Remarkable electronic and optical anisotropy of layered 1T’-WTe₂ 2D materials

• Qiankun Zhang,
• Rongjie Zhang,
• Jiancui Chen,
• Wanfu Shen,
• Chunhua An,
• Xiaodong Hu,
• Mingli Dong,
• Jing Liu and
• Lianqing Zhu

Beilstein J. Nanotechnol. 2019, 10, 1745–1753, doi:10.3762/bjnano.10.170

• optical microscope. This was followed by e-beam lithography and lift-off processing, where 12 electrodes (20 nm Gr/40 nm Au) were fabricated on the same 1T’-WTe2 flake spaced at an angle of 30° along a chosen reference direction (0°) as shown in Figure 3a. Two strategies were taken to ensure consistent

Materials nanoarchitectonics at two-dimensional liquid interfaces

• Katsuhiko Ariga,
• Michio Matsumoto,
• Taizo Mori and
• Lok Kumar Shrestha

Beilstein J. Nanotechnol. 2019, 10, 1559–1587, doi:10.3762/bjnano.10.153

• and co-workers demonstrated two-dimensional co-patterned structures of carbazole-based conductive polymers and gold by nanosphere lithography [217]. Huang and co-workers proposed a high-yield LB method for nanoparticle films through electrospray techniques to significantly reduce the spreading of

Development of a new hybrid approach combining AFM and SEM for the nanoparticle dimensional metrology

• Loïc Crouzier,
• Alexandra Delvallée,
• Sébastien Ducourtieux,
• Laurent Devoille,
• Guillaume Noircler,
• Christian Ulysse,
• Olivier Taché,
• Elodie Barruet,
• Christophe Tromas and
• Nicolas Feltin

Beilstein J. Nanotechnol. 2019, 10, 1523–1536, doi:10.3762/bjnano.10.150

• silicon wafers. The technique is based on using a direct-writing system (Raith-Vistec EBPG 5000+ electron-beam lithography system) and PMMA resist. After developing, the mask is transferred using RIE (reactive-ion etching). The P900H60 grating is used as a transfer standard and was calibrated by means of

• formed by four crosses with a letter (from A to Y) nearby (Figure 3) for an easy localization of NPs to be analyzed. The distance between two crosses is 15 µm to allow the AFM to scan a complete square on a single image. As detailed above, the production method is based on lithography using a direct

Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping

• Lukas Grünewald,
• Dagmar Gerthsen and
• Simon Hettler

Beilstein J. Nanotechnol. 2019, 10, 1290–1302, doi:10.3762/bjnano.10.128

• , which induces unwanted scattering events. Results: Phase masks of conductive amorphous carbon (aC) were successfully fabricated with optical lithography and focused ion beam milling. Analysis by TEM shows the successful generation of Bessel and vortex beams. No charging or degradation of the aC phase

• structure without any (in-)elastic scattering events, i.e., the amplitude is only modified slightly. Experimentally, focused ion beam (FIB) milling or electron-beam lithography are used to engrave a well-defined thickness profile in an amorphous thin film thereby exploiting the direct proportionality

• phase masks Fabrication of SixNy membranes and aC film deposition A 200 µm thick Si wafer with 120 nm thick low-stress SixNy coating on both sides was used as base material. Optical lithography and etching methods for SixNy and Si were applied to produce free-standing SixNy thin films (Figure 1

Angle-dependent structural colors in a nanoscale-grating photonic crystal fabricated by reverse nanoimprint technology

• Xu Zheng,
• Qing Wang,
• Jinjin Luan,
• Yao Li,
• Ning Wang and
• Rui Zhang

Beilstein J. Nanotechnol. 2019, 10, 1211–1216, doi:10.3762/bjnano.10.120

• reverse nanoimprint lithography. The periodicity and the structural color were investigated through measuring reflection spectra. The structural color of the photonic crystal has a period of 90°. Distinctive colors spanning the entire visible spectrum can be seen when the crystal is rotated. In addition

• , there is a blue-shift of the peak wavelength when the observation angle is increased. An equation for the observed wavelength as a function of the observation angle is proposed. Keywords: observation angle; photonic crystal; reverse nanoimprint lithography; structural color; visualized sensor

• of applications, not only due to their compact structures, simple fabrication process and excellent spectral characteristics, but also because reflection wavelength and observation angle are closely connected [5][6][7]. At present, nanoimprint lithography (NIL) and self-assembly are the two main

Revisiting semicontinuous silver films as surface-enhanced Raman spectroscopy substrates

