The sidewalls of carbon FEBID structures have been modified

• ; FEBIP; side wall angle; Introduction Focused electron beam-induced processing (FEBIP) is a technique in which a focused electron beam is directed onto a substrate with an adsorbed layer of precursor molecules. The precursor molecules are supplied from a gas injection system through a nozzle at close

Heat-induced morphological changes in silver nanowires deposited on a patterned silicon substrate

• Elyad Damerchi,
• Sven Oras,
• Edgars Butanovs,
• Allar Liivlaid,
• Mikk Antsov,
• Boris Polyakov,
• Annamarija Trausa,
• Veronika Zadin,
• Andreas Kyritsakis,
• Loïc Vidal,
• Karine Mougin,
• Siim Pikker and
• Sergei Vlassov

Beilstein J. Nanotechnol. 2024, 15, 435–446, doi:10.3762/bjnano.15.39

• significant bending in the suspended part in the heating scheme 2. The onset temperature of this phenomenon is difficult to determine as the deformation can be below the detection limits of SEM. Moreover, in SEM we only see the 2D projection normal to the electron beam. If NWs are bent out of the substrate