One-step chemical vapor deposition synthesis and supercapacitor performance of nitrogen-doped porous carbon–carbon nanotube hybrids

• Egor V. Lobiak,
• Lyubov G. Bulusheva,
• Ekaterina O. Fedorovskaya,
• Yury V. Shubin,
• Pavel E. Plyusnin,
• Pierre Lonchambon,
• Boris V. Senkovskiy,
• Zinfer R. Ismagilov,
• Emmanuel Flahaut and
• Alexander V. Okotrub

Beilstein J. Nanotechnol. 2017, 8, 2669–2679, doi:10.3762/bjnano.8.267

• , 630090 Novosibirsk, Russia, Institute of Coal Chemistry and Materials Science FRC CCC SB RAS, Kemerovo 650000, Russia 10.3762/bjnano.8.267 Abstract Novel nitrogen-doped carbon hybrid materials consisting of multiwalled nanotubes and porous graphitic layers have been produced by chemical vapor deposition

• prepared hybrid materials [6][7][8][9]. Another less common strategy consists of CNT growth by catalytic chemical vapor deposition (CCVD) over catalyst nanoparticles predeposited on the graphitic surfaces [10][11][12][13]. The obtained hybrids are characterized by tight bonding between the components

Synthesis of [{AgO₂CCH₂OMe(PPh₃)}_n] and theoretical study of its use in focused electron beam induced deposition

• Jelena Tamuliene,
• Julian Noll,
• Peter Frenzel,
• Tobias Rüffer,
• Alexander Jakob,
• Bernhard Walfort and
• Heinrich Lang

Beilstein J. Nanotechnol. 2017, 8, 2615–2624, doi:10.3762/bjnano.8.262

• beam induced deposition (FEBID) is a cost efficient direct resist-free chemical vapor deposition technique producing free-standing 3D metal-containing nanoscale structures in a single step on, for example, surfaces of sub-10 nm size using a variety of materials with a high degree of spatial and time

• -domain control [1][2][3]. Up to now, FEBID relies on the chemical availability of chemical vapor deposition (CVD) precursors. However, such precursors are not optimized for the electron-driven FEBID process and hence molecular precursors particularly adapted to its underlying electron-induced

• -bonded PPh3 group could be detected under the measurement conditions applied (Experimental, Figure 5). To show, if 2 is a suitable FEBID or chemical vapor deposition (CVD) precursor for the deposition of silver, vapor pressure measurements of 2 were undertaken (Figure 6). In order to determine the

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• morphology, for example, as individual nanotubes or as CNT forests. Electron beam induced deposition (EBID) with subsequent autocatalytic growth (AG) was applied to lithographically produce catalytically active seeds for the localized growth of CNTs via chemical vapor deposition (CVD). With the precursor Fe

• storage [1][2][3][4]. The most common synthesis method for CNTs is chemical vapor deposition (CVD) [5][6][7][8], in which statistically distributed, metal-containing particles act as catalysts for CNT growth. Thereby, not only does the random position of the catalyst particles determine the position of

• (300:30:30 sccm). (d) Auger electron spectrum of the indicated Fe deposit. SEM micrographs of Fe EBID deposits before and after the chemical vapor deposition (CVD) experiment (1163 K, N2:H2:C2H4 300:30:30 sccm). Fe deposits fabricated with (a) 0.25 nC, (b) 0.5 nC, (c) 1.2 nC electron dose per point. (d

Interface conditions of roughness-induced superoleophilic and superoleophobic surfaces immersed in hexadecane and ethylene glycol

• Yifan Li,
• Yunlu Pan and
• Xuezeng Zhao

Beilstein J. Nanotechnol. 2017, 8, 2504–2514, doi:10.3762/bjnano.8.250

• function layer (thickness ca. 20 nm) by chemical vapor deposition (CVD), one drop (about 0.1 mL) of methyltrichlorosilane (methylsilane, Sigma Aldrich) was placed next to the samples under sealing and left for 10 h. To prepare the superoleophobic surface, the same materials and processes as for

Au nanostructure fabrication by pulsed laser deposition in open air: Influence of the deposition geometry

• Rumen G. Nikov,
• Anna Og. Dikovska,
• Nikolay N. Nedyalkov,
• Georgi V. Avdeev and
• Petar A. Atanasov

