Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films

• Alexander Gaul,
• Daniel Emmrich,
• Timo Ueltzhöffer,
• Henning Huckfeldt,
• Hatice Doğanay,
• Johanna Hackl,
• Muhammad Imtiaz Khan,
• Daniel M. Gottlob,
• Gregor Hartmann,
• André Beyer,
• Dennis Holzinger,
• Slavomír Nemšák,
• Claus M. Schneider,
• Armin Gölzhäuser,
• Günter Reiss and
• Arno Ehresmann

Beilstein J. Nanotechnol. 2018, 9, 2968–2979, doi:10.3762/bjnano.9.276

• limit of engineered magnetic domains depends on the magnetic patterning method and on the magnetic anisotropies of the material system. Smallest patterns are expected to be in the range of the domain wall width of the particular material system. To explore these limits a patterning technology is needed

• with a spatial resolution significantly smaller than the domain wall width. Results: We demonstrate the application of a helium ion microscope with a beam diameter of 8 nm as a mask-less method for local domain patterning of magnetic thin-film systems. For a prototypical in-plane exchange-bias system

• two-dimensional domains, the influence of domain wall overlap and domain wall geometry on the ultimate domain size in the chosen system was analyzed. Conclusion: The application of a helium ion microscope for magnetic patterning has been shown. It allowed for exploring the fundamental limits of domain

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• ”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The

• and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput. Keywords: charged particle beams

• [36] and this was chosen for scanning He+ ion beam lithography (SHIBL) experiments. In order to enable sub-10 nm patterning, an ultra-thin resist film, with small molecules is required. High-fidelity pattern transfer via plasma etching requires high carbon content in the resist, with as many of the

Disorder in H⁺-irradiated HOPG: effect of impinging energy and dose on Raman D-band splitting and surface topography

• Lisandro Venosta,
• Noelia Bajales,
• Sergio Suárez and
• Paula G. Bercoff

Beilstein J. Nanotechnol. 2018, 9, 2708–2717, doi:10.3762/bjnano.9.253

• observed, probably due to the bursting of the stored H2 molecules inside the HOPG matrix. This last effect may not only hint a potential path of patterning, but also contribute to the current interest of developing carbon-based materials for hydrogen storage. Raman spectra of irradiated HOPG (LD-LE, LD-HE

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• shown in Figure 9, to appear later. 2.3.3 Deposition of 3D heterostructures A whole range of new applications becomes feasible if the patterning algorithm is extended to fabricate 3D heterostructures. This, however, introduces additional complexity in the deposition process, which we briefly discuss

• sputtering to a thickness of 30 nm and 3 nm, respectively. The patterning was done by UV lithography using allresist AR-U 4040 and lift-off. In section 3.5 we state some of the execution times for the generation of the pattern files used for deposit fabrication as presented next. 3.1 Edge-angle-dependent

Exploring the photoleakage current and photoinduced negative bias instability in amorphous InGaZnO thin-film transistors with various active layer thicknesses

• Dapeng Wang and
• Mamoru Furuta

Beilstein J. Nanotechnol. 2018, 9, 2573–2580, doi:10.3762/bjnano.9.239

• at 160 °C from a sintered IGZO ceramic target by DC magnetron sputtering with a mixed gas of Ar/O2 = 29.4/0.6 sccm at a deposition pressure of 1 Pa. After patterning of the IGZO films as the active channel, a SiOx etch-stopper (200 nm), source and drain electrodes, and a 200 nm-thick SiOx passivation

Evidence of friction reduction in laterally graded materials

• Roberto Guarino,
• Gianluca Costagliola,
• Federico Bosia and
• Nicola Maria Pugno

Beilstein J. Nanotechnol. 2018, 9, 2443–2456, doi:10.3762/bjnano.9.229

• have been used in many recent studies to describe aspects of the transition from static to dynamic friction, the nucleation of rupture wave fronts, and the effects of patterning [32][33][34][35][36]. The SBM method is usually computationally faster than FEM, thus it is more practical for a qualitative

