Focused ion and electron beams for synthesis and characterization of nanomaterials

• Aleksandra Szkudlarek

Beilstein J. Nanotechnol. 2025, 16, 613–616, doi:10.3762/bjnano.16.47

• question, the co-guest editors Dr. Ivo Utke, Dr. Katja Höflich, Dr. Gregor Hlawacek, Dr. Nico Klingner, and myself organized a thematic issue in connection with the work presented at the joint meeting of the FIT4NANO (fit4nano – Focused Ion Technology for Nanomaterials) and FEBIP (Focused Electron Beam

• Induced Processing) communities during the Focused Charged Particle Week held in Krakow in 2022. Over the past decade, following the publication of the comprehensive book edited by Ivo Utke, Stanislav Moshkalev, and Philip Russell on the fundamentals and applications of focused electron and ion beams [3

Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• ; FEBIP; side wall angle; Introduction Focused electron beam-induced processing (FEBIP) is a technique in which a focused electron beam is directed onto a substrate with an adsorbed layer of precursor molecules. The precursor molecules are supplied from a gas injection system through a nozzle at close

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

• Christian Preischl,
• Linh Hoang Le,
• Elif Bilgilisoy,
• Armin Gölzhäuser and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2021, 12, 319–329, doi:10.3762/bjnano.12.26

• agent need to be considered and further studied. Keywords: 2D materials; carbon nanomembranes (CNMs); focused electron beam-induced processing; metallic nanostructures; self-assembled monolayers; Introduction Focused electron beam-induced processing (FEBIP) is a powerful maskless “direct-write

• electron beam-induced processing is a versatile method for the fabrication of metallic nanostructures with arbitrary shape, in particular, on top of two-dimensional (2D) organic materials, such as self-assembled monolayers (SAMs). Two methods, namely electron beam-induced deposition (EBID) and electron

• Christian Preischl Linh Hoang Le Elif Bilgilisoy Armin Golzhauser Hubertus Marbach Physikalische Chemie II, Friedrich-Alexander Universität Erlangen-Nürnberg, 91058 Erlangen, Germany Fakultät für Physik, Universität Bielefeld, 33615 Bielefeld, Germany 10.3762/bjnano.12.26 Abstract Focused

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• in Figure 10. EBID is a technique with a potentially higher spatial resolution than conventional resist-based EBL. The next section briefly reviews EBID and its counterpart electron beam induced etching (EBIE). The generic term for both techniques is focused electron beam induced processing (FEBIP

• ). 2.2.2 Focused electron beam induced processing. Focused electron beam induced processing (FEBIP) is a high-resolution direct-write nanopatterning method comprising two complementary techniques, namely electron beam induced deposition (EBID) and etching (EBIE). The advantages of FEBIP lie not only in the

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• -induced chemistry of volatile precursor molecules is central to a novel class of gas-assisted nanolithographic techniques, subsumed as focused electron beam induced processing (FEBIP) [1][2]. FEBIP has emerged with the availability of extremely narrow focused electron beams in electron microscopy. These

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• , University of Ghent, B-9000 Ghent, Belgium Uniresearch B.V., 2628 XG Delft, Netherlands 10.3762/bjnano.8.274 Abstract Au(I) complexes are studied as precursors for focused electron beam induced processing (FEBIP). FEBIP is an advanced direct-write technique for nanometer-scale chemical synthesis. The

• interactions, making it volatile. It is stable enough to act as a volatile source for Au deposition, being stabilized by 6.5 kcal/mol. Finally, MeAuCO is likely to dissociate in a single step to pure Au. Keywords: crystallography; focused electron beam induced processing; gold chemistry; precursor design

• ; Introduction Electron microscopes, typically used for imaging and analysis, can be turned into a platform for nanoscale chemical synthesis using electron beam induced chemistry. The electron beam can act as a pen or an eraser on any solid sample, using a technique called focused electron beam induced

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• ; electron beam induced deposition; focused electron beam induced processing; iron pentacarbonyl; nanofabrication; Introduction Carbon nanotubes (CNTs) have attracted enormous interest due to their potential as functional building blocks in applications such as molecular electronics, sensors and energy

• metallic templates for the localized growth of CNTs. However, all of these methods are lacking in either the final desired resolution or in flexibility of the targeted shapes. Therefore, we explore focused electron beam induced processing (FEBIP)-based techniques for the controlled and localized

Focused particle beam-induced processing

• Michael Huth and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2015, 6, 1883–1885, doi:10.3762/bjnano.6.191

• with focused charged particles. The idea for this Thematic Series arose in conjunction with the 5th International Workshop on Focused Electron Beam Induced Processing (FEBIP2014) held at the Physics Department of the Goethe University in Frankfurt am Main in July 2014, which brought together renowned

Continuum models of focused electron beam induced processing

• Milos Toth,
• Charlene Lobo,
• Vinzenz Friedli,
• Aleksandra Szkudlarek and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

• of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 Krakow, Poland 10.3762/bjnano.6.157 Abstract Focused electron beam induced processing (FEBIP) is a

• continuum FEBIP models. Keywords: continuum model; deposition; electron beam processing; etching; gas injection system; Review Introduction to continuum models of focused electron beam induced processing (FEBIP) Continuum FEBIP models enable the simulation of process rates that govern focused electron

Electron-beam induced deposition and autocatalytic decomposition of Co(CO)₃NO

• Florian Vollnhals,
• Martin Drost,
• Fan Tu,
• Esther Carrasco,
• Andreas Späth,
• Rainer H. Fink,
• Hans-Peter Steinrück and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

• deposition; nanofabrication; scanning transmission X-ray microscopy; Introduction The fabrication of nanostructures by using focused electron-beam induced processing (FEBIP) techniques, especially electron-beam induced deposition (EBID), has progressed considerably over the last decade [1][2][3][4][5]. In

The role of electron-stimulated desorption in focused electron beam induced deposition

• Willem F. van Dorp,
• Thomas W. Hansen,
• Jakob B. Wagner and
• Jeff T. M. De Hosson

Beilstein J. Nanotechnol. 2013, 4, 474–480, doi:10.3762/bjnano.4.56

• , Denmark 10.3762/bjnano.4.56 Abstract We present the results of our study about the deposition rate of focused electron beam induced processing (FEBIP) as a function of the substrate temperature with the substrate being an electron-transparent amorphous carbon membrane. When W(CO)6 is used as a precursor

• desorption. Keywords: desorption energy; focused electron beam induced processing; scanning transmission electron microscopy; temperature dependence; tungsten hexacarbonyl; Introduction When the electron beam in an electron microscope is focused on a sample in the presence of a precursor gas, it can be

• used to locally modify the sample. This process has gained increasing interest over the past ten years and is named focused electron beam induced processing (FEBIP) [1][2][3]. The molecules from the precursor gas (transiently) adsorb on the sample surface and dissociate into fragments when they are

Focused electron beam induced deposition: A perspective

• Michael Huth,
• Fabrizio Porrati,
• Christian Schwalb,
• Marcel Winhold,
• Roland Sachser,
• Maja Dukic,
• Jonathan Adams and
• Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

• beam induced processing (FEBIP), the most comprehensive of which is the excellent article by Utke, Hoffmann and Melngailis [6]. These reviews mainly cover the principles of gas-assisted deposition and etching with electrons, provide a summary of modeling approaches to FEBIP, and give some details of

• , with the extension of focused electron beam induced etching (FEBIE), is now the de facto standard in mask repair for the 193 nm node [3]. It also holds great promise for circuit editing. Several reviews have been published in recent years [4][5] discussing various aspects of FEBID, or focused electron