Tailoring of physical properties of RF-sputtered ZnTe films: role of substrate temperature

• Kafi Devi,
• Usha Rani,
• Arun Kumar,
• Divya Gupta and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 333–348, doi:10.3762/bjnano.16.25

• ] carried out studies on the structure and temperature-dependent optical properties of magnetron-sputtered ZnTe films. Bacaksiz et al. [15] reported the effect of substrate temperature (−123 and 27 °C) on structural, morphological, optical, and electrical properties of ZnTe films deposited by evaporation

Various CVD-grown ZnO nanostructures for nanodevices and interdisciplinary applications

• The-Long Phan,
• Le Viet Cuong,
• Vu Dinh Lam and
• Ngoc Toan Dang

Beilstein J. Nanotechnol. 2024, 15, 1390–1399, doi:10.3762/bjnano.15.112

• ], radio-frequency magnetron sputtering [47], pulsed laser ablation [48], and electrodeposition methods [49]. They have many application potentials in dye-sensitized solar cells [46], self-powered energy-harvesting devices [47], photocatalysts [48], and turbid lenses [50]. It has been suggested that the

The role of a tantalum interlayer in enhancing the properties of Fe₃O₄ thin films

• Hai Dang Ngo,
• Vo Doan Thanh Truong,
• Van Qui Le,
• Hoai Phuong Pham and
• Thi Kim Hang Pham

Beilstein J. Nanotechnol. 2024, 15, 1253–1259, doi:10.3762/bjnano.15.101

• . More importantly, changes in grain size and structure due to the effect of the MgO/Ta buffering layers have a strong impact on saturation magnetization and coercivity of Fe3O4 thin films compared to cases of no or just a single buffering layer. Keywords: buffer layer; Fe3O4; magnetite; RF magnetron

• films [11][12][13]. The RF magnetron sputtering technique is extensively utilized because of its cost-effectiveness, simplicity, effectiveness, and capacity to produce Fe3O4 films with remarkable uniformity. The qualities of the films can be modified by manipulating parameters throughout the growth

• structure of Fe3O4 thin films and help to boost the magnetic properties. Experimental RF magnetron sputtering was used at room temperature to grow magnetite films with 40 nm thickness on a variety of substrates, including SiO2, MgO(100), and the multilayer substrate MgO/Ta/SiO2/Si(100). The MgO(100

Synthesis of silver–palladium Janus nanoparticles using co-sputtering of independent sources: experimental and theorical study

• Maria J. Martínez-Carreón,
• Francisco Solís-Pomar,
• Abel Fundora,
• Claudio D. Gutiérrez-Lazos,
• Sergio Mejía-Rosales,
• Hector N. Fernández-Escamilla,
• Jonathan Guerrero-Sánchez,
• Manuel F. Meléndrez and
• Eduardo Pérez-Tijerina

Beilstein J. Nanotechnol. 2024, 15, 808–816, doi:10.3762/bjnano.15.67

• , an original synthesis equipment built by Mantis Ltd. was modified by the inclusion of an additional magnetron in a second chamber, which allowed us to use two monometallic targets to sputter the two metals independently. With this arrangement, we could find appropriate settings at room temperature to

• designed and built by Mantis Ltd., was modified by adding a second magnetron in a different chamber, in contrast to using a bimetallic target, as Pérez-Tijerina and coworkers did [12]. Unlike other synthesis methods, the IGC technique enabled the BNP synthesis at room temperature. Theoretical studies were

• nanoparticles were obtained using a Nanosys 500 system from Mantis Ltd. modified by the addition of a second magnetron in a different chamber to obtain two nanoparticle sources, in a similar manner as described in [13]. In the first magnetron section, Ag atoms were generated from a silver target with 99.99

Effect of repeating hydrothermal growth processes and rapid thermal annealing on CuO thin film properties

• Monika Ozga,
• Eunika Zielony,
• Aleksandra Wierzbicka,
• Anna Wolska,
• Marcin Klepka,
• Marek Godlewski,
• Bogdan J. Kowalski and
• Bartłomiej S. Witkowski

Beilstein J. Nanotechnol. 2024, 15, 743–754, doi:10.3762/bjnano.15.62

• literature. These encompass methods such as molecular beam epitaxy [17][18][19], direct current magnetron sputtering [4][20][21], and pulsed laser deposition [22][23][24]. Alternative approaches involve techniques such as chemical vapor deposition [25][26][27] and atomic layer deposition [28][29][30]. CuO

