Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• Lukas Keller Michael Huth Institute of Physics, Goethe University, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany 10.3762/bjnano.9.240 Abstract Fabrication of three-dimensional (3D) nanoarchitectures by focused electron beam induced deposition (FEBID) has matured to a level that highly

• different precursors are presented that validate the effectiveness of the implementation. Keywords: focused electron beam induced deposition; nanofabrication; three-dimensional nanostructures; 1 Introduction New physical effects and functionalities can arise when the third dimension can be accessed at the

• plating [7], to name a few. In this work, focused electron beam induced deposition [8] (FEBID) is used as a mask-less direct-writing technique that allows for the deposition of structures with a resolution of less than 10 nm in 2D [9][10]. The working principle of FEBID is as follows: A substrate, or any

High-throughput micro-nanostructuring by microdroplet inkjet printing

• Hendrikje R. Neumann and
• Christine Selhuber-Unkel

Beilstein J. Nanotechnol. 2018, 9, 2372–2380, doi:10.3762/bjnano.9.222

• ]. Using electron-beam lithography, it is possible to generate such patterns with very high spatial precision [5]. Focused electron beam induced deposition (FEBID) even serves as a method to deposit 3D nanostructures without the need of masks [6]. A further and very successful method to write gold

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• beams can be used to induce, on a very small area, chemical reactions of adsorbed precursor molecules that either lead to etching of the underlying surface or deposition of material. The latter additive variant of FEBIP is focused electron beam induced deposition (FEBID), a powerful direct-write

• different purification protocols. Recent advancements of such processes are reported in this Thematic Series. This includes a laser-assisted electron beam induced deposition (LAEBID) process in which the laser initiates an additional reaction during deposit growth, which may be further enhanced by

Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• absorbers, and high-temperature and chemically resistant ceramics. In this article, the first investigation into the deposition of boron-based material via electron beam-induced deposition (EBID) is reported. Thin films were deposited using a novel, large-area EBID system that is shown to deposit material

• process and the potential for EBID as a scalable fabrication technique that could have a transformative effect on the athermal deposition of materials. Keywords: boron oxide; diffusion and growth; electron beam-induced deposition; surface reactions; trimethyl borate; Introduction Applications for boron

• demonstrated for a wide range of materials is electron beam-induced deposition (EBID) [6]. It avoids instabilities related to thermal- and mass-transport by overcoming the activation barrier for material deposition via electron-induced dissociation of surface-adsorbed precursor molecules into atomic or

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that

• decomposed by the electron beam and become visible as a darkening of the irradiated area [1]. By introducing a volatile precursor gas into the vacuum chamber [2][3] this focused electron beam induced deposition (FEBID) enables the fabrication of three-dimensional structures with nanometer precision [4]. The

• by FEBID, typically a metal-organic precursor is used, which frequently results in a carbonaceous matrix with small metal inclusions [8]. Fabrication of copper-containing deposits by electron beam induced deposition was shown with Cu(I) and Cu(II) precursors containing the ligand

Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition

• Federico Venturi,
• Gian Carlo Gazzadi,
• Amir H. Tavabi,
• Alberto Rota,
• Rafal E. Dunin-Borkowski and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2018, 9, 1040–1049, doi:10.3762/bjnano.9.97

• nanowires (NWs) and square nanorings, which were deposited by focused electron beam induced deposition (FEBID) of a Co carbonyl precursor, are studied using off-axis electron holography (EH), Lorentz transmission electron microscopy (L-TEM) and magnetic force microscopy (MFM). EH shows that NWs deposited

• at remanence using L-TEM and MFM. Our results confirm the suitability of FEBID for nanofabrication of magnetic structures and demonstrate the versatility of TEM techniques for the study and manipulation of magnetic domain walls in nanostructures. Keywords: focused electron beam induced deposition

• focused electron beam induced deposition (FEBID) of Co carbonyl (Co2(CO)8). This is a direct-write technique performed in a scanning electron microscope (SEM) equipped with a gas injector system (GIS) [9]. It exploits secondary electron emission resulting from interaction of the primary electron beam with

