Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• deposition; 3D nanoprinting; Langmuir model; Introduction Focused electron beam induced deposition (FEBID) is a direct-write nanolithography technique, based on the local decomposition of gas molecules adsorbed on a substrate and induced by the interaction with a focused beam of electrons [1][2][3]. FEBID

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• : additive manufacturing; beam induced processing; 3D printing; direct-write; electron beam induced deposition; microscopy; nanofabrication; pulsed laser; purification; rapid prototyping; Introduction The first fully incorporated 3D transistor logic was reported in 2012 [1]. Further 3D device concepts and

Silicon microgrooves for contact guidance of human aortic endothelial cells

• Sara Fernández-Castillejo,
• Pilar Formentín,
• Úrsula Catalán,
• Josep Pallarès,
• Lluís F. Marsal and
• Rosa Solà

Beilstein J. Nanotechnol. 2017, 8, 675–681, doi:10.3762/bjnano.8.72

• alkaline etch. A thin layer of positive photoresist AZ 1505 (MicroChemicals) was deposited by spin-coating on the silicon wafer at 500 rpm for 10 s then 5000 rpm for 30 s, following by baking at 100 °C for 30 s. Then the wafer was patterned by direct-write lithography (DWL 66FS, Heidelberg Instruments Gmbh

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition

• ; focused electron beam induced deposition (FEBID); low-energy electron-induced fragmentation; neutral dissociation; Review 1 Introduction Focused electron beam induced deposition (FEBID) [1][2][3] is a direct-write method capable of creating nanostructures with potential scientific and industrial

Continuum models of focused electron beam induced processing

• Milos Toth,
• Charlene Lobo,
• Vinzenz Friedli,
• Aleksandra Szkudlarek and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

• suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• controlling the beam scanning three dimensional structures of a complex shape can be created in a single direct-write deposition step onto planar or non-planar surfaces [2]. Nanodevices with various functionalities have been deposited comprising gas sensors [3][4], magnetic sensors [5][6] strain sensors [7

• with a high aspect ratio makes FEBID suitable for fabrication of high resolution probes to scanning magnetic force microscopy (MFM) [17][18][19]. Purification methods of FEBID structures For FEBID direct-write nanostructures lateral resolution can be well-controlled by adjusting the beam and gas flow

Structural transitions in electron beam deposited Co–carbonyl suspended nanowires at high electrical current densities

• Gian Carlo Gazzadi and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2015, 6, 1298–1305, doi:10.3762/bjnano.6.134

• deposition (FEBID), a direct-write nanolithography based on the decomposition of gas precursors molecules with electron beams [1]. This technology, in fact, allows for the deposition of various materials on planar and non-planar substrates with nanoscale resolution [2], and it can be easily implemented on

Tunable magnetism on the lateral mesoscale by post-processing of Co/Pt heterostructures

• Oleksandr V. Dobrovolskiy,
• Maksym Kompaniiets,
• Roland Sachser,
• Fabrizio Porrati,
• Christian Gspan,
• Harald Plank and
• Michael Huth

Beilstein J. Nanotechnol. 2015, 6, 1082–1090, doi:10.3762/bjnano.6.109

• photomask repair [20] to fabrication of nanowires [17][21], nanopores [22], magnetic [5][12] and strain sensors [23] as well as direct-write superconductors [24]. The precursors Co2(CO)8 and (CH3)3CH3PtC5H4 from which Pt- an Co-based structures can be fabricated in the FEBID process, like most metal-organic

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• structures of desired geometry with a spatial resolution of less than 100 nm. One of the most advanced and in-demand technologies is mask-free or direct-write lithography based on the interaction of an electron beam with a polymer resist [1]. Under normal conditions, electron-beam lithography (EBL) enables

Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

• Brett B. Lewis,
• Michael G. Stanford,
• Jason D. Fowlkes,
• Kevin Lester,
• Harald Plank and
• Philip D. Rack

Beilstein J. Nanotechnol. 2015, 6, 907–918, doi:10.3762/bjnano.6.94

• process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention. Keywords: beam induced processing; direct-write; electron beam induced deposition; nano; Introduction Focused electron beam induced deposition (FEBID) is an attractive nanotechnology

Challenges in realizing ultraflat materials surfaces

• Takashi Yatsui,
• Wataru Nomura,
• Fabrice Stehlin,
• Olivier Soppera,
• Makoto Naruse and
• Motoichi Ohtsu

Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99

• involved the fabrication of a nanostripe pattern on TiO2. Direct ArF-laser photopatterning was followed by the application of a sol–gel negative tone photoresist to produce TiO2 nanostructures by using deep-UV (DUV) direct-write imaging [42][43]. Figure 4c and Figure 4f show representative AFM images taken

Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM

• Xiaoxing Ke,
• Carla Bittencourt,
• Sara Bals and
• Gustaaf Van Tendeloo

Beilstein J. Nanotechnol. 2013, 4, 77–86, doi:10.3762/bjnano.4.9

• -induced deposition (FEBID) is used as a direct-write approach to decorate ultrasmall Pt nanoclusters on carbon nanotubes at selected sites in a straightforward maskless manner. The as-deposited nanostructures are studied by transmission electron microscopy (TEM) in 2D and 3D, demonstrating that the Pt

• desired. In this paper, we explore the use of focused-electron-beam-induced deposition (FEBID) to pattern CNTs with well-dispersed ultrasmall nanoclusters. FEBID is a direct-write process where a focused electron beam is used to locally decompose a precursor gas that contains a component such as a metal

• contacts, and therefore much effort is being put into their electrical measurements and resistivity improvement, such as in references [16][17]. Nevertheless, the formation of different patterns of nanostructures at the CNT surface by FEBID is more challenging, since the direct-write process can produce

Direct-write polymer nanolithography in ultra-high vacuum

• Woo-Kyung Lee,
• Minchul Yang,
• Arnaldo R. Laracuente,
• William P. King,
• Lloyd J. Whitman and
• Paul E. Sheehan

Beilstein J. Nanotechnol. 2012, 3, 52–56, doi:10.3762/bjnano.3.6

• -compatible direct-write technique should be of value both for nanoscale lithography of polymer structures and for the study of molecularly-ordered polymer nanostructures. This result would also open a new method of studying polymer-semiconductor surface interaction at a molecular level which is useful to