Ion-induced surface reactions and deposition from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

• Mohammed K. Abdel-Rahman,
• Patrick M. Eckhert,
• Atul Chaudhary,
• Johnathon M. Johnson,
• Jo-Chi Yu,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2024, 15, 1427–1439, doi:10.3762/bjnano.15.115

• data in Figure S5 (Supporting Information File 1) reveal that no detectable Cl or C signals are present in the Ar+-induced Pt deposits. In contrast, electron-induced deposition of Pt from Pt(CO)2Cl2 was found to contain impurities depending on the background environment. Notably, electron-induced

Electron-induced ligand loss from iron tetracarbonyl methyl acrylate

• Hlib Lyshchuk,
• Atul Chaudhary,
• Thomas F. M. Luxford,
• Miloš Ranković,
• Jaroslav Kočišek,
• Juraj Fedor,
• Lisa McElwee-White and
• Pamir Nag

Beilstein J. Nanotechnol. 2024, 15, 797–807, doi:10.3762/bjnano.15.66

• the interaction with free electrons. The motivation comes from the possible use of this molecule as a nanofabrication precursor and from the corresponding need to understand its elementary reactions fundamental to the electron-induced deposition. We utilize two complementary electron collision setups

• acrylate, Fe(CO)4(C4H6O2), further denoted as Fe(CO)4MA. The structure of Fe(CO)4MA is shown in Figure 1. This precursor is related to iron pentacarbonyl, Fe(CO)5, with one ligand replaced with an olefinic methyl acrylate ligand. Recently, Fe(CO)4MA has been utilized for electron-induced deposition under

• energies, the precursor efficiently loses either one carbonyl or one MA ligand, and the fragmentation is more complete at increased electron energies. The present data can be used to interpret the results of an electron-induced deposition using Fe(CO)4MA [8]. There, it has been concluded that electron

Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

• Hannah Boeckers,
• Atul Chaudhary,
• Petra Martinović,
• Amy V. Walker,
• Lisa McElwee-White and
• Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• induced decomposition of this precursor and how this is reflected in the relatively poor performance of H2FeRu3(CO)13 as compared to the structurally similar HFeCo3(CO)12. Keywords: dissociative electron attachment; dissociative ionization; electron induced deposition; electron molecule interaction

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• this work proved to be exceptionally reproducible and are expected to be adequate for applications that require the definition of sub-10 nm structures. This is possible, as the nonthermal electron-induced deposition with low electron densities guarantees lateral resolution fidelity, while the annealing

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• enough to be used as a precursor for chemical vapor or electron-induced deposition [12][51][52]. Concluding, the DFT calculations of the ground states of isolated molecules help to explain the stability of ClAuPF3, CF3AuCO and ClAuPMe3. MeAuPMe3 appears to be stabilized by a significant activation

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• ], where purification is ascribed at least in part to a laser-induced oxidation process. In this technique, the reactive oxygen species are produced from gas phase reactants, such as oxygen, that are deliberately introduced. Sequential cycles of electron-induced deposition are followed by laser-induced

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• the dominating process, the electron-induced deposition of Pt(PF3)4 is initiated by SEs with an incident electron energy of less than 1 eV, and the rest of the SE energy distribution as well as the primary electrons play an insignificant part in this primary step. Conversely, if ND in fact plays an