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Search for "deposition" in Full Text gives 1097 result(s) in Beilstein Journal of Nanotechnology. Showing first 200.

Ultrasensitive and ultrastretchable metal crack strain sensor based on helical polydimethylsiloxane

  • Shangbi Chen,
  • Dewen Liu,
  • Weiwei Chen,
  • Huajiang Chen,
  • Jiawei Li and
  • Jinfang Wang

Beilstein J. Nanotechnol. 2024, 15, 270–278, doi:10.3762/bjnano.15.25

Graphical Abstract
  • substrate via sputter deposition. The metal thin film is then pre-stretched to generate microcracks. The sensor demonstrates a remarkable stretchability of 300%, an exceptional sensitivity with a maximum gauge factor reaching 107, a rapid response time of 158 ms, minimal hysteresis, and outstanding
  • successfully retrieved by peeling it off from the screw. In order to eliminate the contaminants from the surface of the helically structured PDMS, a 10 min ultrasound treatment in absolute alcohol was employed, followed by drying in a sterile oven. Prior to the Au deposition, the outer surface of the helically
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Published 01 Mar 2024

Design, fabrication, and characterization of kinetic-inductive force sensors for scanning probe applications

  • August K. Roos,
  • Ermes Scarano,
  • Elisabet K. Arvidsson,
  • Erik Holmgren and
  • David B. Haviland

Beilstein J. Nanotechnol. 2024, 15, 242–255, doi:10.3762/bjnano.15.23

Graphical Abstract
  • -induced deposition of platinum. Finally, we present measurements that characterize the spread of mechanical resonant frequency, the temperature dependence of the microwave resonance, and the sensor’s operation as an electromechanical transducer of force. Keywords: atomic force microscopy; force sensing
  • niobium and titanium targets [33] in an ATC2200 from AJA International Inc., with a deposition rate of roughly 3 nm/min. (b) Pads and markers. A lift-off process defines the gold contact pads and alignment marks. We spin a 400 nm thick photoresist (maN1407), bake on a hotplate at 100 °C for 60 s and
  • adhesion of the following 150 nm deposition of chromium with electron-beam evaporation in the Auto306 from Edwards. After the lift-off in mrREM700, we also strip the protective PMMA layer on the front side with AR600–71, and we clean the wafer in isopropanol (IPA). (d) Coarse circuit pattern. A layer of
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Published 15 Feb 2024

Multiscale modelling of biomolecular corona formation on metallic surfaces

  • Parinaz Mosaddeghi Amini,
  • Ian Rouse,
  • Julia Subbotina and
  • Vladimir Lobaskin

Beilstein J. Nanotechnol. 2024, 15, 215–229, doi:10.3762/bjnano.15.21

Graphical Abstract
  • provide valuable insights into the mechanisms of lactose and protein deposition on aluminum surfaces, which can aid in the general understanding of protein corona formation. Keywords: all atomistic; aluminum; bionano interface; coarse grained model; lactose; milk protein; multiscale modelling; protein
  • the process of protein deposition on metallic surfaces. Finally, the key insights gained from this study are summarized, highlighting the implications and potential applications of the findings. Results and Discussion Here, we aim to predict the content of a biomolecular corona on a metallic aluminum
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Published 13 Feb 2024

Ion beam processing of DNA origami nanostructures

  • Leo Sala,
  • Agnes Zerolová,
  • Violaine Vizcaino,
  • Alain Mery,
  • Alicja Domaracka,
  • Hermann Rothard,
  • Philippe Boduch,
  • Dominik Pinkas and
  • Jaroslav Kocišek

Beilstein J. Nanotechnol. 2024, 15, 207–214, doi:10.3762/bjnano.15.20

Graphical Abstract
  • origami could be therefore designed in a way that a specific segment of the origami is modified/lifted upon stochastic energy deposition or radical attack, resulting in uniform modifications of the nanostructures. AFM images of DNA origami nanotriangles on Si irradiated with increasing fluences of 56Fe10
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Published 12 Feb 2024

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates

  • Aleksandra Szkudlarek,
  • Jan M. Michalik,
  • Inés Serrano-Esparza,
  • Zdeněk Nováček,
  • Veronika Novotná,
  • Piotr Ozga,
  • Czesław Kapusta and
  • José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