Beilstein J. Nanotechnol. 2017, 8, 2438–2445, doi:10.3762/bjnano.8.242

• their fabrication. Such applications require contamination-free nanostructures, suggesting that the development and use of physical nanofabrication methods is further warranted. One of the physical vapor deposition techniques widely applied in bottom-up nanotechnology is pulsed laser deposition (PLD

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• nanostructures have also been used as masks. The patterns of 1D DNA nanotubes and 2D DNA arrays were replicated to metal films by metal evaporation onto the DNA nanostructures and subsequent lift-off of the metal films [31]. Aligned DNA molecular bundles became shadow masks for angled metal vapor deposition and

• the exposed substrate through shadow gaps was etched to generate trenches with linewidths of sub-10 nm resolution [32]. By differentiating the adsorption of water between DNA nanostructures and a SiO2 substrate, the rates of HF vapor-phase etching of the SiO2 substrate [33] and of chemical vapor

• deposition of SiO2 and TiO2 on the DNA nanostructures and the substrate [34] were modulated to replicate the patterns of the DNA nanostructures into those of the inorganic oxides. In both cases, the patterns of the nanostructures were transferred in both positive tone and negative tone at room temperature

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

• Alexandra M. Patron,
• Timothy S. Hooker,
• Daniel F. Santavicca,
• Corey P. Causey and
• Thomas J. Mullen

Beilstein J. Nanotechnol. 2017, 8, 2339–2344, doi:10.3762/bjnano.8.233

• variations in the surface morphology of the Cu-ligated MHDA-C16 bilayers, it seems that the solution deposition of C16 is not suitable for use in the molecular-ruler process, and specifically for producing nanogaps with reproducible uniformity. To overcome this limitation, the vapor deposition of C16 is

• images of a Cu-ligated MHDA-C16 bilayer formed from the solution deposition of MHDA for 18 h and Cu(ClO4)2·6H2O for 5 min followed by vapor deposition of C16 for 1 h at 80 °C. Figure 3C displays a representative cursor profile across several islands as indicated by the red line in Figure 3B. The apparent

• -ligated MHDA decalayers from previous studies [28]. Figure 4B shows an SEM image of the resulting nanogaps from ten iterations of the solution deposition of MHDA and Cu(ClO4)2·6H2O followed by the vapor deposition of C16 at 80 °C for 1 h. Similar higher and lower intensity regions are observed and

Changes of the absorption cross section of Si nanocrystals with temperature and distance

• Michael Greben,
• Petro Khoroshyy,
• Sebastian Gutsch,
• Daniel Hiller,
• Margit Zacharias and
• Jan Valenta

Beilstein J. Nanotechnol. 2017, 8, 2315–2323, doi:10.3762/bjnano.8.231

• of silicon-rich silicon oxynitride (SRON: SiOxNy) with 4.5 nm thickness and of stoichiometric SiO2 (1, 1.6, 2.2 or 2.8 nm thick) on fused silica substrates by plasma-enhanced chemical vapor deposition (PECVD). On top and below the superlattice stack, 10 nm of SiO2 were deposited as a buffer and

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• [1][2][3]. However, they also play an important role in nanotechnology. In fact, a number of organometallic complexes, originally designed for chemical vapor deposition (CVD) purposes, have also been recognized as promising precursors for focused electron beam induced deposition (FEBID), a process to

Vapor-based polymers: from films to nanostructures

• Meike Koenig and
• Joerg Lahann

Beilstein J. Nanotechnol. 2017, 8, 2219–2220, doi:10.3762/bjnano.8.221

• poly(p-xylylenes) via the Gorham process, has been of industrial use in the fabrication of isolating or protective coatings in electronics and biomaterials for many years [1][2]. More recently, vapor deposition polymerization has been extended to a broad variety of reactive polymers [3], additionally

• using techniques such as plasma-, initiated-, or oxidative chemical vapor deposition polymerization [4][5]. The reason for the ongoing interest in this research field is that, analogue to the deposition of inorganic coatings by chemical vapor deposition, the deposition of polymer coatings from the vapor

• deposition, is used as a top layer above an electro-deposited silver coating, ensuring the prolonged release of antibacterial silver ions. Another advantage of vapor deposition techniques is the potential of synthesizing copolymers of chemically or functionally distinct monomers [12]. Alternatively, vapor

