Nanocomposite–parylene C thin films with high dielectric constant and low losses for future organic electronic devices

• Marwa Mokni,
• Gianluigi Maggioni,
• Abdelkader Kahouli,
• Sara M. Carturan,
• Walter Raniero and
• Alain Sylvestre

Beilstein J. Nanotechnol. 2019, 10, 428–441, doi:10.3762/bjnano.10.42

• deposition and RF-magnetron sputtering for silver deposition. This method yields good dispersion of Ag-containing nanoparticles inside the parylene C polymer matrix. Film composition and structure were studied by using several techniques. It was found that the plasma generated by the RF-magnetron reactor

• increase the dielectric constant of NCPC without degrading its dielectric losses. In this context, this work presents a new strategy to synthesize nanocomposite parylene C materials by a combination of two processes, CVD and RF-magnetron sputtering. The NCPC properties are analyzed in detail by different

• ) and the inorganic compond (silver-containing nanoparticles). This method consists of two associated processes, i.e., primary vacuum-CVD and RF-magnetron sputtering. The deposition process of NCPC involves three successive operations. The process begins with the deposition of parylene C. Some hundreds

Geometrical optimisation of core–shell nanowire arrays for enhanced absorption in thin crystalline silicon heterojunction solar cells

• Robin Vismara,
• Olindo Isabella,
• Andrea Ingenito,
• Fai Tong Si and
• Miro Zeman

Beilstein J. Nanotechnol. 2019, 10, 322–331, doi:10.3762/bjnano.10.31

• , a 100 nm thick transparent tin-doped indium oxide (In2O3:Sn, ITO) was deposited at low power and low temperature, using radio-frequency (RF) magnetron sputtering. The cell area was defined as 5 mm × 5 mm, using a mask during ITO deposition. The reported equivalent thickness values of thin films on

Zn/F-doped tin oxide nanoparticles synthesized by laser pyrolysis: structural and optical properties

• Florian Dumitrache,
• Iuliana P. Morjan,
• Elena Dutu,
• Ion Morjan,
• Claudiu Teodor Fleaca,
• Monica Scarisoreanu,
• Alina Ilie,
• Marius Dumitru,
• Cristian Mihailescu,
• Adriana Smarandache and
• Gabriel Prodan

Beilstein J. Nanotechnol. 2019, 10, 9–21, doi:10.3762/bjnano.10.2

• atom %) made by spray pyrolysis showing high transparency and bandgap values between 3.86 and 4.45 eV have also been reported [32]. Other researchers have used radio frequency magnetron sputtering of mixed 30 wt % ZnO and 70 wt % SnO2 targets to obtain similar FZTO films, yet their reported different

Site-controlled formation of single Si nanocrystals in a buried SiO₂ matrix using ion beam mixing

• Xiaomo Xu,
• Thomas Prüfer,
• Daniel Wolf,
• Hans-Jürgen Engelmann,
• Lothar Bischoff,
• René Hübner,
• Karl-Heinz Heinig,
• Wolfhard Möller,
• Stefan Facsko,
• Johannes von Borany and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2018, 9, 2883–2892, doi:10.3762/bjnano.9.267

• -oxide-semiconductor (CMOS) technology and thus have yet to be integrated into a cost-efficient Si-based technology. Multiple methods have been proposed and optimized for Si NC fabrication, including plasma-enhanced chemical vapor deposition (PECVD) [4][10], magnetron sputtering [11][12], laser-induced

Optimization of Mo/Cr bilayer back contacts for thin-film solar cells

• Nima Khoshsirat,
• Fawad Ali,
• Vincent Tiing Tiong,
• Mojtaba Amjadipour,
• Hongxia Wang,
• Mahnaz Shafiei and
• Nunzio Motta

Beilstein J. Nanotechnol. 2018, 9, 2700–2707, doi:10.3762/bjnano.9.252

• chromium (Cr) adhesion layer is used as the back contact for a copper zinc tin sulfide (CZTS) thin-film solar cell on a SLG substrate. DC magnetron sputtering is used for deposition of Mo and Cr films. The conductivity of Mo/Cr bilayer films, their microstructure and surface morphology are studied at

• substrate using a Kurt J. Lesker PVD75 DC magnetron sputtering system operated at 40 W and 10 mTorr for 10 min, from a 2 inch Cr target (Kurt J. Lesker, 99.95% purity). The Mo layer was deposited on uncoated and Cr-coated substrates by using a 2 inch Mo target (Kurt J. Lesker, 99.95% purity) at different

Au–Si plasmonic platforms: synthesis, structure and FDTD simulations

• Anna Gapska,
• Marcin Łapiński,
• Paweł Syty,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241

