Investigation of Hf/Ti bilayers for the development of transition-edge sensor microcalorimeters

• Victoria Y. Safonova,
• Anna V. Gordeeva,
• Anton V. Blagodatkin,
• Dmitry A. Pimanov,
• Anton A. Yablokov and
• Andrey L. Pankratov

Beilstein J. Nanotechnol. 2024, 15, 1353–1361, doi:10.3762/bjnano.15.108

• , photolithography was performed on a Karl Suss MJB3 lithography aligner before deposition. We used AZ5214E photoresist, which was subsequently developed with MIF726. We then deposited 85 nm of hafnium and 5 nm of titanium onto the substrates through developed areas in the resist, using an electron beam evaporator

• superconductor. More importantly, the superconducting properties of the structures fabricated by lift-off photolithography not only did not deteriorate compared to continuous films, but became much more suitable for use in TES. Based on the obtained data on the sensitivity of the detector resistance to

• superconducting state, that is, less than 1.2 mK for bridges compared to more than 2.2 mK for films. The measurements also demonstrate that the quality of the performed lift-off photolithography is sufficient to obtain high values of the temperature coefficient α; hence, this process can be used to fabricate the

New design of operational MEMS bridges for measurements of properties of FEBID-based nanostructures

• Bartosz Pruchnik,
• Krzysztof Kwoka,
• Ewelina Gacka,
• Dominik Badura,
• Piotr Kunicki,
• Andrzej Sierakowski,
• Paweł Janus,
• Tomasz Piasecki and
• Teodor Gotszalk

Beilstein J. Nanotechnol. 2024, 15, 1273–1282, doi:10.3762/bjnano.15.103

• electrical measurement equipment. The experiments performed in this way belong to the so-called lab-in-SEM (LiS) technologies. The technology for MEMS fabrication comes from microelectronic surface and bulk micromachining methods [31]. MEMS dimensions are typically defined by photolithography and e-beam

• (Si3N4) layer was deposited via CVD. The 40 nm thick platinum paths were then patterned by lift-off photolithography. The opMEMS bridge body was defined photolithographically with a feature size of 2 µm, etched by dry oxygen plasma etching (DRIE) and then released by KOH anisotropic wet silicon etching

Design, fabrication, and characterization of kinetic-inductive force sensors for scanning probe applications

• August K. Roos,
• Ermes Scarano,
• Elisabet K. Arvidsson,
• Erik Holmgren and
• David B. Haviland

Beilstein J. Nanotechnol. 2024, 15, 242–255, doi:10.3762/bjnano.15.23

• photolithography defines the coarse circuit features in the superconducting film, such as coplanar waveguide, ground planes, and signal line. We use the same recipe as in steps (b) and (c) to define a resist etch mask; after development, we transfer the pattern into the superconducting film with a CF4/O2 reactive

• . Photolithography defines the chip and cantilever. We spin a 1.7 μm thick photoresist maP1225, bake at 105 °C for 2 min. We then expose with a dose of 300 mJ/cm2 in the MLA150, and develop in maD331 for 45 s. We etch through the Si-N layer using a CHF3/SF6 process with an etch rate of roughly 100 nm/min in the

Measurements of dichroic bow-tie antenna arrays with integrated cold-electron bolometers using YBCO oscillators

• Leonid S. Revin,
• Dmitry A. Pimanov,
• Alexander V. Chiginev,
• Anton V. Blagodatkin,
• Viktor O. Zbrozhek,
• Andrey V. Samartsev,
• Anastasia N. Orlova,
• Dmitry V. Masterov,
• Alexey E. Parafin,
• Victoria Yu. Safonova,
• Anna V. Gordeeva,
• Andrey L. Pankratov,
• Leonid S. Kuzmin,
• Anatolie S. Sidorenko,
• Silvia Masi and
• Paolo de Bernardis

Beilstein J. Nanotechnol. 2024, 15, 26–36, doi:10.3762/bjnano.15.3

• Microstructures of the Russian Academy of Sciences (IPM RAS), with subsequent measurements of the samples in the sorption 3He refrigerator of our laboratory. The 210/240 GHz receiving system is fabricated using a two-layer technology (two lithography steps). During the first photolithography step, a layer of

• contact pads, DC lines, and antennas is made. The second electronic lithography step is used for the exposition of the bolometric layer. During photolithography, the first exposure was carried out with two photoresists. This is because the DC linewidth was 3 µm, and the use of a single photoresist would

Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• approaches are quite limited. In this work, we show that nanopillars and nanoholes, and their combination with microgrooves, can be patterned on polyurethane (PU) films using a low-cost, reusable photoresist master mold prepared via nanosphere lens lithography and UV-LED photolithography, with specific