A systematic study of the controlled generation of crystalline iron oxide nanoparticles on graphene using a chemical etching process

• Peter Krauß,
• Jörg Engstler and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2017, 8, 2017–2025, doi:10.3762/bjnano.8.202

• Peter Krauss Jorg Engstler Jorg J. Schneider Fachbereich Chemie, Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss Str. 12, 64287 Darmstadt, Germany 10.3762/bjnano.8.202 Abstract Chemical vapor deposition (CVD) of carbon precursors

• on graphene are active in the catalytic growth of carbon nanotubes when employing a water-assisted CVD process. Keywords: carbon nanotubes; chemical vapor deposition; graphene; iron oxide; nanoparticles; Introduction Graphene was first described by Boehm and coworkers in the early 1960s [1][2][3][4

• -down and bottom-up approaches to synthesize and isolate graphene, each having their own advantages and disadvantages [5][6][7][8][9][10][11][12]. The most common route to synthesize continuous, large-area graphene is chemical vapor deposition (CVD) using a carbon precursor on a planar metal catalyst

Bi-layer sandwich film for antibacterial catheters

• Gerhard Franz,
• Florian Schamberger,
• Hamideh Heidari Zare,
• Sara Felicitas Bröskamp and
• Dieter Jocham

Beilstein J. Nanotechnol. 2017, 8, 1982–2001, doi:10.3762/bjnano.8.199

• electrolessly deposited applying Tollens’ reagens, the cap layer is deposited by using chemical vapor deposition. Conclusion: The three main problems of this process, electroless deposition of a fragmented silver film on the surface of an electrically insulating organic polymer, irreproducible evaporation

• , irrespective of whether the catheter is utilized as urethral balloon catheter or as ureteral stent. Due to the high aspect ratio of the catheters (20 to 30 cm in length at with a small lumen of maximal 1 or 3 mm), the only technique to achieve a double-sided coating is chemical vapor deposition (CVD). A

• coating, because it forms the very stable complex [Ag(NH3)2]+, which dissolves a possible precipitate of AgCl [19]. 3. Among the various deposition techniques, chemical vapor deposition (CVD) is known for its outstanding conformal coatings, in particular on three-dimensional substrates. Because the

Growth and characterization of textured well-faceted ZnO on planar Si(100), planar Si(111), and textured Si(100) substrates for solar cell applications

• Chin-Yi Tsai,
• Jyong-Di Lai,
• Shih-Wei Feng,
• Chien-Jung Huang,
• Chien-Hsun Chen,
• Fann-Wei Yang,
• Hsiang-Chen Wang and
• Li-Wei Tu

Beilstein J. Nanotechnol. 2017, 8, 1939–1945, doi:10.3762/bjnano.8.194

• and Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung, Taiwan, R.O.C 10.3762/bjnano.8.194 Abstract In this work, textured, well-faceted ZnO materials grown on planar Si(100), planar Si(111), and textured Si(100) substrates by low-pressure chemical vapor deposition

• replacement for the metal contact in semiconductor devices. When applied to solar cells, it can eliminate the optical shading effect induced by the conventional metal contact thereby effectively increasing solar cell photocurrent and efficiency. Granular ZnO thin films grown by low pressure chemical vapor

• deposition (LPCVD) can act as good TCOs for thin film silicon solar cells [1][2][3][4][5][6][7][8][9][10]. This is mainly due to its high transparency over the visible and near-infrared (NIR) wavelength range, lower electrical resistivity (down to 1 × 10−3 Ω·cm), and the light-trapping capability due to its

Fabrication of carbon nanospheres by the pyrolysis of polyacrylonitrile–poly(methyl methacrylate) core–shell composite nanoparticles

• Dafu Wei,
• Youwei Zhang and
• Jinping Fu

Beilstein J. Nanotechnol. 2017, 8, 1897–1908, doi:10.3762/bjnano.8.190

• batteries [3][4][5], fuel cells [6][7], supercapacitors [8][9], catalysis carriers [10][11], drug delivery [12][13] and adsorption [14][15]. Various techniques, including arc discharge [16], laser ablation [17], chemical vapor deposition [18], and solvothermal method [19], have been developed for the

Laser processing of thin-film multilayer structures: comparison between a 3D thermal model and experimental results

