Focused ion beam-induced platinum deposition with a low-temperature cesium ion source

• Thomas Henning Loeber,
• Bert Laegel,
• Meltem Sezen,
• Feray Bakan Misirlioglu,
• Edgar J. D. Vredenbregt and
• Yang Li

Beilstein J. Nanotechnol. 2025, 16, 910–920, doi:10.3762/bjnano.16.69

• surface is a frequently used process of focused ion beam (FIB) systems. Here, we report on the deposition of platinum (Pt) with a new kind of cesium (Cs) FIB, in which the cesium ions are produced by a low-temperature ion source. Platinum was deposited at different acceleration voltages and ion beam

• conditions, but the deposit has lower Pt content for Cs+. The electrical resistivity of the deposit is found to be higher for Cs+ than for Ga+ and decreasing with increasing acceleration voltage. Keywords: cesium ion source; cold atom ion source; focused ion beam (FIB); FIB-induced deposition (FIBID

• ); Introduction The deposition of material at a certain spot on a sample surface is a powerful and useful feature of focused ion beam (FIB) systems. At first, the deposition was used for circuit editing and as a protection layer before milling. Nowadays, the process is more far-reaching, and three-dimensional

Synchrotron X-ray photoelectron spectroscopy study of sodium adsorption on vertically arranged MoS₂ layers coated with pyrolytic carbon

• Alexander V. Okotrub,
• Anastasiya D. Fedorenko,
• Anna A. Makarova,
• Veronica S. Sulyaeva,
• Yuliya V. Fedoseeva and
• Lyubov G. Bulusheva

Beilstein J. Nanotechnol. 2025, 16, 847–859, doi:10.3762/bjnano.16.64

• molybdenum layer sputtered for 90 s. Part of the film surface was covered with a protective Pt layer and a lamella was cut using a focused ion beam (FIB) system (see the Experimental section for details). Figure 1d shows the SEM image of the cross section of the lamella. The bright round spots on the film

High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications

• Michelle Cedillo Rosillo,
• Oscar Contreras López,
• Jesús Antonio Díaz,
• Agustín Conde Gallardo and
• Harvi A. Castillo Cuero

Beilstein J. Nanotechnol. 2025, 16, 690–699, doi:10.3762/bjnano.16.53

• focused ion beam (FIB) for SEM observation; Au films were evaporated on the TaN samples before the FIB process to protect the samples (Figure 6a). The sample in Figure 6b shows a film thickness of 70 nm, and one can distinguish the Au protective layer used for the FIB process. Figure 6c shows the

Nanoscale capacitance spectroscopy based on multifrequency electrostatic force microscopy

• Pascal N. Rohrbeck,
• Lukas D. Cavar,
• Franjo Weber,
• Peter G. Reichel,
• Mara Niebling and
• Stefan A. L. Weber

Beilstein J. Nanotechnol. 2025, 16, 637–651, doi:10.3762/bjnano.16.49

• nanospectroscopy experiments. The microcapacitors were produced by focused ion beam (FIB) milling on a silicon wafer with a 300 nm layer of SiO2 and a 14 nm sputtered layer of Pt on it (Figure 2). Results and Discussion To investigate whether the C″-sensitive detection leads to an improved spatial resolution of

New design of operational MEMS bridges for measurements of properties of FEBID-based nanostructures

• Bartosz Pruchnik,
• Krzysztof Kwoka,
• Ewelina Gacka,
• Dominik Badura,
• Piotr Kunicki,
• Andrzej Sierakowski,
• Paweł Janus,
• Tomasz Piasecki and
• Teodor Gotszalk

Beilstein J. Nanotechnol. 2024, 15, 1273–1282, doi:10.3762/bjnano.15.103

• ). However, parasitic strain can cause unforeseen static changes in the geometry of the RoI. This problem is addressed by focused ion beam (FIB) technology, which can be used as a strain engineering tool. We will refer to MEMS with a formed RoI as operational MEMS, or opMEMS for short. In contrast to

A low-kiloelectronvolt focused ion beam strategy for processing low-thermal-conductance materials with nanoampere currents

• Annalena Wolff,
• Nico Klingner,
• William Thompson,
• Yinghong Zhou,
• Jinying Lin and
• Yin Xiao