High-throughput micro-nanostructuring by microdroplet inkjet printing

• Hendrikje R. Neumann and
• Christine Selhuber-Unkel

Beilstein J. Nanotechnol. 2018, 9, 2372–2380, doi:10.3762/bjnano.9.222

• surfaces and the generated patterns were found to depend on the material type and surface topography. Based on the presented strategy, we were able to achieve patterning times of a few seconds and produce quasi-hexagonal micro-nanopatterns of gold nanoparticles on smooth surfaces. Hence, this method is a

• : biofunctional surfaces; inkjet printing; microstructures; nanolithography; nanoparticles; Introduction Many applications require well-organized micro- and nanoscale patterning of metallic nanoparticles. Examples include high-performance optics [1], multimodal waveguides [2], biosensors [3] and biomaterials [4

• clean-room equipment. In contrast to such methods, inkjet printing has recently become a powerful and affordable tool for the quick, easy-to-handle and user-defined surface patterning in various orders of magnitude and with a broad spectrum of different inks, including conductive gels, dispersions, but

Two-dimensional photonic crystals increasing vertical light emission from Si nanocrystal-rich thin layers

• Lukáš Ondič,
• Marian Varga,
• Ivan Pelant,
• Alexander Kromka,
• Karel Hruška and
• Robert G. Elliman

Beilstein J. Nanotechnol. 2018, 9, 2287–2296, doi:10.3762/bjnano.9.213

• defined direction through Bragg diffraction. Optical modes that instead of being guided in the layer can radiate into air, are referred to as leaky modes [8][9]. It was shown that by using 2D periodic patterning of group-III-nitride-based LEDs [10], similar light-extraction efficiencies as those of

Localized photodeposition of catalysts using nanophotonic resonances in silicon photocathodes

• Evgenia Kontoleta,
• Sven H. C. Askes,
• Lai-Hung Lai and
• Erik C. Garnett

Beilstein J. Nanotechnol. 2018, 9, 2097–2105, doi:10.3762/bjnano.9.198

• with higher catalytic activity, leading to preferential deposition, or traps that capture carriers preventing deposition. Conclusion We show that the optical modes of silicon nanostructures can be used for lithography-free patterning of catalytic nanoparticles. Tuning of the photo-electrochemical

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• (SEM), focused ion beam (FIB) dual-beam instrument, installed with a lithography attachment (Please see the Experimental section for details). Several exposure, milling or patterning strategies can be adopted in an IBL process. A few such processing procedures relevant to present work are illustrated

• )3CH3C5H4Pt, as the metal-organic precursor gas. Structure of the FZP The patterning and ion beam parameters tabulated in Table 1 resulted in a linear dosage of 0.8 pC/µm, and the successful fabrication of the FZP with 50 µm diameter, 110 nm nominal thickness and 30 nm Δr in just 8 min and 23 s. The dosage is

• given in linear terms because of the single pixel circular elements used for patterning. The overall FZP exhibited a high quality as shown in Figure 2. The FZP (internally designated as M-IV), is shown side by side with the reference aperture for diffraction efficiency (DE) measurements in Figure 2a

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• method, which enables the parallel processing of large areas. A cost-effective photochemical method is block copolymer micelle lithography (BCML), which can be used to create templates on the surfaces of substrates [10][11][12]. To use the templates for further patterning of the substrate with nanodots

Defect formation in multiwalled carbon nanotubes under low-energy He and Ne ion irradiation

• Santhana Eswara,
• Jean-Nicolas Audinot,
• Brahime El Adib,
• Maël Guennou,
• Tom Wirtz and
• Patrick Philipp

Beilstein J. Nanotechnol. 2018, 9, 1951–1963, doi:10.3762/bjnano.9.186

• total irradiation fluences of the MWCNT samples ranged from 1014 to 1018 ions/cm2. Beam position and primary ion fluence were controlled by the Fibics Nanopatterning and Visualisation Engine (NPVE) (http://www.fibics.com/). The FIBICS nano-patterning software allows for high-performance milling and ion