• Babak B. Naghshine and
• Amirkianoosh Kiani

Beilstein J. Nanotechnol. 2017, 8, 1749–1759, doi:10.3762/bjnano.8.176

• <100> coated by an aluminum layer with the thickness of 1 μm. c-silicon wafer <100> coated by a very thin gold layer with a thickness around 100 nm. The thin films were deposited on the surface of the samples using physical vapor deposition technique and the samples were purchased with thin-film

Fluorination of vertically aligned carbon nanotubes: from CF₄ plasma chemistry to surface functionalization

• Claudia Struzzi,
• Mattia Scardamaglia,
• Jean-François Colomer,
• Alberto Verdini,
• Luca Floreano,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2017, 8, 1723–1733, doi:10.3762/bjnano.8.173

• vapor deposition (CCVD) at atmospheric pressure. The catalysts are prepared by magnetron sputtering: a 30 nm Al2O3 buffer layer is deposited on Si wafers with native SiO2 and a 6 nm Fe layer is then deposited to form nanoparticles which catalyse the vCNT growth. Then, the substrate is placed inside the

Effect of the fluorination technique on the surface-fluorination patterning of double-walled carbon nanotubes

• Lyubov G. Bulusheva,
• Yuliya V. Fedoseeva,
• Emmanuel Flahaut,
• Jérémy Rio,
• Christopher P. Ewels,
• Victor O. Koroteev,
• Gregory Van Lier,
• Denis V. Vyalikh and
• Alexander V. Okotrub

Beilstein J. Nanotechnol. 2017, 8, 1688–1698, doi:10.3762/bjnano.8.169

• by catalytic chemical vapor deposition (CCVD) using CH4 (18 mol %) in H2 at 1000 °C and an Mg1−xCoxO solid solution as catalyst [23]. High-resolution transmission electron microscopy (HRTEM) showed that a typical sample consists of ca. 80% DWCNTs, 20% SWCNTs, and a few triple-walled nanotubes. The

Process-specific mechanisms of vertically oriented graphene growth in plasmas

• Subrata Ghosh,
• Shyamal R. Polaki,
• Niranjan Kumar,
• Sankarakumar Amirthapandian,
• Mohamed Kamruddin and
• Kostya (Ken) Ostrikov

Beilstein J. Nanotechnol. 2017, 8, 1658–1670, doi:10.3762/bjnano.8.166

• growth. Plasma-enhanced chemical vapor deposition (PECVD) is one of the most suitable techniques for the transfer-free and catalyst-free growth of VGNs at low temperature [15][16][17][18][19][20]. Various research groups reported the growth mechanism of VGNs during PECVD [21][22][23][24]. In brief, the

• improved the crystallinity and resulted in lower resistivity. Conclusion In summary, plasma-enhanced chemical vapor deposition (PECVD) was employed to conduct a series of controlled growth experiments. The experimental results specify the effects of the growth temperature, plasma power and distance from

Surface functionalization of 3D-printed plastics via initiated chemical vapor deposition

• Christine Cheng and
• Malancha Gupta

Beilstein J. Nanotechnol. 2017, 8, 1629–1636, doi:10.3762/bjnano.8.162

• studied the ability of the initiated chemical vapor deposition (iCVD) process to coat 3D-printed shapes composed of poly(lactic acid) and acrylonitrile butadiene styrene. The thermally insulating properties of 3D-printed plastics pose a challenge to the iCVD process due to large thermal gradients along

• microfluidics. Keywords: 3D printing; chemical vapor deposition; coatings; functional polymers; surface modification; Introduction Three-dimensional printing (3DP) is a useful fabrication technique that offers rapid and low-cost prototyping, high levels of design complexity, and resolution on the micron scale

• SLA-printed objects and wastes unused initiator embedded within the bulk structure. The breadth of materials and feature sizes of 3D-printed objects presents a challenge to finding a universal method for surface functionalization. Initiated chemical vapor deposition (iCVD) is a technique that can be

Parylene C as a versatile dielectric material for organic field-effect transistors

• Tomasz Marszalek,
• Maciej Gazicki-Lipman and
• Jacek Ulanski

Beilstein J. Nanotechnol. 2017, 8, 1532–1545, doi:10.3762/bjnano.8.155

• under the commercial name of parylenes, is unique in many ways. It is a synthetic path for polymer formation, at the same time it belongs to the category of chemical vapor deposition (CVD) and, as such, it yields products in a form of conformal solid films depositing at any surface exposed. As a CVD