Controllable physicochemical properties of WO_x thin films grown under glancing angle

• Rupam Mandal,
• Aparajita Mandal,
• Alapan Dutta,
• Rengasamy Sivakumar,
• Sanjeev Kumar Srivastava and
• Tapobrata Som

Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31

• , Alagappa University, Karaikudi 630 003, India Department of Physics, Indian Institute of Technology Kharagpur, Kharagpur 721 302, India 10.3762/bjnano.15.31 Abstract In this work, various physicochemical properties are investigated in nanostructured WOx thin films prepared by radio-frequency magnetron

• thin films were deposited on ultrasonically cleaned p-Si (100) and soda lime glass substrates of 1 × 1 cm2 dimension using a rf magnetron sputtering setup (Excel Instruments). Trichloroethylene, propanol, acetone, and DI water were used to carry out ultrasonication of the substrates for removing

Measurements of dichroic bow-tie antenna arrays with integrated cold-electron bolometers using YBCO oscillators

• Leonid S. Revin,
• Dmitry A. Pimanov,
• Alexander V. Chiginev,
• Anton V. Blagodatkin,
• Viktor O. Zbrozhek,
• Andrey V. Samartsev,
• Anastasia N. Orlova,
• Dmitry V. Masterov,
• Alexey E. Parafin,
• Victoria Yu. Safonova,
• Anna V. Gordeeva,
• Andrey L. Pankratov,
• Leonid S. Kuzmin,
• Anatolie S. Sidorenko,
• Silvia Masi and
• Paolo de Bernardis

Beilstein J. Nanotechnol. 2024, 15, 26–36, doi:10.3762/bjnano.15.3

• based on high-temperature YBCO Josephson junctions [27][28][29]. Long junctions based on YBCO thin films were fabricated by the preliminary topology mask method [30][31]. Specifically, YBCO film was deposited on a 24° [001]-tilt Zr1−xYxO2 bicrystal substrate by magnetron sputtering with preliminary

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

• Joshua Williams,
• Michael I. Faley,
• Joseph Vimal Vas,
• Peng-Han Lu and
• Rafal E. Dunin-Borkowski

Beilstein J. Nanotechnol. 2024, 15, 1–12, doi:10.3762/bjnano.15.1

• magnetron sputtering through the resist aperture. We used DC magnetron sputtering in a pure Ar environment at a pressure of 1 Pa to deposit Py at room temperature. The effective permalloy target had a diameter of 8 mm. The sputtered material almost forms a parallel beam when it approaches the substrate at a

SERS performance of GaN/Ag substrates fabricated by Ag coating of GaN platforms

• Magdalena A. Zając,
• Bogusław Budner,
• Malwina Liszewska,
• Bartosz Bartosewicz,
• Łukasz Gutowski,
• Jan L. Weyher and
• Bartłomiej J. Jankiewicz

Beilstein J. Nanotechnol. 2023, 14, 552–564, doi:10.3762/bjnano.14.46

• substrates using pulsed laser deposition (PLD) and magnetron sputtering (MS) and their evaluation as potential substrates for surface-enhanced Raman spectroscopy (SERS) are reported. Ag layers of comparable thicknesses were deposited using PLD and MS on nanostructured GaN platforms. All fabricated SERS

• : GaN/Ag; magnetron sputtering; nanofabrication; pulsed laser deposition; SERS substrates; surface-enhanced Raman spectroscopy (SERS); Introduction Surface-enhanced Raman spectroscopy (SERS) is a highly sensitive and specific technique with multiplexing capabilities [1][2][3][4]. It is considered for

• [31], gene mutation identification [34][35], and investigations of the reactivity of organic monoradicals [36]. In our previous studies, nanostructured GaN platforms were coated with pure metals or alloys using magnetron sputtering (MS) in an argon atmosphere [28][29][30][31][32]. Until now, no other

A novel approach to pulsed laser deposition of platinum catalyst on carbon particles for use in polymer electrolyte membrane fuel cells

• Bogusław Budner,
• Wojciech Tokarz,
• Sławomir Dyjak,
• Andrzej Czerwiński,
• Bartosz Bartosewicz and
• Bartłomiej Jankiewicz

Beilstein J. Nanotechnol. 2023, 14, 190–204, doi:10.3762/bjnano.14.19

• [27]. Direct deposition of PtNPs can be attained by the use of various physical vapor deposition techniques such as magnetron sputtering [28], sputtering [29], e-beam evaporation [30], dual ion-beam assisted deposition [31], and pulsed laser deposition (PLD) [27][32][33]. Previously, PLD has been used

