Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO₂ nanorods

• Julian Kalb,
• Vanessa Knittel and
• Lukas Schmidt-Mende

Beilstein J. Nanotechnol. 2019, 10, 412–418, doi:10.3762/bjnano.10.40

• probe lithography method in which a silicon tip, commonly used for atomic force microscopy, was pulled across an anatase TiO2 film. This process scratches the film causing tiny anatase TiO2 nanoparticles to form on the surface. According to previous reports, these anatase particles convert into rutile

• nanocrystals and provide the growth of rutile TiO2 nanorods in well-defined areas. Due to the small tip radius, the resolution of this method is excellent and the method is quite inexpensive compared to electron-beam lithography and similar methods providing a position-controlled growth of semiconducting TiO2

• nanostructures. Keywords: hydrothermal crystal growth; lithography; nanostructures; seed crystals; surface processes; oxides; Introduction Rutile TiO2 is a chemically stable semiconductor with a band gap of 3.1 eV [1]. Dependent on the kind of nanostructure and doping, it has outstanding electronic and

Integration of LaMnO_3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD

• Raquel Rodriguez-Lamas,
• Dolors Pla,
• Odette Chaix-Pluchery,
• Benjamin Meunier,
• Fabrice Wilhelm,
• Andrei Rogalev,
• Laetitia Rapenne,
• Xavier Mescot,
• Quentin Rafhay,
• Hervé Roussel,
• Michel Boudard,
• Carmen Jiménez and
• Mónica Burriel

Beilstein J. Nanotechnol. 2019, 10, 389–398, doi:10.3762/bjnano.10.38

• performed in clean-room facilities combining laser lithography (Heidelberg instruments µPG 101) to define the top electrode pads (200 µm squared pads) and metal evaporation (Plassys MEB550 electron gun 10 kW) to grow 100 nm thick Au layer as top metal electrode. The electrical characteristics were measured

Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

• Eduardo Nery Duarte de Araujo,
• Thiago Alonso Stephan Lacerda de Sousa,
• Luciano de Moura Guimarães and
• Flavio Plentz

Beilstein J. Nanotechnol. 2019, 10, 349–355, doi:10.3762/bjnano.10.34

• applied in standard lithography processes and that, inevitably, modify the electrical proprieties of graphene. By Raman spectroscopy and electrical-transport investigations, we correlate the room-temperature carrier mobility of graphene devices with the size of well-ordered domains in graphene. In

• chemical contamination of graphene in lithography processes [11]. Because of this, in the present work we investigate by Raman spectroscopy and electrical transport measurements the effects of different post-photolithography cleaning methods on the yield and performance of CVD-based graphene devices

Geometrical optimisation of core–shell nanowire arrays for enhanced absorption in thin crystalline silicon heterojunction solar cells

• Robin Vismara,
• Olindo Isabella,
• Andrea Ingenito,
• Fai Tong Si and
• Miro Zeman

Beilstein J. Nanotechnol. 2019, 10, 322–331, doi:10.3762/bjnano.10.31

• (λBG = 1107 nm) [52][58][59]. However, the manufacturing of such device would require abandoning the proposed mask-less approach in favour of a (potentially) more expensive lithography process and was thus not investigated in this work. Finally, it was observed that NW-based solar cells maintain high

Site-specific growth of oriented ZnO nanocrystal arrays

• Rekha Bai,
• Dinesh K. Pandya,
• Sujeet Chaudhary,
• Veer Dhaka,
• Vladislav Khayrudinov,
• Jori Lemettinen,
• Christoffer Kauppinen and
• Harri Lipsanen

Beilstein J. Nanotechnol. 2019, 10, 274–280, doi:10.3762/bjnano.10.26

• grow ZnO nanocrystals on both bare and on an array of pores patterned on the polymer-coated indium-doped tin oxide (ITO) conducting substrates. The patterning process for the polymer, poly(Disperse Red 1 acrylate), involves laser interference lithography and oxygen plasma etching and has been reported

Pull-off and friction forces of micropatterned elastomers on soft substrates: the effects of pattern length scale and stiffness

• Peter van Assenbergh,
• Marike Fokker,
• Julian Langowski,
• Jan van Esch,
• Marleen Kamperman and
• Dimitra Dodou

Beilstein J. Nanotechnol. 2019, 10, 79–94, doi:10.3762/bjnano.10.8

• substrate between the dimples. Keywords: adhesion; biomimetic micropatterned adhesive; colloidal lithography; friction; pull-off; soft substrate; Introduction Pull-off and friction forces of micropatterned adhesives as a function of geometry, feature size, and stiffness Over the last few decades