Synthesis of hafnium nanoparticles and hafnium nanoparticle films by gas condensation and energetic deposition

• Irini Michelakaki,
• Nikos Boukos,
• Dimitrios A. Dragatogiannis,
• Spyros Stathopoulos,
• Costas A. Charitidis and
• Dimitris Tsoukalas

Beilstein J. Nanotechnol. 2018, 9, 1868–1880, doi:10.3762/bjnano.9.179

• alternative method to tune the porosity of the NTFs. 3D NTF patterning Cluster beam deposition combined with patterning for fabricating 3D objects has been successfully performed by other groups with techniques such as supersonic cluster beam deposition combined with stencil masks [65][66]. In our case we

• , several scenarios, such as derformation, fragmentation and implantation of the NPs, are possible [40][43]. In this study we observed partial and complete deformation of the NPs. 3D NTF patterning In order to fabricate 3D NTF patterns, a spin-coated PMMA film on a Si substrate was initially patterned via e

Preparation of micro/nanopatterned gelatins crosslinked with genipin for biocompatible dental implants

• Reika Makita,
• Tsukasa Akasaka,
• Seiichi Tamagawa,
• Yasuhiro Yoshida,
• Saori Miyata,
• Hirofumi Miyaji and
• Tsutomu Sugaya

Beilstein J. Nanotechnol. 2018, 9, 1735–1754, doi:10.3762/bjnano.9.165

• surfaces using genipin crosslinking, with the aim of understanding the use of patterning in surface modification of dental implants. Results: Grooves, holes, and pillars, with widths or diameters of 2 µm, 1 µm, or 500 nm were fabricated using a combination of molding and genipin crosslinking of gelatin

• showed that the number of surface-attached cells increased with increasing patterning of the gelatin surface. Unlike the cell attachment assay, the results of a cell proliferation assay showed that Saos-2 cells prefer grooves with diameters of approximately 2 µm and 1 µm and pillars with diameters of 1

• . Thus, gelatin surfaces patterned using genipin crosslinking are now an available option for biocompatible material patterning. Keywords: cell attachment; cell proliferation; dental implants; gelatin; genipin; nanopatterning; Introduction Topography on the micro- and nanoscale is an important property

Magnetic properties of Fe₃O₄ antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

• Juan L. Palma,
• Alejandro Pereira,
• Raquel Álvaro,
• José Miguel García-Martín and
• Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

• [23] and colloidal [24] lithography, porous anodic alumina [25][26], block copolymer templates [27], nanochannel glass [28] and focused ion beam (FIB) patterning [29][30]. Recently, we have proposed the fabrication of disordered antidot arrays through the thermal reduction of thin films synthesized by

• , one of the samples was measured every 15°. Results and Discussion Figure 2a shows the SEM image of a representative Fe2O3 antidot array patterned on the film with 27 nm thickness. After patterning the antidot array has the shape of a circle of 30 μm diameter, which is surrounded by a circular trench

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• innovative fabrication technique employing spherical, nanoscale crystals as a lithographic mask for the low cost realization of nanoscale patterning. The features of the resulting nanostructures are related to the particle size, deposition conditions and interactions involved. In this work, we studied the

• control the number of particles on the surface and the interparticle distance, namely changing the salt concentration and absorption time in the particle solution. These approaches enabled the realization of large area (≈cm2) patterning of nanoscale holes (nanoholes) and nanoscale disks (nanodisks) of

• different sizes and materials. Keywords: colloidal lithography; electrostatic interactions; large-area nanostructure patterning; localized surface plasmon resonance; spherical nanoparticles; Introduction In recent years, ordered nanostructured arrays have attracted great interest because of their

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• patterning possibilities of varying point distances and dwell times, three-dimensional shapes with high lateral resolution can be fabricated [4][5][6]. There is ongoing research for new precursors to improve the quality of the deposits and expand the choice of materials [2][7]. To deposit metallic structures

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

• Phillip C. Chambers and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112