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  • as an unwanted co-deposition of amorphous carbon. Those deposition and etching processes may co-exist and can be controlled to a certain level by the electron flux [23]. The influence of surface kinetics phenomena on the etch profiles has not been considered in the previous works describing the proof
  • [17]. The central protrusion in the etch profiles is observed in ex situ AFM profiles at high doses in case of singular lines and large triangular patterns. Its origin is unlikely due to amorphous carbon co-deposition from the residual vapor impurities. Such transition from the deposition (FEBID) of
  • deposited should be etched away with water. The parameters used in our experiments are even further from the switching point. Therefore, the protrusions in the middle of the line profiles, visible in Figure 3 for doses D3–D5, are unlikely due to the deposition of hydrocarbons. The nanostructurizing process
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Published 07 Feb 2024

In situ optical sub-wavelength thickness control of porous anodic aluminum oxide

  • Aleksandrs Dutovs,
  • Raimonds Popļausks,
  • Oskars Putāns,
  • Vladislavs Perkanuks,
  • Aušrinė Jurkevičiūtė,
  • Tomas Tamulevičius,
  • Uldis Malinovskis,
  • Iryna Olyshevets,
  • Donats Erts and
  • Juris Prikulis

Beilstein J. Nanotechnol. 2024, 15, 126–133, doi:10.3762/bjnano.15.12

Graphical Abstract
  • of templates, including evaporation masks [8][9][10], molds for nanowire array production using the supercritical fluid method [11], electrochemical deposition [12], atomic layer deposition [13], or traps for colloidal nanoparticle assembly [14]. Several applications, for example, color filtering [15
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Published 31 Jan 2024

New application of bimetallic Ag/Pt nanoplates in a colorimetric biosensor for specific detection of E. coli in water

  • Azam Bagheri Pebdeni,
  • Mohammad N. AL-Baiati and
  • Morteza Hosseini

Beilstein J. Nanotechnol. 2024, 15, 95–103, doi:10.3762/bjnano.15.9

Graphical Abstract
  • penetration through the bottom of the sheets (similarly to reference [12]). To conduct the analysis, 3 µL of aptamer-NPL was dropped on the paper in the first stage, and after drying, this procedure was repeated two more times to get a total amount of 9 µL of aptamer-NPL on each deposition zone. Following
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Published 17 Jan 2024

Measurements of dichroic bow-tie antenna arrays with integrated cold-electron bolometers using YBCO oscillators

  • Leonid S. Revin,
  • Dmitry A. Pimanov,
  • Alexander V. Chiginev,
  • Anton V. Blagodatkin,
  • Viktor O. Zbrozhek,
  • Andrey V. Samartsev,
  • Anastasia N. Orlova,
  • Dmitry V. Masterov,
  • Alexey E. Parafin,
  • Victoria Yu. Safonova,
  • Anna V. Gordeeva,
  • Andrey L. Pankratov,
  • Leonid S. Kuzmin,
  • Anatolie S. Sidorenko,
  • Silvia Masi and
  • Paolo de Bernardis

Beilstein J. Nanotechnol. 2024, 15, 26–36, doi:10.3762/bjnano.15.3

Graphical Abstract
  • -frequency receiving system prototype for the LSPE mission) is shown in Figure 3a, and a photograph from an optical microscope is shown in Figure 3b. The shadow evaporation of the bolometric layer consists of the following stages: The first stage is the vertical deposition of a normal metal layer, consisting
  • stage is the deposition of about 70 nm of Al at an angle of −45° to form a SIN tunnel junction. Thus, as a normal layer we use the hybrid superconducting/ferromagnetic structure, which allows for decreasing the absorber volume and also for suppressing the Andreev heating current [22] to improve detector
  • process. In the future, it is planned to carry out a set of works to improve the barrier properties of aluminum oxide. The quality of the barrier largely depends on the roughness of aluminum. It can be critically large during electron beam deposition, which in turn affects the thickness of the barrier and
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Published 04 Jan 2024

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

  • Joshua Williams,
  • Michael I. Faley,
  • Joseph Vimal Vas,
  • Peng-Han Lu and
  • Rafal E. Dunin-Borkowski