• . Experimental Au nanostructures were prepared on Si(111) as a substrate. The substrates (1 × 1 cm2 of area) were cleaned with acetylacetone and then rinsed in ethanol. Thin Au films (with thicknesses in a range of 1.7–5.0 nm) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica

Exploring the photoleakage current and photoinduced negative bias instability in amorphous InGaZnO thin-film transistors with various active layer thicknesses

• Dapeng Wang and
• Mamoru Furuta

Beilstein J. Nanotechnol. 2018, 9, 2573–2580, doi:10.3762/bjnano.9.239

• thicknesses were prepared by magnetron sputtering. The initial electrical properties and the photoleakage current of a-IGZO TFTs with various active layer thicknesses were investigated. The subthreshold value slightly increased while the threshold voltage (Vth) and mobility (μ) decreased with increasing TIGZO

• at 160 °C from a sintered IGZO ceramic target by DC magnetron sputtering with a mixed gas of Ar/O2 = 29.4/0.6 sccm at a deposition pressure of 1 Pa. After patterning of the IGZO films as the active channel, a SiOx etch-stopper (200 nm), source and drain electrodes, and a 200 nm-thick SiOx passivation

Thickness-dependent photoelectrochemical properties of a semitransparent Co₃O₄ photocathode

• Malkeshkumar Patel and
• Joondong Kim

Beilstein J. Nanotechnol. 2018, 9, 2432–2442, doi:10.3762/bjnano.9.228

• -Aldrich, sheet resistance of 7 Ω/sq) and a glass microscope slide were used as substrates. These were cleaned using a sequence of isopropyl alcohol, acetone and distilled water using ultrasonication. Then, various thicknesses of Co films were deposited using a dc magnetron sputtering system (dc power ca

ZnO-nanostructure-based electrochemical sensor: Effect of nanostructure morphology on the sensing of heavy metal ions

• Marina Krasovska,
• Vjaceslavs Gerbreders,
• Irena Mihailova,
• Andrejs Ogurcovs,
• Eriks Sledevskis,
• Andrejs Gerbreders and
• Pavels Sarajevs

Beilstein J. Nanotechnol. 2018, 9, 2421–2431, doi:10.3762/bjnano.9.227

• carried out with the LAB18 thin film deposition system (Kurt J. Lesker, USA) in DC magnetron sputtering mode. As a result, a set of electrodes consisted of four mutually separated planar elements, as illustrated in Figure 1. All of the manipulations described below were carried out using a metal mask

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• 620 equipment situated into a cleanroom class 100 (ISO EN 14644) with RF magnetron sputtering and thermal vacuum evaporation (using TECTRA equipment). Thus, to contact single Ni–Cu alloy nanowires using a typical EBL process (Zeiss Merlin Compact field-emission scanning electron microscope combined

• , the deposition of Ti and Au contacts (100/200 nm) by RF magnetron sputtering and thermal vacuum evaporation, respectively, was performed. Individual contacted Ni–Cu alloy nanowires are thus obtained. The main steps of the EBL process are shown in Figure 8. The morphological and compositional

Influence of the thickness of an antiferromagnetic IrMn layer on the static and dynamic magnetization of weakly coupled CoFeB/IrMn/CoFeB trilayers

• Deepika Jhajhria,
• Dinesh K. Pandya and
• Sujeet Chaudhary

Beilstein J. Nanotechnol. 2018, 9, 2198–2208, doi:10.3762/bjnano.9.206

• (10 nm) were deposited at room temperature using pulsed-DC magnetron sputtering on naturally oxidized Si wafers with Ta (5 nm) seed and cap layers. The base pressure and working pressure of deposition were 2·10−7 and 4·10−3 Torr, respectively. The thickness tIrMn was systematically varied in 1 nm

Electrospun one-dimensional nanostructures: a new horizon for gas sensing materials

• Muhammad Imran,
• Nunzio Motta and
• Mahnaz Shafiei

Beilstein J. Nanotechnol. 2018, 9, 2128–2170, doi:10.3762/bjnano.9.202

A scanning probe microscopy study of nanostructured TiO₂/poly(3-hexylthiophene) hybrid heterojunctions for photovoltaic applications

• Laurie Letertre,
• Roland Roche,
• Olivier Douhéret,
• Hailu G. Kassa,
• Denis Mariolle,
• Nicolas Chevalier,
• Łukasz Borowik,
• Philippe Dumas,
• Benjamin Grévin,
• Roberto Lazzaroni and
• Philippe Leclère

Beilstein J. Nanotechnol. 2018, 9, 2087–2096, doi:10.3762/bjnano.9.197

• knowledge, this joint KPFM/PC-AFM study of such a nanostructured array of TiO2 columns sensitized with functionalized P3HT-COOH constitutes a novel result of interest from both a theoretical and material design perspectives. Materials and Methods The TiO2 layers were synthesized by magnetron sputtering in

