Absence of free carriers in silicon nanocrystals grown from phosphorus- and boron-doped silicon-rich oxide and oxynitride

• Daniel Hiller,
• Julian López-Vidrier,
• Keita Nomoto,
• Michael Wahl,
• Wolfgang Bock,
• Tomáš Chlouba,
• František Trojánek,
• Sebastian Gutsch,
• Margit Zacharias,
• Dirk König,
• Petr Malý and
• Michael Kopnarski

Beilstein J. Nanotechnol. 2018, 9, 1501–1511, doi:10.3762/bjnano.9.141

• since both samples are subject to the same LME the comparison discussed above is not influenced. Besides LME there are also other factors influencing the precision and resolution of APT such as inhomogeneous tip shape evolution during the measurement [31], delayed dissociation of molecules during the

• as used in our work, the effective (endothermic) dissociation enthalpy of the reactions 2 P-DB + H2 → 2 P-H and 2 Si-DB + H2 → 2 Si-H yield ca. 0.05 eV and ca. 0.09 eV per DB passivation, respectively [51]. This finding renders the P–H bond breakage to occur at significantly lower temperatures as

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• may be removed more easily than previously anticipated, as exemplified by the electron-induced dissociation of benzene–Cr(CO)3 [17] and by FEBID using the fluorine-free precursor Cu(tbaoac)2 [18]. The most elegant approach to precursor design yet is to use a bimetallic molecular structure to predefine

• molecular precursors that enhance DEA processes [21]. The development of such strategies that enable control over electron-induced processes relies on a detailed understanding of the underlying dissociation reactions. These cannot only be initiated by DEA and DI but may also be the consequence of electronic

• -induced dissociation of FEBID precursors. However, it is also important to investigate how these processes change in the presence of a surface or of other molecules. Therefore, it is also shown that DEA at near-thermal energies (which has previously received the most attention among electron-induced

Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• demonstrated for a wide range of materials is electron beam-induced deposition (EBID) [6]. It avoids instabilities related to thermal- and mass-transport by overcoming the activation barrier for material deposition via electron-induced dissociation of surface-adsorbed precursor molecules into atomic or

• intensity ratios. The concentration of boron and oxygen relative to carbon decreases with increasing substrate temperature in the central region. The increase in concentration of carbon at higher temperatures is ascribed to electron-induced dissociation of residual hydrocarbons that are present in the

• electron-induced dissociation of precursor that is diffusing across the concentration gradient between the outer periphery of the deposit and the depleted central region [28]. The composition of material at the diffusion interface in the deposit formed at 195 °C is carbon-rich compared to the center of the

Understanding the performance and mechanism of Mg-containing oxides as support catalysts in the thermal dry reforming of methane

• Nor Fazila Khairudin,
• Mohd Farid Fahmi Sukri,
• Mehrnoush Khavarian and
• Abdul Rahman Mohamed

Beilstein J. Nanotechnol. 2018, 9, 1162–1183, doi:10.3762/bjnano.9.108

• dissociation process. In one proposal, CH4 activation was found to take place on the active sites. Niu et al. [66] proposed the mechanism of DRM over a Pt catalyst as shown in Equation 5. Equation 5 shows the adsorption of methane on the metal catalyst followed by dehydrogenation to produce hydrogen and a

• hydrocarbon species CHx (x = 0–3). When x = 0, carbon deposition occurs on the metal surface. Equation 6 describes the dissociation of CO2 into CO and O. The produced atomic H from the dehydrogenation process activates CO2 to form COOH before decomposition into CO and OH, as displayed in Equation 7. The H

• dissociation, CO2 dissociation, C oxidation, and CH oxidation, as shown in Figure 2. Interestingly, carbon formed only through the C oxidation pathway; meanwhile, CH was transformed to CO through CHO in the CH oxidation pathway, which bypasses the formation of carbon from CH4. Furthermore, carbon formation

A simple extension of the commonly used fitting equation for oscillatory structural forces in case of silica nanoparticle suspensions