Femtosecond laser-assisted fabrication of chalcopyrite micro-concentrator photovoltaics

• Franziska Ringleb,
• Stefan Andree,
• Berit Heidmann,
• Jörn Bonse,
• Katharina Eylers,
• Owen Ernst,
• Torsten Boeck,
• Martina Schmid and
• Jörg Krüger

Beilstein J. Nanotechnol. 2018, 9, 3025–3038, doi:10.3762/bjnano.9.281

• . The advantage of the spin-coating approach is that the insulating layer not only covers the molybdenum substrate, but also fills cavities or holes that might form sporadically within the islands and that would lead to power leakage in a lithography-based isolation approach. Characterization of solar

Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films

• Alexander Gaul,
• Daniel Emmrich,
• Timo Ueltzhöffer,
• Henning Huckfeldt,
• Hatice Doğanay,
• Johanna Hackl,
• Muhammad Imtiaz Khan,
• Daniel M. Gottlob,
• Gregor Hartmann,
• André Beyer,
• Dennis Holzinger,
• Slavomír Nemšák,
• Claus M. Schneider,
• Armin Gölzhäuser,
• Günter Reiss and
• Arno Ehresmann

Beilstein J. Nanotechnol. 2018, 9, 2968–2979, doi:10.3762/bjnano.9.276

• ][20][21], laser annealing [22][23][24], thermally assisted scanning probe lithography [25], or a combination of spatially broad laser- or ion-beams and shadow masks [26][27][28][29][30]. Especially in magnonic [14] and sensor applications [4] in-plane magnetic domain patterns play a key role and are

• assisted scanning probe lithography [25] or 250 nm wide dots fabricated by direct interferometric laser annealing [34]. Local annealing, however, results in three-dimensional temperature gradients within the magnetic film causing thermal diffusion and material intermixing over several hundreds of

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS

• ”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The

• to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• obtain porous silver nanostructures [12]. Other routes include the use of gold or silver nanoparticles of different shapes in solution and their assembly on a solid substrate [6][13][14][15][16][17], nanosphere lithography [18][19][20][21][22][23][24][25] as well as nanolithography and nanoimprinting [26

Polarization-dependent strong coupling between silver nanorods and photochromic molecules

• Gwénaëlle Lamri,
• Alessandro Veltri,
• Jean Aubard,
• Pierre-Michel Adam,
• Nordin Felidj and
• Anne-Laure Baudrion

Beilstein J. Nanotechnol. 2018, 9, 2657–2664, doi:10.3762/bjnano.9.247

• lithography to fabricate large arrays of silver nanorods on a glass substrate. The pitch of the arrays has been varied to keep the filling factor approximately equal to 10% and to avoid any lattice mode contribution in the optical spectra. For three different nanorod widths (70, 90 and 110 nm), the nanorod

Au–Si plasmonic platforms: synthesis, structure and FDTD simulations

• Anna Gapska,
• Marcin Łapiński,
• Paweł Syty,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241

• homogeneous distributions of nanostructures, but are far more complex and expensive, such as electron beam lithography. One promising technique that could be used to fabrication of plasmonic platforms is the method based on the directional solidification of eutectics. In this process, two or more phases can

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• uses a layer-by-layer based technique [4]. The design of the desired 3D structure is partitioned into horizontal slices parallel to the substrate surface. For each slice a full set of structure-definition steps, typically combining physical vapor deposition and UV or electron beam lithography, are

• applied. This process is not only challenging due to the need for accurate alignment of all consecutive slices, but also extremely time consuming, depending on the required resolution in the vertical dimension. Other methods are two-photon lithography [5], heterogeneous nucleation [6] or template-based

• sputtering to a thickness of 30 nm and 3 nm, respectively. The patterning was done by UV lithography using allresist AR-U 4040 and lift-off. In section 3.5 we state some of the execution times for the generation of the pattern files used for deposit fabrication as presented next. 3.1 Edge-angle-dependent

Friction reduction through biologically inspired scale-like laser surface textures

• Johannes Schneider,
• Vergil Djamiykov and
• Christian Greiner

Beilstein J. Nanotechnol. 2018, 9, 2561–2572, doi:10.3762/bjnano.9.238

• demonstrated, for example, that sandfish skin exhibits low friction and little wear [25][26]. The development of manufactured surface textures that are inspired by animals with scale-like surface morphology has resulted in fascinating insights. For texturing a titanium alloy, a lithography-based method was

• lithography with morphologies inspired by snake skin, Cuervo et al. [24] systematically varied the height, width and spacing of their elliptical surface features. A reduction in friction was also reported for surfaces featuring pillar and channel surface morphologies inspired by biology [57][58]. The authors