Synthesis of hafnium nanoparticles and hafnium nanoparticle films by gas condensation and energetic deposition

• Irini Michelakaki,
• Nikos Boukos,
• Dimitrios A. Dragatogiannis,
• Spyros Stathopoulos,
• Costas A. Charitidis and
• Dimitris Tsoukalas

Beilstein J. Nanotechnol. 2018, 9, 1868–1880, doi:10.3762/bjnano.9.179

• study the fabrication and characterization of hafnium nanoparticles and hafnium nanoparticle thin films. Hafnium nanoparticles were grown in vacuum by magnetron-sputtering inert-gas condensation. The as deposited nanoparticles have a hexagonal close-packed crystal structure, they possess truncated

• nanoindentation measurements, were utilized for their characterization. Hf nanoparticles were fabricated by magnetron sputtering inert-gas condensation. They exhibit a hexagonal close-packed crystal structure and the shape of truncated hexagonal biprisms, and form core–shell structures upon exposure to ambient

• the aggregation and deposition chamber, respectively. The nanoparticles are produced in the aggregation chamber, which contains a dc magnetron sputtering source. In the first stage of nanoparticle growth, atoms of the chosen material are produced by dc magnetron sputtering of a high-purity metallic

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• thick metal layers (gold films deposited by thermal evaporation and cobalt films deposited by magnetron sputtering) and successively removing the metal-capped spherical, nanoscale materials (termed “nanospheres” throughout the remainder of this article) by careful tape stripping with carbon tape in

Semi-automatic spray pyrolysis deposition of thin, transparent, titania films as blocking layers for dye-sensitized and perovskite solar cells

• Hana Krýsová,
• Josef Krýsa and
• Ladislav Kavan

Beilstein J. Nanotechnol. 2018, 9, 1135–1145, doi:10.3762/bjnano.9.105

• prevent recombination on this surface [3][4][5]. Blocking layers (BLs) can be fabricated by spray pyrolysis [3][6], magnetron sputtering [7], electrochemical deposition [8] spin coating [9][10], dip coating [11] and atomic layer deposition (ALD) [3]. From the viewpoint of low-cost processing and easy

Effect of annealing treatments on CeO₂ grown on TiN and Si substrates by atomic layer deposition

• Silvia Vangelista,
• Rossella Piagge,
• Satu Ek and
• Alessio Lamperti

Beilstein J. Nanotechnol. 2018, 9, 890–899, doi:10.3762/bjnano.9.83

• . Incidentally, such a high-temperature regime is typical of front-end CMOS processes, and could be of relevance to evaluate a possible CeO2 integration at this process step. Deposition of CeO2 thin films in previous studies has been achieved by using a variety of growth techniques, such as RF-magnetron

• sputtering [7], e-beam [16], physical vapor deposition [17], chemical vapor deposition (CVD) [18], and atomic layer deposition (ALD). The latter has been explored by using different precursors, e.g., Ce(thd)4, Ce(iPrCp)3 and Ce(mmp)4) [19][20][21][22][23], obtaining as-deposited film with polycrystalline

Facile chemical routes to mesoporous silver substrates for SERS analysis

• Elina A. Tastekova,
• Alexander Y. Polyakov,
• Anastasia E. Goldt,
• Alexander V. Sidorov,
• Alexandra A. Oshmyanskaya,
• Irina V. Sukhorukova,
• Dmitry V. Shtansky,
• Wolgang Grünert and
• Anastasia V. Grigorieva

Beilstein J. Nanotechnol. 2018, 9, 880–889, doi:10.3762/bjnano.9.82

• nm was deposited onto the 2.5 × 2.5 cm glass slides using magnetron sputtering. The chemical oxidation of silver was performed by vapors of 63% nitric acid. Then, the partially oxidized film was chemically reduced in an excess of sodium borohydride to AgI in the presence of or without PVP. The

Comparative study of antibacterial properties of polystyrene films with TiO_x and Cu nanoparticles fabricated using cluster beam technique

• Vladimir N. Popok,
• Cesarino M. Jeppesen,
• Peter Fojan,
• Anna Kuzminova,
• Jan Hanuš and
• Ondřej Kylián

Beilstein J. Nanotechnol. 2018, 9, 861–869, doi:10.3762/bjnano.9.80

• [9][10][11][12][13][14][15]. In the current work, both Ti and Cu clusters are produced using magnetron sputtering in special cluster sources and deposited on substrates coated by a thin layer of polystyrene (PS). The focus is on the optimization of the nanocomposite formation using the cluster beam

• that the surface cluster density is not changed after the deposition of bacteria and the following washing of the samples over a few cycles of the experiments. Such example is presented in Figure 2 for Ti NPs. Ti clusters produced by magnetron sputtering were either left untreated or oxidized in two