• fabrication. For instance, traditional techniques, such as electron-beam lithography, laser writing, and cleanroom photolithography, have flexibility in design but require costly equipment [13][14]. Relatively cheaper techniques, such as anodization, electroplating, and electrospinning, are limited by the

• photolithography step following NLL (Figure 3A(i) and (ii)). The starting samples for photolithography were a hard-baked SU-8 film, SU-8 nanopillars (not hard-baked), and SU-8 nanoholes for the creation of plain microgrooves (“microgroove”), nanopillars on microgrooves (“pillar–groove”), and nanoholes on

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

• François Piquemal,
• Khaled Kaja,
• Pascal Chrétien,
• José Morán-Meza,
• Frédéric Houzé,
• Christian Ulysse and
• Abdelmounaim Harouri

Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94

• standard photolithography, using a mask aligner (MA6, Karl Suss, Germany), and conventional deposition techniques. Following a resist (about 1 µm thick) development process, a 2 inch diameter wafer was placed in a vacuum chamber for electron beam deposition of a 200 nm thick titanium/gold layer

Industrial perspectives for personalized microneedles

• Remmi Danae Baker-Sediako,
• Benjamin Richter,
• Matthias Blaicher,
• Michael Thiel and
• Martin Hermatschweiler

Beilstein J. Nanotechnol. 2023, 14, 857–864, doi:10.3762/bjnano.14.70

• microoptic fabrication, grayscale lithography offers a solution to mitigate the staircase effect. Grayscale lithography is a novel approach in photolithography for 2.5D patterning (x,y,z) with ultrasmooth surfaces that exhibits improved shape accuracy [57][58]. In 2019, Nanoscribe GmbH & Co launched the

Silver-based SERS substrates fabricated using a 3D printed microfluidic device

• Phommachith Sonexai,
• Minh Van Nguyen,
• Bui The Huy and
• Yong-Ill Lee

Beilstein J. Nanotechnol. 2023, 14, 793–803, doi:10.3762/bjnano.14.65

• separate microreactor [12][22]. A traditional approach to producing microfluidic devices involves a three-step microfabrication process of (i) creating a channel mold using photolithography, (ii) fabricating the channels by casting the mold through soft lithography, and (iii) bonding the channel device to

• a substrate [23]. This procedure typically requires a clean room and expensive facilities such as a photolithography machine, a spin-coater, and photoresist agents, as well as long processing times and well-trained technical staff. Additionally, the photolithography process is limited to planar

• dimension to a scale smaller than a millimeter remains challenging [29]. In the second approach, 3D printing can replace photolithography to fabricate a mold. This approach can achieve a better lateral resolution of printed features down to 100 µm with a higher aspect ratio of the printed channel features

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

• Chang-Ming Wang,
• Hong-Sheng Chan,
• Chia-Li Liao,
• Che-Wei Chang and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2023, 14, 34–44, doi:10.3762/bjnano.14.4

• -off lithography; gap; self-assembled monolayer; sub-micrometer; surface patterning; Introduction The development of lithographic techniques is crucial to the advancement of the electronics and semiconductor industry, the backbones of modern technology. Advances in photolithography have pushed the

• nanoscale surface patterns, whereas conventional photolithography methods are limited by diffraction during the illumination step and under/overetching during the development process [17]. In soft lithography, the deformation and collapsing of rubber stamp structures occur due to the adhesion between the

• :1 mass ratio of SYLGARD 184 silicone elastomer base and curing agent were thoroughly mixed with a homogenizer, degassed in vacuum, cast onto the silicon master mold created through photolithography, and cured in an oven at 80 °C for 1 h. The PDMS stamps were then separated from the master mold

Observation of collective excitation of surface plasmon resonances in large Josephson junction arrays

• Roger Cattaneo,
• Mikhail A. Galin and
• Vladimir M. Krasnov

Beilstein J. Nanotechnol. 2022, 13, 1578–1588, doi:10.3762/bjnano.13.132

• using photolithography and reactive ion etching. The JJ sensor with variable thickness and a width of ≈100 nm is made by Ga+ focused ion beam etching. The JJ is made small in order to increase its resistance Rn to approx. 50 Ω, which is needed for a good impedance matching with the antenna. In order to

Enhanced electronic transport properties of Te roll-like nanostructures

• E. R. Viana,
• N. Cifuentes and
• J. C. González

Beilstein J. Nanotechnol. 2022, 13, 1284–1291, doi:10.3762/bjnano.13.106

• work, the electronic transport properties of Te roll-like nanostructures were investigated in a broad temperature range by fabricating single-nanostructure back-gated field-effect-transistors via photolithography. These one-dimensional nanostructures, with a unique roll-like morphology, were produced

