Correction: AFM-IR investigation of thin PECVD SiO_x films on a polypropylene substrate in the surface-sensitive mode

• Hendrik Müller,
• Hartmut Stadler,
• Teresa de los Arcos,
• Adrian Keller and
• Guido Grundmeier

Beilstein J. Nanotechnol. 2025, 16, 252–253, doi:10.3762/bjnano.16.19

• Hendrik Muller Hartmut Stadler Teresa de los Arcos Adrian Keller Guido Grundmeier Technical and Macromolecular Chemistry, Paderborn University, Warburger Str. 100, 33098 Paderborn, Germany Bruker Nano Surfaces and Metrology Division, Östliche Rheinbrückenstr. 49, 76187 Karlsruhe, Germany 10.3762

New design of operational MEMS bridges for measurements of properties of FEBID-based nanostructures

• Bartosz Pruchnik,
• Krzysztof Kwoka,
• Ewelina Gacka,
• Dominik Badura,
• Piotr Kunicki,
• Andrzej Sierakowski,
• Paweł Janus,
• Tomasz Piasecki and
• Teodor Gotszalk

Beilstein J. Nanotechnol. 2024, 15, 1273–1282, doi:10.3762/bjnano.15.103

• discharging of parasitic capacitance. Voltages higher than 80 V were not used in order not to exceed the device breakdown voltage. Discussion In the measurements described, opMEMS proved to be a suitable platform for FEBID nanostructure metrology. It has been shown that it is possible to deposit a free

AFM-IR investigation of thin PECVD SiO_x films on a polypropylene substrate in the surface-sensitive mode

• Hendrik Müller,
• Hartmut Stadler,
• Teresa de los Arcos,
• Adrian Keller and
• Guido Grundmeier

Beilstein J. Nanotechnol. 2024, 15, 603–611, doi:10.3762/bjnano.15.51

• Hendrik Muller Hartmut Stadler Teresa de los Arcos Adrian Keller Guido Grundmeier Technical and Macromolecular Chemistry, Paderborn University, Warburger Str. 100, 33098 Paderborn, Germany Bruker Nano Surfaces and Metrology Division, Östliche Rheinbrückenstr. 49, 76187 Karlsruhe, Germany 10.3762

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• 20 µm × 20 µm, and image resolution of 512 × 512 pixels. The resonance frequency of the particular AFM probe was 43 kHz. The acquired data were post-processed using the Gwyddion software from the Czech Metrology Institute. The ex situ measured AFM profiles of SiO2 substrate after the processing with

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

• François Piquemal,
• Khaled Kaja,
• Pascal Chrétien,
• José Morán-Meza,
• Frédéric Houzé,
• Christian Ulysse and
• Abdelmounaim Harouri

Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94

• DVM for the upper resistance range between 1 GΩ and 100 GΩ. The DVM and the current amplifier were calibrated at the French National Metrology Institute (LNE) following the highest standards in metrology (see Supporting Information File 1, section S1). Table 1 compares the nominal resistance values

• 20IND12), which is supported by the European Metrology Programme for Innovation and Research (EMPIR). The EMPIR initiative is co-funded by the European Horizon 2020 research and innovation program and the EMPIR Participating States. Competing Interests The authors declare no competing interests.

On the use of Raman spectroscopy to characterize mass-produced graphene nanoplatelets

• Keith R. Paton,
• Konstantinos Despotelis,
• Naresh Kumar,
• Piers Turner and
• Andrew J. Pollard

Beilstein J. Nanotechnol. 2023, 14, 509–521, doi:10.3762/bjnano.14.42

• , although quantification of the amount remains approximate. We therefore recommend this approach as a robust methodology for reliable characterization of mass-produced graphene-related 2D materials using confocal Raman spectroscopy. Keywords: few-layer graphene; graphene; metrology; quality control; Raman

• , Enabling innovation to meet UK Net Zero targets through physicochemical metrology of nanoscale advanced materials) for funding.

Plasmonic nanotechnology for photothermal applications – an evaluation

• A. R. Indhu,
• L. Keerthana and
• Gnanaprakash Dharmalingam

Beilstein J. Nanotechnol. 2023, 14, 380–419, doi:10.3762/bjnano.14.33

A super-oscillatory step-zoom metalens for visible light

• Yi Zhou,
• Chao Yan,
• Peng Tian,
• Zhu Li,
• Yu He,
• Bin Fan,
• Zhiyong Wang,
• Yao Deng and
• Dongliang Tang

Beilstein J. Nanotechnol. 2022, 13, 1220–1227, doi:10.3762/bjnano.13.101

• -oscillatory lenses, through fine modulation of the amplitude and phase of the optical field, have been used in super-resolution imaging [9][10][11], heat-assisted magnetic recording [12], and optical metrology [13]. In order to form the specific super-oscillatory optical field, common super-oscillatory lenses

