Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

• Alexandra M. Greiner,
• Adria Sales,
• Hao Chen,
• Sarah A. Biela,
• Dieter Kaufmann and
• Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

• masks for subsequent etching or sputtering processes. It is a low-cost technique that does not require complex equipment since the pattern can be obtained by spin-coating the surface or by dipping it in the colloidal solution. Moreover, this technique allows for large surface patterning. The size of the

• defined coating over longer time periods. Control of the spatial distribution and density of molecules is for many biological investigations an interesting option. Such patterning with adhesive molecules can be realized by several techniques. Commonly used are microcontact printing [53][155] dry lift-off

Photothermal effect of gold nanostar patterns inkjet-printed on coated paper substrates with different permeability

• Mykola Borzenkov,
• Anni Määttänen,
• Petri Ihalainen,
• Maddalena Collini,
• Elisa Cabrini,
• Giacomo Dacarro,
• Piersandro Pallavicini and
• Giuseppe Chirico

Beilstein J. Nanotechnol. 2016, 7, 1480–1485, doi:10.3762/bjnano.7.140

• effect; Introduction Due to advantages over other patterning techniques, inkjet printing technology has met important challenges to pattern a broad range of functional materials with promising biomedical application [1][2][3][4][5][6][7]. Inks based on metal nanoparticles are widely used in inkjet

Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography

• Siti Noorhaniah Yusoh and
• Khatijah Aisha Yaacob

Beilstein J. Nanotechnol. 2016, 7, 1461–1470, doi:10.3762/bjnano.7.138

• parameters, such as applied voltage, writing speed and humidity, play important roles in the patterning of the oxide mask [27]. This study adopted parameters reported by Yusoh and Yaacob [27]. They found that use of a contact mode AFM tip coated with Au with 9 V of applied voltage and 0.3 µm/s writing speed

Direct formation of gold nanorods on surfaces using polymer-immobilised gold seeds

• Majid K. Abyaneh,
• Pietro Parisse and
• Loredana Casalis

Beilstein J. Nanotechnol. 2016, 7, 809–816, doi:10.3762/bjnano.7.72

• . Secondly, the synthesis protocol applied in this work can be broadened to produce 1D nanostructures other than GNRs. Thirdly, applying direct growth of NRs on the surface makes this method perfectly suited for many applications such as optical data storage [23], optical laser writing and patterning [24

Magnetic switching of nanoscale antidot lattices

• Ulf Wiedwald,
• Joachim Gräfe,
• Kristof M. Lebecki,
• Maxim Skripnik,
• Felix Haering,
• Gisela Schütz,
• Paul Ziemann,
• Eberhard Goering and
• Ulrich Nowak

Beilstein J. Nanotechnol. 2016, 7, 733–750, doi:10.3762/bjnano.7.65

• magnetized thin films provide strong out-of-plane demagnetizing fields. These are the origin of the often-observed labyrinth like domain patterns. Patterning reduced the effect of the demagnetizing field in a similar way as discussed above for in-plane fields, based on an effective local demagnetisation

Fabrication and properties of luminescence polymer composites with erbium/ytterbium oxides and gold nanoparticles

• Julia A. Burunkova,
• Ihor Yu. Denisiuk,
• Dmitri I. Zhuk,
• Lajos Daroczi,
• Attila Csik,
• István Csarnovics and
• Sándor Kokenyesi

Beilstein J. Nanotechnol. 2016, 7, 630–636, doi:10.3762/bjnano.7.55

• SiO2-Au-REO NP complexes randomly distributed in polymer matrix falls within tens of nanometers, where the influence of plasmon fields on RE ion excitation is efficient. Based on the earlier data on direct surface patterning in polymer nanocomposites [10][11][12] the in situ formation of two

Organized films

• Maurizio Canepa and
• Helmuth Möhwald

Beilstein J. Nanotechnol. 2016, 7, 406–408, doi:10.3762/bjnano.7.35

• modifying films, opening the way to patterning and even to nanolithography methods [14]. This was a crucial step in the development of nanosensors and biochips, especially in new and emerging fields such as nanomedicine. Coming back to LB films, irrespective of other technical difficulties in fabrication