Beilstein J. Nanotechnol. 2024, 15, 1–12, doi:10.3762/bjnano.15.1

Graphical Abstract
  • membrane also allows for high-resolution patterning since there is less electron scattering during exposure [26]. The purpose of applying two layers of resist is to create a large undercut by using a bottom layer that is more sensitive than the top layer. This prevents the unwanted deposition of metal that
  • techniques, a one-time exposure is possible with the help of high accelerating voltage during electron beam exposure. In this process, rather than doing one resist deposition and exposure after another, the layer selectivity is controlled by the electron beam dose and the sensitivity of the two layers. Only
  • establish a good thermal contact during metal deposition to prevent the resist mask from melting as the substrate temperature is above the glass transition temperature of the resist. Ion beam etching The IBE process (Figure 6) is as follows: The first step is to deposit Py on the substrate; then a negative
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Published 02 Jan 2024

Fluorescent bioinspired albumin/polydopamine nanoparticles and their interactions with Escherichia coli cells

  • Eloïse Equy,
  • Jordana Hirtzel,
  • Sophie Hellé,
  • Béatrice Heurtault,
  • Eric Mathieu,
  • Morgane Rabineau,
  • Vincent Ball and
  • Lydie Ploux

Beilstein J. Nanotechnol. 2023, 14, 1208–1224, doi:10.3762/bjnano.14.100

Graphical Abstract
  • mixtures of BSA and DA in Tris buffer inhibited the deposition of a PDA film on the wall of the reaction beakers (Figure 3a). This suggested that BSA/PDA aggregates formed and that almost all the free DA molecules were consumed in these aggregates, as already mentioned by Bergtold and co-workers [13]. A
  • ambient temperature, as shown by the good dispersion and the absence of precipitates and deposition on the container wall (Figure 3c). Good stability and dispersion were maintained after dialysis with a 100 kDa cut-off membrane, which allowed for the removal of free BSA molecules. As shown by Chassepot
  • progressive inhibition of the deposition of a PDA film on the wall of the reaction beaker, which was mentioned above and observed above a certain amount of BSA (Figure 3a). This allowed us to assume that BSA molecules below a critical amount cannot surround all DA molecules (some DA molecules thus form a thin
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Published 22 Dec 2023

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH3)2Cl]2

  • Elif Bilgilisoy,
  • Ali Kamali,
  • Thomas Xaver Gentner,
  • Gerd Ballmann,
  • Sjoerd Harder,
  • Hans-Peter Steinrück,
  • Hubertus Marbach and
  • Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

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  • Iceland, Dunhagi 3, 107 Reykjavík, Iceland Inorganic and Organometallic Chemistry, Universität Erlangen-Nürnberg, 91058 Erlangen, Germany Carl Zeiss SMT GmbH, 64380 Roßdorf, Germany 10.3762/bjnano.14.98 Abstract Motivated by the potential of focused-electron-beam-induced deposition (FEBID) in the
  • that we attribute to electron-induced secondary and tertiary reactions in the deposition process. We find this precursor to be stable at ambient conditions and to have sufficient vapor pressure to be suitable for use in HV instruments. More importantly, in the UHV setup, FEBID with [Au(CH3)2Cl]2
  • yielded deposits with high gold content, ranging from 45 to 61 atom % depending on the beam current and on the cleanliness of the substrates surface. Keywords: dissociative electron attachment; dissociative ionization; focused-electron-beam-induced deposition (FEBID); gold deposit; low-energy electrons
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Published 06 Dec 2023

Spatial variations of conductivity of self-assembled monolayers of dodecanethiol on Au/mica and Au/Si substrates

  • Julian Skolaut,
  • Jędrzej Tepper,
  • Federica Galli,
  • Wulf Wulfhekel and
  • Jan M. van Ruitenbeek