• toluene. Thin films are coated on silicon and quartz substrates of 10 × 10 mm2 and annealed at 110 °C (above the glass transition temperature). The thickness of PS films was measured by ellipsometry and found to be 50 ± 5 nm. Ti clusters are produced by magnetron sputtering in a cluster source similar to

Towards 3D crystal orientation reconstruction using automated crystal orientation mapping transmission electron microscopy (ACOM-TEM)

• Aaron Kobler and
• Christian Kübel

Beilstein J. Nanotechnol. 2018, 9, 602–607, doi:10.3762/bjnano.9.56

• starting point for the 3D reconstruction is an ACOM map containing experimental spot diffraction patterns originating from a Pd thin film deposited by radio frequency (RF) magnetron sputtering. The orientation map was acquired on a Philips Tecnai F20 ST TEM instrument which was equipped with a NanoMegas

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

Bombyx mori silk/titania/gold hybrid materials for photocatalytic water splitting: combining renewable raw materials with clean fuels

• Stefanie Krüger,
• Michael Schwarze,
• Otto Baumann,
• Christina Günter,
• Michael Bruns,
• Christian Kübel,
• Dorothée Vinga Szabó,
• Rafael Meinusch,
• Verónica de Zea Bermudez and
• Andreas Taubert

Beilstein J. Nanotechnol. 2018, 9, 187–204, doi:10.3762/bjnano.9.21

• (Ag) NPs or TiO2 nano-grass films with AuNP for photocatalytic water splitting [29][30]. Matsuoka et al. sputtered TiO2 on a quartz glass plate by radiofrequency (RF) magnetron sputtering deposition followed by Pt deposition to make a TiO2 thin film photocatalyst for water splitting [31]. Finally

Atomic layer deposition and properties of ZrO₂/Fe₂O₃ thin films

• Kristjan Kalam,
• Helina Seemen,
• Peeter Ritslaid,
• Mihkel Rähn,
• Aile Tamm,
• Kaupo Kukli,
• Aarne Kasikov,
• Joosep Link,
• Raivo Stern,
• Salvador Dueñas,
• Helena Castán and
• Héctor García

Beilstein J. Nanotechnol. 2018, 9, 119–128, doi:10.3762/bjnano.9.14

• reactive DC magnetron sputtering [7], also exhibited ferromagnetic properties. The undoped ZrO2 exhibited ferromagnetic properties mainly driven by oxygen vacancies. Monoclinic and tetragonal phases with similar amounts of oxygen vacancies were compared and ferromagnetism was only observed in the case of

Ta₂N₃ nanocrystals grown in Al₂O₃ thin layers

• Krešimir Salamon,
• Maja Buljan,
• Iva Šarić,
• Mladen Petravić and
• Sigrid Bernstorff

Beilstein J. Nanotechnol. 2017, 8, 2162–2170, doi:10.3762/bjnano.8.215

• isolated nitride NPs within thin dielectric layers. An emphasis is placed here on the control of size and spatial arrangement of NPs, which should then ensure the desired optical properties. This is achieved by using reactive magnetron sputtering and the deposition procedure we already used for the self

• by using the reactive magnetron sputtering deposition technique under conditions that implied a high nitrogen fraction in sputtering gas mixture and post-deposition annealing [23]. We found that the Ta2N3 phase has metallic properties, which makes it a possible candidate for the LSPR applications

Advances and challenges in the field of plasma polymer nanoparticles

• Andrei Choukourov,
• Pavel Pleskunov,
• Daniil Nikitin,
• Valerii Titov,
• Artem Shelemin,
• Mykhailo Vaidulych,
• Anna Kuzminova,
• Pavel Solař,
• Jan Hanuš,
• Jaroslav Kousal,
• Ondřej Kylián,
• Danka Slavínská and
• Hynek Biederman

Beilstein J. Nanotechnol. 2017, 8, 2002–2014, doi:10.3762/bjnano.8.200

• plasma polymerization of volatile monomers or via radio frequency (RF) magnetron sputtering of conventional polymers. The formation of hydrocarbon, fluorocarbon, silicon- and nitrogen-containing plasma polymer nanoparticles as well as core@shell nanoparticles based on plasma polymers is discussed with a

• the production of metal NPs by vacuum thermal evaporation with subsequent condensation of atomic metal vapours on a cool buffer gas and later thermal evaporation was replaced by magnetron sputtering [41]. At least one work investigated the formation of polymeric NPs by thermal evaporation of poly(N

• a result of plasma polymerization of n-hexane and hexamethyldisiloxane (HMDSO) [53] or as a result of RF magnetron sputtering of nylon [54] and poly(tetrafluoroethylene) (PTFE) [55]. One can readily judge the diversity of shape and morphology of the NPs with diameters ranging from tens to hundreds