Nanoscale rippling on polymer surfaces induced by AFM manipulation

• Mario D’Acunto,
• Franco Dinelli and
• Pasqualantonio Pingue

Beilstein J. Nanotechnol. 2015, 6, 2278–2289, doi:10.3762/bjnano.6.234

• number of scans. In the work of Y. Sun et al. [13] the interpretation of the ripple patterning dependence on Mw is well depicted in terms of small and large sizes of the polymer molecules. The authors found well-ordered ripple patterns forming on PS films with a Mw of 250 kDa. No ripple formation was

• ’ after the spin coating deposition step. In this way, part of the solvent remains trapped in the polymeric thin film and the specific patterning procedure employed leads to the production of well-ordered ripple structures. Temperature dependence: The temperature (T) dependence of nanorippling can be

• to control the patterning, namely using cantilevers with miniaturized and integrated heaters; enriching the film with solvent; creating boundary conditions via defined tip trajectories; applying localized electrostatic fields through the tip to induce mechanical instabilities or crosslinking. Some of

Orthogonal chemical functionalization of patterned gold on silica surfaces

• Francisco Palazon,
• Didier Léonard,
• Thierry Le Mogne,
• Francesca Zuttion,
• Céline Chevalier,
• Magali Phaner-Goutorbe,
• Éliane Souteyrand,
• Yann Chevolot and
• Jean-Pierre Cloarec

Beilstein J. Nanotechnol. 2015, 6, 2272–2277, doi:10.3762/bjnano.6.233

• immobilization. Current work is being undertaken to implement this methodology into LSPR biosensors. Experimental Substrate patterning A silica thin film (100 nm) was sputtered onto clean silicon wafers. UV lithography was used to define different patterns (lines, squares) with typical dimensions ranging from 2

Electrochemical coating of dental implants with anodic porous titania for enhanced osteointegration

• Amirreza Shayganpour,
• Alberto Rebaudi,
• Pierpaolo Cortella,
• Alberto Diaspro and
• Marco Salerno

Beilstein J. Nanotechnol. 2015, 6, 2183–2192, doi:10.3762/bjnano.6.224

• additive nanoscale patterning. Additional advantages are provided by this material when considering the possible loading of bioactive drugs in the porous cavities. Keywords: anodization; dental implants; nanopores; surface treatment; titania; Introduction Titanium (Ti) is the standard material used for

• alumina and silica for example [5], makes micro-nanoscale patterning of this material of even more critical importance for implant success. The surface micropatterning of Ti implants is usually achieved by mechanical (sandblasting) or purely chemical (etching) treatments [4]. However, Ti is also known as

• explored for APA also [10][11][12]. Generally speaking, oxide inertness provides biocompatibility, while controlled porous patterning allows for tuning the roughness for optimized stimulation of living-cell response. The role of nanotopography in guiding cell differentiation and tissue generation is not

Near-field visualization of plasmonic lenses: an overall analysis of characterization errors

• Jing Wang,
• Yongqi Fu,
• Zongwei Xu and
• Fengzhou Fang

Beilstein J. Nanotechnol. 2015, 6, 2069–2077, doi:10.3762/bjnano.6.211

• Figure 8. A lens with σ = 1 (circular slits) was milled using FIB direct writing. But the fabricated structure is deformed along the long (as indicated by A–B line) and the short axis (as indicated by C–D line) due to stigmation during patterning, as shown in Figure 8a. The dotted circular and elliptical

• . For FIB patterning, the inherent astigmatism will exist to a certain extent no matter how finely the operator calibrates the stigmation. Stigmation causes excessive overlapping of the focused ion beam spot along long-axis. Sometime, the overlap can be as large as 90% which is obviously too large for

• patterning. However, oxidation of the metal film will be caused by thermal annealing. The internal stress can lead to deformation of the fabricated structures and the NSOM measurement results will change accordingly. The internal stress τ is determined by the following parameters where d is the ion

Focused particle beam-induced processing

• Michael Huth and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2015, 6, 1883–1885, doi:10.3762/bjnano.6.191

• for the patterning of gold nanoparticle structures is introduced by Takahiro Noriki and coworkers [9]. The resolution limiting aspects are covered in the article by Roland Schmied and collaborators concerning fundamental edge-broadening effects in FEBID [10]. A more recent development that may help to

Improved atomic force microscopy cantilever performance by partial reflective coating

