Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring

• Joy Mukherjee,
• Safiul Alam Mollick,
• Tanmoy Basu and
• Tapobrata Som

Beilstein J. Nanotechnol. 2025, 16, 484–494, doi:10.3762/bjnano.16.37

• no reaction between the inert Ar ions and the Si atoms, ensuring the absence of a chemical aspect of pattern formation. However, the native silicon oxide layer is partially sputtered. This is also a key factor in generating surface instabilities. The surface morphology largely varies due to different

Impact of adsorbate–substrate interaction on nanostructured thin films growth during low-pressure condensation

• Alina V. Dvornichenko,
• Vasyl O. Kharchenko and
• Dmitrii O. Kharchenko

Beilstein J. Nanotechnol. 2025, 16, 473–483, doi:10.3762/bjnano.16.36

• different adsorbate–substrate bonding. Keywords: adsorbate–substrate interaction; adsorptive systems; numerical simulations; pattern formation; Introduction Innovative nanostructured thin films are widely exploited in ground-breaking developments regarding transistors [1][2], energy harvesting [3][4

• interactions in a homogeneous system. Next, we perform stability analysis and define a range of the strength of adsorbate–substrate interaction responsible for pattern formation during deposition. Finally, we present results of numerical simulations and discuss dynamics of surface patterns formation and

• condensation, an increase in the adsorption rate leads to pattern formation and change of the surface morphology [33]. We will focus onto the ability of elastic interactions between adsorbate and substrate to induce patterning at low-pressure condensation. The corresponding stability diagram δ(α) illustrating

Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar⁺ ion beam: a comparative study

• Indra Sulania,
• Harpreet Sondhi,
• Tanuj Kumar,
• Sunil Ojha,
• G R Umapathy,
• Ambuj Mishra,
• Ambuj Tripathi,
• Richa Krishna,
• Devesh Kumar Avasthi and
• Yogendra Kumar Mishra

Beilstein J. Nanotechnol. 2024, 15, 367–375, doi:10.3762/bjnano.15.33

• fabrication on Si and Ge by 100 keV Ar+ ion beam bombardment is discussed. The irradiation was performed in the ion fluence range of ≈3 × 1017 to 9 × 1017 ions/cm2 and at an incident angle of θ ≈ 60° with respect to the surface normal. The investigation focuses on topographical studies of pattern formation

• ° incidence angle. The pattern formation starts on any surface with amorphization through ion-induced defects resulting from collision cascades [16]. As shown in the AFM micrographs, the Si surface shows ripple patterns. These ripples are more organized and become more regular with ion fluence, with a ripple

Morphology-driven gas sensing by fabricated fractals: A review

• Vishal Kamathe and
• Rupali Nagar

Beilstein J. Nanotechnol. 2021, 12, 1187–1208, doi:10.3762/bjnano.12.88

• -equilibrium processes predict pattern formation by considering movement/diffusion of aggregates that ultimately results in the final fractal pattern [53][54]. In the DLA model, one seed particle is placed initially at a location called “origin” of a chosen lattice. Then, another particle is placed far from

Electromigration-induced formation of percolating adsorbate islands during condensation from the gaseous phase: a computational study

• Alina V. Dvornichenko,
• Vasyl O. Kharchenko and
• Dmitrii O. Kharchenko

Beilstein J. Nanotechnol. 2021, 12, 694–703, doi:10.3762/bjnano.12.55

• islands during condensation from the gaseous phase. We will show that the elongated morphology of adsorbate islands remains stable if the electric field is turned off. Keywords: adsorptive systems; electromigration; numerical simulations; pattern formation; thin films; Introduction The processes of

• surface pattern formation at elevated temperatures are the result of the self-organization of adsorbed atoms. They are usually governed by kinetic factors, that is, the rates of processes realized on the growing surface. One of the interesting phenomena influencing the formation of surface morphology at

• of vertical motion of adatoms k∥, one can define domains of main system parameters, in which pattern formation is possible. In particular, for the case λ(κ) ≤ 0 κ any spatial instability that can be realized at the initial stages of the system evolution disappears at long time scales leading to a

Stationary beam full-field transmission helium ion microscopy using sub-50 keV He⁺: Projected images and intensity patterns

• Michael Mousley,
• Santhana Eswara,
• Olivier De Castro,
• Olivier Bouton,
• Nico Klingner,
• Christoph T. Koch,
• Gregor Hlawacek and
• Tom Wirtz

Beilstein J. Nanotechnol. 2019, 10, 1648–1657, doi:10.3762/bjnano.10.160

• sample, the voltage of Lens 2 was decreased from (A) to (E). A) A shadow image, B) a higher magnification shadow image of the area highlighted with the green dashed circle in A, C) an even higher magnification and the start of deflection pattern formation with bright outlines, D) the overfocus deflection