• Sebastian Schön and
• Regine von Klitzing

Beilstein J. Nanotechnol. 2018, 9, 1095–1107, doi:10.3762/bjnano.9.101

• with charged objects (i.e., polyelectrolytes) but at high ionic strengths, which means strong electrostatic screening. The dissociation of the strong polyelectrolytes leads to a high ionic strength and thus a very small Debye length (<10 nm). This results in double-layer forces declining to zero even

Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition

• Federico Venturi,
• Gian Carlo Gazzadi,
• Amir H. Tavabi,
• Alberto Rota,
• Rafal E. Dunin-Borkowski and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2018, 9, 1040–1049, doi:10.3762/bjnano.9.97

• most of the deposited material consisted of Co, some C and O were present in the fabricated structures due to incomplete dissociation of the precursor molecules. In particular, a more significant halo of deposited material was observed near the structures grown on Si. This was caused by larger

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• direct-write technique that allows for a highly precise fabrication of three-dimensional nanostructures [1][2]. Gaseous precursor molecules are injected into the vacuum chamber of a scanning electron microscope and are locally dissociated by a focused electron beam [3]. After dissociation, the non

• -volatile part forms the deposit while the volatile rest is pumped out. The dissociation is a complex process influenced by the local dynamics of the precursor molecules and induced by electrons with their specific, yet mostly unknown, cross-sections for the respective energy ranges and molecule bonds to

• electrons are expected to contribute to the precursor dissociation [4]. The ultimate resolution of the fabricated features strongly depends on the number and energy of primary electrons [6][7]. In this respect, the vertical growth rate plays a crucial role. The vertical growth rate is determined by the

Dynamics and fragmentation mechanism of (C₅H₄CH₃)Pt(CH₃)₃ on SiO₂ surfaces

• Kaliappan Muthukumar,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2018, 9, 711–720, doi:10.3762/bjnano.9.66

• molecular dynamics simulations. Fully and partially hydroxylated surfaces represent substrates before and after electron beam treatment and this study examines the role of electron beam pretreatment on the substrates in the initial stages of precursor dissociation and formation of Pt deposits. Our

• the initial orientation of the molecule and the distribution of surface active sites. Based on the observations from the simulations and available experiments, we discuss possible dissociation channels of the precursor. Keywords: deposition; dissociation; electron beam induced deposition (EBID

• incomplete dissociation of the precursor molecules on the substrate during the deposition process leaves a significant organic residue, thus impairing the quality of the deposits [3][6]. This lowers the range of applicability of EBID for nanotechnological applications. Several postfabrication approaches

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• by four distinctly different processes, which are active within different energy ranges, and more importantly, lead to distinctly different processes; dissociative electron attachment (DEA), dissociative ionization (DI), and neutral and dipolar dissociation upon electron excitation (ND and DD). An

• are adsorbed on surfaces, as is the case in FEBID. Furthermore, current gas phase experiments rely on the detection of charged fragments, leaving the potentially significant neutral dissociation [22][33][41] upon electron excitation largely unexplored. The single electron/molecule collision

• concluded that in general electron induced dissociation of surface adsorbed precursor molecules proceeds in two steps. Electron induced desorption of ligands associated with the precursor occurs to some extent in the first step (e.g., desorption of one of the PF3 groups in Pt(PF3)4 to form a Pt(PF3)3

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• used to identify the fragmentation pattern of the coordination compounds produced in crossed electron – molecular beam experiments and to measure the dependence of ion yields of positive and negative ions on the electron energy. The dissociation pattern of positive ions contains a sequential loss of

• materials for preparation of thin layers or 3D nanostructures. Complexes and metalorganic compounds are used as precursors in modern nano scale layer techniques. After activation, molecules undergo dissociation on the surface. Volatile parts of molecules are removed from the surface while a metal component

• remains and forms the layer. Activation of the precursor molecules can be induced by several processes. For instance, a catalytic or a thermal dissociation can occur. Plasma activated processes such as plasma enhanced chemical vapor deposition (PECVD) can be used for coating of the surface [1]. In the

Nanoparticle delivery to metastatic breast cancer cells by nanoengineered mesenchymal stem cells

• Liga Saulite,
• Karlis Pleiko,
• Ineta Popena,
• Dominyka Dapkute,
• Ricardas Rotomskis and
• Una Riekstina

