Search results
Search for "patterning" in Full Text gives 184 result(s) in Beilstein Journal of Nanotechnology.
Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition
Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240
- electron beam irradiation, with non-volatile product species being incorporated into the growing deposit. The size and shape of the nanostructure are controlled by manipulation of the electron beam (focusing ability and patterning capabilities), which allows an almost unlimited array of three-dimensional
- pA in a serpentine patterning sequence. A point pitch of 26 nm and a dwell time of 250 µs were used to ensure a flat-top deposit shape [49]. Nine different deposition heights, ranging from 14 to 73 nm were achieved by a variation of loops (1–9 loops), resulting in a variation of the total exposure
- MeCpPtMe3 contain platinum atoms embedded in a carbonaceous matrix [7][44], which we will refer to hereafter as a PtCx structure. To produce PtCx FEBID deposits with well-defined shapes suitable for AFM analysis, a focused electron beam in combination with patterning was used to create a range of different
Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography
Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236
- inorganic oxide film by ALD and demonstrated its usefulness in soft lithography patterning of polymer films. DNA nanotubes and origami triangles with Al2O3 films of ca. 2 nm, ca. 5 nm or ca. 20 nm thickness have been tested as the master templates to imprint their nanoscale features to PLLA films. As the
Expanding the molecular-ruler process through vapor deposition of hexadecanethiol
Beilstein J. Nanotechnol. 2017, 8, 2339–2344, doi:10.3762/bjnano.8.233
- -ruler process is a notable example of this hybrid approach as it couples conventional patterning methods with molecular self-assembly [14]. The molecular-ruler process can be employed to form nanogaps between registered metal surface features that have been generated using conventional lithographic
Tailoring the nanoscale morphology of HKUST-1 thin films via codeposition and seeded growth
Beilstein J. Nanotechnol. 2017, 8, 2307–2314, doi:10.3762/bjnano.8.230
- formation [25][26]. Processing conditions have been optimized for some specific MOF systems to utilize conventional lithography for patterning of the film [8][27][28]. While these methods offer means to control the spatial location of the MOF for integration, they typically do not present processing
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198
- complementary alternative to traditional patterning methods providing sub-10 nm resolution, low-cost processing and high throughput [1][2][3]. Moreover, it is one of the most promising techniques for the development of the next generation of nanoelectronic devices and circuits, as it is compatible with current
Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold
Beilstein J. Nanotechnol. 2017, 8, 1863–1877, doi:10.3762/bjnano.8.187
- conditions (i.e., with benzyl nicotinamide). We also combined thin film deposition with particle lithography [10][17][45][46][47][48][49]. This approach to surface patterning uses photomasks consisting of silicon dioxide mesospheres (d = 500 nm) on surfaces to protect small, discrete regions of the surface
Laser processing of thin-film multilayer structures: comparison between a 3D thermal model and experimental results
Beilstein J. Nanotechnol. 2017, 8, 1749–1759, doi:10.3762/bjnano.8.176
- can have many potential applications including patterning the cell growth for biomedical applications and controlling the grain size in fabrication of polycrystalline silicon (poly-Si) thin-film transistors (TFTs). Keywords: 3D transient modelling; heat transfer; laser materials processing
- application is finding the best laser parameters and layer thickness for controlling the size of heat affected zone and ablated zone for patterning the cell, as mentioned in the previous paragraph. Despite the necessity for thermal modelling of this process, there have been very few efforts in this area so
- . However, the molten zone is very small for gold coated samples, which means the deeper holes created on the gold coated surface are mainly caused by the lower plasma absorption. The results presented in this paper can be manipulated for cell patterning applications. Figure 3 depicts that, the size and
Effect of the fluorination technique on the surface-fluorination patterning of double-walled carbon nanotubes
Beilstein J. Nanotechnol. 2017, 8, 1688–1698, doi:10.3762/bjnano.8.169
- possibility of different patterning of carbon surfaces through choosing the fluorination method. Keywords: double-walled carbon nanotubes; fluorination; NEXAFS; quantum-chemical modeling; Introduction Even after surface chemical functionalization, due to their inner shell double-walled carbon nanotubes
- , gaseous BrF3 at room temperature, and CF4 plasma under mild working conditions. It was found that the resultant composition and fluorination patterning of the sample depend on the fluorination method. In the case of two latter samples, Raman spectroscopy unambiguously indicated a fluorination of the outer
