Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

• Hannah Boeckers,
• Atul Chaudhary,
• Petra Martinović,
• Amy V. Walker,
• Lisa McElwee-White and
• Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

• bound to the surface or to precursor fragments following thermal surface reactions on the Ta substrate. We note that scenario B would imply that thermal dissociation continues on top of the dissociated first layer of Fe(CO)5 or Fe(CO)4MA on the Ta substrate. Such AG has previously been revealed by AES

• by thermal surface reactions on Ta are, thus, not capable of reacting with further precursor to sustain AG. Electron beam-induced deposition experiments with Fe(CO)4MA and Fe(CO)5 These deposition experiments aimed to evaluate the performance of Fe(CO)4MA in both EBID and cryo-EBID processes and as

• cryo-EBID may relate to thermal surface reactions (see section Thermal reactions of residual gases and of Fe(CO)4MA and Fe(CO)5 on the Ta substrate) within areas of the Ta substrate that are not covered by deposit aggregates. This underlines that the absolute figures obtained from the analysis of the