• Zeno Schumacher,
• Yoichi Miyahara,
• Laure Aeschimann and
• Peter Grütter

Beilstein J. Nanotechnol. 2015, 6, 1450–1456, doi:10.3762/bjnano.6.150

• 1/f behavior. Labuda et al. recently published a study on how to reduce the 1/f noise of coated cantilevers by patterning the metal coating with a Fresnel lens like pattern [4]. Bull et al. reported the reduction of the cantilever noise in liquid by a partial metallic coating on commercially

Self-assembly of nanostructures and nanomaterials

• Isabelle Berbezier and
• Maurizio De Crescenzi

Beilstein J. Nanotechnol. 2015, 6, 1397–1398, doi:10.3762/bjnano.6.144

• of nanostructures at the nanoscale including: large-scale patterning obtained by spontaneous structuring as well as local probe nanopatterning for nanostructure size and position control; theoretical and experimental efforts dedicated to a better understanding of the formation, evolution, and

Scalable, high performance, enzymatic cathodes based on nanoimprint lithography

• Dmitry Pankratov,
• Richard Sundberg,
• Javier Sotres,
• Dmitry B. Suyatin,
• Ivan Maximov,
• Sergey Shleev and
• Lars Montelius

Beilstein J. Nanotechnol. 2015, 6, 1377–1384, doi:10.3762/bjnano.6.142

• application of NIL for amperometric bioelectronics. NIL is a parallel patterning technique capable of rendering features as small as 2–3 nm (or even smaller) in a fast, reproducible, scalable and economical way [17]. Nanoimprinting is based on the pattern transfer by a replication technique where nanometer

Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch²

• Cheng Huang,
• Alexander Förste,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2015, 6, 1205–1211, doi:10.3762/bjnano.6.123

Enhancing the thermoelectric figure of merit in engineered graphene nanoribbons

• Hatef Sadeghi,
• Sara Sangtarash and
• Colin J. Lambert

Beilstein J. Nanotechnol. 2015, 6, 1176–1182, doi:10.3762/bjnano.6.119

• geometry [21] and it is known that by patterning graphene to form nanoribbons or anti-dots one can suppress the phonon contribution to heat transport [3]. This suppression is supported by experimental data, as reviewed in [2]. Phonon transport in graphene ribbons is limited by the ribbon size and edge

High sensitivity and high resolution element 3D analysis by a combined SIMS–SPM instrument

• Yves Fleming and
• Tom Wirtz

Beilstein J. Nanotechnol. 2015, 6, 1091–1099, doi:10.3762/bjnano.6.110

• are commonly used. For manufacturing the structures used in this example, a TaN layer was grown through atomic layer deposition (ALD) on a Si wafer. Subsequently, using e-beam patterning the trenches were etched into the TaN layer. After processing, the test structures were deliberately contaminated

Patterning technique for gold nanoparticles on substrates using a focused electron beam

• Takahiro Noriki,
• Shogo Abe,
• Kotaro Kajikawa and
• Masayuki Shimojo

Beilstein J. Nanotechnol. 2015, 6, 1010–1015, doi:10.3762/bjnano.6.104

• , Midori-ku, Yokohama, 226-8502, Japan 10.3762/bjnano.6.104 Abstract We propose a novel patterning technique for gold nanoparticles on substrates that combines a chemical reaction with electron beam irradiation. First, gold nanoparticles are placed in a two-dimensional arrangement on the substrate. Then

• nanoparticle arrays of a designed shape is needed. In this paper, we propose a new patterning technique for gold nanoparticles on substrates. The nanoparticles are first placed in a two-dimensional arrangement on a substrate by chemical methods. Thereafter, the desired nanoparticles are immobilized by focused

• , while most particles were washed away outside of the irradiated area. This patterning process for nanoparticles, which combines both chemical and electron beam techniques, could contribute to the fabrication of single electron transistors [14], Fano resonance devices [15] and plasmonic waveguides, as

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• reflection and absorption of electrons to be manipulated and can be used for precise tuning of the parameters of the pattern. Patterning of complex nanostructures of various geometries For the fabrication of polymer nanostructure patterns of complex geometry, the Si substrate was spin-coated with a PMMA A2

• method is very promising for fabrication of high-quality, artificial, spin-ice lattices [21][22], magnonic [23] and photonic [24] crystals on large scale. An important additional advantage of the proposed method is the fast patterning of a template as compared with the exposure time required for the

Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

• Brett B. Lewis,
• Michael G. Stanford,
• Jason D. Fowlkes,
• Kevin Lester,
• Harald Plank and
• Philip D. Rack

