High-temperature magnetism and microstructure of a semiconducting ferromagnetic (GaSb)_1−x(MnSb)_x alloy

• Leonid N. Oveshnikov,
• Elena I. Nekhaeva,
• Alexey V. Kochura,
• Alexander B. Davydov,
• Mikhail A. Shakhov,
• Sergey F. Marenkin,
• Oleg A. Novodvorskii,
• Alexander P. Kuzmenko,
• Alexander L. Vasiliev,
• Boris A. Aronzon and
• Erkki Lahderanta

Beilstein J. Nanotechnol. 2018, 9, 2457–2465, doi:10.3762/bjnano.9.230

• , Russian Federation 10.3762/bjnano.9.230 Abstract We have studied the properties of relatively thick (about 120 nm) magnetic composite films grown by pulsed laser deposition using the eutectic compound (GaSb)0.59(MnSb)0.41 as target for sputtering. For the studied films we have observed ferromagnetism and

• , using a GaSb–MnSb eutectic composition as a target for sputtering allowed us to avoid the formation of MnGa inclusions, which were observed earlier in samples obtained by laser deposition from Mn and GaSb targets, without taking the stoichiometry into account [28]. However, due to unevenness of the film

Thickness-dependent photoelectrochemical properties of a semitransparent Co₃O₄ photocathode

• Malkeshkumar Patel and
• Joondong Kim

Beilstein J. Nanotechnol. 2018, 9, 2432–2442, doi:10.3762/bjnano.9.228

• favourable HER properties [20]. We also developed compact Co3O4 films by a reactive sputtering method, in which sputtered Co particles were converted into a compact Co3O4 film by controlling the flowing O2 gas, to offer a self-powered ultraviolet photodetector [17] and semitransparent photovoltaics [39]. It

• thickness were deposited using large-area (4 inch diameter) sputtering on glass and FTO/glass substrates. Identical rapid thermal processing (RTP) oxidation was applied to these Co films to allow the formation of Co3O4 films of varying thickness and porosity. Figure 1b shows the XRD pattern of two prepared

• Co3O4 film are primarily due to its enhanced porosity and optical absorption. We also studied the thickness dependent optical and electrical properties of Co3O4 film grown by reactive sputtering [17]. In fact, we can see the systematic variation of Mott–Schottky characteristics, and so of the VFB and NA

ZnO-nanostructure-based electrochemical sensor: Effect of nanostructure morphology on the sensing of heavy metal ions

• Marina Krasovska,
• Vjaceslavs Gerbreders,
• Irena Mihailova,
• Andrejs Ogurcovs,
• Eriks Sledevskis,
• Andrejs Gerbreders and
• Pavels Sarajevs

Beilstein J. Nanotechnol. 2018, 9, 2421–2431, doi:10.3762/bjnano.9.227

• carried out with the LAB18 thin film deposition system (Kurt J. Lesker, USA) in DC magnetron sputtering mode. As a result, a set of electrodes consisted of four mutually separated planar elements, as illustrated in Figure 1. All of the manipulations described below were carried out using a metal mask

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• 620 equipment situated into a cleanroom class 100 (ISO EN 14644) with RF magnetron sputtering and thermal vacuum evaporation (using TECTRA equipment). Thus, to contact single Ni–Cu alloy nanowires using a typical EBL process (Zeiss Merlin Compact field-emission scanning electron microscope combined

• , the deposition of Ti and Au contacts (100/200 nm) by RF magnetron sputtering and thermal vacuum evaporation, respectively, was performed. Individual contacted Ni–Cu alloy nanowires are thus obtained. The main steps of the EBL process are shown in Figure 8. The morphological and compositional

Influence of the thickness of an antiferromagnetic IrMn layer on the static and dynamic magnetization of weakly coupled CoFeB/IrMn/CoFeB trilayers

• Deepika Jhajhria,
• Dinesh K. Pandya and
• Sujeet Chaudhary

Beilstein J. Nanotechnol. 2018, 9, 2198–2208, doi:10.3762/bjnano.9.206

• (10 nm) were deposited at room temperature using pulsed-DC magnetron sputtering on naturally oxidized Si wafers with Ta (5 nm) seed and cap layers. The base pressure and working pressure of deposition were 2·10−7 and 4·10−3 Torr, respectively. The thickness tIrMn was systematically varied in 1 nm

Electrospun one-dimensional nanostructures: a new horizon for gas sensing materials

• Muhammad Imran,
• Nunzio Motta and
• Mahnaz Shafiei

Beilstein J. Nanotechnol. 2018, 9, 2128–2170, doi:10.3762/bjnano.9.202

• fabrication strategy for synthesis of SnO2 NFs with a branch-on-stem morphology using electrospinning, oxygen plasma etching, sputtering and annealing. Electrospun PVP NFs were first etched with oxygen plasma to make a hierarchical template. Afterwards, a SnO2 film is deposited by sputtering and the PVP