Beilstein J. Nanotechnol. 2023, 14, 1169–1177, doi:10.3762/bjnano.14.97

Graphical Abstract
  • deposition can be made. Overall, five areas were investigated on Au/mica and three for Au/Si, which all showed consistent images. Dodecanethiol SAMs on Au/mica Figure 3 shows images of the DDT-covered Au/mica surface obtained after the deposition procedure described above. In total, four different areas on
  • . All these indications lead to the conclusion that ordered DDT SAMs form on the surface with the chosen deposition technique. More importantly, the current maps in Figure 3 show that substrate and measurement technique are suitable for obtaining information on the conductivity of a molecular SAM, as
  • variation in the current is governed by the structure of the substrate, which remains qualitatively unchanged by the deposition of the SAM. For the Au/Si substrate, the rough topography yields only small areas on the surface on which comparable conductive properties can be expected. Without information on
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Published 05 Dec 2023

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

  • François Piquemal,
  • Khaled Kaja,
  • Pascal Chrétien,
  • José Morán-Meza,
  • Frédéric Houzé,
  • Christian Ulysse and
  • Abdelmounaim Harouri

Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94

Graphical Abstract
  • standard photolithography, using a mask aligner (MA6, Karl Suss, Germany), and conventional deposition techniques. Following a resist (about 1 µm thick) development process, a 2 inch diameter wafer was placed in a vacuum chamber for electron beam deposition of a 200 nm thick titanium/gold layer
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Published 22 Nov 2023

Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone

  • Kristjan Kalam,
  • Peeter Ritslaid,
  • Tanel Käämbre,
  • Aile Tamm and
  • Kaupo Kukli

Beilstein J. Nanotechnol. 2023, 14, 1085–1092, doi:10.3762/bjnano.14.89

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  • Kristjan Kalam Peeter Ritslaid Tanel Kaambre Aile Tamm Kaupo Kukli Institute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, Estonia 10.3762/bjnano.14.89 Abstract Polycrystalline SnO2 thin films were grown by atomic layer deposition (ALD) on SiO2/Si(100) substrates from SnI4 and O3
  • implied the formation of single-phase oxide in the films grown at temperatures above 300 °C. Appropriateness of the mentioned precursor system to the preparation of SnO2 films was established. Keywords: atomic layer deposition; tin oxide; tin tetraiodide; Introduction Atomic layer-deposited SnO2 films
  • precursor combinations for obtaining SnO2 in atomic layer deposition (ALD) processes [9]. Two of these processes have employed SnI4 as the metal precursor with either O2 [10][11][12][13][14] or H2O2 [10][11][15] as oxidizer. Of these two oxygen sources, O2 would be more desirable because with it a hydrogen
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Published 13 Nov 2023

Spatial mapping of photovoltage and light-induced displacement of on-chip coupled piezo/photodiodes by Kelvin probe force microscopy under modulated illumination

  • Zeinab Eftekhari,
  • Nasim Rezaei,
  • Hidde Stokkel,
  • Jian-Yao Zheng,
  • Andrea Cerreta,
  • Ilka Hermes,
  • Minh Nguyen,
  • Guus Rijnders and
  • Rebecca Saive

Beilstein J. Nanotechnol. 2023, 14, 1059–1067, doi:10.3762/bjnano.14.87

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  • × 2.8) and (1.4 × 1.2) mm2 labeled as A, B, C, and D, respectively. In the process of fabrication, a 100 nm thick layer of LNO as the bottom electrode was first deposited, using pulsed laser deposition (PLD) technique, on a single crystal silicon wafer. Then, an 850 nm lead barium zirconia titanate
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Published 06 Nov 2023

Nanoarchitectonics of photothermal materials to enhance the sensitivity of lateral flow assays

  • Elangovan Sarathkumar,
  • Rajasekharan S. Anjana and
  • Ramapurath S. Jayasree

Beilstein J. Nanotechnol. 2023, 14, 988–1003, doi:10.3762/bjnano.14.82

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  • diagnostic tools. Based on the photothermal principle, very recently, Shirshahi et al. developed LFA strips for the detection of E. coli O157:H7 strains of bacteria. They used reduced graphene oxide as both tracer and photothermal signal amplification material. After the deposition of rGO on the test line
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Published 04 Oct 2023

Fragmentation of metal(II) bis(acetylacetonate) complexes induced by slow electrons