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• , Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland 10.3762/bjnano.9.78 Abstract Carboxylates constitute an extremely promising class of precursor compounds for the electron beam induced deposition of silver. In this work both silver 2,2-dimethylbutyrate and silver

• towards the direct electron beam writing of three-dimensional plasmonic device parts from the gas phase. Keywords: carboxylate; electron beam induced deposition; silver; three-dimensional nanostructures; vertical growth rate; Introduction Focused electron beam induced deposition (FEBID) is a resistless

• . Furthermore, the electron beam induced deposition of silver is challenging. Many potential precursor candidates have to be heated above 100 °C and show extremely low vapor pressures [22][23][24][25]. This is related to the main oxidation state of +1 for silver, which severely limits the possibility to attach

Dynamics and fragmentation mechanism of (C₅H₄CH₃)Pt(CH₃)₃ on SiO₂ surfaces

• Kaliappan Muthukumar,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2018, 9, 711–720, doi:10.3762/bjnano.9.66

• the initial orientation of the molecule and the distribution of surface active sites. Based on the observations from the simulations and available experiments, we discuss possible dissociation channels of the precursor. Keywords: deposition; dissociation; electron beam induced deposition (EBID

• ); focused electron beam induced deposition (FEBID); precursor; trimethyl(methylcyclopentadienyl)platinum(IV) ((CH3-C5H4)Pt(CH3)3); Introduction Nanoscale device applications require a growth of regular or specially patterned transition metal nanodeposits. Electron beam induced deposition (EBID), is a size

• , it can be speculated that a design of suitable precursors for electron beam induced deposition might be more efficient than the use of traditional ALD precursors. With our reaction modeling studies, possible pathways by which the precursor molecule can fragment on SiO2 surfaces were also explored

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• with 500 eV electrons, and its performance in focused electron beam induced deposition (FEBID) at room temperature under HV conditions. The performance of this precursor in FEBID is poor, resulting in maximum metal content of 26 atom % under optimized conditions. Furthermore, the Ru/Fe ratio in the

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

• complex geometries [1][2]. Focused electron beam induced deposition (FEBID) is a powerful technique relying on the decomposition of transiently adsorbed precursors under low vacuum conditions [3]. Different strategies have been used to identify suitable precursors for this process, which relies on

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• latter, reactive chemical species (radicals) and electrons lead to activation of molecules and this process can be controlled well on large scales. One of the most innovative techniques, known as EBID or FEBID (Focused Electron Beam Induced Deposition) [2][3], uses a high energy electron beam that can be

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• Physics and Applied Computer Science, Al. Mickiewicza 30, 30-059 Kraków, Poland 10.3762/bjnano.9.24 Abstract Focused electron beam induced deposition (FEBID) is a flexible direct-write method to obtain defined structures with a high lateral resolution. In order to use this technique in application fields

• , silver crystal growth presents a strong dependency on electron dose and precursor refreshment. Keywords: focused electron beam induced deposition; low volatility precursor; silver; Introduction The fabrication of defined patterns in the nanometer regime demands techniques with high lateral resolution

• and preferably as few processing steps as possible. Therefore, a maskless direct-write method would be favorable in comparison to common resist-based lithography techniques, which require multiple steps and are reaching their lateral resolution limits. Focused electron beam induced deposition (FEBID

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• storage, ferroelectric tunnel junction memristors, metal interconnects for high performance integrated circuits in microelectronics and nano-optics applications, especially in the areas of plasmonics and metamaterials. Focused-electron-beam-induced deposition (FEBID) is a maskless direct-write tool

• removing the carbon matrix and drastically reducing the electrical resistance of the deposit. Keywords: copper; gold; cobalt; focused-electron-beam-induced deposition; noble metal; non-noble metals; post-growth annealing; Introduction Focused-electron-beam-induced deposition (FEBID) constitutes a well