• template is removed by annealing. The morphology of the NFs is dependent on sputtering time, resulting in uniformly distributed branches all over stem. Jun et al. [77] developed polypyrrole (PPy)-coated SnO2 tube-in-tube structures using single-nozzle electrospinning with a phase separation solvent method

A scanning probe microscopy study of nanostructured TiO₂/poly(3-hexylthiophene) hybrid heterojunctions for photovoltaic applications

• Laurie Letertre,
• Roland Roche,
• Olivier Douhéret,
• Hailu G. Kassa,
• Denis Mariolle,
• Nicolas Chevalier,
• Łukasz Borowik,
• Philippe Dumas,
• Benjamin Grévin,
• Roberto Lazzaroni and
• Philippe Leclère

Beilstein J. Nanotechnol. 2018, 9, 2087–2096, doi:10.3762/bjnano.9.197

• knowledge, this joint KPFM/PC-AFM study of such a nanostructured array of TiO2 columns sensitized with functionalized P3HT-COOH constitutes a novel result of interest from both a theoretical and material design perspectives. Materials and Methods The TiO2 layers were synthesized by magnetron sputtering in

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• sputtering processes. The idea here is, if the desired depth of an open zone can be reached before destroying the adjacent zones, it becomes possible to write very dense structures, very quickly. To achieve this goal, the ion beam dosage, which is now determined by the 1D beam overlap (i.e., the step size in

Metal-free catalysis based on nitrogen-doped carbon nanomaterials: a photoelectron spectroscopy point of view

• Mattia Scardamaglia and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2018, 9, 2015–2031, doi:10.3762/bjnano.9.191

• kinetic energies from hundreds of electronvolts to few kiloelectronvolts does not lead to a damage or the sputtering of the material [37][57][84][85]. This effect was explained with different dissipation of the ion energy in the nanostructured material compared to the bulk. In the former, many ions

• traverse the nanostructures without inelastic scattering, while for bulk materials or graphene supported on heavy metallic substrates, the energy of the incident ion species is dissipated at the surface generating a backscattering cascade leading to the sputtering of the sample surface (Figure 5). Using

Electromigrated electrical optical antennas for transducing electrons and photons at the nanoscale

• Arindam Dasgupta,
• Mickaël Buret,
• Nicolas Cazier,
• Marie-Maxime Mennemanteuil,
• Reinaldo Chacon,
• Kamal Hammani,
• Jean-Claude Weeber,
• Juan Arocas,
• Laurent Markey,
• Gérard Colas des Francs,
• Alexander Uskov,
• Igor Smetanin and
• Alexandre Bouhelier

Beilstein J. Nanotechnol. 2018, 9, 1964–1976, doi:10.3762/bjnano.9.187

• . Electron imaging is made possible by sputtering a thin conductive Au layer. Different information can be deduced from the image. To begin with, the tunneling gap is not situated at the location of the constriction, but is displaced towards the source electrode as already reported in the past [37]. There

• electromigration. Voids resulting from Au migration are also observed on the source electrode. The image is obtained by sputtering a thin conductive Au layer on the post mortem device. (a) Current density JT plotted versus applied bias Vdc. The black circles are experimental data points and the solid red line is

Defect formation in multiwalled carbon nanotubes under low-energy He and Ne ion irradiation

• Santhana Eswara,
• Jean-Nicolas Audinot,
• Brahime El Adib,
• Maël Guennou,
• Tom Wirtz and
• Patrick Philipp

Beilstein J. Nanotechnol. 2018, 9, 1951–1963, doi:10.3762/bjnano.9.186

• carbon support of typical TEM grids, a new methodology involving Raman inactive Au TEM grids was developed. The experimental results have been compared to SDTRIMSP simulations. Due to the small thickness of the MWCNTs, sputtering has been observed for the top and bottom side of the samples. Depending on

• sputtering of targets with a cylindrical geometry [49], however, as we are going to irradiate a slab of MWCNTs we prefer to use a solid slab representing the whole sample. A study by Hobler et al. showed that BCA-based simulations can be used to study backward and forward sputtering of membranes or targets

• the extent of damage observed by TEM in Figure 3B,E is consistent with the ratio of intensities of D to G band shown in Figure 2b. This agrees also with the simulation results discussed later which indicate a higher sputtering yield and a higher displacement due to Ne+ irradiation in comparison to He

Synthesis of hafnium nanoparticles and hafnium nanoparticle films by gas condensation and energetic deposition

• Irini Michelakaki,
• Nikos Boukos,
• Dimitrios A. Dragatogiannis,
• Spyros Stathopoulos,
• Costas A. Charitidis and
• Dimitris Tsoukalas

