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Search for "deposition" in Full Text gives 1097 result(s) in Beilstein Journal of Nanotechnology. Showing first 200.

Interface properties of nanostructured carbon-coated biological implants: an overview

  • Mattia Bartoli,
  • Francesca Cardano,
  • Erik Piatti,
  • Stefania Lettieri,
  • Andrea Fin and
  • Alberto Tagliaferro

Beilstein J. Nanotechnol. 2024, 15, 1041–1053, doi:10.3762/bjnano.15.85

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  • defects, including passivation and vacancies [78]. Deposition methods for the synthesis of carbon coatings The addition of nanostructured and nanosized carbon species into materials for biological applications can be attained by several techniques such as chemical vapor deposition (CVD), physical vapor
  • deposition (PVD), and in situ formation through laser treatments. CVD offers several advantageous features such as a high degree of control over the deposition process. CVD involves the deposition of a thin film of material onto a substrate through homogeneous or heterogeneous reactions [79]. Homogeneous
  • which the deposition occurs. During electron beam evaporation, an electron beam is used to vaporize the target material, while during sputtering, a high-energy ion beam is used to bombard the target. In both cases, atoms are ejected from the target and subsequently condense onto the substrate. The
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Published 16 Aug 2024

Bolometric IR photoresponse based on a 3D micro-nano integrated CNT architecture

  • Yasameen Al-Mafrachi,
  • Sandeep Yadav,
  • Sascha Preu,
  • Jörg J. Schneider and
  • Oktay Yilmazoglu

Beilstein J. Nanotechnol. 2024, 15, 1030–1040, doi:10.3762/bjnano.15.84

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  • thermistor region, can be fabricated in a single chemical vapor deposition process step. The thermistor resistance is mainly determined by the high junction resistances of the adjacent aligned CNTs. This configuration also provides low lateral thermal conductivity and a high temperature coefficient of
  • was deposited by atomic layer deposition to support the elongated growth of CNTs (Figure 1a). The contact pad regions were opened by an optical lithography process prior to the evaporation of Cr/Au (20 nm, e-beam/100 nm, thermal) (Figure 1b). The overall M-shape for the CNT growth as shown in Figure
  • nanoparticles at ≈750 °C. Finally, the samples were synthesized by water-assisted chemical vapor deposition (CVD) at 800 °C, similar to the CVD process presented in [13][14], to achieve a crystalline graphitic nature of the carbon nanotubes. Argon was used as the carrier gas and ethylene as the carbon source. A
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Published 15 Aug 2024

Can neutral clusters: a two-step G0W0 and DFT benchmark

  • Sunila Bakhsh,
  • Sameen Aslam,
  • Muhammad Khalid,
  • Muhammad Sohail,
  • Sundas Zafar,
  • Sumayya Abdul Wadood,
  • Kareem Morsy and
  • Muhammad Aamir Iqbal

Beilstein J. Nanotechnol. 2024, 15, 1010–1016, doi:10.3762/bjnano.15.82

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  • materials science (as an ionic deposition) [2]. The clusters of calcium are essential because they bridge the atomic and bulk materials; therefore, revealing their transition from micro- to macroscopic characteristics is a significant undertaking [3]. Being a divalent metal, the size transition of calcium
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Published 08 Aug 2024

Water-assisted purification during electron beam-induced deposition of platinum and gold

  • Cristiano Glessi,
  • Fabian A. Polman and
  • Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 884–896, doi:10.3762/bjnano.15.73

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  • beam-induced deposition (FEBID). It was recently achieved for gold deposits by the co-injection of a water precursor and the gold precursor Au(tfac)Me2. In this work results are reported, using the same approach, on a different gold precursor, Au(acac)Me2, as well as the frequently used platinum
  • precursor MeCpPtMe3. As a water precursor MgSO4·7H2O was used. The purification during deposition led to a decrease of the carbon-to-gold ratio (in atom %) from 2.8 to 0.5 and a decrease of the carbon-to-platinum ratio (in atom %) from 6–7 to 0.2. The purification was done in a regular scanning electron
  • microscope using commercially available components and chemicals, which paves the way for a broader application of direct etching-assisted FEBID to obtain pure metallic structures. Keywords: FEBID; gold; nanofabrication; platinum; purification; Introduction Focused electron beam-induced deposition (FEBID
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Published 18 Jul 2024

Intermixing of MoS2 and WS2 photocatalysts toward methylene blue photodegradation

  • Maryam Al Qaydi,
  • Nitul S. Rajput,
  • Michael Lejeune,
  • Abdellatif Bouchalkha,
  • Mimoun El Marssi,
  • Steevy Cordette,
  • Chaouki Kasmi and
  • Mustapha Jouiad

Beilstein J. Nanotechnol. 2024, 15, 817–829, doi:10.3762/bjnano.15.68

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  • Arab Emirates 10.3762/bjnano.15.68 Abstract Visible-light-driven photocatalysis using layered materials has garnered increasing attention regarding the degradation of organic dyes. Herein, transition-metal dichalcogenides MoS2 and WS2 prepared by chemical vapor deposition as well as their intermixing
  • deposition (CVD) as previously reported [32]. This means that the samples are well preserved after exfoliation through the intense sonication process. Certain flakes can be observed to have bent. The edges in some flakes can be seen to lose the smoothness, which could be a result of the harsh sonication
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Published 05 Jul 2024