• ]. Multiporphyrin assemblies have been proposed for molecular photonic devices due to the versatile physical properties [24]. Particle lithography is a patterning method that uses a surface mask of colloidal spheres to direct the deposition of molecules or other nanomaterials on surfaces. Particle lithography

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• finally resulted in a gas flux of around 30 × 1015 molecules per second and cm2 roughly doubling the typical gas flux of AgO2Me2Bu [9]. Due to the low vapor pressure of the compounds, the growth pressure equaled the base pressure being typically around 3 × 10−5 hPa. A Xenos Patterning engine was used to

• define the patterning parameters. Square patterns of 10 × 10 µm2 with a pitch of 3 nm and 100 repeats were written using a spiral beam path and 500 pA beam current. Spot arrays with 5 µm distance between the respective spots were exposed with increasing dwell times from row to row and 100,000 repeats

• of 500 pA with varying dwell times were carried out. The dwell time was increased from 100 ns as the minimum value that could be realized with the patterning engine up to 5 µs to cover the typical time scale for precursor depletion. At the end of each line, the beam dwells for approximately 5 ms to

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• lift-off lithography; patterning; self-assembled monolayer; Introduction Patterning on the micro- to nanoscale plays a key role in modern scientific and engineering research fields. Particularly, the creation of bioactive surfaces with well-defined geometries has drawn lots of attention due to its

• sizes created by CLL. The scale bars are 50 μm. A representative photo (A) and fluorescence images (B–D) of the large-area bioactive surface fabricated by CLL. (A) Photo images showing a wafer-scale patterning achieved by CLL. (B–D) Fluorescence images obtained from different sampling spots indicated in

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• beam lithography patterning and etching of the SiC layer deposited over the Si/SiO2 substrate and following release of SiC nanostructures by removing the SiO2 sacrificial layer. The as-fabricated 400–500 nm thick poly-SiC beam-based 3T switches showed stable operation during more than 106 cycles at

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• have a measured full width at half maximum varying from 180 to 400 nm, according to the beam parameters (Table S1, Supporting Information File 1). The electron beam was controlled by a Xenos patterning engine which controls the shape, step size, dwell time and number of passes of the deposit. The line

• pC/µm, respectively. The spot deposition was achieved by stationary spot exposure for 10 min, while lineXENOS was written with the patterning software of our system. For both structures a central area is visually well distinguishable from the surrounding halo, as shown in detail in Figure 1c. The

Study of the vertically aligned in-plane switching liquid crystal mode in microscale periodic electric fields

• Artur R. Geivandov,
• Mikhail I. Barnik,
• Irina V. Kasyanova and
• Serguei P. Palto

Beilstein J. Nanotechnol. 2018, 9, 11–19, doi:10.3762/bjnano.9.2

• speeding up the VA-IPS mode. Recent advances in photolithography allow for the use of sub-micrometer spatial resolution in electrode patterning. The decrease of the electrode size down to the micrometer and sub-micrometer scale opens up new possibilities for the application of the VA-IPS LC mode. When the

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• supported Au–thiolate layers. The patterning of these layers laterally encodes their functionality, as demonstrated by a fluorescence-based approach that relies on dye-labeled complementary DNA hybridization. Supported thin Au films can be patterned via features on PDMS stamps (controlled contact), using

• patterned Au substrates prior to lift-off (e.g., selective wet etching), or by patterning alkanethiols on Au substrates to be reactive in selected regions but not others (controlled reactivity). In all cases, the regions containing Au–alkanethiolate layers have a sub-nanometer apparent height, which was

• found to be consistent with molecular dynamics simulations that predicted the removal of no more than 1.5 Au atoms per thiol, thus presenting a monolayer-like structure. Keywords: chemical patterning; hybrid material; monolayer; soft lithography; two-dimensional material; Introduction Chemical lift

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• materials. Moreover, bearing in mind that this deposition technique allows for extremely precise patterning of 2D and 3D structures on the nano- and microscale, these findings may facilitate a widespread usage of FEBID in a range of applications. Oxygen-plasma cleaning of FEBID Au nanostructures As was