Combining physical vapor deposition structuration with dealloying for the creation of a highly efficient SERS platform

• Adrien Chauvin,
• Walter Puglisi,
• Damien Thiry,
• Cristina Satriano,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2023, 14, 83–94, doi:10.3762/bjnano.14.10

• complexity and the high cost of gold restrict its use in devices. Here, we report on a novel two-step approach that combines the deposition of a silver–aluminum thin film with dealloying to design and fabricate efficient SERS platforms. The magnetron sputtering technique was used for the deposition of the

• rhodamine B. Keywords: dealloying; magnetron sputtering; nanoporous thin film; nanostructuring; SERS; Introduction Pollutant residues are strictly regulated in most countries to ensure water and food safety. In this context, there is an increasing demand for pollutant analysis tools with practical and

• resulting signal intensity tends to strongly vary due to surface contamination [30]. In this paper, a simple synthesis method to design bimodal porous silver substrate for SERS is reported. Magnetron co-sputtering of a silver and aluminum target was used for the deposition of the precursor alloy thin film

Upper critical magnetic field in NbRe and NbReN micrometric strips

• Zahra Makhdoumi Kakhaki,
• Antonio Leo,
• Federico Chianese,
• Loredana Parlato,
• Giovanni Piero Pepe,
• Angela Nigro,
• Carla Cirillo and
• Carmine Attanasio

Beilstein J. Nanotechnol. 2023, 14, 45–51, doi:10.3762/bjnano.14.5

• Hc2⟂. We have not observed a positive curvature of Hc2⟂(T) near Tc as it was in the case of two-band superconductivity [44] or proximity-coupled superconducting systems [45][46]. Experimental NbRe and NbReN films were sputtered on oxidized Si substrates in a UHV dc magnetron system with base pressure

The influence of structure and local structural defects on the magnetic properties of cobalt nanofilms

• Alexander Vakhrushev,
• Aleksey Fedotov,
• Olesya Severyukhina and
• Anatolie Sidorenko

Beilstein J. Nanotechnol. 2023, 14, 23–33, doi:10.3762/bjnano.14.3

• that are influenced and corrected in the manufacturing process). The previously conducted studies considered the influence of sample parameters (e.g., temperature of the substrate on which the magnetron sputtering of nanofilms takes place, the intensity and deposition direction) on the final properties

Electrical and optical enhancement of ITO/Mo bilayer thin films via laser annealing

• Abdelbaki Hacini,
• Ahmad Hadi Ali,
• Nurul Nadia Adnan and
• Nafarizal Nayan

Beilstein J. Nanotechnol. 2022, 13, 1589–1595, doi:10.3762/bjnano.13.133

• . Experimental IM bilayer thin films were sputtered on n-type silicon(111) substrates for structural, morphological, and electrical characterization. In addition, the bilayer thin films were deposited on glass substrates for optical characterization. This process was performed using RF magnetron sputtering

• (Quorum Q300T D) at 10−4 mbar pressure. The magnetron sputter contains a double target with high purity (approx. 99.99%). The first target is for sputtering ITO (90 wt % In2O3 and 10 wt % SnO2), and the second target is for sputtering Mo. Before deposition, the Si and the glass samples were cut into

• decreased with the increase of laser energy. Consequently, the optimal laser energy can be estimated as 120 mJ for the ITO/Mo bilayer structure from the presented electrical and optical results. Conclusion ITO/Mo bilayer thin film structures were deposited on glass and silicon substrates using RF magnetron

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

• Jānis Sniķeris,
• Vjačeslavs Gerbreders,
• Andrejs Bulanovs and
• Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

• ) magnetron sputtering. The samples were fixed to the SEM stub with colloidal Ag paint. The surface of the samples was irradiated with a focused EB with controlled parameters in point mode using a Tescan MAIA3 SEM (Figure 1a). Several samples were irradiated, each time one of the irradiation parameters was

Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

• Chun-Da Liao,
• Andrea Capasso,
• Tiago Queirós,
• Telma Domingues,
• Fatima Cerqueira,
• Nicoleta Nicoara,
• Jérôme Borme,
• Paulo Freitas and
• Pedro Alpuim

Beilstein J. Nanotechnol. 2022, 13, 796–806, doi:10.3762/bjnano.13.70

• : C4 PMMA; Wafer 2: B2 PMMA). Both wafers started with the patterning of Cr/Au contacts (deposited by magnetron sputtering) using direct-write laser lithography and ion milling. The fabrication of the two wafers followed slightly different steps, as described below. Wafer 1: A stopping layer (Al2O3