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• Division, Richland, WA, USA Siedlce University, Faculty of Sciences, 4 Maja 54, 08-110 Siedlce, Poland 10.3762/bjnano.9.10 Abstract Focused electron beam induced deposition (FEBID) is a versatile tool for the direct-write fabrication of nanostructures on surfaces. However, FEBID nanostructures are usually

• deposition; nanostructure purification; platinum precursor; Introduction Focused electron beam induced deposition (FEBID) produces solid nanomaterials with size down to the sub-10 nm regime by decomposing precursor molecules adsorbed on a surface under a tightly focused high-energy electron beam [1

• insights into the chemistry that occurs during purification of FEBID nanostructures with implications also for the stability of the carbonaceous matrix of nanogranular FEBID materials under humid conditions. Keywords: carbon contamination; electron induced reactions; focused electron beam induced

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• 10.3762/bjnano.9.8 Abstract Background: Focused electron beam induced deposition (FEBID) allows for the deposition of free standing material within nanometre sizes. The improvement of the technique needs a combination of new precursors and optimized irradiation strategies to achieve a controlled

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• , Cambridge CB21EZ, UK (fax: (+44)1223-336-033; email: deposit@ccdc.cam.ac.uk) (a) A schematic drawing of the focused electron beam induced deposition. (b) A Fokke and Sukke cartoon. Reproduced with permission of Reid, Geleijnse & Van Tol. (c) The cartoon in panel (b) written on an electron-transparent

Synthesis of [{AgO₂CCH₂OMe(PPh₃)}_n] and theoretical study of its use in focused electron beam induced deposition

• Jelena Tamuliene,
• Julian Noll,
• Peter Frenzel,
• Tobias Rüffer,
• Alexander Jakob,
• Bernhard Walfort and
• Heinrich Lang

Beilstein J. Nanotechnol. 2017, 8, 2615–2624, doi:10.3762/bjnano.8.262

• beam induced deposition (FEBID) is a cost efficient direct resist-free chemical vapor deposition technique producing free-standing 3D metal-containing nanoscale structures in a single step on, for example, surfaces of sub-10 nm size using a variety of materials with a high degree of spatial and time

• O2CCH2OMe− is generated, further following the first fragmentation route. However, at 1.3 eV the initial step is decarboxylation giving [AgCH2OMe(PPh3)], followed by Ag–P and Ag–C bond cleavages. Keywords: DFT; DSC; FEBID; silver(I) carboxylate; solid-state structure; TGA; Introduction Focused electron

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• morphology, for example, as individual nanotubes or as CNT forests. Electron beam induced deposition (EBID) with subsequent autocatalytic growth (AG) was applied to lithographically produce catalytically active seeds for the localized growth of CNTs via chemical vapor deposition (CVD). With the precursor Fe

• ; electron beam induced deposition; focused electron beam induced processing; iron pentacarbonyl; nanofabrication; Introduction Carbon nanotubes (CNTs) have attracted enormous interest due to their potential as functional building blocks in applications such as molecular electronics, sensors and energy

• . In the present work, we used the so-called electron beam induced deposition (EBID) method as the FEBIP technique in which adsorbed precursor molecules are locally dissociated by the impact of the electron beam and leave a deposit of the nonvolatile dissociation products [16][17][18]. In this regard

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2591–2591, doi:10.3762/bjnano.8.259

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.259 Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir

Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)₆)

• Jusuf M. Khreis,
• João Ameixa,
• Filipe Ferreira da Silva and
• Stephan Denifl

Beilstein J. Nanotechnol. 2017, 8, 2583–2590, doi:10.3762/bjnano.8.258

• compounds can be used as a precursor to deposit metals on a surface. The conventional lithography techniques are approaching the limits of spatial resolution [1], therefore it is crucial to search and improve new methods and techniques for future technological requirements. Focused electron beam induced

• deposition (FEBID) can be considered an assisted chemical vapour deposition (CVD) technique. However, in the former case the organometallic precursor is not fragmented by thermal energy but instead by a high-energy electron beam. The precursor molecules are delivered to the substrate in the gas phase and