Beilstein J. Nanotechnol. 2024, 15, 1197–1207, doi:10.3762/bjnano.15.97

• milling speed but reduced heat damage. Keywords: biological sample; COMSOL; focused ion beam; forward time–centered space (FTCS); heat damage; SRIM; Introduction FIB-SEMs combine a scanning electron microscope (SEM) and a focused ion beam (FIB) in a single instrument and are increasingly used to prepare

Level set simulation of focused ion beam sputtering of a multilayer substrate

• Alexander V. Rumyantsev,
• Nikolai I. Borgardt,
• Roman L. Volkov and
• Yuri A. Chaplygin

Beilstein J. Nanotechnol. 2024, 15, 733–742, doi:10.3762/bjnano.15.61

• ; multilayer substrate; silicon; silicon dioxide; sputtering; Introduction The focused ion beam (FIB) technique is an effective method for surface nanostructuring. It is based on the local removal of material by sputtering with a narrow beam of, typically, gallium ions. This feature of the FIB method makes it

Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• using focused ion beam (FIB) milling and shown as an electron tilt image in Figure 1b, clearly demonstrates the Gaussian shape. For lithography applications, however, both the long tails and the Gaussian cross section are highly undesirable. The tails may form interconnects to neighboring lines, and the

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• -beam bombardment, which initially introduces defects into the graphene structure and then knocks out carbon atoms, although the edges of the fabricated nanostructures remain rough after the process [11]. Other direct techniques, such as focused ion beam (FIB) milling with heavy Ga+ ions, are not

Exploring internal structures and properties of terpolymer fibers via real-space characterizations

• Michael R. Roenbeck and
• Kenneth E. Strawhecker

Beilstein J. Nanotechnol. 2023, 14, 1004–1017, doi:10.3762/bjnano.14.83

• features at different length scales and verify the applicability of analytical structural models used to date. Over the last several years, a “focused ion beam (FIB) notch” technique has been developed and employed to address these gaps in understanding of the internal structures of fibers such as Kevlar

Measurement of polarization effects in dual-phase ceria-based oxygen permeation membranes using Kelvin probe force microscopy

• Kerstin Neuhaus,
• Christina Schmidt,
• Liudmila Fischer,
• Wilhelm Albert Meulenberg,
• Ke Ran,
• Joachim Mayer and
• Stefan Baumann

Beilstein J. Nanotechnol. 2021, 12, 1380–1391, doi:10.3762/bjnano.12.102

• , KPFM measurements were started with an imaging velocity of 1 image per minute to measure the relaxation of the introduced gradient. Electron microscopy The TEM specimens were cut from 60CSO20-FC2O pellets by focused ion beam (FIB) milling using a FEI Strata400 system with Ga ion beam. Further thinning

Chemical vapor deposition of germanium-rich CrGe_x nanowires

• Vladislav Dřínek,
• Stanislav Tiagulskyi,
• Roman Yatskiv,
• Jan Grym,
• Radek Fajgar,
• Věra Jandová,
• Martin Koštejn and
• Jaroslav Kupčík

Beilstein J. Nanotechnol. 2021, 12, 1365–1371, doi:10.3762/bjnano.12.100

• transfer single NWs onto contact lithographic pads (Supporting Information File 1, Figure S9) to measure their conductivity. The NWs, however, turned out to be fragile and were destroyed when an attempt was made to cut them from the tungsten tip using a focused ion beam (FIB). Therefore, a method to

• with the Ga+ focused ion beam (FIB), gas injection system (GIS), and nanomanipulator OmniProbe 400 (Oxford Instruments) with a tungsten tip. The nanomanipulator enabled a direct contact of single as-grown NWs. The current–voltage (I–V) characteristics were measured using a Keithley 237 source

Is the Ne operation of the helium ion microscope suitable for electron backscatter diffraction sample preparation?