• Malwina Liszewska,
• Bogusław Budner,
• Małgorzata Norek,
• Bartłomiej J. Jankiewicz and
• Piotr Nyga

Beilstein J. Nanotechnol. 2019, 10, 1048–1055, doi:10.3762/bjnano.10.105

• via various structuring methods. Electron beam lithography allows fabrication of planar [21] and 3D metallic structures [22]. Nanosphere lithography can be used to obtain nanotriangles [23] and nanocones [24]. Much attention has been also given to the deposition of metal onto nano- and micro

Experimental study of an evanescent-field biosensor based on 1D photonic bandgap structures

• Jad Sabek,
• Francisco Javier Díaz-Fernández,
• Luis Torrijos-Morán,
• Zeneida Díaz-Betancor,
• Ángel Maquieira,
• María-José Bañuls,
• Elena Pinilla-Cienfuegos and
• Jaime García-Rupérez

Beilstein J. Nanotechnol. 2019, 10, 967–974, doi:10.3762/bjnano.10.97

• increase by a factor about three. Experimental For the creation of the photonic chips, a standard nanofabrication process optimized in our clean-room facilities has been used [11]. E-beam lithography with 100 keV acceleration voltage was used to expose the created chip layout onto a 100 nm thick hydrogen

• upper cladding, and a 400 µm wide channel is opened on it using UV lithography in order to have access to the PBG sensing structures. The SNOM measurements have been performed by using a customized MultiView 4000 system (Nanonics Imaging Ltd.) working in collection mode, which has been used in previous

Ultrathin hydrophobic films based on the metal organic framework UiO-66-COOH(Zr)

• Miguel A. Andrés,
• Clemence Sicard,
• Christian Serre,
• Olivier Roubeau and
• Ignacio Gascón

Beilstein J. Nanotechnol. 2019, 10, 654–665, doi:10.3762/bjnano.10.65

• ultrathin hydrophobic coatings. The results obtained in this contribution suggest that the controlled coating of MOF sMPs can help to engineer surfaces at the nanoscale by finding synergy between surfactants and MOFs. Thus the use of LB, LS and RLS films can be an alternative to tools based on lithography

Biomimetic synthesis of Ag-coated glasswing butterfly arrays as ultra-sensitive SERS substrates for efficient trace detection of pesticides

• Guochao Shi,
• Mingli Wang,
• Yanying Zhu,
• Yuhong Wang,
• Xiaoya Yan,
• Xin Sun,
• Haijun Xu and
• Wanli Ma

Beilstein J. Nanotechnol. 2019, 10, 578–588, doi:10.3762/bjnano.10.59

• invaluable in research and industrial application. Researchers have paid attention to physical methods (“top-down” techniques) such as focused ion beam lithography (FIB) [14][15], electron beam lithography (EBL) [16][17] or soft nanoimprint nanolithography (NIL) [18], which can produce controllable shapes

Quantification and coupling of the electromagnetic and chemical contributions in surface-enhanced Raman scattering

• Yarong Su,
• Yuanzhen Shi,
• Ping Wang,
• Jinglei Du,
• Markus B. Raschke and
• Lin Pang

Beilstein J. Nanotechnol. 2019, 10, 549–556, doi:10.3762/bjnano.10.56

• lithography (IL) and oblique angle deposition (OAD) methods [23]. The Ag substrates with nanostructures are gratings with and without nanogap, which can achieve field enhancements as high as 106. The samples were pre-characterized by AFM (see example of Ag grating with nanogap in inset in Figure 1a, for

Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO₂ nanorods

• Julian Kalb,
• Vanessa Knittel and
• Lukas Schmidt-Mende

Beilstein J. Nanotechnol. 2019, 10, 412–418, doi:10.3762/bjnano.10.40

• probe lithography method in which a silicon tip, commonly used for atomic force microscopy, was pulled across an anatase TiO2 film. This process scratches the film causing tiny anatase TiO2 nanoparticles to form on the surface. According to previous reports, these anatase particles convert into rutile

• nanocrystals and provide the growth of rutile TiO2 nanorods in well-defined areas. Due to the small tip radius, the resolution of this method is excellent and the method is quite inexpensive compared to electron-beam lithography and similar methods providing a position-controlled growth of semiconducting TiO2

• nanostructures. Keywords: hydrothermal crystal growth; lithography; nanostructures; seed crystals; surface processes; oxides; Introduction Rutile TiO2 is a chemically stable semiconductor with a band gap of 3.1 eV [1]. Dependent on the kind of nanostructure and doping, it has outstanding electronic and