Application of nanoarchitectonics in moist-electric generation

• Jia-Cheng Feng and
• Hong Xia

Beilstein J. Nanotechnol. 2022, 13, 1185–1200, doi:10.3762/bjnano.13.99

• , photolithography, embossing, deposition, and sol–gel nanofabrication, all of which can provide high specific surface areas [19][24][25][26][27][28]. Nanomaterials can also be divided into inorganic nanomaterials and organic nanomaterials. In inorganic nanomaterials, metal nanomaterials and carbon nanomaterials

Microneedle-based ocular drug delivery systems – recent advances and challenges

• Piotr Gadziński,
• Anna Froelich,
• Monika Wojtyłko,
• Antoni Białek,
• Julia Krysztofiak and
• Tomasz Osmałek

Beilstein J. Nanotechnol. 2022, 13, 1167–1184, doi:10.3762/bjnano.13.98

• matrices are dried by the flowing air [154][155]. Another well-known method is photolithography. In this technique, a silicon wafer is covered with a photosensitive or photoresistant polymer. The plate is then exposed to UV radiation. A pattern is formed depending on the coverage of the photosensitive or

Bioselectivity of silk protein-based materials and their bio-inspired applications

• Hendrik Bargel,
• Vanessa T. Trossmann,
• Christoph Sommer and
• Thomas Scheibel

Beilstein J. Nanotechnol. 2022, 13, 902–921, doi:10.3762/bjnano.13.81

• and antifouling surfaces have been successfully generated by soft photolithography, micro-molding or nanopatterning techniques [57]. Moreover, the biomimetic application Sharklet® textured similarly to shark skin has not only been reported to be antiadhesive against green algae spores and bacterial

DNA aptamer selection and construction of an aptasensor based on graphene FETs for Zika virus NS1 protein detection

• Nathalie B. F. Almeida,
• Thiago A. S. L. Sousa,
• Viviane C. F. Santos,
• Camila M. S. Lacerda,
• Thais G. Silva,
• Rafaella F. Q. Grenfell,
• Flavio Plentz and
• Antero S. R. Andrade

Beilstein J. Nanotechnol. 2022, 13, 873–881, doi:10.3762/bjnano.13.78

• characterization utilizing field-effect transistors fabricated using single-layer graphene grown by chemical vapor deposition (CVD) and transferred to Si/SiO2 substrates. The wafers were purchased from Graphene Platform and we produced graphene transistors by conventional photolithography, following the procedures

Micro- and nanotechnology in biomedical engineering for cartilage tissue regeneration in osteoarthritis

• Zahra Nabizadeh,
• Mahmoud Nasrollahzadeh,
• Hamed Daemi,
• Mohamadreza Baghaban Eslaminejad,
• Ali Akbar Shabani,
• Mehdi Dadashpour,
• Majid Mirmohammadkhani and
• Davood Nasrabadi

Beilstein J. Nanotechnol. 2022, 13, 363–389, doi:10.3762/bjnano.13.31

• different characteristics and kinds of behavior of compounds on submicrometer and nanometer scales and resulted in the development of new methods such as electrospinning, self-assembly, phase separation, nano-imprinting, and photolithography for the generation of new biomaterials with improved properties

• nature. They are constructed as NPs, nanofibers, nanocrystals, nanotubes, and nanofilms by high-tech methods of photolithography, electrospinning, nanoimprinting, and phase separation. Due to the hierarchical structure of articular cartilage ECM, there is considerable enthusiasm regarding the use of

Design aspects of Bi₂Sr₂CaCu₂O_8+δ THz sources: optimization of thermal and radiative properties

• Mikhail M. Krasnov,
• Natalia D. Novikova,
• Roger Cattaneo,
• Alexey A. Kalenyuk and
• Vladimir M. Krasnov

Beilstein J. Nanotechnol. 2021, 12, 1392–1403, doi:10.3762/bjnano.12.103

• photolithography and argon-ion etching. Mesa structures are formed at the overlap between the line and the electrodes, as indicated in Figure 1a. Figure 2a,b shows current–voltage (I–V) characteristics of mesas of whisker- and crystal-based devices, respectively. The I–V curves are fairly similar. They contain

An overview of microneedle applications, materials, and fabrication methods

• Zahra Faraji Rad,
• Philip D. Prewett and
• Graham J. Davies

Beilstein J. Nanotechnol. 2021, 12, 1034–1046, doi:10.3762/bjnano.12.77

• ; photolithography; and Lithographie, Galvanoformung, Abformung or lithography, electroplating, moulding (LIGA), using deep X-ray lithography, are the most extensively used manufacturing technologies for microneedle fabrication, although fabrication of longer microneedles (>400 μm) is difficult with some of these

• to develop the next generation of polymer microneedle point-of-care tests and drug delivery patches will be photolithography, replica moulding, 3D printing, and micromachining. Photolithography involves polymerization of a liquid material by chemical modification through exposure to short wavelength