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• microstructures can be fabricated by one-step direct-write lithography process using focused electron beam induced deposition (FEBID). Typically, as-deposited gold nanostructures suffer from a low Au content and unacceptably high carbon contamination. We show that the undesirable carbon contamination can be

• direct writing of purer gold nanostructures that can enable their future use for demanding applications. Keywords: FEBID; gold nanostructures; oxygen plasma; postdeposition purification; Introduction Focused electron beam induced deposition (FEBID) is an additive direct-write method for making complex

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• from PtCl2 deposits created from cis-Pt(CO)2Cl2 by focused electron beam induced deposition (FEBID) is evaluated. Auger electron spectroscopy (AES) and energy-dispersive X-ray spectroscopy (EDS) measurements as well as thermodynamics calculations support the idea that electrons can remove chlorine from

• of AO restricts its effectiveness as a purification strategy to relatively small nanostructures. Keywords: atomic hydrogen; atomic oxygen; electron beam processing; focused electron beam induced deposition (FEBID); purification; Introduction Focused electron beam induced deposition (FEBID) has

• Me2Au(tfac) with co-deposition of water vapor resulted in Au FEBID nanostructures with the highest conductivity achieved to date (resistivity of 8.8 μΩ cm, compared with 2.2 μΩ cm for pure Au [12]). Another recent purification method is laser-assisted electron beam induced deposition (LAEBID) [24

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

• /bjnano.8.237 Abstract We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds

• attachment; dissociative ionization; electron beam induced deposition; low-energy electrons; silacyclohexane; Introduction Focused electron beam induced deposition (FEBID) [1][2] is a 3-D direct writing method suitable for the fabrication of nanostructures, even on non-planar surfaces. This approach is in

• many ways complementary to current mask-based lithography methods and has high potential in areas where these are not applicable. Focused electron beam induced deposition is based on the exposure of precursor molecules, physisorbed on a substrates surface, to a narrowly focused high-energy electron

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• [1][2][3]. However, they also play an important role in nanotechnology. In fact, a number of organometallic complexes, originally designed for chemical vapor deposition (CVD) purposes, have also been recognized as promising precursors for focused electron beam induced deposition (FEBID), a process to

Comprehensive investigation of the electronic excitation of W(CO)₆ by photoabsorption and theoretical analysis in the energy region from 3.9 to 10.8 eV

• Mónica Mendes,
• Khrystyna Regeta,
• Filipe Ferreira da Silva,
• Nykola C. Jones,
• Søren Vrønning Hoffmann,
• Gustavo García,
• Chantal Daniel and
• Paulo Limão-Vieira

Beilstein J. Nanotechnol. 2017, 8, 2208–2218, doi:10.3762/bjnano.8.220

• of relevance to estimate neutral dissociation cross sections of W(CO)6, a precursor molecule in focused electron beam induced deposition (FEBID) processes, from electron scattering measurements. Keywords: cross sections; density functional theory (DFT) calculations; focused electron beam induced

• *-orbitals, which play a significant role in the stability of carbonyl complexes, and in particular for W(CO)6 where the tungsten oxidation state is zero. W(CO)6 is a precursor molecule used in electron beam induced deposition (EBID) to produce well-defined tungsten-containing nanostructures [21][22

• initio molecular dynamics simulations of focused electron beam induced deposition (FEBID) precursor molecules adsorbed on fully and partially hydroxylated SiO2 surfaces [24]. Electron-induced reactions in FEBID processes are initiated by low-energy secondary electrons rather than the high-energy primary

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.214 Abstract In this work, the continuum model for focused electron beam induced deposition (FEBID) is generalized to account for multilayer

• deposition; 3D nanoprinting; Langmuir model; Introduction Focused electron beam induced deposition (FEBID) is a direct-write nanolithography technique, based on the local decomposition of gas molecules adsorbed on a substrate and induced by the interaction with a focused beam of electrons [1][2][3]. FEBID

• types of growth regimes are possible for FEBID under no diffusion, resulting into four types of adsorption isotherms. We propose the use of these maps as a powerful tool for the analysis of FEBID processes. Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced