Magnetic properties of Fe₃O₄ antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

• Juan L. Palma,
• Alejandro Pereira,
• Raquel Álvaro,
• José Miguel García-Martín and
• Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

• [23] and colloidal [24] lithography, porous anodic alumina [25][26], block copolymer templates [27], nanochannel glass [28] and focused ion beam (FIB) patterning [29][30]. Recently, we have proposed the fabrication of disordered antidot arrays through the thermal reduction of thin films synthesized by

Josephson effect in junctions of conventional and topological superconductors

• Alex Zazunov,
• Albert Iks,
• Miguel Alvarado,
• Alfredo Levy Yeyati and
• Reinhold Egger

Beilstein J. Nanotechnol. 2018, 9, 1659–1676, doi:10.3762/bjnano.9.158

• ][5][6][7][8][9][10][11][12], and they may also be designed in two-dimensional layouts by means of gate lithography techniques. Over the last few years, several experiments employing such platforms have provided mounting evidence for MBSs, e.g., from zero-bias conductance peaks in N–TS junctions

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• , Campus Ecotekne, Via Monteroni, Lecce, Italy National Institute of Gastroenterology “S. De Bellis” Research Hospital, via Turi 27, 70013, Castellana Grotte (Bari), Italy Institute for Microelectronics and Microsystems, IMM-CNR, Lecce, Italy 10.3762/bjnano.9.150 Abstract Colloidal lithography is an

• different sizes and materials. Keywords: colloidal lithography; electrostatic interactions; large-area nanostructure patterning; localized surface plasmon resonance; spherical nanoparticles; Introduction In recent years, ordered nanostructured arrays have attracted great interest because of their

• ; this is why a proper fabrication tool, able to guarantee good flexibility, is required to meet research goals. Typically, the fabrication of nanostructured systems involves techniques such as electron beam and focused ion beam lithography in order to realize arrays of nanoscale features with precise

Evaluation of replicas manufactured in a 3D-printed nanoimprint unit

• Manuel Caño-García,
• Morten A. Geday,
• Manuel Gil-Valverde,
• Xabier Quintana and
• José M. Otón

Beilstein J. Nanotechnol. 2018, 9, 1573–1581, doi:10.3762/bjnano.9.149

• Manuel Cano-Garcia Morten A. Geday Manuel Gil-Valverde Xabier Quintana Jose M. Oton CEMDATIC, ETSI Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, 28040-Madrid, Spain 10.3762/bjnano.9.149 Abstract Nanoimprint lithography has become a useful tool to prepare elements

• of a solvent were found to be superior for most nanoimprint applications. A large dispersion of the samples was found. Keywords: nanoimprint; oriented gradient; photoresist; polymer; replica; Introduction Although the basic principles behind nanoimprint lithography (NIL) have been known for many

Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography

• Gitanjali Kolhatkar,
• Alexandre Merlen,
• Jiawei Zhang,
• Chahinez Dab,
• Gregory Q. Wallace,
• François Lagugné-Labarthet and
• Andreas Ruediger

Beilstein J. Nanotechnol. 2018, 9, 1536–1543, doi:10.3762/bjnano.9.144

• Department and Centre for Materials and Biomaterials, 1151 Richmond Street, London, ON, N6A5B7, Canada 10.3762/bjnano.9.144 Abstract We introduce a simple, fast, efficient and non-destructive method to study the optical near-field properties of plasmonic nanotriangles prepared by nanosphere lithography

• : apertureless scanning near-field optical microscopy; diffuse signal; nanosphere lithography; photomultiplier tube; plasmonic nanostructures; Introduction SNOM (scanning near-field optical microscopy) is an imaging technique based on an optical near-field probe for high spatial resolution [1][2]. A version of

• contribution, we use the Fourier transformation of the diffuse signal and filtering. This method is applied to plasmonic gold nanotriangles [19] inscribed on a glass substrate, that were prepared by nanosphere lithography [20][21][22]. Those nanostructures, that most commonly consist of arrays of metallic

Cathodoluminescence as a probe of the optical properties of resonant apertures in a metallic film

• Kalpana Singh,
• Evgeniy Panchenko,
• Babak Nasr,
• Amelia Liu,
• Lukas Wesemann,
• Timothy J. Davis and
• Ann Roberts

Beilstein J. Nanotechnol. 2018, 9, 1491–1500, doi:10.3762/bjnano.9.140

• lithography, the authors [58] of were able to efficiently investigate a range of hole separations, but were restricted to weakly resonant circular apertures and pairs of holes. Here we investigate the resonances of small groups of apertures in gold films on a glass substrate. Specifically, we study ensembles

Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• separation of fluorescent-labeled protein molecules [47]. Although the preparation may be addressed as demanding, the whole processing is factory compatible and stable, enabled by consequent application of parallel processes of unconventional lithography techniques. Inspired by recent reports [48][49][50][51

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

• Phillip C. Chambers and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112

• porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of Si(111) with octadecyltrichlorosilane (OTS). A methyl-terminated matrix was chosen to direct the growth of CMPS nanostructures to fill

• matrix of OTS showed minimal areas of nonspecific adsorption. The AFM studies provide insight into the mechanism of the self-polymerization of CMPS as a platform for constructing porphyrin heterostructures. Keywords: atomic force microscopy (AFM); nanostructures; particle lithography; porphyrin; self

• triple-decker sandwich complex of phthalocyanine compounds prepared on graphite was studied using STM by Lei et al. [17]. A method of photocatalytic lithography was reported for making porphyrin surface structures that were applied for preparing protein arrays [18][19]. The assembly of porphyrins at

Field-controlled ultrafast magnetization dynamics in two-dimensional nanoscale ferromagnetic antidot arrays

• Anulekha De,
• Sucheta Mondal,
• Sourav Sahoo,
• Saswati Barman,
• Yoshichika Otani,
• Rajib Kumar Mitra and
• Anjan Barman

Beilstein J. Nanotechnol. 2018, 9, 1123–1134, doi:10.3762/bjnano.9.104

• previously. Results and Discussion 25 × 25 μm2 arrays of two-dimensional Py antidot arrays with triangular holes arranged in hexagonal lattice symmetry have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling [20]. Figure 1a,b shows the scanning electron

• -dimensional arrays of Py antidots with triangular holes arranged in a hexagonal lattice have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling. The 20 nm-thick Py film was deposited on a commercially available self-oxidized Si(100) substrate and a 60-nm

• irradiation of laser light. A PMMA/MMA bilayer resist was used for electron-beam lithography to prepare the resist pattern on the Py thin film followed by argon ion milling at a base pressure of 1 × 10−4 Torr with a beam current of 60 mA for 6 min for etching out the Py film from everywhere except the

Tuning adhesion forces between functionalized gold colloidal nanoparticles and silicon AFM tips: role of ligands and capillary forces

• Sven Oras,
• Sergei Vlassov,
• Marta Berholts,
• Rünno Lõhmus and
• Karine Mougin

Beilstein J. Nanotechnol. 2018, 9, 660–670, doi:10.3762/bjnano.9.61

• substrate material for MEMS and NEMS is silicon. It can be tailored into complex shapes by fine lithography methods. The adhesion between Au and Si or SiO2 is known to be rather poor [18][19][20]. Böhme et al. [21] demonstrated that the oxygen layer forming on the silicon substrates affects the adhesion

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• biological species recognition with minimum nonspecific attachment. Herein, a straightforward approach utilizing chemical lift-off lithography to create a diluted self-assembled monolayer matrix for anchoring diverse biological probes is introduced. The strategy encompasses convenient operation, well-tunable

• lift-off lithography; patterning; self-assembled monolayer; Introduction Patterning on the micro- to nanoscale plays a key role in modern scientific and engineering research fields. Particularly, the creation of bioactive surfaces with well-defined geometries has drawn lots of attention due to its

• fact that optical lithography allows for large-area fabrication provides an accessible route to bioactive substrate manufacturing but is limited by light diffraction when very fine control is required. On the other hand, scanning beam-based lithographic techniques allow for highly controllable fine

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• nanomanipulation approaches. The top-down approach involves lithography, etching and coating technologies to fabricate device structures from bulk materials or thin films [7][19][23][39][47][48][49][50]. The combined approach of fabricating NEM switches requires subsequent transfer and alignment of synthesized

• ] top-down NEM switch fabrication approaches. Similarly to copper, the fabrication of a platinum cantilever NEM switching element involved an additional thermal annealing step at 300 °C to reduce the stress gradient in the beam. The usability of platinum for electron-beam lithography-based fabrication

• . Several CNT-based relays and switches have been fabricated using the bottom-up arrangement of CNTs, including dielectrophoresis [33], controlled growth of CNTs [34][37], dispersion coating [12][35][36], nanomanipulation [15][32] techniques and electron beam lithography/metal sputtering for the fabrication

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• and preferably as few processing steps as possible. Therefore, a maskless direct-write method would be favorable in comparison to common resist-based lithography techniques, which require multiple steps and are reaching their lateral resolution limits. Focused electron beam induced deposition (FEBID

Al₂O₃/TiO₂ inverse opals from electrosprayed self-assembled templates

• Arnau Coll,
• Sandra Bermejo,
• David Hernández and
• Luís Castañer

Beilstein J. Nanotechnol. 2018, 9, 216–223, doi:10.3762/bjnano.9.23

• top-down approaches based on lithography or holography), the present state of the current techniques [8][9][10][11][12][13] either leads to various randomly oriented domains [14] or to limited defect-free areas, and furthermore, they are typically very slow fabrication processes. In addition, a review

Combined scanning probe electronic and thermal characterization of an indium arsenide nanowire

• Tino Wagner,
• Fabian Menges,
• Heike Riel,
• Bernd Gotsmann and
• Andreas Stemmer

Beilstein J. Nanotechnol. 2018, 9, 129–136, doi:10.3762/bjnano.9.15

• = 2 mΩ·cm) silicon wafers coated with a 100 nm thick thermal oxide. Electrical contact pads and alignment marks for e-beam alignment and localization of the NWs where defined and fabricated using an ultraviolet lithography process. The InAs NWs were transferred from a growth substrate onto the pre

• -patterned wafer on which they where localized and contacted by e-beam lithography. The InAs NWs studied were grown in a metal-organic vapor deposition (MOCVD) system by vapor–liquid–solid (VLS) growth using a gold particle as catalyst and using trimethylindium (TMIn) and tert-butylarsine (TBA) as precursors

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• thick CuxFyCzOz and 50 nm thick AuxCyOz depositions. Each defined a rectangular pattern of 20 × 5 μm2 onto predefined 100 nm thick Au electrodes. These electrodes were obtained by standard UV lithography on phosphorus-doped Si wafers (8 mΩ·cm) with a 200 nm thick SiO2 layer for electrodes isolation. The

Gas-sensing behaviour of ZnO/diamond nanostructures

• Marina Davydova,
• Alexandr Laposa,
• Jiri Smarhak,
• Alexander Kromka,
• Neda Neykova,
• Josef Nahlik,
• Jiri Kroutil,
• Jan Drahokoupil and
• Jan Voves

Beilstein J. Nanotechnol. 2018, 9, 22–29, doi:10.3762/bjnano.9.4

• . All designs were fabricated in-house by standard UV lithography, followed by thermal evaporation and lift-off. The diamond growth was carried out by microwave-plasma-enhanced chemical vapour deposition from a gas mixture containing 1% of CH4 in H2 at temperatures as low as 450 °C. Then, the samples

A robust AFM-based method for locally measuring the elasticity of samples

• Alexandre Bubendorf,
• Stefan Walheim,
• Thomas Schimmel and
• Ernst Meyer

Beilstein J. Nanotechnol. 2018, 9, 1–10, doi:10.3762/bjnano.9.1

• -density polyethylene) and a self-assembled monolayer of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) on a silicon oxide substrate perforated with circular holes prepared by polymer blend lithography. For all samples the relation was evidenced by recording Δf1, Δf2 and FN as a function of the Z

• ) of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) on a silicon oxide (SiOx) substrate were investigated. The SAM was prepared with circular holes obtained by polymer blend lithography (PBL) [24]. A reference sample consisting of polytetrafluoroethylene (PTFE), commonly called Teflon, with a nominal

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• be etched [16]. As it is damage-free, it is used for repairing the masks for ultraviolet and extreme ultraviolet lithography [17][18], which is a major industry. FEBIP also enables the prototyping of 3D structures, such as AFM tips [19] and photonically active components [20], and the direct

• instable while being extremely flammable and highly poisonous. Similar to the extensive development of resists and processes for electron beam lithography, a significant research effort is required to design precursors dedicated to FEBIP. In this paper we focus on the design criteria for Au precursors

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• during chemical lift-off lithography is a scarcely studied hybrid material. We show that these Au–alkanethiolate layers on poly(dimethylsiloxane) (PDMS) are transparent, functional, hybrid interfaces that can be patterned over nanometer, micrometer, and millimeter length scales. Unlike other ultrathin Au

• found to be consistent with molecular dynamics simulations that predicted the removal of no more than 1.5 Au atoms per thiol, thus presenting a monolayer-like structure. Keywords: chemical patterning; hybrid material; monolayer; soft lithography; two-dimensional material; Introduction Chemical lift

• -off lithography (CLL) is a subtractive technique for patterning self-assembled alkanethiol molecules on Au surfaces via rupture of Au–Au bonds at the Au–monolayer interface [1][2]. In CLL, hydroxyl-terminated molecules (or other species with reactive termini) in preformed self-assembled monolayers

Inelastic electron tunneling spectroscopy of difurylethene-based photochromic single-molecule junctions

• Youngsang Kim,
• Safa G. Bahoosh,
• Dmytro Sysoiev,
• Thomas Huhn,
• Fabian Pauly and
• Elke Scheer

Beilstein J. Nanotechnol. 2017, 8, 2606–2614, doi:10.3762/bjnano.8.261

• lithography is performed with a double layer of electron beam resists (copolymer/PMMA). After developing the resists, Au of around 70 nm in thickness is deposited, the electron-beam mask is lifted off in warm acetone, and then the polyimide layer is partially etched away (thickness reduction of ca. 700 nm) by

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• well-defined configurations for building integrated systems for micro- and nanoelectronics. In this regard, classical methods like optical lithography (OL) [13] and electron beam lithography (EBL) [14], but also focused ion beam (FIB) processing [15], have been successfully applied to fabricate

• electron exposures for SEM and lithography were performed at a beam energy of 15 keV and a probe current of 400 pA. The lithographic processes were realized via a self-developed lithography application based on LabView 8.6 (National Instruments) and a high speed DAC PCIe-card (M2i.6021-exp, Spectrum GmbH

Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)₆)

• Jusuf M. Khreis,
• João Ameixa,
• Filipe Ferreira da Silva and
• Stephan Denifl

Beilstein J. Nanotechnol. 2017, 8, 2583–2590, doi:10.3762/bjnano.8.258

• compounds can be used as a precursor to deposit metals on a surface. The conventional lithography techniques are approaching the limits of spatial resolution [1], therefore it is crucial to search and improve new methods and techniques for future technological requirements. Focused electron beam induced

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• microstructures can be fabricated by one-step direct-write lithography process using focused electron beam induced deposition (FEBID). Typically, as-deposited gold nanostructures suffer from a low Au content and unacceptably high carbon contamination. We show that the undesirable carbon contamination can be