Beilstein J. Nanotechnol. 2018, 9, 321–332, doi:10.3762/bjnano.9.32

• dissociation of the spheroids into a single cell suspension. The cells were washed, stained with CD90 FITC or EpCAM FITC and analysed by flow cytometry. For fluorescence imaging of QD transfer, the cancer cell and MSC mono- or co-culture spheroids were harvested after 24 h of propagation on the polyHEMA

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• organic precursors are introduced with a gas injection system (GIS) and physisorb onto the substrate. The electrons induce local precursor dissociation on the surface, which in the ideal case results in a selective and pure metal deposit and volatile organic ligands. However, the organic ligand elements

• often contaminate the metal deposit via ligand co-deposition or incomplete precursor dissociation [6]. Metal content for typical metal organic FEBID precursors without further processing ranges from 5 to 40 atom % [7]. In order to use FEBID for applications such as plasmonics [8][9][10], defined

• deposition with high (pure) metal content has to be achieved. For that, the precursor should ideally be volatile at room or slightly elevated temperatures, evaporate without decomposition, and be susceptible towards electron-induced dissociation resulting in the desired compound [11][12]. Recently, a silver

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• -established maskless nanopattering technique. It is based on the local dissociation of adsorbates upon the irradiation with electrons, combining the advantages of a direct-write process with the depositing possibility of a number of geometries at nanometric scale [1][2][3][4][5][6][7][8][9][10][11]. The

• electrons generated in the vicinity of the impinging primary beam, is transferred to the adsorbates. The dissociation yields both volatile ligand fragments (pumped away) and deposited non-volatile products (such as metals) [8][9][12][13]. FEBID has been recently used to define nanodevices for several

• incomplete dissociation of organometallic precursor adsorbate molecules usually leads to codeposition of organic compounds into the metal deposits [3][8][12][32][33][34][35]. This unwanted deposition degrades the electrical transport properties of the deposit, thus limiting the applicability of the FEBID

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• ion mass spectra suggest that fragmentation does not exclusively produce CH4 but also some CH3 [21]. ESD of CH3 from a condensed layer of MeCpPtMe3 during electron exposure would thus again be anticipated. Considering these electron-induced dissociation reactions of MeCpPtMe3, trapping of fragments in

• data for DEA and EI of MeCpPtMe3 as well as a detailed understanding of the fragmentation mechanisms following EI do not exist to the best of our knowledge. Furthermore, neutral dissociation (ND), a non-resonant process with a threshold comparable to EI and leading to the formation of uncharged

• fragments, may also play a role in the observed CH4 production. However, data on ND are generally difficult to obtain and do not exist so far for MeCpPtMe3. A complete set of such cross section data supplemented by theoretical studies of the electron-induced dissociation and of subsequent reactions of the

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• competitive with thermolysis of the ligands. The possibility to evaporate the compound allows one to envisage its use as a FEBID precursor. Moreover, the dissociation of the precursor to a pure heavy deposit and the release of volatile fragments is a crucial issue in FEBID. Considering the amine and

• carboxylate ligands, one can anticipate the ease of removal of the lightly bound amine ligands. In addition, the carboxylate ligands could favourably drive the precursor dissociation to the release of CO2 fragments, known to be a general product of electron impact on carboxylic acids [9][10]. These

• assumptions need to be confronted to experiments, not only for the specific use of the precursor in the present study, but also in order to contribute to the fundamental understanding of precursor dissociation in FEBID. The evaporation of the precursor is a delicate aspect of FEBID experiments. The precursor

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• applications. Designing FEBIP precursors is not straightforward, as they have to meet many requirements. They need to have tailor-made dissociation behavior, high volatility, long shelf life and they should be preferably non-hazardous and non-corrosive. The challenge is to develop a precursor that is

• , but non-volatile [12]. MeAuPMe3 has been used for chemical vapor deposition (CVD) [51][52] and can be used for FEBIP. However, the electron-induced dissociation is incomplete, with just a single methyl ligand being removed [12]. The studies of Au(I) compounds that have been made so far have raised