• Annalena Wolff

Beilstein J. Nanotechnol. 2021, 12, 965–983, doi:10.3762/bjnano.12.73

• commonly used approach is the focused ion beam (FIB) polishing. Unfortunately, artefacts that can be easily induced by Ga FIB polishing approaches are seldom published. This work aims to provide a better understanding of the underlying causes for artefact formation and to assess if the helium ion

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

Spontaneous shape transition of Mn_xGe_1−x islands to long nanowires

• S. Javad Rezvani,
• Luc Favre,
• Gabriele Giuli,
• Yiming Wubulikasimu,
• Isabelle Berbezier,
• Augusto Marcelli,
• Luca Boarino and
• Nicola Pinto

Beilstein J. Nanotechnol. 2021, 12, 366–374, doi:10.3762/bjnano.12.30

• and 25 mA with a graphite monochromator. Step-scan diffractograms were collected in the 2θ range of 3–70° with 0.02° step and 3 s/step counting time. For HRTEM analysis, focused ion beam (FIB) lamellae were prepared using a dual-beam FIB. The lamellae were oriented along the elongation direction. The

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

• Victor Deinhart,
• Lisa-Marie Kern,
• Jan N. Kirchhof,
• Sabrina Juergensen,
• Joris Sturm,
• Enno Krauss,
• Thorsten Feichtner,
• Sviatoslav Kovalchuk,
• Michael Schneider,
• Dieter Engel,
• Bastian Pfau,
• Bert Hecht,
• Kirill I. Bolotin,
• Stephanie Reich and
• Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

• nanometer range is heavily sought after. One promising candidate for ultraprecise nanofabrication is focused ion beam (FIB) machining. Focused ion beams locally remove material based on physical sputtering with a large degree of flexibility due to advanced beam control. FIB patterning is a direct single

Mapping the local dielectric constant of a biological nanostructured system

• Wescley Walison Valeriano,
• Rodrigo Ribeiro Andrade,
• Juan Pablo Vasco,
• Angelo Malachias,
• Bernardo Ruegger Almeida Neves,
• Paulo Sergio Soares Guimarães and
• Wagner Nunes Rodrigues

Beilstein J. Nanotechnol. 2021, 12, 139–150, doi:10.3762/bjnano.12.11

• . The scanning electron microscopy (SEM) image presented in Figure 2 shows the nanostructured section of a fragment of the red region indicated in Figure 1a. The section was partially polished using a focused ion beam (FIB) and the multilayered structure is clearly visible. The corrugated surface is the

Imaging and milling resolution of light ion beams from helium ion microscopy and FIBs driven by liquid metal alloy ion sources

• Nico Klingner,
• Gregor Hlawacek,
• Paul Mazarov,
• Wolfgang Pilz,
• Fabian Meyer and
• Lothar Bischoff

Beilstein J. Nanotechnol. 2020, 11, 1742–1749, doi:10.3762/bjnano.11.156

• /bjnano.11.156 Abstract While the application of focused ion beam (FIB) techniques has become a well-established technique in research and development for patterning and prototyping on the nanometer scale, there is still a large underused potential with respect to the usage of ion species other than

• In modern nanotechnology, focused ion beam (FIB) techniques are well-established for nanoscale structuring, local surface modification, doping, prototyping, as well as for ion beam analysis. One of the main components of such a FIB system is the ion source providing the needed ion species [1

Oxidation of Au/Ag films by oxygen plasma: phase separation and generation of nanoporosity

• Abdel-Aziz El Mel,
• Said A. Mansour,
• Mujaheed Pasha,
• Atef Zekri,
• Janarthanan Ponraj,
• Akshath Shetty and
• Yousef Haik

Beilstein J. Nanotechnol. 2020, 11, 1608–1614, doi:10.3762/bjnano.11.143

• increased in size (Figure 3e,f). To investigate whether the formed nanoporous microspheres have a hollow interior or not, a cross-section SEM specimen from the sample oxidized for 30 min was prepared using focused ion beam (FIB) (Figure 3e). According to the results, the microspheres were not hollow and the

Fabrication of nano/microstructures for SERS substrates using an electrochemical method

• Jingran Zhang,
• Tianqi Jia,
• Xiaoping Li,
• Junjie Yang,
• Zhengkai Li,
• Guangfeng Shi,
• Xinming Zhang and
• Zuobin Wang