Fixation mechanisms of nanoparticles on substrates by electron beam irradiation
Beilstein J. Nanotechnol. 2017, 8, 1523–1529, doi:10.3762/bjnano.8.153
- -1 Sengen, Tsukuba, 305-0047, Japan 10.3762/bjnano.8.153 Abstract For applications such as the fabrication of plasmonic waveguides we developed a patterning technique to fabricate an array of nanoparticles on a substrate using focused electron beams (Noriki, T.; Abe, S.;.Kajikawa, K.; Shimojo, M
- -scattering leads to an increase in line width and thus reduces the resolution of this patterning technique. Keywords: accelerating voltage; electron beam; gold; Monte Carlo simulation; nanoparticle array; Introduction Techniques to fabricate assemblies or arrays of nanostructures on a desired area have
Micro- and nano-surface structures based on vapor-deposited polymers
Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138
- such as light-directed patterning and direct-writing approaches. The limitations for patterning on non-flat surfaces are resolution and cost. With the requirement of chemical control and/or precise accessibility to the linkage with functional molecules, chemically and topographically defined interfaces
- have recently attracted considerable attention. The multifunctional, gradient, and/or synergistic activities of using such interfaces are also discussed. Finally, an emerging discovery of selective deposition of polymer coatings and the bottom-up patterning approach by using the selective deposition
- technology is demonstrated. Keywords: multifunctional; polymer coating; surface modification; surface patterning; vapor deposition; Review Introduction Vapor-based processes of polymer coating/deposition combine many unique attributes in a dry, solvent-free process, and the deposition protocols as well as
Nanotopographical control of surfaces using chemical vapor deposition processes
Beilstein J. Nanotechnol. 2017, 8, 1250–1256, doi:10.3762/bjnano.8.126
- is the structured coating of the substrate by initiator molecules in surface-initiated vapor-deposition polymerization. With this method, the polymer only grows on those locations on the surface equipped with predeposited initiator molecules. The patterning of the initiator can be achieved using
- ]. Due to secondary adsorption on deactivated monomers, the authors found a maximum thickness of selectively grown polymer depending on the metal and the monomer type. Iron was found to be the most efficient inhibitor for the investigated polymers. By patterning iron molecules via photolithography or
- results in the deactivation of the reactive monomer species on the surface. Patterning was realized by placing conducting aluminum metal channels on a nonconductive glass surface [24]. The selective growth of various polymers was also found for surfaces equipped with different functional groups. This
A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls
Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124
- is typically required to create integrated systems based on multifunctional devices on a chip. For the latter purpose, top-down approaches based on fabrication methods used in the microelectronics industry are particularly well-suited because of the patterning design flexibility and controllability
- thick walls on planar substrates is presented. The method consists of three sequential, standard microelectronic processes: 1) lithographic patterning of an organic polymer resist film; 2) deposition of a thin film of metal on all surfaces of the nanopattern resist; and 3) removal of the polymer resist
Preparation of thick silica coatings on carbon fibers with fine-structured silica nanotubes induced by a self-assembly process
Beilstein J. Nanotechnol. 2017, 8, 1145–1155, doi:10.3762/bjnano.8.116
- of the fiber with LPEI aggregates can be obtained which serves as both catalyst and template in the following mineralization step. The nature of LPEI enables access to a nanostructured patterning of the resulting silica shell. LPEI/silica composite particles and their immobilization on carbon fibers
- mediated by LPEI (inset: surface patterning of the neat carbon fiber) and b) close-up image of a silica shell fragment. Scanning electron micrographs of mineralized LPEI aggregates modified by copper nitrate addition, a) disk-like morphology of a complete particle, b) close-up image of the linear
CVD transfer-free graphene for sensing applications
Beilstein J. Nanotechnol. 2017, 8, 1015–1022, doi:10.3762/bjnano.8.102
- advantage of the absence of damage or contamination of the synthesized graphene, because there is no need for the transfer onto a substrate. Moreover, a proper pre-patterning of the Mo catalyst allows one to obtain graphene films with different shapes and dimensions. The sensing properties of the material
- of conductometric devices in which multilayer graphene films have been directly synthesized on insulating SiO2 substrates by means of a transfer-free CVD method mediated by Mo. The pre-patterning of the Mo layer allows the graphene to be shaped in the desired form by means of standard lithography
- made as thin as 50 nm without any segregation at the graphene CVD temperature (≈1000 °C), because of the higher melting point of Mo (2623 °C) compared to that of other conventional catalysts such as Cu (1085 °C) or Ni (1455 °C). Moreover, this allows a pre-patterning the film for the selective growth
Near-field surface plasmon field enhancement induced by rippled surfaces
Beilstein J. Nanotechnol. 2017, 8, 956–967, doi:10.3762/bjnano.8.97
- processes or self-organization have been demonstrated to be an excellent and relatively low-cost alternative, allowing maskless patterning of macroscopic surface areas [18]. Many of such techniques lead to typical patterns including fractal surfaces. Regular, or nearly regular, nanoscale ripples have width
- ) that we will use in the SIE picture. Here, we are using the notation that , where and are unit vectors along the x and y directions. Since many patterning techniques, including ballistic deposition processes (such as molecular beam epitaxy or IBS) or plasma etching, are characterized by dynamic
- growth processes subsequent to deposition rates as, for example, with the IBS technique or other equivalent patterning methods is a nonequilibrium process where a two-dimensional surface is defined by the height function h(x,y,t), whose evolution in time is monitored. The physics of the growth and of the
Triptycene-terminated thiolate and selenolate monolayers on Au(111)
Beilstein J. Nanotechnol. 2017, 8, 892–905, doi:10.3762/bjnano.8.91
- defined border between zones with and without the molecules on the substrate. Occasionally, using sophisticated patterning methods, height differences between two different SAMs have been determined [33]. Ellipsometry is suitable to measure thicknesses of monomolecular films, in principle, but the
Relationships between chemical structure, mechanical properties and materials processing in nanopatterned organosilicate fins
Beilstein J. Nanotechnol. 2017, 8, 863–871, doi:10.3762/bjnano.8.88
- curing to create a 33% nanoporous organosilicate material with a nominal Young’s modulus of 5 GPa [36]. The pitch quarter patterning process consisted of first depositing on the nanoporous organosilicate a quad-layer film stack consisting of a backbone layer, an anti-reflection coating, a second backbone
- fins. After completion of fin formation, some samples were exposed to a standard silylation treatment in an attempt to restore some of the terminal organic groups removed from the nanoporous organosilicate by the patterning process. The details of the silylation treatment are described elsewhere [37
- properties of the nanoporous organosilicate induced by the pitch division patterning process as a function of feature size, we utilized the resonance enhanced mode of AFM-IR (Figure 1c) [32] and CR-AFM (Figure 1d) [34], respectively. In the resonance-enhanced AFM-IR technique, a tunable IR laser is pulsed
3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity
Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83
- . While standard patterning of the electron beam has resulted in complex 2D deposits of arbitrary shape, care must be taken as subtle proximity effects can be minimized or exacerbated in some electron beam [32], gas flux and patterning [33], and temperature regimes [34]. Moreover, while several examples
- to gold sputtering, to promote adhesion between the gold contacts and the underlying, insulating SiO2 film (290 nm). The original photolithographically defined spacing between electrical contacts was 20 µm. EBL was performed using a Raith ELPHY Quantum patterning engine equipped on the FEI NovaLab
- 600 dual beam. The contact spacing was reduced to 500 nm using EBL. The EBL contact extensions were 20 nm thick gold with a 3 nm titanium adhesion layer. After patterning, the substrate was cleaned via sonication for 5 minutes in an acetone bath. EBID was then used to construct a 3D bridge across the
Phospholipid arrays on porous polymer coatings generated by micro-contact spotting
Beilstein J. Nanotechnol. 2017, 8, 715–722, doi:10.3762/bjnano.8.75
- of ink fluidity under humidity controlled conditions [11][12]. Using quill-like pens (SPTs, short for surface patterning tool [13]) for lipid ink deposition permitted the reduction of the volume of phospholipids needed for array generation, as compared to other spotting techniques like ink jet
- the therapeutic treatment for breast and prostate cancer patients. Keeping in mind previous applications of HEMA polymer in creating superhydrophilic–superhydrophobic micropatterned surfaces for cell patterning [28] and cell-screening applications [29][30], the addition of lipid arraying to the
- polymer nanoglobules with pores of around 150 nm. Microcontact spotting The patterning of lipid arrays was performed on a NLP 2000 system (NanoInk, USA) with oxygen plasma activated (0.2 mbar O2, 2 min) SPT probes (SPT-S-C10S, BioForce Nanosciences, USA). All lipids were purchased from Avanti Polar Lipids
Ion beam profiling from the interaction with a freestanding 2D layer
Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73
- , Department of Mechanical and Process Engineering, Eidgenössische Technische Hochschule (ETH) Zürich, Tannenstrasse 3, CH-8092 Zürich, Switzerland 10.3762/bjnano.8.73 Abstract Recent years have seen a great potential of the focused ion beam (FIB) technology for the nanometer-scale patterning of a
- cascades, featured by no interaction volume. Thus, the patterning resolution is directly set by the beam diameters. Here, we demonstrate pattern resolution beyond the beam size and precise profiling of the focused ion beams. We find out that FIB exposure time of individual pixels can influence the
- . FIBs interaction with such a self-suspending layer brings no collision cascade. Instead, atoms of the 2D membrane material are sputtered only by direct binary collision events with incident ions. Thus, the patterning resolution is directly set by the beam diameters. In fact, it was shown that FIB
Silicon microgrooves for contact guidance of human aortic endothelial cells
Beilstein J. Nanotechnol. 2017, 8, 675–681, doi:10.3762/bjnano.8.72
- adhesion, morphology (alignment, circularity and filopodia presence) and proliferation. Moreover, these structures exerted no cytotoxic effect. Conclusion: The results suggest that topographical patterning influences cell response. Silicon groove substrates can be used in developing medical devices with
- < 0.05). On the one hand, cells cultured on V15 presented no proliferation. On the other hand, cells proliferated when cultured on S15, S40 and V40 and this proliferation was different accordingly to the patterning. That is to say, proliferation was greater in S15 and lower in S40 and V40, when compared
- silicon structures consisting of repeated ridges and grooves patterning modify the behaviour of endothelial cells. Microscopy analysis revealed differences between flat silicon and patterned substrates. Firstly, the number of attached cells was higher when cells were cultured on V-shaped substrates
Anodization-based process for the fabrication of all niobium nitride Josephson junction structures
Beilstein J. Nanotechnol. 2017, 8, 539–546, doi:10.3762/bjnano.8.58
- overall fabrication recipe with existing processes and literature. Along with the optimal and controlled film growth we also carried out an investigation of the anodization of these films since this technique is necessary for the most of the procedures leading to the patterning of tunnel junctions. The
- growth of the oxide film and the voltage during the anodization as a method to control its thickness up to few angstroms per second. The properties and the quality of Josephson junctions obtained using our patterning based on lift-off lithography on cold substrates and the anodization of NbN for defining
Advances in the fabrication of graphene transistors on flexible substrates
Beilstein J. Nanotechnol. 2017, 8, 467–474, doi:10.3762/bjnano.8.50
- was also confirmed (43 ± 1 nm) by the local step height measure reported in Figure 1b for a patterned Al2O3. The dielectric patterning was obtained by depositing the oxide on a silicon wafer masked by a negative profile resist and then removing the resist by an ultrasonic hot chemical bath. This
- exploited on Si during the dielectric layer testing, and patterning by a lift-off approach. The metal morphology is reported in Figure 3a, revealing an RMS of ≈9.8 nm, consistent with the roughness of the underlying substrate. Figure 3b reports the schematic illustration of the patterned Al pads on the
- smoother substrates. However, it is still possible to identify wrinkles, as indicated by the dashed green circle in Figure 4a. A schematic illustration of the graphene channel fabricated over the FET gate contact is reported in Figure 4b. After patterning the graphene channel, the source and drain contacts
Annealing-induced recovery of indents in thin Au(Fe) bilayer films
Beilstein J. Nanotechnol. 2016, 7, 2088–2099, doi:10.3762/bjnano.7.199
- their subsequent dissolution. The application of the processes uncovered in this work show great potential for the patterning of thin films. Keywords: annealing; diffusion; dislocation loops; nanoindenation; thin films; Introduction The intentional introduction of defects into bulk metallic material
- patterning with the aid of nanoindentation imprints is quite obvious, we demonstrated that a thermo-mechanical treatment of the film, i.e., nanoindentation followed by annealing, can result in the formation of ordered arrays of hillocks. While the parameters of the naturally formed hillocks can hardly be
Active and fast charge-state switching of single NV centres in diamond by in-plane Al-Schottky junctions
Beilstein J. Nanotechnol. 2016, 7, 1727–1735, doi:10.3762/bjnano.7.165
- initialization, processing and read-out as well as single 13C atoms for storage of quantum information. This could be realised with a suitable patterning of the Al-gates, such that single NV centres could be addressed individually. Furthermore, a control of the spectral emission properties of NVs as a single
Other Beilstein-Institut Open Science Activities