Materials nanoarchitectonics at two-dimensional liquid interfaces

• Katsuhiko Ariga,
• Michio Matsumoto,
• Taizo Mori and
• Lok Kumar Shrestha

Beilstein J. Nanotechnol. 2019, 10, 1559–1587, doi:10.3762/bjnano.10.153

• vapour annealing [201]. Complicated morphology shifts such as swelling, coalescing of aggregates, bicontinuous pattern formation, one-dimensional droplet formation, and the periodic evolution of the droplets were observed. Mori et al. reported the formation of two-dimensional arrays of disk-shaped nano

Nanoprofilometry study of focal conic domain structures in a liquid crystalline free surface

• Anna N. Bagdinova,
• Evgeny I. Demikhov,
• Nataliya G. Borisenko and
• Sergei M. Tolokonnikov

Beilstein J. Nanotechnol. 2017, 8, 2544–2551, doi:10.3762/bjnano.8.254

• with twist grain boundary (TGB)-like structures [18][19][20] because of some interdomain regions, which can explain the holes in the FCD-structured surface. We could expect some pattern formation starting from the nematic phase. The surface of the isotropic liquid and the nematic phase of 8CB revealed

Micro- and nano-surface structures based on vapor-deposited polymers

• Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

• for the pattern formation of polyethylene glycol (PEG)-like polymer derivatives to guide fibroblast attachment [21]. A photodefinable polymer of poly(4-benzoyl-p-xylylene-co-p-xylylene) was synthesized by CVD, and a combined soft lithographical and UV light process was performed to create the

• ) (PDMS), and poly(tetrafluoroethylene) (PTFE) [24]. Microcontact printing (μCP) is a commonly exploited technique that uses a PDMS elastomer to stamp patterns of reactive substances on mostly flat surfaces [17]. It is also widely adopted for the confinement of pattern formation on vapor-deposited coating

• same work, spatial control of the cell attachments and patterns were further produced via the biotin/streptavidin conjugation and subsequently immobilized by the cell-binding antibody [25]. A more delicate pattern formation was generated by combining the μCP technique and the supramolecular

Nanoscale rippling on polymer surfaces induced by AFM manipulation

• Mario D’Acunto,
• Franco Dinelli and
• Pasqualantonio Pingue

Beilstein J. Nanotechnol. 2015, 6, 2278–2289, doi:10.3762/bjnano.6.234

• -b-PEO, the melting enthalpy of PEO, and the Helmholtz free energy for unfolding (and melting) of PEO. Composite films: Another class of samples showing a peculiar pattern formation are polymer blends. They can be miscible or immiscible, presenting clear phase separation or a similar morphology to

• (relative humidity: 50 to 60% and T = 22–23 °C). How to avoid ripple formation The nanoripple formation can be either a nuisance or an opportunity. In the framework of nanolithography, one should consider the development of tools for creating but also preventing the pattern formation. Regarding this second

Nanomechanical humidity detection through porous alumina cantilevers

• Olga Boytsova,
• Alexey Klimenko,
• Vasiliy Lebedev,
• Alexey Lukashin and
• Andrey Eliseev

Beilstein J. Nanotechnol. 2015, 6, 1332–1337, doi:10.3762/bjnano.6.137

• foil with a conventional photolithography process (Figure 1). Using the lithography approach for AAO pattern formation mostly becomes possible due to selective and anisotropic etching of anodic alumina films on aluminium in basic solutions. On the other hand anodic oxidation itself enables easy control

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• electrons with positive resist; the overexposed area shown in red. 2: a normal exposure of resist areas highlighted in green. 3: the expected pattern profile after development. Effect of the exposure dose and substrate material on the single-spot pattern formation: (a) the ring prepared on a single-crystal

The effect of surface charge on nonspecific uptake and cytotoxicity of CdSe/ZnS core/shell quantum dots

• Vladimir V. Breus,
• Anna Pietuch,
• Marco Tarantola,
• Thomas Basché and
• Andreas Janshoff

Beilstein J. Nanotechnol. 2015, 6, 281–292, doi:10.3762/bjnano.6.26

• -Planck-Institute for Dynamics and Self-Organization (MPIDS), Laboratory for Fluid Dynamics, Pattern Formation and Biocomplexity, Am Fassberg 17, 37077 Goettingen, Germany 10.3762/bjnano.6.26 Abstract In this work, cytotoxicity and cellular impedance response was compared for CdSe/ZnS core/shell quantum

Mechanical properties of MDCK II cells exposed to gold nanorods

• Anna Pietuch,
• Bastian Rouven Brückner,
• David Schneider,
• Marco Tarantola,
• Christina Rosman,
• Carsten Sönnichsen and
• Andreas Janshoff

Beilstein J. Nanotechnol. 2015, 6, 223–231, doi:10.3762/bjnano.6.21

• , 50931 Cologne, Germany Max-Planck-Institute for Dynamics and Self-Organization (MPIDS), Laboratory for Fluid Dynamics, Pattern Formation and Biocomplexity, Am Fassberg 17, 37077 Goettingen, Germany Institute of Physical Chemistry, Duesbergweg 10–14, University of Mainz, 55128 Mainz, Germany 10.3762

