Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

• Hannah Boeckers,
• Atul Chaudhary,
• Petra Martinović,
• Amy V. Walker,
• Lisa McElwee-White and
• Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• method was later improved by taking into account the molecular bonding [48]. The ionization cross section can also be calculated using the Deutsch and Märk (DM) formalism [49] or the binary encounter Bethe (BEB) model [50]. It should be noted that the mentioned methods yield the total electron ionization

Sputtering of silicon nanopowders by an argon cluster ion beam

• Xiaomei Zeng,
• Vasiliy Pelenovich,
• Zhenguo Wang,
• Wenbin Zuo,
• Sergey Belykh,
• Alexander Tolstogouzov,
• Dejun Fu and
• Xiangheng Xiao

Beilstein J. Nanotechnol. 2019, 10, 135–143, doi:10.3762/bjnano.10.13

• ]. Therefore, the decrease of the mean cluster specific size at higher electron ionization energy can be interpreted as a formation of multiple ionized cluster ions [30]. The multiple ionization is also characterized by some charge distribution with the most probable value, which we designate as an effective

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• electron ionization (EI), dissociative ionization (DI) [17][18][19] processes. Their kinetic energy is only a few eV, with energy distribution determined by the type of wafer and energy of primary beam [20][21]. Thorman et al. have compared gas phase and surface data on low energy electron interactions

• by varying the electron energy. In the case of the negative ions the recorded mass spectrum strongly depends on the electron energy due to a resonant character of attachment reaction. For the measured cross section of electron ionization and dissociative ionization we can evaluate the threshold value

• of the corresponding ion formation by a fitting procedure using a modified Wannier law [55]. This value then represents an ionization potential or appearance energy of electron ionization or dissociative ionization respectively. where b represent background, AE represent appearance (or ionization

Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)₆)

• Jusuf M. Khreis,
• João Ameixa,
• Filipe Ferreira da Silva and
• Stephan Denifl

Beilstein J. Nanotechnol. 2017, 8, 2583–2590, doi:10.3762/bjnano.8.258

• ; dissociative electron attachment; electron ionization; FEBID; metastable decay; Introduction Organometallic compounds have been extensively studied since they are used for a broad field of applications. Among the variety of applications, nanotechnologies have caught special attention since organometallic

• backscattered electrons with the precursor molecules. LEE initiate chemical reactions on the surface by dissociative electron attachment (DEA) and dissociative electron ionization, as well as neutral dissociation. Those processes need to be well understood, in order to maximise the quality of deposited metal as

• by electron transmission spectroscopy describing the negative ion states [14], and electron attachment thresholds for Cr(CO)6, Mo(CO)6 and W(CO)6 were reported [15]. Electron attachment to tungsten hexacarbonyl [13] and tungsten hexachloride [16], as well as electron ionization studies with those

Fluorination of vertically aligned carbon nanotubes: from CF₄ plasma chemistry to surface functionalization

• Claudia Struzzi,
• Mattia Scardamaglia,
• Jean-François Colomer,
• Alberto Verdini,
• Luca Floreano,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2017, 8, 1723–1733, doi:10.3762/bjnano.8.173

• source of the spectrometer by means of fast moving electrons and the electron ionization can contribute to partial fragmentation, as observed in Figure 1a. When the CF4 gas flows in the chamber and the plasma power is set to zero, the origin of the ionized molecules is related to the dissociative

• chamber and it is located at around 30 cm away from the coil. Neutral species entering the mass spectrometer are ionized by electron ionization (EI) using an electron kinetic energy fixed at 20 eV to avoid any further fragmentations in the ionization source. The multiplier, the first dynode, and the

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

Simulation of electron transport during electron-beam-induced deposition of nanostructures

• Francesc Salvat-Pujol,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2013, 4, 781–792, doi:10.3762/bjnano.4.89

• ][21][22], which yield appearance energies of ionic fragments as well as approximate internal energy distributions after electron ionization. The main advantage of using this precursor gas is that the tungsten metal content in the deposits can be widely varied so as to cover a wide range of electronic