Zinc oxide nanostructures for fluorescence and Raman signal enhancement: a review

• Ioana Marica,
• Fran Nekvapil,
• Maria Ștefan,
• Cosmin Farcău and
• Alexandra Falamaș

Beilstein J. Nanotechnol. 2022, 13, 472–490, doi:10.3762/bjnano.13.40

• allowed for the decoration of vertically aligned cone-shaped ZnO nanorods with Ag NPs on their sides and their top ends [35], and magnetron sputtering [7][36]. Electron beam evaporation of, for example, a 30 nm Au layer on ZnO nanopillars arrays [37] or of ZnO-elevated Au dimer nanostructures (Figure 2a,b

• ), respectively [63]. For pure spherical Zn NPs, on average 28 ± 5 nm in diameter, obtained by vacuum magnetron sputtering on molten quartz, the plasmonic resonance is located around 240 and 290 nm, while for ZnO NPs, the maximum is around 360 nm [64]. In addition, ZnO nanosubstrates serve as carriers of Ag or Au

Selected properties of Al_xZn_yO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target

• Witold Posadowski,
• Artur Wiatrowski,
• Jarosław Domaradzki and
• Michał Mazur

Beilstein J. Nanotechnol. 2022, 13, 344–354, doi:10.3762/bjnano.13.29

• magnetron sputtering. A two-element Zn/Al planar target was used as source material prepared in the form of a Zn disc (100 mm diameter) with Al rings pressed into its surface. The sputtering processes were carried out in a mixture of argon and oxygen. The films were deposited with a discharge power of PE

• : aluminium zinc oxide; magnetron sputtering; thin film; transparent conducting oxide; transparent electronics; Introduction Aluminium-doped zinc oxide (AZO) is a potential alternative to indium tin oxide (ITO) for transparent conducting oxide (TCO) electrodes in transparent electronic and photovoltaic

• are strongly desired. Magnetron sputtering is one of the most widely used methods for obtaining thin films with different properties for different purposes and is one of the most commonly used methods for industrial production. However, the manufacturing of AZO thin films is a challenge and requires

A broadband detector based on series YBCO grain boundary Josephson junctions

• Egor I. Glushkov,
• Alexander V. Chiginev,
• Leonid S. Kuzmin and
• Leonid S. Revin

Beilstein J. Nanotechnol. 2022, 13, 325–333, doi:10.3762/bjnano.13.27

• dynamic range by a factor of 5. For typical YBaCuO Josephson junctions fabricated on a ZrYO bicrystal substrate by magnetron deposition, the following parameters were obtained at a temperature of 77 K: responsivity = 9 kV/W; NEP = 3·10−13 W/Hz(1/2); power dynamic range = 1·106. Keywords: array

• meander begins to influence the AFC and to distort it. It is obvious that a decrease in the meander dimensions L1, L2, and L3 leads to a decrease in the described effect. But, in our case, these dimensions were chosen based on the maximum resolution of the standard technology of alignment and magnetron

• this difference is insignificant [3]. Thus, the parameters of the junctions were chosen as typical for bicrystal JJs fabricated by magnetron deposition [24][25][31][32][33]: Ic = 100 μA, RN = 5 Ω, C = 0.02 pF. The antenna parameters were chosen based on the impedance calculation using the relations Re

Investigation of a memory effect in a Au/(Ti–Cu)Ox-gradient thin film/TiAlV structure

• Damian Wojcieszak,
• Jarosław Domaradzki,
• Michał Mazur,
• Tomasz Kotwica and
• Danuta Kaczmarek

Beilstein J. Nanotechnol. 2022, 13, 265–273, doi:10.3762/bjnano.13.21

• analysis of resistive switching properties observed in a Au/(Ti–Cu)Ox/TiAlV structure with a gradient distribution of Cu and Ti along the (Ti–Cu)Ox thin film thickness. Thin films were prepared via multisource reactive magnetron co-sputtering. The programmed profile of the pulse width modulation

• investigations allowed us to conclude about the possible mechanism for the observed resistive switching mechanism. Keywords: gradient thin film; magnetron sputtering; memory effect; resistive switching; Introduction In recent years, significant development has been observed in design, simulation, manufacturing

• -sectional elemental analysis. Experimental The deposition system and the method for the preparation of gradient thin films have already been described in detail in [41][42][43][44][45]. The thin films were deposited via reactive magnetron co-sputtering, using two circular titanium targets (99.995%) and one