Spontaneous shape transition of Mn_xGe_1−x islands to long nanowires

• S. Javad Rezvani,
• Luc Favre,
• Gabriele Giuli,
• Yiming Wubulikasimu,
• Isabelle Berbezier,
• Augusto Marcelli,
• Luca Boarino and
• Nicola Pinto

Beilstein J. Nanotechnol. 2021, 12, 366–374, doi:10.3762/bjnano.12.30

• S. Javad Rezvani Luc Favre Gabriele Giuli Yiming Wubulikasimu Isabelle Berbezier Augusto Marcelli Luca Boarino Nicola Pinto INFN - Laboratori Nazionali di Frascati, Via Enrico Fermi 54, Frascati, Italy Advanced Materials Metrology and Life Science Division, INRiM (Istituto Nazionale di Ricerca

Controlling the electronic and physical coupling on dielectric thin films

• Philipp Hurdax,
• Michael Hollerer,
• Larissa Egger,
• Georg Koller,
• Xiaosheng Yang,
• Anja Haags,
• Serguei Soubatch,
• Frank Stefan Tautz,
• Mathias Richter,
• Alexander Gottwald,
• Peter Puschnig,
• Martin Sterrer and
• Michael G. Ramsey

Beilstein J. Nanotechnol. 2020, 11, 1492–1503, doi:10.3762/bjnano.11.132

• photoemission tomography experiments were conducted at the Metrology Light Source insertion device beamline of the Physikalisch-Technische Bundesanstalt using the toroidal electron spectrometer. The ARUPS experiments were performed with a small hemispherical sector electron analyzer mounted on a goniometer (VG

Atomic defect classification of the H–Si(100) surface through multi-mode scanning probe microscopy

• Jeremiah Croshaw,
• Thomas Dienel,
• Taleana Huff and
• Robert Wolkow

Beilstein J. Nanotechnol. 2020, 11, 1346–1360, doi:10.3762/bjnano.11.119

• tunnelling hydrogen microscopy; scanning tunnelling microscopy; surface metrology; Introduction Novel approaches to advance integrated circuitry beyond CMOS have focused on atom scale structures and their reliable fabrication [1]. Hydrogen-terminated silicon (H–Si) surfaces are one such versatile platform

Growth of a self-assembled monolayer decoupled from the substrate: nucleation on-command using buffer layers

• Robby Reynaerts,
• Kunal S. Mali and
• Steven De Feyter

Beilstein J. Nanotechnol. 2020, 11, 1291–1302, doi:10.3762/bjnano.11.113

• Probe Image Processor (SPIP) software (Image Metrology ApS), using the recorded graphite images for calibration purposes, allowing a more accurate unit cell determination. The unit cell parameters were determined by examining at least 4 images and only the average values are reported. The images are

Long-term stability and scale-up of noncovalently bound gold nanoparticle-siRNA suspensions

• Anna V. Epanchintseva,
• Julia E. Poletaeva,
• Dmitrii V. Pyshnyi,
• Elena I. Ryabchikova and
• Inna A. Pyshnaya

Beilstein J. Nanotechnol. 2019, 10, 2568–2578, doi:10.3762/bjnano.10.248

• in samples ×1 and ×10 was evaluated in each experimental point using the SPIP program (Image Metrology) using the digital images with a total area of 39.7 µm2 for each point. The number and diameter of all clusters were calculated using the particle and pore analysis module in advanced threshold

Nitrogen-vacancy centers in diamond for nanoscale magnetic resonance imaging applications

• Alberto Boretti,
• Lorenzo Rosa,
• Jonathan Blackledge and
• Stefania Castelletto

Beilstein J. Nanotechnol. 2019, 10, 2128–2151, doi:10.3762/bjnano.10.207

Development of a new hybrid approach combining AFM and SEM for the nanoparticle dimensional metrology

• Loïc Crouzier,
• Alexandra Delvallée,
• Sébastien Ducourtieux,
• Laurent Devoille,
• Guillaume Noircler,
• Christian Ulysse,
• Olivier Taché,
• Elodie Barruet,
• Christophe Tromas and
• Nicolas Feltin

Beilstein J. Nanotechnol. 2019, 10, 1523–1536, doi:10.3762/bjnano.10.150

• proposes a new approach of hybrid metrology taking advantage of the complementary nature of atomic force microscopy (AFM) and scanning electron microscopy (SEM) techniques for measuring the main characteristic parameters of nanoparticle (NP) dimensions in 3D. The NP area equivalent, the minimal and the