  • Janina Kopyra and
  • Hassan Abdoul-Carime

Beilstein J. Nanotechnol. 2023, 14, 980–987, doi:10.3762/bjnano.14.81

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  • attachment. The reported data may contribute to a better understanding of the physical chemistry underlying the electron–molecule interactions, which is crucial for potential applications of these molecular systems in the deposition of nanoscale structures. Keywords: dissociative electron attachment; gas
  • electron beam with an organometallic target (e.g., focused electron beam-induced deposition, FEBID) is a promising technique for direct 3D deposition of high-purity materials with minimum residual carbon in the product on the surface [4][5]. The FEBID precursor molecules adsorb and diffuse on the surface
  • . Metal bis(acetylacetonate) complexes are of interest for many thin film fabrication techniques (e.g., chemical vapor deposition [9], atomic layer epitaxy [10], or atomic layer etching [11]) and as precursors for carbon materials, such as carbon nanotubes and carbon onion particles [12], or metal oxide
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Published 26 Sep 2023

Isolation of cubic Si3P4 in the form of nanocrystals

  • Polina K. Nikiforova,
  • Sergei S. Bubenov,
  • Vadim B. Platonov,
  • Andrey S. Kumskov,
  • Nikolay N. Kononov,
  • Tatyana A. Kuznetsova and
  • Sergey G. Dorofeev

Beilstein J. Nanotechnol. 2023, 14, 971–979, doi:10.3762/bjnano.14.80

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  • 520.8 cm−1. Interestingly, the observed Raman spectrum for SP900 is very similar to that of the product of silicon and phosphorus MBE co-deposition at 3:2 molar ratio [34]. This substance was reported as amorphous; however, it could contain Si3P4 NPs along with other SixPy compounds. Factor group
  • Si3P4 phase. Also worth noting was that the synthesis of cubic Si3P4 NPs could be performed immediately after laser-induced or plasma-enhanced chemical vapor deposition of nanosilicon from the silane precursor (since the NPs obtained this way are readily hydrogenated). Additionally, there is preliminary
  • (reagent grade) were used for sol preparation; 40% hydrofluoric acid (pure) was used for etching. Si NPs were synthesized by laser-induced chemical vapor deposition using a silane precursor (the average particle diameter was 20 nm [41]). The NPs oxidized when stored in air, and the resultant mass fraction
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Published 26 Sep 2023

Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor

  • Mathias Franz,
  • Mahnaz Safian Jouzdani,
  • Lysann Kaßner,
  • Marcus Daniel,
  • Frank Stahr and
  • Stefan E. Schulz

Beilstein J. Nanotechnol. 2023, 14, 951–963, doi:10.3762/bjnano.14.78

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  • , Clemens-Winkler-Str. 6c, 09116 Chemnitz, Germany FAP Forschungs- und Applikationslabor Plasmatechnik GmbH, Gostritzer Str. 67B, 01217 Dresden, Germany 10.3762/bjnano.14.78 Abstract In this work, we present the development of an atomic layer deposition (ALD) process for metallic cobalt. The process
  • operates at low temperatures using dicobalt hexacarbonyl-1-heptyne [Co2(CO)6HC≡CC5H11] and hydrogen plasma. For this precursor an ALD window in the temperature range between 50 and 110 °C was determined with a constant deposition rate of approximately 0.1 Å/cycle. The upper limit of the ALD window is
  • defined by the onset of the decomposition of the precursor. In our case, decomposition occurs at temperatures of 125 °C and above, resulting in a film growth in chemical vapour deposition mode. The lower limit of the ALD window is around 35 °C, where the reduction of the precursor is incomplete. The
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Published 15 Sep 2023

Upscaling the urea method synthesis of CoAl layered double hydroxides

  • Camilo Jaramillo-Hernández,
  • Víctor Oestreicher,
  • Martín Mizrahi and
  • Gonzalo Abellán

Beilstein J. Nanotechnol. 2023, 14, 927–938, doi:10.3762/bjnano.14.76

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  • spin-coated on a Si wafer (3000 rpm, 40 s), washed with ethanol and dried afterward. For AFM, the samples were diluted in ethanol and drop-cast on a Si/SiO2 wafer. Si/SiO2 wafers were washed by spin-coating ten droplets of acetone and ten droplets of isopropanol prior to sample deposition. Scanning
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Published 11 Sep 2023