• reported that friction depends on all of these parameters, in agreement with the results presented above for dimple size. We so far did not systematically vary the height of our scale-like structures; a task for future research. It should be noted that compared to mask lithography [24] and double moulding

Droplet-based synthesis of homogeneous magnetic iron oxide nanoparticles

• Christian D. Ahrberg,
• Ji Wook Choi and
• Bong Geun Chung

Beilstein J. Nanotechnol. 2018, 9, 2413–2420, doi:10.3762/bjnano.9.226

• have been synthesized in pinched flow microfluidic geometries, such as fluorescent silica particles [13], or titanium dioxide particles [27]. For these applications, the microfluidic devices were made from poly(dimethylsiloxane) (PDMS) following a soft-lithography fabrication method [28][29], or made

High-throughput micro-nanostructuring by microdroplet inkjet printing

• Hendrikje R. Neumann and
• Christine Selhuber-Unkel

Beilstein J. Nanotechnol. 2018, 9, 2372–2380, doi:10.3762/bjnano.9.222

• ]. Using electron-beam lithography, it is possible to generate such patterns with very high spatial precision [5]. Focused electron beam induced deposition (FEBID) even serves as a method to deposit 3D nanostructures without the need of masks [6]. A further and very successful method to write gold

• steps that are only achievable with clean-room methods. For example, so-called “micro-nanostructures” have been fabricated by combining BCML with electron-beam lithography and photolithography [20][21]. A different approach was proposed based on topography-induced micro-nanostructuring, but this method

• BCML micro-nanostructuring strategies is the time for the patterning itself – it is much shorter and less complicated than other approaches that employ additional steps such as electron-beam lithography or photolithography [20][21]. A further result of the plasma treatment could be a rough surface

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• membranes. Photolithography was employed for obtaining interdigitated metallic electrode systems of Ti/Au onto SiO2/Si substrates and subsequent electron beam lithography was used for contacting single nanowires in order to investigate their galvano-magnetic properties. The results of the magnetoresistance

• electrochemical replication, using as templates chemically etched polycarbonate membranes irradiated with swift heavy ions. Individual Ni–Cu alloy nanowires of different compositions have been contacted on interdigitated metallic electrodes by using electron beam lithography (EBL) and magnetoresistive

Performance analysis of rigorous coupled-wave analysis and its integration in a coupled modeling approach for optical simulation of complete heterojunction silicon solar cells

• Ziga Lokar,
• Benjamin Lipovsek,
• Marko Topic and
• Janez Krc

Beilstein J. Nanotechnol. 2018, 9, 2315–2329, doi:10.3762/bjnano.9.216

• into solar cells [1][2][3][4][5]. The use of different techniques for the wet and dry etching of Si wafers [6] in combination with thermal or UV nanoimprint lithography [6][7] has opened new potential for design of (nano)textures with superior antireflection, light scattering and trapping properties

• textures that are commonly applied in HJ Si solar cells. The first one can be experimentally realized on the nanometer scale by UV nanoimprint lithography (NIL) in combination with dry and wet etching of the wafer [6]. The second, the random pyramid texture, is typically used as a microtexture in c-Si

Metal–dielectric hybrid nanoantennas for efficient frequency conversion at the anapole mode

• Valerio F. Gili,
• Lavinia Ghirardini,
• Davide Rocco,
• Giuseppe Marino,
• Ivan Favero,
• Iännis Roland,
• Giovanni Pellegrini,
• Lamberto Duò,
• Marco Finazzi,
• Luca Carletti,
• Andrea Locatelli,
• Aristide Lemaître,
• Dragomir Neshev,
• Costantino De Angelis,
• Giuseppe Leo and
• Michele Celebrano

Beilstein J. Nanotechnol. 2018, 9, 2306–2314, doi:10.3762/bjnano.9.215

• SiOx are deposited on the surface via plasma-enhanced chemical vapor deposition (PECVD) to later improve the adhesion of the negative-tone HSQ resist on the III–V layer. A first positive-tone lithography step with PMMA resist is performed to realize the alignment structures, followed by electron beam

• evaporation of 5 nm of Ti and 80 nm of Au. Finally, a standard lift-off procedure reveals the gold alignment structures. The choice of gold as a material at this stage is crucial to ensure the highest possible contrast and precision in the successive lithography step. HSQ resist is then spun and nanoantenna

• patterns are transferred on the resist with a second lithography step. Two non-selective etching processes are then performed: a first CHF3-mediated reactive ion etching (RIE) removes the 3 nm SiOx layer which is no longer needed, while the second inductively coupled plasma RIE with SiCl4/Ar gas treatment