Synthesis of silver–palladium Janus nanoparticles using co-sputtering of independent sources: experimental and theorical study

  • Maria J. Martínez-Carreón,
  • Francisco Solís-Pomar,
  • Abel Fundora,
  • Claudio D. Gutiérrez-Lazos,
  • Sergio Mejía-Rosales,
  • Hector N. Fernández-Escamilla,
  • Jonathan Guerrero-Sánchez,
  • Manuel F. Meléndrez and
  • Eduardo Pérez-Tijerina

Beilstein J. Nanotechnol. 2024, 15, 808–816, doi:10.3762/bjnano.15.67

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  • could establish the conditions to obtain the Ag/Pd nanoparticles. It is important to highlight that, by correctly selecting the deposition conditions, we can obtain either structures in Janus configurations or uniformly distributed alloys of these materials at room temperature, as will be shown later in
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Published 04 Jul 2024

Electron-induced ligand loss from iron tetracarbonyl methyl acrylate

  • Hlib Lyshchuk,
  • Atul Chaudhary,
  • Thomas F. M. Luxford,
  • Miloš Ranković,
  • Jaroslav Kočišek,
  • Juraj Fedor,
  • Lisa McElwee-White and
  • Pamir Nag

Beilstein J. Nanotechnol. 2024, 15, 797–807, doi:10.3762/bjnano.15.66

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  • the interaction with free electrons. The motivation comes from the possible use of this molecule as a nanofabrication precursor and from the corresponding need to understand its elementary reactions fundamental to the electron-induced deposition. We utilize two complementary electron collision setups
  • . Interesting differences also appear when this precursor is compared to structurally similar iron pentacarbonyl. The present findings shed light on the recent electron-induced chemistry of Fe(CO)4MA on a surface under ultrahigh vacuum. Keywords: electron collision; focused electron beam-induced deposition
  • (FEBID); FEBID precursor; iron tetracarbonyl methyl acrylate; Introduction In recent years, a wave of interest in the electron-induced loss of ligands from organometallic and coordination compounds appeared, which has been motivated by the need to understand focused electron beam-induced deposition
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Published 03 Jul 2024

Exploring surface charge dynamics: implications for AFM height measurements in 2D materials

  • Mario Navarro-Rodriguez,
  • Andres M. Somoza and
  • Elisa Palacios-Lidon

Beilstein J. Nanotechnol. 2024, 15, 767–780, doi:10.3762/bjnano.15.64

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  • and/or rGO in Milli-Q type-I water (MQ water) were utilized. A drop of these dispersions was cast onto highly doped p-type silicon (1–10 Ω·cm, Siltronix) with a 300 nm SiO2 layer thermally grown on top. Before deposition, the substrate underwent a thorough cleaning process, which involved rinsing with
  • –60%, Sigma-Aldrich). After deposition, we heated the sample for a minimum of 3 h at 60 °C on a hot plate to remove some of the physisorbed water. While still hot, it was transferred to the AFM and left to cool down in a nitrogen atmosphere. Before starting measurements under controlled humidity, we
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Published 01 Jul 2024

Effect of repeating hydrothermal growth processes and rapid thermal annealing on CuO thin film properties

  • Monika Ozga,
  • Eunika Zielony,
  • Aleksandra Wierzbicka,
  • Anna Wolska,
  • Marcin Klepka,
  • Marek Godlewski,
  • Bogdan J. Kowalski and
  • Bartłomiej S. Witkowski

Beilstein J. Nanotechnol. 2024, 15, 743–754, doi:10.3762/bjnano.15.62

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  • utility in photodetectors [10][11], memory structures [12][13], and p-type channels in transistors [14][15]. Simultaneously, ongoing efforts are consistently directed towards developing deposition techniques and functionalization of CuO films in order to modify their properties for specific applications
  • literature. These encompass methods such as molecular beam epitaxy [17][18][19], direct current magnetron sputtering [4][20][21], and pulsed laser deposition [22][23][24]. Alternative approaches involve techniques such as chemical vapor deposition [25][26][27] and atomic layer deposition [28][29][30]. CuO
  • thin films can also be grown from liquid phases, employing techniques such as chemical bath deposition [31][32][33], successive ionic layer adsorption and reaction (SILAR) [34][35][36], sol–gel processes (using dip and spin coating) [37][38][39], as well as spray pyrolysis [40][41][42]. This work
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Published 24 Jun 2024

Elastic modulus of β-Ga2O3 nanowires measured by resonance and three-point bending techniques

  • Annamarija Trausa,
  • Sven Oras,
  • Sergei Vlassov,
  • Mikk Antsov,
  • Tauno Tiirats,
  • Andreas Kyritsakis,
  • Boris Polyakov and
  • Edgars Butanovs