Beilstein J. Nanotechnol. 2015, 6, 907–918, doi:10.3762/bjnano.6.94

• performed using the FEI GIS and MeCpPt(IV)Me3 precursor which raised the chamber pressure to ≈1.5 × 10−5 mbar. 500 × 500 nm boxes were synthesized at this elevated pressure using the NOVA patterning software with a beam energy of 5 keV, beam current of 120 pA, point pitch of 13.55 nm, a pixel dwell time of

Electroburning of few-layer graphene flakes, epitaxial graphene, and turbostratic graphene discs in air and under vacuum

• Andrea Candini,
• Nils Richter,
• Domenica Convertino,
• Camilla Coletti,
• Franck Balestro,
• Wolfgang Wernsdorfer,
• Mathias Kläui and
• Marco Affronte

Beilstein J. Nanotechnol. 2015, 6, 711–719, doi:10.3762/bjnano.6.72

• formation than working in air. Conversely, for graphene on SiC the EB process is not successful under vacuum. Finally, the EB is possible with turbostratic graphene discs only after the creation of a constriction in the sample using lithographic patterning. Keywords: graphene; graphene based electrodes

• are deposited on the same substrate as the exfoliated graphene. Here, we found that the EB process leads to a breaking of the graphene devices only after the patterning of a constriction. This hardness with respect to exfoliated graphene suggests that the different morphology of the edges also plays a

• role to initiate the burning. Indeed, the presence of nonsaturated carbon bonds makes the edges the most reactive part of the device. Edges cleaved during the exfoliation (exfoliated graphene), edges created during the oxygen plasma (graphene on SiC and turbostratic discs after the patterning), and

Fundamental edge broadening effects during focused electron beam induced nanosynthesis

• Roland Schmied,
• Jason D. Fowlkes,
• Robert Winkler,
• Phillip D. Rack and
• Harald Plank

Beilstein J. Nanotechnol. 2015, 6, 462–471, doi:10.3762/bjnano.6.47

• –3)·10−6 mbar. Prior to patterning, the GIS was opened for about 2 min to establish stable precursor conditions at the surface at a chamber pressure of (1–2)·10−5 mbar. All structures have been fabricated by using stream-files that were generated through a patterning algorithm custom-written in C

• varying the number of patterning loops. Beam currents, DTs and PoPs were based on previous studies, suggesting a widely balanced working regime without strong excess of electrons or molecules [10][44][45][47]. Preliminary experiments were performed without precursor gas by using the same patterns at the

• . The dotted vertical line gives the last patterning point at the edge (intended patterning edge) revealing the final slope to be symmetrically distributed at half maximum. Previous studies by Arnold et al. [44] revealed that the achievable width of single lines is determined by BSE/SE-II contributions

Electrical properties of single CdTe nanowires

• Elena Matei,
• Camelia Florica,
• Andreea Costas,
• María Eugenia Toimil-Molares and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2015, 6, 444–450, doi:10.3762/bjnano.6.45

• nanowire suspension was placed on Si/SiO2 substrates on which interdigitated Ti/Au electrodes were patterned by photolithography (Figure 4). FIBIM is a direct patterning method employed for the design of metallic nanostructures. The method is based on the interaction of an ion beam with the surface

Boosting the local anodic oxidation of silicon through carbon nanofiber atomic force microscopy probes

• Gemma Rius,
• Matteo Lorenzoni,
• Soichiro Matsui,
• Masaki Tanemura and
• Francesc Perez-Murano

Beilstein J. Nanotechnol. 2015, 6, 215–222, doi:10.3762/bjnano.6.20

• nanofabrication methods based on scanning probe microscopy have been developed during the last decades. Local anodic oxidation (LAO) is one of such methods: Upon application of an electric field between tip and surface under ambient conditions, oxide patterning with nanometer-scale resolution can be performed

• and chemical properties, intrinsic very high aspect ratios and tiny tip radii, CNTs looked very promising for LAO-AFM application. Indeed, both single and multi-walled CNTs showed remarkable patterning capabilities [16]. However, this approach has been nearly abandoned, due to the high cost and poor

• current experiments we focus on the definition of line patterns. Prior to patterning, the AFM control feedback is disabled and the required voltage is applied. However, in order to keep a constant tip–surface distance, previously the surface inclination with respect to the X–Y piezo-scanning plane is