Mammalian cell growth on gold nanoparticle-decorated substrates is influenced by the nanoparticle coating

• Christina Rosman,
• Sebastien Pierrat,
• Marco Tarantola,
• David Schneider,
• Eva Sunnick,
• Andreas Janshoff and
• Carsten Sönnichsen

Beilstein J. Nanotechnol. 2014, 5, 2479–2488, doi:10.3762/bjnano.5.257

• , 47057 Duisburg, Germany Laboratory for Fluid Dynamics, Pattern Formation and Biocomplexity, Max Planck Institute for Dynamics and Self-Organization (MPIDS), Am Fassberg 17, 37077 Göttingen, Germany Institute of Physical Chemistry, University of Göttingen, Tammannstraße 6, 37077 Göttingen, Germany, Max

Mapping of plasmonic resonances in nanotriangles

• Simon Dickreuter,
• Julia Gleixner,
• Andreas Kolloch,
• Johannes Boneberg,
• Elke Scheer and
• Paul Leiderer

Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66

• this work. The triangles in (a) and (b) were prepared by colloid lithography, the triangles in (c) and (d) were prepared by e-beam lithography. In (a) only part of the nanosphere evaporation mask has been removed to illustrate the pattern formation. AFM image of a colloid lithography triangle. (a) Top

Digging gold: keV He⁺ ion interaction with Au

• Vasilisa Veligura,
• Gregor Hlawacek,
• Robin P. Berkelaar,
• Raoul van Gastel,
• Harold J. W. Zandvliet and
• Bene Poelsema

Beilstein J. Nanotechnol. 2013, 4, 453–460, doi:10.3762/bjnano.4.53

• polycrystalline nature of the samples influences the pattern formation as well. First, the pattern propagation is stopped by grain boundaries as can be seen in the inset in Figure 1c: no pattern or rising of the surface level is observed on the neighboring grain. Second, the pattern orientation depends on the

• Figure 2g), as well as the 2D FFTs in Figure 3b). This suggests that the pattern formation is governed by diffusion processes of gold adatoms and surface vacancies. Together with the sputtering processes it leads to surface roughening and the development of a periodic pattern. Although the sputtering

• of interlayer diffusion by the step edge or Ehrlich–Schwoebel barrier [14][20][24][25][26][27][28]. The activation energy for vacancy diffusion on Au{111} is much higher than the one for adatoms [29], hence we can suppose that at room temperature adatoms are dominantly responsible for the pattern

Porous polymer coatings as substrates for the formation of high-fidelity micropatterns by quill-like pens

• Michael Hirtz,
• Marcus Lyon,
• Wenqian Feng,
• Andrea E. Holmes,
• Harald Fuchs and
• Pavel A. Levkin

Beilstein J. Nanotechnol. 2013, 4, 377–384, doi:10.3762/bjnano.4.44

• surface area for binding of analytes, potentially giving rise to increased sensitivity in sensor applications. The pattern formation by SPTs can be tuned by varying the dwell time, or in the case of line patterns, by using different writing speeds. The basic feasibility of the HEMA as substrate for

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• through covalent binding. A subsequent metallisation step enabled the formation of conducting nanopatterns in the 100 nm regime. Compared to resist-based EBL with five or more processing steps, the pattern formation was achieved in just three steps (SAM preparation, irradiation, and immobilisation

• calculations of primary electron pathways within the used substrates. SEM pictures of 100 nm structures incubated with 16 nm AuNPs are shown in Figures S4 and S5. Figure S7 presents preliminary results of AuNP pattern formation on ITO-covered PET foils by this approach. Supporting Information File 10

Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

• Britta Kämpken,
• Verena Wulf,
• Norbert Auner,
• Marcel Winhold,
• Michael Huth,
• Daniel Rhinow and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

• of the different steps of the irradiation-induced pattern formation. Left: The “liquid bright gold” film after UV irradiation and washing with dichloromethane. Center: The same area after annealing at 650 °C. Right: The pattern is reproduced after 1 h of treatment with NPS at 650 °C. The bright areas

Septipyridines as conformationally controlled substitutes for inaccessible bis(terpyridine)-derived oligopyridines in two-dimensional self-assembly

• Daniel Caterbow,
• Daniela Künzel,
• Michael G. Mavros,
• Axel Groß,
• Katharina Landfester and
• Ulrich Ziener

Beilstein J. Nanotechnol. 2011, 2, 405–415, doi:10.3762/bjnano.2.46

• substrate has a minor influence on the pattern formation [12]. Besides the preset constitution of each BTP molecule, different conformations are possible, which might subsequently lead to different monolayer structures. The influence of the conformation of adlayer molecules on the 2D structures formed is

• nitrogen atoms in the central aromatic moiety plays only a minor role for pattern formation, and that the orientation of the peripheral pyridine nitrogen atoms is critical. Thus, we assume that the structures that are formed by the remaining three PhSpPys, with different peripheral pyridine ring