Direct electron beam writing of silver using a β-diketonate precursor: first insights

• Katja Höflich,
• Krzysztof Maćkosz,
• Chinmai S. Jureddy,
• Aleksei Tsarapkin and
• Ivo Utke

Beilstein J. Nanotechnol. 2024, 15, 1117–1124, doi:10.3762/bjnano.15.90

• functionality [23][24]. Here, skin depth refers to the penetration depth of an electromagnetic field into a (non-transparent) metallic material. While pure metal deposition by direct electron beam writing was demonstrated for gold precursors with inorganic ligands [25][26], high purity comes often at the

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

• . This may partly explain the insufficient metal content achieved when using CVD precursors in FEBID [18]. In this context, efforts have been made to design gold precursors optimized for FEBID. Arguably, the most noticeable of these are chloro(carbonyl)gold(I) (AuICl(CO)) [22] and chloro

Gold(I) N-heterocyclic carbene precursors for focused electron beam-induced deposition

• Cristiano Glessi,
• Aya Mahgoub,
• Cornelis W. Hagen and
• Mats Tilset

Beilstein J. Nanotechnol. 2021, 12, 257–269, doi:10.3762/bjnano.12.21

• −. Keywords: Au(I) precursors; focused electron beam-induced deposition (FEBID); gold-NHC; gold precursors; nanofabrication; N-heterocyclic carbene; Introduction Focused electron beam-induced deposition (FEBID) is a nanofabrication technique that allows for the growth of three-dimensional free-standing

• applications from plasmonics [10] to optoelectronics [13]. Gold FEBID precursors (Figure 1) have had a similar history as other metal precursors, as the first tested compounds were taken from the existing library of gold precursors for chemical vapour deposition (CVD). The first compounds tested were gold

• ]. Although many different ligand architectures of gold organometallic complexes were tested as FEBID gold precursors, the effect of different substitutions in the core structure of the molecule on the composition and growth rate of deposits is still largely unexplored. Such studies may reveal groups or

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• properties? In this paper we present a thorough study of organometallic gold precursors for FEBIP. Three Au(I) complexes, ClAuCO, ClAuPMe3 and MeAuPMe3, are characterized using scanning electron microscopy. The crystal structure of MeAuPMe3 was determined using single crystal X-ray diffraction and compared

• with a range of Au complexes. We combine these results with density functional theory calculations of ClAuCO, ClAuPF3, CF3AuCO, ClAuPMe3 and MeAuPMe3. The complexes are shown in Figure 2. Combining these experimental and theoretical datasets we elucidate the design rules for gold precursors. Finally

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• different surface mechanisms prevented the direct application of the methods used for Pt purification to Au purification. These differences between the platinum precursor MeCpPtMe3 and the acetylacetonate-based gold precursors Me2-Au-acac, Me2-Au-tfac, and Me2-Au-hfac become evident by the fact that atomic