• equality between their height and their lateral diameters. However, discrepancies between AFM and SEM measurements have been observed, showing significant deviation from sphericity as a function of the nanoparticle size. Keywords: AFM; hybrid metrology; nanoparticles; SEM; size distribution; uncertainty

• -emission guns can reach a resolution of 1 nm in the XY-plane. Consequently, we propose in this paper the development of a hybrid metrology that allows for the measurement of the characteristic dimensions of a nano-object in 3D, by combining the measurements performed with AFM and SEM. The concept of hybrid

Pure and mixed ordered monolayers of tetracyano-2,6-naphthoquinodimethane and hexathiapentacene on the Ag(100) surface

• Robert Harbers,
• Timo Heepenstrick,
• Dmitrii F. Perepichka and
• Moritz Sokolowski

Beilstein J. Nanotechnol. 2019, 10, 1188–1199, doi:10.3762/bjnano.10.118

• Metrology, Denmark). The correction was done such that the unit cell of the periodic structures fitted to the unit cell determined by LEED. All experiments were performed on the same Ag(100) single crystal, which was prepared by cycles of Ar+ ion sputtering at 800 eV for 30 min and annealing at 800–900 K

Relation between thickness, crystallite size and magnetoresistance of nanostructured La_1−xSr_xMn_yO_3±δ films for magnetic field sensors

• Rasuole Lukose,
• Valentina Plausinaitiene,
• Milita Vagner,
• Nerija Zurauskiene,
• Skirmantas Kersulis,
• Virgaudas Kubilius,
• Karolis Motiejuitis,
• Birute Knasiene,
• Voitech Stankevic,
• Zita Saltyte,
• Martynas Skapas,
• Algirdas Selskis and
• Evaldas Naujalis

Beilstein J. Nanotechnol. 2019, 10, 256–261, doi:10.3762/bjnano.10.24

• , Naugarduko 21, LT- 03227 Vilnius, Lithuania Department of Metrology, Center for Physical Sciences and Technology, Sauletekio av. 3, LT-10257 Vilnius, Lithuania Department of Characterization of Materials Structure, Center for Physical Sciences and Technology, Sauletekio av. 3, LT-10257 Vilnius, Lithuania

Silencing the second harmonic generation from plasmonic nanodimers: A comprehensive discussion

• Jérémy Butet,
• Gabriel D. Bernasconi and
• Olivier J. F. Martin

Beilstein J. Nanotechnol. 2018, 9, 2674–2683, doi:10.3762/bjnano.9.250

• Jeremy Butet Gabriel D. Bernasconi Olivier J. F. Martin Nanophotonics and Metrology Laboratory (NAM), Swiss Federal Institute of Technology Lausanne (EPFL), 1015 Lausanne, Switzerland 10.3762/bjnano.9.250 Abstract The silencing of the second harmonic generation process from plasmonic

The structural and chemical basis of temporary adhesion in the sea star Asterina gibbosa

• Birgit Lengerer,
• Marie Bonneel,
• Mathilde Lefevre,
• Elise Hennebert,
• Philippe Leclère,
• Emmanuel Gosselin,
• Peter Ladurner and
• Patrick Flammang

Beilstein J. Nanotechnol. 2018, 9, 2071–2086, doi:10.3762/bjnano.9.196

• Metrology A/S) was used to determine the roughness parameters from the confocal images. Atomic force microscopy (AFM) Footprints were collected on clean microscope glass slides, rinsed with MilliQ water and air dried. The footprints were then imaged in air and under ambient conditions with a Dimension Icon

A variable probe pitch micro-Hall effect method

• Maria-Louise Witthøft,
• Frederik W. Østerberg,
• Janusz Bogdanowicz,
• Rong Lin,
• Henrik H. Henrichsen,
• Ole Hansen and
• Dirch H. Petersen

Beilstein J. Nanotechnol. 2018, 9, 2032–2039, doi:10.3762/bjnano.9.192

• , Kapeldreef 75, B-3001 Leuven, Belgium 10.3762/bjnano.9.192 Abstract Hall effect metrology is important for a detailed characterization of the electronic properties of new materials for nanoscale electronics. The micro-Hall effect (MHE) method, based on micro four-point probes, enables a fast

• ; in that case, the better method depends on the experimental conditions, i.e., the distance between the insulating boundary and the electrodes. Improvement to the accuracy of Hall Effect measurement results is crucial for nanoscale metrology, since surface scattering often leads to low carrier

• mobility. Keywords: four-point probes; Hall effect; metrology; mobility; variable Probe Pitch; Introduction Materials characterization becomes increasingly difficult as the dimensions of transistors continue to decrease. Although three dimensional electrical characterization is the ultimate goal of

Electrical characterization of single nanometer-wide Si fins in dense arrays

• Steven Folkersma,
• Janusz Bogdanowicz,
• Andreas Schulze,
• Paola Favia,
• Dirch H. Petersen,
• Ole Hansen,
• Henrik H. Henrichsen,
• Peter F. Nielsen,
• Lior Shiv and
• Wilfried Vandervorst

Beilstein J. Nanotechnol. 2018, 9, 1863–1867, doi:10.3762/bjnano.9.178

• the technique, this opens the prospect for the use of μ4PP in electrical critical dimension metrology. Keywords: critical dimension metrology; electrical characterization; finFET; micro four-point probe; sheet resistance; Introduction The transition from planar to three-dimensional transistor

• to about 0.5 nm, opening the prospects for its use in electrical critical dimension metrology. As also interestingly shown in the inset of Figure 3b, the measured Rsfin is higher than the sheet resistance Rspad = 135 Ω (dashed red line) measured in a large 80 × 80 μm2 pad having undergone the same

Nanoscale electrochemical response of lithium-ion cathodes: a combined study using C-AFM and SIMS

• Jonathan Op de Beeck,
• Nouha Labyedh,
• Alfonso Sepúlveda,
• Valentina Spampinato,
• Alexis Franquet,
• Thierry Conard,
• Philippe M. Vereecken,
• Wilfried Vandervorst and
• Umberto Celano

Beilstein J. Nanotechnol. 2018, 9, 1623–1628, doi:10.3762/bjnano.9.154

• hybrid metrology approach combining SPM with SIMS, this is a technique able to observe the actual Li concentration. Using the C-AFM tip as a nanoscaled electrode, we can now stress films at different bias values by scanning over the surface (8.5 min) and subsequently observe the induced conductivity

• and the solid electrolyte, which share the same open issues for their nanoscale physical characterization. All-solid-state lithium batteries are considered as promising energy storage devices to meet the requirements of a low-carbon society, therefore the development of a dedicated material metrology

• . Acknowledgements A. Sepúlveda acknowledges the EU Horizon 2020 research and innovation program under the MSCA grant agreement No 658057. This project has received funding from the European Union’s Horizon 2020 research and innovation program under grant agreement No 688225 (Metro4-3D - Metrology for future 3D

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

• Phillip C. Chambers and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112

• that have force constants ranging from 10 to 30 N/m, and resonance frequencies ranging from 265 to 280 kHz (Nanosensors, Neuchatel, Switzerland) were used for AFM studies. Digital images were processed using the open source software Gwyddion, which is supported by the Czech Metrology Institute [42

Evaluation of preparation methods for suspended nano-objects on substrates for dimensional measurements by atomic force microscopy

• Petra Fiala,
• Daniel Göhler,
• Benno Wessely,
• Michael Stintz,
• Giovanni Mattia Lazzerini and
• Andrew Yacoot

Beilstein J. Nanotechnol. 2017, 8, 1774–1785, doi:10.3762/bjnano.8.179

• the primary route to traceability for dimensional metrology, and in this case it is realized using a frequency-stabilized He-Ne laser [12]. This results in improved accuracy and traceability over commercial AFMs [11]. The measurements were carried out using the AFM in closed-loop, non-contact mode in

• held responsible for the use of, or inability to use, any products mentioned herein that have been used by TU Dresden or NPL. Acknowledgements This research was supported by the European Union by funding the European Metrology Research Programme (EMRP) project “Traceable measurement of mechanical

Functional dependence of resonant harmonics on nanomechanical parameters in dynamic mode atomic force microscopy

• Federico Gramazio,
• Matteo Lorenzoni,
• Francesc Pérez-Murano,
• Enrique Rull Trinidad,
• Urs Staufer and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 883–891, doi:10.3762/bjnano.8.90

• below 20 GPa). Keywords: atomic force microscopy; metrology; multifrequency; nanomechanics; Introduction When an AFM cantilever oscillating freely and harmonically at a given frequency f and amplitude A1 approaches a solid surface, the oscillation becomes anharmonic due to the non-linear interaction

• distance. Off-resonance experimental approach curves. Acknowledgements This work has been performed within the aim4np project (Automated in-line Metrology for Nanoscale Production), which is supported by the EC through a grant (contract Nr. 309558) within the 7th Frame-work Program NMP Call 2012.1.4-3 on

• Nanoscale mechanical metrology for industrial processes and products (Patent pending), and within the framework of the PhD program in Physics of the Autonomous University of Barcelona. ICN2 acknowledges support of the Spanish MINECO through the Severo Ochoa Centers of Excellence Program under Grant SEV-2013