Beilstein J. Nanotechnol. 2020, 11, 1568–1576, doi:10.3762/bjnano.11.139

• ion beam (FIB) technology can also be used to directly fabricate high-precision nanostructures on surfaces made of silicon, silicon dioxide and metal [27][28][29][30][31][32][33]. FIB technology is therefore used as a processing method for SERS substrates. Using the FIB method, Lin et al. [29

• achieved for 4-mercaptobenzoic acid molecules on the arrayed Au nanoholes. However, lithography-based methods have limitations, as they are inefficient and cannot be exploited for mass production. In addition, it is challenging to use the existing methods to fabricate more complex nanostructures. Focused

An atomic force microscope integrated with a helium ion microscope for correlative nanoscale characterization

• Santiago H. Andany,
• Gregor Hlawacek,
• Stefan Hummel,
• Charlène Brillard,
• Mustafa Kangül and
• Georg E. Fantner

Beilstein J. Nanotechnol. 2020, 11, 1272–1279, doi:10.3762/bjnano.11.111

• readout of cantilever deflection. Since then, more advanced and versatile combined instruments have been proposed for a broad spectrum of applications in nanoscale characterization and nanoscale fabrication inside SEM and focused ion beam (FIB) setups [7][8][9][10][11]. Given the extent of the interest

A set of empirical equations describing the observed colours of metal–anodic aluminium oxide–Al nanostructures

• Cristina V. Manzano,
• Jakob J. Schwiedrzik,
• Gerhard Bürki,
• Laszlo Pethö,
• Johann Michler and
• Laetitia Philippe

Beilstein J. Nanotechnol. 2020, 11, 798–806, doi:10.3762/bjnano.11.64

• (yielding to the same porosity), changing only the second anodization time (from 120 to 600 s) to obtain different film thicknesses (from 209 ± 12 nm to 380 ± 15 nm). Focused ion beam (FIB) milling and field-emission scanning electron microscopy (FESEM) imaging were used to accurately determine the

• focused ion beam (FIB) instrument (TESCAN Lyra, Brno, Czech Republic) with a gallium source at 30 kV and 180–400 pA. 2 µm of platinum was deposited to protect the surface prior to FIB cutting. FESEM images were taken in three different areas of the films and three different measurements were carried out

Electromigration-induced directional steps towards the formation of single atomic Ag contacts

• Atasi Chatterjee,
• Christoph Tegenkamp and
• Herbert Pfnür

Beilstein J. Nanotechnol. 2020, 11, 680–687, doi:10.3762/bjnano.11.55

• could not be identified visually nor be reproducibly generated. This contrasts with experiments where the smallest constriction was reduced by one order of magnitude down to about 15 nm using a focused ion beam (FIB), i.e., far below the average grain size in the Ag film, in which complex morphological

Comparison of fresh and aged lithium iron phosphate cathodes using a tailored electrochemical strain microscopy technique

• Matthias Simolka,
• Hanno Kaess and
• Kaspar Andreas Friedrich

Beilstein J. Nanotechnol. 2020, 11, 583–596, doi:10.3762/bjnano.11.46

• spectroscopy (EDS or EDX) it adds chemical information on the elemental distribution to the structural analysis. Further methods that have been applied to study ageing in LFP are X-ray photoelectron spectroscopy (XPS), inductively coupled plasma (ICP), transmission electron microscopy (TEM), focused ion beam

• (FIB) SEM and X-ray absorption near edge structure (XANES) [6][7][8][9][10][11][12][13]. Another technique for post-mortem analysis is atomic force microscopy (AFM). In its basic form, it provides information on the topography of the sample. More advanced AFM modes extract in addition to the topography

Precise local control of liquid crystal pretilt on polymer layers by focused ion beam nanopatterning

• Maxim V. Gorkunov,
• Irina V. Kasyanova,
• Vladimir V. Artemov,
• Alena V. Mamonova and
• Serguei P. Palto

Beilstein J. Nanotechnol. 2019, 10, 1691–1697, doi:10.3762/bjnano.10.164

• appropriate polarized optical interference patterns, induce planar LC alignment with the director rotating within the substrate plane. Recently, we have reported on LC metasurfaces formed due to local transformation of polymer–LC anchoring from planar to vertical by focused ion beam (FIB) [31]. While the