Beilstein J. Nanotechnol. 2018, 9, 1868–1880, doi:10.3762/bjnano.9.179

• study the fabrication and characterization of hafnium nanoparticles and hafnium nanoparticle thin films. Hafnium nanoparticles were grown in vacuum by magnetron-sputtering inert-gas condensation. The as deposited nanoparticles have a hexagonal close-packed crystal structure, they possess truncated

• produced by inert-gas condensation. In order to avoid contaminants the base pressure prior to deposition was ca. 9·10−7 mbar, a high-purity (99.95%) sputtering Hf target was utilized, and thorough target presputtering was performed prior to deposition. All depositions were performed at room temperature

• , the argon (Ar) flow rate was in all cases kept at 60 sccm and the sputtering power at 32 W. During deposition in the soft-landing regime, no substrate bias voltage was applied (Vs = 0 kV). Thus, the kinetic energy of the nanoparticles was mainly defined by the pressure difference between the

Preparation of micro/nanopatterned gelatins crosslinked with genipin for biocompatible dental implants

• Reika Makita,
• Tsukasa Akasaka,
• Seiichi Tamagawa,
• Yasuhiro Yoshida,
• Saori Miyata,
• Hirofumi Miyaji and
• Tsutomu Sugaya

Beilstein J. Nanotechnol. 2018, 9, 1735–1754, doi:10.3762/bjnano.9.165

Friction force microscopy of tribochemistry and interfacial ageing for the SiO_x/Si/Au system

• Christiane Petzold,
• Marcus Koch and
• Roland Bennewitz

Beilstein J. Nanotechnol. 2018, 9, 1647–1658, doi:10.3762/bjnano.9.157

• cantilevers before use. A Au(111) single crystal (MaTeck GmbH, Jülich, Germany) was prepared by repeating a sputter–heating cycle (20 min Ar sputtering at 25 μA/1 keV followed by 1 h annealing at 850 °C) until a sharp (111) pattern was observed by low-energy electron diffraction (LEED). The n-Si(100) sample

• ). Prolonged stationary contact with Au(111) after sputtering resulted in activation of a Au/Si tip. After sliding this tip for 260 mm on Au(111), the tip was worn by 370 nm (Figure 6e). The largest wear was measured for tips that had been sliding against reactive Si(100); the Au/Si tip was worn by 530 nm

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• thick metal layers (gold films deposited by thermal evaporation and cobalt films deposited by magnetron sputtering) and successively removing the metal-capped spherical, nanoscale materials (termed “nanospheres” throughout the remainder of this article) by careful tape stripping with carbon tape in

Photoluminescence of CdSe/ZnS quantum dots in nematic liquid crystals in electric fields

• Margarita A. Kurochkina,
• Elena A. Konshina and
• Daria Khmelevskaia

Beilstein J. Nanotechnol. 2018, 9, 1544–1549, doi:10.3762/bjnano.9.145

• of two quartz substrates with a fixed gap of about 33 μm. Both substrates were coated by cathode sputtering with transparent conductive electrodes based on indium tin oxide. Orienting layers of rubbed polyimide and chromolane were used to obtain a planar or vertical orientation of the LC molecules

Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• pillars are removed by grazing incidence sputtering with Ar ions. (f) Subsequent RIE results in nanopores. (g) Optional removal of the residual Cr layer with a liquid etchant. (h) Experiment: SEM micrograph of the cross-section of membrane A (cf. text) with nanopores. HRSEM micrographs of nanoporous

Semi-automatic spray pyrolysis deposition of thin, transparent, titania films as blocking layers for dye-sensitized and perovskite solar cells

• Hana Krýsová,
• Josef Krýsa and
• Ladislav Kavan

Beilstein J. Nanotechnol. 2018, 9, 1135–1145, doi:10.3762/bjnano.9.105

• prevent recombination on this surface [3][4][5]. Blocking layers (BLs) can be fabricated by spray pyrolysis [3][6], magnetron sputtering [7], electrochemical deposition [8] spin coating [9][10], dip coating [11] and atomic layer deposition (ALD) [3]. From the viewpoint of low-cost processing and easy

Effect of annealing treatments on CeO₂ grown on TiN and Si substrates by atomic layer deposition

• Silvia Vangelista,
• Rossella Piagge,
• Satu Ek and
• Alessio Lamperti

Beilstein J. Nanotechnol. 2018, 9, 890–899, doi:10.3762/bjnano.9.83

• sputtering [7], e-beam [16], physical vapor deposition [17], chemical vapor deposition (CVD) [18], and atomic layer deposition (ALD). The latter has been explored by using different precursors, e.g., Ce(thd)4, Ce(iPrCp)3 and Ce(mmp)4) [19][20][21][22][23], obtaining as-deposited film with polycrystalline