• dissolving versions for drug delivery [27][37][99]. Figure 4a is a schematic of the manufacturing procedure for γ-PGA microneedles and Figure 4b shows the manufactured array [99]. In another study, photolithography was first used to create master structures from SU-8 photoresist by UV photolithography

In situ transport characterization of magnetic states in Nb/Co superconductor/ferromagnet heterostructures

• Olena M. Kapran,
• Roman Morari,
• Taras Golod,
• Evgenii A. Borodianskyi,
• Vladimir Boian,
• Andrei Prepelita,
• Nikolay Klenov,
• Anatoli S. Sidorenko and
• Vladimir M. Krasnov

Beilstein J. Nanotechnol. 2021, 12, 913–923, doi:10.3762/bjnano.12.68

• were used for the calibration of the etching rates of the films. MLs are patterned into micrometer-scale bridges with multiple contacts using photolithography and reactive ion etching. A scanning electron microscopy (SEM) image of one of the studied samples is shown in Figure 1a. Control of the

Recent progress in actuation technologies of micro/nanorobots

• Ke Xu and
• Bing Liu

Beilstein J. Nanotechnol. 2021, 12, 756–765, doi:10.3762/bjnano.12.59

• nanoparticles and photoresist are uniformly mixed and a U-shaped pattern is processed by photolithography. The robot could capture and automatically transport microbeads injected with chemicals to specific locations in neurons under the control of a gradient magnetic field, which has potential applications in

• standard photolithography process. When the actuator is stimulated by laser pulses, it will bend and make the robot walk. The research of this technology provides an extremely powerful theoretical basis for the manufacture of actuators in the future. Acoustic field actuation Ultrasound is sound with a

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

• ] (Figure 4d). In this work by Arora et al., free-standing cantilevers in silicon nitride membranes that had been prepared by photolithography were irradiated near the base with helium ions at different energies. Upwards versus downwards bending was observed, depending on the implantation depth profiles. It

Wet-spinning of magneto-responsive helical chitosan microfibers

• Dorothea Brüggemann,
• Johanna Michel,
• Naiana Suter,
• Matheus Grande de Aguiar and
• Michael Maas

Beilstein J. Nanotechnol. 2020, 11, 991–999, doi:10.3762/bjnano.11.83

• in which freshly-spun alginate fibers containing magnetic nanoparticles were fixed with a magnetized conical tip and rotated around micropillars, acquiring a helical shape with three to four windings [47]. Non-scalable procedures, such as high-temperature synthesis, photolithography or the use of

Electrochemical nanostructuring of (111) oriented GaAs crystals: from porous structures to nanowires

• Elena I. Monaico,
• Eduard V. Monaico,
• Veaceslav V. Ursaki,
• Shashank Honnali,
• Vitalie Postolache,
• Karin Leistner,
• Kornelius Nielsch and
• Ion M. Tiginyanu

Beilstein J. Nanotechnol. 2020, 11, 966–975, doi:10.3762/bjnano.11.81

• requiring the use of photolithography with colloidal crystal templating in the first pre-etching step. Fabrication of GaAs nanopillars by metal-assisted chemical etching (MacEtch) also requires lithographic methods for catalytic metal patterning [25][26]. Among non-lithographic methods based on

• needed for such structures, which makes photolithography challenging [38]. Conclusion This study demonstrates possibilities to produce porous GaAs structures with a controlled degree of porosity through the anodization of GaAs(111) wafers in a neutral, environmentally friendly NaCl electrolyte. Porous

Effect of Ag loading position on the photocatalytic performance of TiO₂ nanocolumn arrays

• Jinghan Xu,
• Yanqi Liu and
• Yan Zhao

Beilstein J. Nanotechnol. 2020, 11, 717–728, doi:10.3762/bjnano.11.59

• photolithography and the template method by Sung et al. [30]. In this case, Ag particles were loaded on the outside of the nanocolumns by magnetron sputtering, and the catalysis was carried out at a sputtering time of 30 min. Besides, Jani et al. [31] studied the preparation of TiO2 nanotube arrays by anodization

Electromigration-induced directional steps towards the formation of single atomic Ag contacts

• Atasi Chatterjee,
• Christoph Tegenkamp and
• Herbert Pfnür

Beilstein J. Nanotechnol. 2020, 11, 680–687, doi:10.3762/bjnano.11.55

• ultrathin Ag films. Experimental Low-doped Si(100) substrates (1000 Ω·cm at 300 K), which are good insulators at temperatures around 100 K, were used. Structuring was carried out by a three-step process. As a first step, we patterned the contact pads by photolithography. Secondly, electron beam lithography

• mechanical) contact with the contact pads produced by photolithography. To perform EM measurements, an in-house LabVIEW program was developed (following Motto et al. [34]), which allowed for a precise control of the conductance in order to obtain atomic point contacts. Suitable feedback parameters and ramp