Two-dimensional photonic crystals increasing vertical light emission from Si nanocrystal-rich thin layers

• Lukáš Ondič,
• Marian Varga,
• Ivan Pelant,
• Alexander Kromka,
• Karel Hruška and
• Robert G. Elliman

Beilstein J. Nanotechnol. 2018, 9, 2287–2296, doi:10.3762/bjnano.9.213

• theoretically [12] and experimentally [13], that by optimizing the dimensions of the PhC, very high absorption efficiencies can be achieved. The main issue limiting the practical use of 2D PhCs is a relatively complicated and expensive fabrication process. Typically, electron beam lithography in combination

• for photonic nanostructures, such as nanoimprinting [13][16], microsphere-based lithography [17] or laser processing [18], which may open up ways towards practical applications of 2D PhCs. The latter method, for example, enabled to enhance the light extraction from InGaN/GaN quantum wells on a

• ” by electron beam lithography (“e-LiNE system”, Raith GmbH, Germany) into a polymer mask forming a 2D periodic patterns of holes. A 60 nm thick gold layer was subsequently evaporated and part of the gold was removed by lift-off of the PMMA to define a mask for etching. Afterwards, the samples were

Optimization of the optical coupling in nanowire-based integrated photonic platforms by FDTD simulation

• Nan Guan,
• Andrey Babichev,
• Martin Foldyna,
• Dmitry Denisov,
• François H. Julien and
• Maria Tchernycheva

Beilstein J. Nanotechnol. 2018, 9, 2248–2254, doi:10.3762/bjnano.9.209

• from 1.25 to 1.75 µm. We note that the control of the waveguide width with a precision of ≈20 nm is within reach of electron beam lithography processing techniques. The FDTD simulations for the waveguide widths around 1.5 µm were performed as shown in Figure 3b. A coupling efficiency above 59% is

Dumbbell gold nanoparticle dimer antennas with advanced optical properties

• Janning F. Herrmann and
• Christiane Höppener

Beilstein J. Nanotechnol. 2018, 9, 2188–2197, doi:10.3762/bjnano.9.205

• approaches, which rely on, e.g., electron-beam lithography, ion milling and other techniques, are widely used, often tailoring gap structures explores common limitations in regard to their obtainable resolution and non-invasiveness. In contrast, common bottom-up approaches often rely on the specific

Localized photodeposition of catalysts using nanophotonic resonances in silicon photocathodes

• Evgenia Kontoleta,
• Sven H. C. Askes,
• Lai-Hung Lai and
• Erik C. Garnett

Beilstein J. Nanotechnol. 2018, 9, 2097–2105, doi:10.3762/bjnano.9.198

• promising for the design of lithography-free and efficient hierarchical nanostructures for the generation of solar fuels. Keywords: catalysts; nanomaterials; nanophotonics; photodeposition; solar fuels; Introduction The relentless rise of CO2 levels in the atmosphere as well as the growth of the world

• excitation wavelength. The extensive literature on such nanophotonic tuning makes this an exciting approach for lithography-free nanoscale control over catalyst positioning [34][35][36][37][38]. We have chosen vertical silicon nanowires as a model nanophotonic system because of their ease of fabrication

• with higher catalytic activity, leading to preferential deposition, or traps that capture carriers preventing deposition. Conclusion We show that the optical modes of silicon nanostructures can be used for lithography-free patterning of catalytic nanoparticles. Tuning of the photo-electrochemical

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• -resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ion beam lithography (IBL) is a noteworthy method thanks to its robust direct

• that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics. Keywords: extreme ultraviolet (EUV

• ) radiation; focused ion beam (FIB); Fresnel zone plate; ion beam lithography (IBL); nanopatterning; soft X-rays; Introduction Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• lithography; optical antenna; self-assembly; SERS; Introduction Over the last decades self-assembled layers of gold nanoparticles have taken an important role in emerging nanotechnologies. Noble metal nanoparticles show localized surface plasmon polariton resonances (LSPRs) in the visible and infrared

• enhanced Raman spectroscopy (SERS) [10]. Ordered arrays of such particles can be fabricated by different methods. Electron-beam lithography for example is a top-down method which provides good control, but is time consuming and costly. In contrast, the self-assembly of block-copolymers is a bottom-up

• method, which enables the parallel processing of large areas. A cost-effective photochemical method is block copolymer micelle lithography (BCML), which can be used to create templates on the surfaces of substrates [10][11][12]. To use the templates for further patterning of the substrate with nanodots