Integration of LaMnO_3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD

• Raquel Rodriguez-Lamas,
• Dolors Pla,
• Odette Chaix-Pluchery,
• Benjamin Meunier,
• Fabrice Wilhelm,
• Andrei Rogalev,
• Laetitia Rapenne,
• Xavier Mescot,
• Quentin Rafhay,
• Hervé Roussel,
• Michel Boudard,
• Carmen Jiménez and
• Mónica Burriel

Beilstein J. Nanotechnol. 2019, 10, 389–398, doi:10.3762/bjnano.10.38

• performed in clean-room facilities combining laser lithography (Heidelberg instruments µPG 101) to define the top electrode pads (200 µm squared pads) and metal evaporation (Plassys MEB550 electron gun 10 kW) to grow 100 nm thick Au layer as top metal electrode. The electrical characteristics were measured

Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

• Eduardo Nery Duarte de Araujo,
• Thiago Alonso Stephan Lacerda de Sousa,
• Luciano de Moura Guimarães and
• Flavio Plentz

Beilstein J. Nanotechnol. 2019, 10, 349–355, doi:10.3762/bjnano.10.34

• applied in standard lithography processes and that, inevitably, modify the electrical proprieties of graphene. By Raman spectroscopy and electrical-transport investigations, we correlate the room-temperature carrier mobility of graphene devices with the size of well-ordered domains in graphene. In

• chemical contamination of graphene in lithography processes [11]. Because of this, in the present work we investigate by Raman spectroscopy and electrical transport measurements the effects of different post-photolithography cleaning methods on the yield and performance of CVD-based graphene devices

Geometrical optimisation of core–shell nanowire arrays for enhanced absorption in thin crystalline silicon heterojunction solar cells

• Robin Vismara,
• Olindo Isabella,
• Andrea Ingenito,
• Fai Tong Si and
• Miro Zeman

Beilstein J. Nanotechnol. 2019, 10, 322–331, doi:10.3762/bjnano.10.31

• (λBG = 1107 nm) [52][58][59]. However, the manufacturing of such device would require abandoning the proposed mask-less approach in favour of a (potentially) more expensive lithography process and was thus not investigated in this work. Finally, it was observed that NW-based solar cells maintain high

Site-specific growth of oriented ZnO nanocrystal arrays

• Rekha Bai,
• Dinesh K. Pandya,
• Sujeet Chaudhary,
• Veer Dhaka,
• Vladislav Khayrudinov,
• Jori Lemettinen,
• Christoffer Kauppinen and
• Harri Lipsanen

Beilstein J. Nanotechnol. 2019, 10, 274–280, doi:10.3762/bjnano.10.26

• grow ZnO nanocrystals on both bare and on an array of pores patterned on the polymer-coated indium-doped tin oxide (ITO) conducting substrates. The patterning process for the polymer, poly(Disperse Red 1 acrylate), involves laser interference lithography and oxygen plasma etching and has been reported

Pull-off and friction forces of micropatterned elastomers on soft substrates: the effects of pattern length scale and stiffness

• Peter van Assenbergh,
• Marike Fokker,
• Julian Langowski,
• Jan van Esch,
• Marleen Kamperman and
• Dimitra Dodou

Beilstein J. Nanotechnol. 2019, 10, 79–94, doi:10.3762/bjnano.10.8

• substrate between the dimples. Keywords: adhesion; biomimetic micropatterned adhesive; colloidal lithography; friction; pull-off; soft substrate; Introduction Pull-off and friction forces of micropatterned adhesives as a function of geometry, feature size, and stiffness Over the last few decades

Femtosecond laser-assisted fabrication of chalcopyrite micro-concentrator photovoltaics

• Franziska Ringleb,
• Stefan Andree,
• Berit Heidmann,
• Jörn Bonse,
• Katharina Eylers,
• Owen Ernst,
• Torsten Boeck,
• Martina Schmid and
• Jörg Krüger

Beilstein J. Nanotechnol. 2018, 9, 3025–3038, doi:10.3762/bjnano.9.281

• . The advantage of the spin-coating approach is that the insulating layer not only covers the molybdenum substrate, but also fills cavities or holes that might form sporadically within the islands and that would lead to power leakage in a lithography-based isolation approach. Characterization of solar

Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films

• Alexander Gaul,
• Daniel Emmrich,
• Timo Ueltzhöffer,
• Henning Huckfeldt,
• Hatice Doğanay,
• Johanna Hackl,
• Muhammad Imtiaz Khan,
• Daniel M. Gottlob,
• Gregor Hartmann,
• André Beyer,
• Dennis Holzinger,
• Slavomír Nemšák,
• Claus M. Schneider,
• Armin Gölzhäuser,
• Günter Reiss and
• Arno Ehresmann

Beilstein J. Nanotechnol. 2018, 9, 2968–2979, doi:10.3762/bjnano.9.276

• ][20][21], laser annealing [22][23][24], thermally assisted scanning probe lithography [25], or a combination of spatially broad laser- or ion-beams and shadow masks [26][27][28][29][30]. Especially in magnonic [14] and sensor applications [4] in-plane magnetic domain patterns play a key role and are

• assisted scanning probe lithography [25] or 250 nm wide dots fabricated by direct interferometric laser annealing [34]. Local annealing, however, results in three-dimensional temperature gradients within the magnetic film causing thermal diffusion and material intermixing over several hundreds of

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS

• ”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The

• to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• obtain porous silver nanostructures [12]. Other routes include the use of gold or silver nanoparticles of different shapes in solution and their assembly on a solid substrate [6][13][14][15][16][17], nanosphere lithography [18][19][20][21][22][23][24][25] as well as nanolithography and nanoimprinting [26

Polarization-dependent strong coupling between silver nanorods and photochromic molecules

• Gwénaëlle Lamri,
• Alessandro Veltri,
• Jean Aubard,
• Pierre-Michel Adam,
• Nordin Felidj and
• Anne-Laure Baudrion

Beilstein J. Nanotechnol. 2018, 9, 2657–2664, doi:10.3762/bjnano.9.247

• lithography to fabricate large arrays of silver nanorods on a glass substrate. The pitch of the arrays has been varied to keep the filling factor approximately equal to 10% and to avoid any lattice mode contribution in the optical spectra. For three different nanorod widths (70, 90 and 110 nm), the nanorod

Au–Si plasmonic platforms: synthesis, structure and FDTD simulations

• Anna Gapska,
• Marcin Łapiński,
• Paweł Syty,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241

• homogeneous distributions of nanostructures, but are far more complex and expensive, such as electron beam lithography. One promising technique that could be used to fabrication of plasmonic platforms is the method based on the directional solidification of eutectics. In this process, two or more phases can

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• uses a layer-by-layer based technique [4]. The design of the desired 3D structure is partitioned into horizontal slices parallel to the substrate surface. For each slice a full set of structure-definition steps, typically combining physical vapor deposition and UV or electron beam lithography, are

• applied. This process is not only challenging due to the need for accurate alignment of all consecutive slices, but also extremely time consuming, depending on the required resolution in the vertical dimension. Other methods are two-photon lithography [5], heterogeneous nucleation [6] or template-based

• sputtering to a thickness of 30 nm and 3 nm, respectively. The patterning was done by UV lithography using allresist AR-U 4040 and lift-off. In section 3.5 we state some of the execution times for the generation of the pattern files used for deposit fabrication as presented next. 3.1 Edge-angle-dependent

Friction reduction through biologically inspired scale-like laser surface textures

• Johannes Schneider,
• Vergil Djamiykov and
• Christian Greiner

Beilstein J. Nanotechnol. 2018, 9, 2561–2572, doi:10.3762/bjnano.9.238

• demonstrated, for example, that sandfish skin exhibits low friction and little wear [25][26]. The development of manufactured surface textures that are inspired by animals with scale-like surface morphology has resulted in fascinating insights. For texturing a titanium alloy, a lithography-based method was

• lithography with morphologies inspired by snake skin, Cuervo et al. [24] systematically varied the height, width and spacing of their elliptical surface features. A reduction in friction was also reported for surfaces featuring pillar and channel surface morphologies inspired by biology [57][58]. The authors

• reported that friction depends on all of these parameters, in agreement with the results presented above for dimple size. We so far did not systematically vary the height of our scale-like structures; a task for future research. It should be noted that compared to mask lithography [24] and double moulding

Droplet-based synthesis of homogeneous magnetic iron oxide nanoparticles

• Christian D. Ahrberg,
• Ji Wook Choi and
• Bong Geun Chung

Beilstein J. Nanotechnol. 2018, 9, 2413–2420, doi:10.3762/bjnano.9.226

• have been synthesized in pinched flow microfluidic geometries, such as fluorescent silica particles [13], or titanium dioxide particles [27]. For these applications, the microfluidic devices were made from poly(dimethylsiloxane) (PDMS) following a soft-lithography fabrication method [28][29], or made