Electron-induced ligand loss from iron tetracarbonyl methyl acrylate

• Hlib Lyshchuk,
• Atul Chaudhary,
• Thomas F. M. Luxford,
• Miloš Ranković,
• Jaroslav Kočišek,
• Juraj Fedor,
• Lisa McElwee-White and
• Pamir Nag

Beilstein J. Nanotechnol. 2024, 15, 797–807, doi:10.3762/bjnano.15.66

• ultrahigh-vacuum conditions [8]. The deposits had an Fe/C/O composition similar to those obtained from Fe(CO)5, which was surprising since the methyl acrylate ligand has a high carbon content. This opens a fundamental question of how much can a change in one ligand change the outcome of electron-induced

• reactions? This is basically impossible to predict a priori since several effects come into play, for example, change in bond dissociation energies, electron density at the metal, and dipole moment. Of the possible experimental approaches to address this question, a crossed-beam gas-phase experiment

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• thermal decomposition, while dissociation mechanisms in FEBID are predominantly electron-induced reactions. While primary electron (PE) energies during FEBID are typically between 1 and 30 keV, chemical dissociation is most efficient for low-energy (up to several tens of electronvolts) secondary electrons

Molecular assemblies on surfaces: towards physical and electronic decoupling of organic molecules

• Sabine Maier and
• Meike Stöhr

Beilstein J. Nanotechnol. 2021, 12, 950–956, doi:10.3762/bjnano.12.71

• , photon-induced reactions [46][49][50][51] or electron-induced reactions by electrons from a probe tip [52][53]. In the following, we would like to highlight a few examples for physical properties and built-in functionalities of molecular systems, which were successfully accessed by employing one of the

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• between contributions of thermal chemistry, direct chemistry between water and the deposit, and electron-induced reactions that all contribute to the purification process. We discuss reaction kinetics for the main volatile products CO and CH4 to obtain mechanistic information. The results provide novel

• insights into the chemistry that occurs during purification of FEBID nanostructures with implications also for the stability of the carbonaceous matrix of nanogranular FEBID materials under humid conditions. Keywords: carbon contamination; electron induced reactions; focused electron beam induced

• -deposition thermal purification processes. This result shows that a combination of ESD and TDS can provide an estimate of the relative contribution of electron-induced and thermal reactions in a given FEBID process. Water- and electron-induced reactions in electron-degraded multilayers of MeCpPtMe3 The fact

Comprehensive investigation of the electronic excitation of W(CO)₆ by photoabsorption and theoretical analysis in the energy region from 3.9 to 10.8 eV

• Mónica Mendes,
• Khrystyna Regeta,
• Filipe Ferreira da Silva,
• Nykola C. Jones,
• Søren Vrønning Hoffmann,
• Gustavo García,
• Chantal Daniel and
• Paulo Limão-Vieira

Beilstein J. Nanotechnol. 2017, 8, 2208–2218, doi:10.3762/bjnano.8.220

• initio molecular dynamics simulations of focused electron beam induced deposition (FEBID) precursor molecules adsorbed on fully and partially hydroxylated SiO2 surfaces [24]. Electron-induced reactions in FEBID processes are initiated by low-energy secondary electrons rather than the high-energy primary

Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

• Kai Rückriem,
• Sarah Grotheer,
• Henning Vieker,
• Paul Penner,
• André Beyer,
• Armin Gölzhäuser and
• Petra Swiderek

Beilstein J. Nanotechnol. 2016, 7, 852–861, doi:10.3762/bjnano.7.77

• evidence that nanoparticle formation is primarily controlled by the available amount of precursor. Keywords: copper(II) oxalate; electron-induced reactions; layer-by-layer deposition; nanoparticle formation; thin film; Introduction Electron-induced chemistry is a versatile approach to the fabrication of

• likely deteriorate the size distribution after NP formation. We also propose a mechanism of the electron-induced reactions of copper(II) oxalate leading to the removal of oxalate and to the reduction of Cu2+ ions to elemental Cu. Experimental Preparation of copper(II) oxalate surface layers Using a layer

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition

• be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface

• has been verified both by simulations [11] and by experiments [12]. In recent years, it has motivated a number of gas phase studies focusing on the energy dependence of the branching ratios and cross sections for various low energy (0–100 eV) electron-induced reactions with organometallic precursors

Focused electron beam induced deposition: A perspective

• Michael Huth,
• Fabrizio Porrati,
• Christian Schwalb,
• Marcel Winhold,
• Roland Sachser,
• Maja Dukic,
• Jonathan Adams and
• Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

• from a broader perspective, FEBID still has to live up to the original idea of providing a tool for electron-controlled chemistry on the nanometer scale. This has to be understood in the sense that, by providing a suitable environment during the FEBID process, the outcome of the electron-induced

• reactions can be steered in a controlled way towards yielding the desired composition of the products. The development of a FEBID-specialized surface chemistry is mostly still in its infancy. Next to application development, it is this aspect that will likely be a guiding light for the future development of