Influence of magnetic domain walls on all-optical magnetic toggle switching in a ferrimagnetic GdFe film

• Rahil Hosseinifar,
• Evangelos Golias,
• Ivar Kumberg,
• Quentin Guillet,
• Karl Frischmuth,
• Sangeeta Thakur,
• Mario Fix,
• Manfred Albrecht,
• Florian Kronast and
• Wolfgang Kuch

Beilstein J. Nanotechnol. 2022, 13, 74–81, doi:10.3762/bjnano.13.5

• thickness, deposited at room temperature using magnetron sputtering (base pressure <10−8 mbar) from elemental targets. The Ar sputter pressure was kept constant at 3.5 × 10−3 mbar during the deposition process. The film was prepared with 5 nm Pt as a seed layer on a Si(100) substrate with a 100 nm thick

Sputtering onto liquids: a critical review

• Anastasiya Sergievskaya,
• Adrien Chauvin and
• Stephanos Konstantinidis

Beilstein J. Nanotechnol. 2022, 13, 10–53, doi:10.3762/bjnano.13.2

• colloidal synthesis, the review contains chapters explaining the basics of (magnetron) sputter deposition and the formation of NPs in solution. This review article covers more than 132 papers published on this topic from 1996 to September 2021 and aims at providing a critical analysis of most of the

• overview of the properties and applications of the produced NPs. Keywords: low-pressure plasmas; magnetron; nanoparticles; nanoparticle formation; sputtering; sputtering onto liquids; Introduction According to the general terminology, nanoparticles (NPs) are objects that have a size of less than 100 nm

• the target, to generate a magnetic field in the target vicinity thus promoting magnetron sputtering (MS) cathode systems. Typical MS cathodes consist of a magnet placed at the center of the target and magnets with opposite poles on the target periphery. This configuration is schematically presented in

Nonmonotonous temperature dependence of Shapiro steps in YBCO grain boundary junctions

• Leonid S. Revin,
• Dmitriy V. Masterov,
• Alexey E. Parafin,
• Sergey A. Pavlov and
• Andrey L. Pankratov

Beilstein J. Nanotechnol. 2021, 12, 1279–1285, doi:10.3762/bjnano.12.95

• discussed, and the measurement results are compared with the results of numerical calculations. Experimental Setup and Numerical Model The samples of grain boundary Josephson junctions were fabricated by on-axis dc magnetron sputtering [28][29][30][31] of YBa2Cu3O7−δ (YBCO) film on the surface of 24°[001

Plasmon-enhanced photoluminescence from TiO₂ and TeO₂ thin films doped by Eu³⁺ for optoelectronic applications

• Marcin Łapiński,
• Jakub Czubek,
• Katarzyna Drozdowska,
• Anna Synak,
• Wojciech Sadowski and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2021, 12, 1271–1278, doi:10.3762/bjnano.12.94

• thermal annealing of the gold thin film. Thermal dewetting of gold film results in spherical gold nanostructures with average dimensions of 50 nm. Both, luminescent TiO2:Eu and TeO2:Eu films were deposited by RF magnetron sputtering from mosaic targets. The morphology of the gold nanostructures was

• ethanol and dried at 50 °C. Plasmonic nanostructures were prepared by thermal dewetting of gold thin films. Thin Au films with a thickness of 2.8 nm were deposited using a tabletop DC magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products, 99.999%) at a pressure of 0.2 Pa

• was conducted at 200 °C. The second kind of dielectric layer was TiO2. It was prepared by radio frequency (RF) reactive magnetron sputtering using an Omicron Nanotechnology four targets sputter system. A Ti target (99.9%) was sputtered in an argon–oxygen atmosphere (Ar/O2 flow ratio: 5 sccm:30 sccm

Uniform arrays of gold nanoelectrodes with tuneable recess depth

• Elena O. Gordeeva,
• Ilya V. Roslyakov,
• Alexey P. Leontiev,
• Alexey A. Klimenko and
• Kirill S. Napolskii

Beilstein J. Nanotechnol. 2021, 12, 957–964, doi:10.3762/bjnano.12.72

• deposited by magnetron sputtering onto the bottom side of the AAO template. Electrodeposition of metals into channels of the AAO template was performed in a three-electrode cell with an electrodeposition area of 0.2 cm2 and a volume of 50 mL at room temperature in a potentiostatic mode. A platinum ring