• electronegative, which means that d-electrons are strongly bound and backdonation is poor. For this reason, Ni(CO)4 is less stable than Fe(CO)5. The calculated energies (BP86/ECP2) for dissociation of the first CO ligand in Fe(CO)5 and Ni(CO)4 are 44.5 and 27.5 kcal/mol, respectively [57]. Stabilities also

The role of ligands in coinage-metal nanoparticles for electronics

• Ioannis Kanelidis and
• Tobias Kraus

Beilstein J. Nanotechnol. 2017, 8, 2625–2639, doi:10.3762/bjnano.8.263

• sintering at 140 °C. The authors suggest that the shorter acid first disassociated, which caused partial nanoparticle coalescence, released heat, and led to partial dissociation of the decanoic acid, and the formation of conductive patterns [125]. Copper nanoparticles with glycolic (Figure 3) and lactic

Synthesis of [{AgO₂CCH₂OMe(PPh₃)}_n] and theoretical study of its use in focused electron beam induced deposition

• Jelena Tamuliene,
• Julian Noll,
• Peter Frenzel,
• Tobias Rüffer,
• Alexander Jakob,
• Bernhard Walfort and
• Heinrich Lang

Beilstein J. Nanotechnol. 2017, 8, 2615–2624, doi:10.3762/bjnano.8.262

• suitable as a FEBID precursor for silver deposition, its vapor pressure was determined (p170 °C = 5.318 mbar, ∆Hvap = 126.1 kJ mol−1), evincing little volatility. Also EI and ESI mass spectrometric studies were carried out. The dissociation of the silver(I) compound 2 under typical electron-driven FEBID

• respective volatiles, as result from dissociation, should be quickly removed to avoid their entrapment in the respective deposit. Therefore, precursors must be designed, which completely decompose under typical FEBID conditions. Recently, Botman et al. highlighted the difficulty in the deposition of pure

• the sum of the total energies of the fragments predicted. The calculations for the final states of the compounds are presented for the case of dissociation without taking into account the activation energy of the reverse reaction (Еr). The total number of the decomposition reactions investigated was

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• . In the present work, we used the so-called electron beam induced deposition (EBID) method as the FEBIP technique in which adsorbed precursor molecules are locally dissociated by the impact of the electron beam and leave a deposit of the nonvolatile dissociation products [16][17][18]. In this regard

• CNT yield [21]. The existence of the corresponding carbon contamination was traced back to deposits from the residual gas in the high-vacuum (HV) environment and the dissociation of the carbon-containing precursor ligands [19]. With our “surface science approach” to FEBIP, that is, working in an ultra

• directly contribute to the CNT growth for example by catalytic carbon source dissociation [30]. As depicted in Figure 6f, a spatially well-defined 4 × 4 µm2 CNT nanostructure with high density was synthesized, indicating the possibility to produce CNT forest structures by further exploring the experimental

Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)₆)

• Jusuf M. Khreis,
• João Ameixa,
• Filipe Ferreira da Silva and
• Stephan Denifl

Beilstein J. Nanotechnol. 2017, 8, 2583–2590, doi:10.3762/bjnano.8.258

• (CO)3− into Cr(CO)2− are discussed. Electron-induced dissociation at 70 eV impact energy was found to be in agreement with previous studies. A series of Cr(CO)nC+ (0 ≤ n ≤ 3) cations formed by C–O cleavage is described for the first time. The metastable decay of Cr(CO)6+ into Cr(CO)5+ and collision

• -induced dissociation leading to bare Cr+, are discussed. In addition, doubly charged cations were identified and the ration between doubly and singly charged fragments was determined and compared with previous studies, showing considerable differences. Keywords: chromium hexacarbonyl Cr(CO)6

• backscattered electrons with the precursor molecules. LEE initiate chemical reactions on the surface by dissociative electron attachment (DEA) and dissociative electron ionization, as well as neutral dissociation. Those processes need to be well understood, in order to maximise the quality of deposited metal as

Amplified cross-linking efficiency of self-assembled monolayers through targeted dissociative electron attachment for the production of carbon nanomembranes