• distribution as in [26]. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) investigation of the compositional depth profile of the CeO2/TiN/Si and CeO2/Si structures has been performed by means of a Cs+ ion beam (energy of 0.5 keV, ion current 38.0 nA) sputtering a 200 μm × 200 μm area, and a Ga+ ion

• evidence of TiN oxidation over almost its entire thickness. On the other side, no variation of the CeO profile is detectable apart from a tail broadening at increasing sputtering times, further evidence of CeO2/TiN interface instability. We note here that the instability of the CeO2/TiN interface imposes a

Facile chemical routes to mesoporous silver substrates for SERS analysis

• Elina A. Tastekova,
• Alexander Y. Polyakov,
• Anastasia E. Goldt,
• Alexander V. Sidorov,
• Alexandra A. Oshmyanskaya,
• Irina V. Sukhorukova,
• Dmitry V. Shtansky,
• Wolgang Grünert and
• Anastasia V. Grigorieva

Beilstein J. Nanotechnol. 2018, 9, 880–889, doi:10.3762/bjnano.9.82

• nm was deposited onto the 2.5 × 2.5 cm glass slides using magnetron sputtering. The chemical oxidation of silver was performed by vapors of 63% nitric acid. Then, the partially oxidized film was chemically reduced in an excess of sodium borohydride to AgI in the presence of or without PVP. The

• Technologies Q150T turbo-pumped sputter coater/carbon coater. A standard silver disk sputtering target (Stanford Materials, 99.99%) served as a source and the deposition rate was 2 nm/s. Then, the silver film was oxidized in the vapors of concentrated nitric acid (Reachim, purus). The silver film was fixed

Comparative study of antibacterial properties of polystyrene films with TiO_x and Cu nanoparticles fabricated using cluster beam technique

• Vladimir N. Popok,
• Cesarino M. Jeppesen,
• Peter Fojan,
• Anna Kuzminova,
• Jan Hanuš and
• Ondřej Kylián

Beilstein J. Nanotechnol. 2018, 9, 861–869, doi:10.3762/bjnano.9.80

• [9][10][11][12][13][14][15]. In the current work, both Ti and Cu clusters are produced using magnetron sputtering in special cluster sources and deposited on substrates coated by a thin layer of polystyrene (PS). The focus is on the optimization of the nanocomposite formation using the cluster beam

• that the surface cluster density is not changed after the deposition of bacteria and the following washing of the samples over a few cycles of the experiments. Such example is presented in Figure 2 for Ti NPs. Ti clusters produced by magnetron sputtering were either left untreated or oxidized in two

• toluene. Thin films are coated on silicon and quartz substrates of 10 × 10 mm2 and annealed at 110 °C (above the glass transition temperature). The thickness of PS films was measured by ellipsometry and found to be 50 ± 5 nm. Ti clusters are produced by magnetron sputtering in a cluster source similar to

Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films

• Daiki Katsube,
• Hayato Yamashita,
• Satoshi Abo and
• Masayuki Abe

Beilstein J. Nanotechnol. 2018, 9, 686–692, doi:10.3762/bjnano.9.63

• a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are

• ][22]. For observations of surface atoms of metal oxides using NC-AFM and STM, it is critical to prepare atomically flat and clean surfaces. A standard method for obtaining clean surfaces of metal oxides is performing iterations of Ar+ sputtering and annealing at high temperatures [23][24][25][26][37

• ][41][42]. Different conditions of annealing and sputtering result in different types of surface reconstruction even under the same preparation conditions [26]. As an example of an insulator metal oxide, an Al2O3(0001) surface prepared using iterations of annealing and sputtering was imaged with atomic

Sensing behavior of flower-shaped MoS₂ nanoflakes: case study with methanol and xylene

• Maryam Barzegar,
• Masoud Berahman and
• Azam Iraji zad

Beilstein J. Nanotechnol. 2018, 9, 608–615, doi:10.3762/bjnano.9.57

• , dispersed flower-shaped MoS2 nanoflakes in ethanol were first deposited on a 1 × 1 cm2 alumina wafer by spin coating. Then the gold microelectrodes were deposited on selective areas of the prepared, uniform, thin film through a comb-shaped shadow mask by sputtering. The mask was then lifted off and the

Towards 3D crystal orientation reconstruction using automated crystal orientation mapping transmission electron microscopy (ACOM-TEM)

• Aaron Kobler and
• Christian Kübel

Beilstein J. Nanotechnol. 2018, 9, 602–607, doi:10.3762/bjnano.9.56

• starting point for the 3D reconstruction is an ACOM map containing experimental spot diffraction patterns originating from a Pd thin film deposited by radio frequency (RF) magnetron sputtering. The orientation map was acquired on a Philips Tecnai F20 ST TEM instrument which was equipped with a NanoMegas

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53