Ultralow-energy amorphization of contaminated silicon samples investigated by molecular dynamics

  • Grégoire R. N. Defoort-Levkov,
  • Alan Bahm and
  • Patrick Philipp

Beilstein J. Nanotechnol. 2023, 14, 834–849, doi:10.3762/bjnano.14.68

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  • years, the need to control what happens at the surface of the sample has risen sharply, specifically for semiconductors [3][4], microelectronics [5], and surface patterning [6][7]. Other applications of low-energy beams include the preparation of nanoholes [8][9]. Furthermore, deposition processes are
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Published 01 Aug 2023

Silver-based SERS substrates fabricated using a 3D printed microfluidic device

  • Phommachith Sonexai,
  • Minh Van Nguyen,
  • Bui The Huy and
  • Yong-Ill Lee

Beilstein J. Nanotechnol. 2023, 14, 793–803, doi:10.3762/bjnano.14.65

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  • submerged in concentrated HNO3, rinsed with deionized water, and then dried at room temperature to produce the PS substrates. Fabrication of the SERS substrate The deposition of Ag particles on the substrates is based on the SAM method. Colloidal Ag NPs solutions were generated at the methanol/air interface
  • homogeneous results because of the even deposition of the self-assembled monolayer of Ag NPs on the PS substrate. Detection of melamine using PS@Ag SERS substrate SERS spectra of MLM solutions at different concentrations (10−7 to 10−3 M) on the PS@Ag substrates were recorded, as shown in Figure 6a. The Raman
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Published 21 Jul 2023

In situ magnesiothermic reduction synthesis of a Ge@C composite for high-performance lithium-ion batterie anodes

  • Ha Tran Huu,
  • Ngoc Phi Nguyen,
  • Vuong Hoang Ngo,
  • Huy Hoang Luc,
  • Minh Kha Le,
  • Minh Thu Nguyen,
  • My Loan Phung Le,
  • Hye Rim Kim,
  • In Young Kim,
  • Sung Jin Kim,
  • Van Man Tran and
  • Vien Vo

Beilstein J. Nanotechnol. 2023, 14, 751–761, doi:10.3762/bjnano.14.62

Graphical Abstract
  • preparation routes, such as sputtering deposition [20], wet-chemical reduction [21][22], thermal reduction [23], colloidal synthesis [24], and molten-salt synthesis [25], metallothermic, especially magnesiothermic reduction, has been widely applied in the synthesis of group-IV elements to control the
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Published 26 Jun 2023

Control of morphology and crystallinity of CNTs in flame synthesis with one-dimensional reaction zone

  • Muhammad Hilmi Ibrahim,
  • Norikhwan Hamzah,
  • Mohd Zamri Mohd Yusop,
  • Ni Luh Wulan Septiani and
  • Mohd Fairus Mohd Yasin

Beilstein J. Nanotechnol. 2023, 14, 741–750, doi:10.3762/bjnano.14.61

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  • . To date, many researchers have shown promising results on the synthesis control of CNTs to produce tailored CNT morphologies and properties through conventional furnace-based methods. Progress in CNT synthesis processes has been achieved mostly using chemical vapor deposition (CVD). Various studies
  • widely accepted vapor–liquid–solid mechanism, the growth of CNTs occurs in three steps, namely, melting of nickel particles, adsorption of carbon atoms onto the surface of the metallic nickel, and finally, diffusion and deposition of the precipitated carbon, which forms tubular materials by curling of
  • large average CNT diameter with high standard deviation suggests different sizes of formed particles, possibly due to the high temperature. Generally, the size of nanoparticles is affected by several factors, including solution concentration, deposition method, quantity, and annealing [25]. At higher
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Published 21 Jun 2023

Metal-organic framework-based nanomaterials as opto-electrochemical sensors for the detection of antibiotics and hormones: A review

  • Akeem Adeyemi Oladipo,
  • Saba Derakhshan Oskouei and
  • Mustafa Gazi

Beilstein J. Nanotechnol. 2023, 14, 631–673, doi:10.3762/bjnano.14.52

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Published 01 Jun 2023
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