Adsorption and electronic properties of pentacene on thin dielectric decoupling layers

• Sebastian Koslowski,
• Daniel Rosenblatt,
• Alexander Kabakchiev,
• Klaus Kuhnke,
• Klaus Kern and
• Uta Schlickum

Beilstein J. Nanotechnol. 2017, 8, 1388–1395, doi:10.3762/bjnano.8.140

• at 1073 K for 5 min. A h-BN layer was grown by chemical vapor deposition (CVD) by heating the Rh(111) sample to 1073 K and exposing it to 110 L of borazine ((HBNH)3) gas. h-BN grows in a self-terminating growth process [22] on the (111) surface of the crystal. The KCl layers on various metal surfaces

Micro- and nano-surface structures based on vapor-deposited polymers

• Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

• Hsien-Yeh Chen Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan 10.3762/bjnano.8.138 Abstract Vapor-deposition processes and the resulting thin polymer films provide consistent coatings that decouple the underlying substrate surface properties and can be

• technology is demonstrated. Keywords: multifunctional; polymer coating; surface modification; surface patterning; vapor deposition; Review Introduction Vapor-based processes of polymer coating/deposition combine many unique attributes in a dry, solvent-free process, and the deposition protocols as well as

• the resulting coatings are mostly applicable to a wide range of substrate materials [1]. In addition, the vapor deposition process typically provides excellent coating fidelity, i.e., the resulting polymer coatings are conformal with respect to micrometer- or nanometer-sized topology of the substrate

Oxidative chemical vapor deposition of polyaniline thin films

• Yuriy Y. Smolin,
• Masoud Soroush and
• Kenneth K. S. Lau

Beilstein J. Nanotechnol. 2017, 8, 1266–1276, doi:10.3762/bjnano.8.128

• Yuriy Y. Smolin Masoud Soroush Kenneth K. S. Lau Department of Chemical and Biological Engineering, Drexel University, Philadelphia, PA 19104, USA 10.3762/bjnano.8.128 Abstract Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony

• can be used for depositing PANI and for effectively controlling the chemical state of PANI. Keywords: conducting polymers; emeraldine oxidation state; oxidative chemical vapor deposition; polyaniline; thin film processing; Introduction Conducting polymers (CPs) have attracted considerable attention

• solvent-based methods becomes considerably more challenging due to the lack of solubility in common commercial solvents, which limits processability and leads to poor wettability. These challenges can be overcome with oxidative chemical vapor deposition (oCVD). oCVD is a single step, solvent-free

Nanotopographical control of surfaces using chemical vapor deposition processes

• Meike Koenig and
• Joerg Lahann

Beilstein J. Nanotechnol. 2017, 8, 1250–1256, doi:10.3762/bjnano.8.126

• .8.126 Abstract In recent years much work has been conducted in order to create patterned and structured polymer coatings using vapor deposition techniques – not only via post-deposition treatment, but also directly during the deposition process. Two-dimensional and three-dimensional structures can be

• achieved via various vapor deposition strategies, for instance, using masks, exploiting surface properties that lead to spatially selective deposition, via the use of additional porogens or by employing oblique angle polymerization deposition. Here, we provide a concise review of these studies. Keywords

• : polymer coatings; polymer structures; structured coatings; vapor deposition polymerization; Review Introduction Polymer coatings have wide-spread applications, from electronics [1], to sensor systems [2] to biotechnology [3]. The ability to spatially control the surface properties in order to further

Preparation of thick silica coatings on carbon fibers with fine-structured silica nanotubes induced by a self-assembly process

• Benjamin Baumgärtner,
• Hendrik Möller,
• Thomas Neumann and
• Dirk Volkmer

Beilstein J. Nanotechnol. 2017, 8, 1145–1155, doi:10.3762/bjnano.8.116

• study is the deposition of nanostructured silica onto the surface of carbon fibers. Among other techniques of covering the carbon fiber surface with a silicon dioxide layer (or other ceramic coatings), the most common ones are chemical vapor deposition (CVD) [4], liquid phase impregnation [5] and sol

• deposition of thick silica coatings onto carbon fibers in the micrometer range. In addition, the silica shell exhibits a fine-structure in the nanometer regime. Both features are not feasible by means of conventional coating procedures such as chemical vapor deposition. The hierarchically and nanostructured