• Sascha Koch,
• Christopher D. Kaiser,
• Paul Penner,
• Michael Barclay,
• Lena Frommeyer,
• Daniel Emmrich,
• Patrick Stohmann,
• Tarek Abu-Husein,
• Andreas Terfort,
• D. Howard Fairbrother,
• Oddur Ingólfsson and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2017, 8, 2562–2571, doi:10.3762/bjnano.8.256

• ]. In the energy range from about 0–100 eV, electron-induced bond rupture may proceed through four distinctly different initiating processes: dissociative ionization (DI), neutral or dipolar dissociation upon electronic excitation (ND and DD, respectively) or through dissociative electron attachment

• thus bound to relax through re-emission of the electron (autodetachment) or through dissociation. The cross section for the formation of the TNI at very low incident energies follows an E−1/2 energy dependency and can be substantial at or close to 0 eV [28][29]. Dissociative ionization, on the other

• fragment (X) exceeds the respective bond dissociation energy (BDE(M−X)); Here ΔHrxn is the reaction enthalpy for the bond rupture, which is approximately equal to the respective threshold energy (Eth). For the higher halogens Cl, Br and I, the BDE(C6H5−X) in the respective halo-benzenes decreases

PTFE-based microreactor system for the continuous synthesis of full-visible-spectrum emitting cesium lead halide perovskite nanocrystals

• Chengxi Zhang,
• Weiling Luan,
• Yuhang Yin and
• Fuqian Yang

Beilstein J. Nanotechnol. 2017, 8, 2521–2529, doi:10.3762/bjnano.8.252

• with dissociation of ions from the QDs. At high temperatures, ions are in a relatively high energy state, which makes it easy for them to overcome the energy barrier and migrate back to the solution. Generally, the PL emission wavelength of the QDs is directly related to the energy state of the QDs

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• height loss in the PtCx structures as a function of their initial thickness. The inset shows a top-down AFM image of one of the purified nanostructures. Hess cycle for electron purification of PtCl2. ∆H = −∆Hf PtCl2 + Cl2 bond dissociation enthalpy (BDE) + 2 × Cl electron affinity (EA) and therefore ∆H

• = 138 kJ/mol + 243 kJ/mol + 2 × (−349 kJ/mol) = −317 kJ/mol. Hess cycle for atomic hydrogen purification of PtCl2. ∆H = −∆Hf PtCl2 + H2 bond dissociation enthalpy (BDE) + 2 × ∆Hf HCl and therefore ∆H = 138 kJ/mol − 436 kJ/mol + 2 × (−92 kJ/mol) = −482 kJ/mol. Purification data for other Pt-containing

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

•  1), dissociative ionization (DI; Equation 2), neutral dissociation (ND; Equation 3) and dipolar dissociation (DD; Equation 4) [13][14][15][16][17][18][19][20]. The respective reaction schemes for each of these pathways are: The double dagger (‡) signifies vibrational or electronic excitation, the

• same is true for electronic excitation upon electron impact [34]. However, no experimental information is available on actual cross sections for neutral dissociation upon such electronic excitations. This is due to the difficulties associated with the detection of the resulting neutral species and

• that the inert behaviour of SCH towards DEA, as compared to DCSCH, only concerns electrons of energies below 2 eV and in the range of 6–9 eV. The effective dissociation yield of DEA in the DCSCH EBID process, however, depends not only on the DEA cross sections, but also on the available number of

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• fabricate three-dimensional metal-containing nanoscale structures [4][5]. FEBID is a direct-write technique in which a highly focused, high-energy electron beam impinges on precursor molecules physisorbed onto a substrate, thereby causing their dissociation, and in the ideal case, leading to pure deposit

• molecules via various decomposition processes such as dissociative ionization (DI), dipolar dissociation (DD), neutral dissociation (ND), and dissociative electron attachment (DEA) [8]. These reactions occur with relatively high cross sections and typically result in partial fragmentation of the precursor

• known that DEA is responsible for the dissociation of the molecule. The DEA reaction is a two-step process in which, in a first step, an incident electron is captured by the target molecule to form a transient negative ion (TNI). Since the TNI is not stable, it will decay in a second step either via