Beilstein J. Nanotechnol. 2024, 15, 704–712, doi:10.3762/bjnano.15.58

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  • suggests that the NW maintains a consistent horizontal alignment without deviating from a straight path throughout the observed region. Furthermore, to confirm the secure attachment of the NW to the substrate, seven NWs were “welded” to the substrate in SEM by Pt deposition using a gas injection system
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Published 18 Jun 2024

Gold nanomakura: nanoarchitectonics and their photothermal response in association with carrageenan hydrogels

  • Nabojit Das,
  • Vikas,
  • Akash Kumar,
  • Sanjeev Soni and
  • Raja Gopal Rayavarapu

Beilstein J. Nanotechnol. 2024, 15, 678–693, doi:10.3762/bjnano.15.56

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  • growth solution contains excess of gold ions along with a weak reducing agent and AgNO3. The excess gold is used as a reservoir for particle formation. On the other hand, AgNO3 plays a vital role through under potential deposition (UPD) by modulating the growth in a particular fashion. In Figure 6, it
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Published 07 Jun 2024

Functional fibrillar interfaces: Biological hair as inspiration across scales

  • Guillermo J. Amador,
  • Brett Klaassen van Oorschot,
  • Caiying Liao,
  • Jianing Wu and
  • Da Wei

Beilstein J. Nanotechnol. 2024, 15, 664–677, doi:10.3762/bjnano.15.55

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  • see [5]. However, we will mention some of the cleaning functions of hairs here. Hairs around the eyes of mammals (eyelashes) and on the eyes of insects (interommatidial setae) have been found to minimize the deposition of particle-laden contaminants through aerodynamic interactions [42][43]. Hairs on
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Published 06 Jun 2024

AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode

  • Hendrik Müller,
  • Hartmut Stadler,
  • Teresa de los Arcos,
  • Adrian Keller and
  • Guido Grundmeier

Beilstein J. Nanotechnol. 2024, 15, 603–611, doi:10.3762/bjnano.15.51

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  • /bjnano.15.51 Abstract Thin silicon oxide films deposited on a polypropylene substrate by plasma-enhanced chemical vapor deposition were investigated using atomic force microscopy-based infrared (AFM-IR) nanospectroscopy in contact and surface-sensitive mode. The focus of this work is the comparison of
  • ]. In this study thin coatings of SiOx were deposited by plasma-enhanced chemical vapor deposition (PECVD) in an oxygen-rich plasma process with hexamethyldisiloxane (HMDSO) used as monomer. With this process, the thickness of the coating can be controlled and homogeneous films can be produced [15
  • between 0.2 and 0.5 mbar. As the gas mixture, argon, oxygen, and HMDSO (98.5% purity, Sigma-Aldrich) were used in different ratios. First, the surface was pretreated for five seconds with an oxygen-rich plasma. For this step, the argon-to-oxygen ratio was set to 1:2. For the deposition of silicon oxide
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Published 24 May 2024

Directed growth of quinacridone chains on the vicinal Ag(35 1 1) surface

  • Niklas Humberg,
  • Lukas Grönwoldt and
  • Moritz Sokolowski

Beilstein J. Nanotechnol. 2024, 15, 556–568, doi:10.3762/bjnano.15.48

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  • the vicinal Ag(35 1 1) surface was investigated by scanning tunneling microscopy and low-energy electron diffraction. The focus was on the influence of the steps on the QA structures and their preferential azimuthal orientations with the aim of achieving a selective orientation. After deposition at a
  • with the (100) surface. At 300 K, the chains grow across the Ag steps, which do not break the azimuthal chain orientations. In contrast, during the deposition at sample temperatures of 400 and 500 K, the nucleation of the chains takes place at the Ag step edges. Hence, these have a strong influence on
  • temperature. The deposition process was monitored by the QMS, and the integrated QMS signal was used to calculate the QA coverage θQA. It is given in numbers of monolayers (ML) of the α-phase, as explained in detail in [23]. A more detailed description of the experimental procedures can be found in [23]. The
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Published 21 May 2024

Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 – effect of MA ligand and process conditions

  • Hannah Boeckers,
  • Atul Chaudhary,
  • Petra Martinović,
  • Amy V. Walker,
  • Lisa McElwee-White and
  • Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

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  • new precursor for focused electron beam-induced deposition (FEBID), was investigated by surface science experiments under UHV conditions. Auger electron spectroscopy was used to monitor deposit formation. The comparison between Fe(CO)4MA and Fe(CO)5 revealed the effect of the modified ligand
  • heteroleptic precursor Fe(CO)4MA, thus, offers the possibility to suppress contributions of thermal reactions, which can compromise control over the deposit shape and size in FEBID processes. Keywords: autocatalytic growth; cryo-EBID; electron beam-induced deposition; heteroleptic iron precursor; thermal
  • surface reactions; Introduction Focused electron beam-induced deposition (FEBID) is a state-of-the-art direct-write process for the fabrication of nanoscale materials and devices with arbitrary shape and size down to the sub-10 nm regime [1][2][3]. In FEBID, precursor molecules that contain the element
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Published 08 May 2024

Aero-ZnS prepared by physical vapor transport on three-dimensional networks of sacrificial ZnO microtetrapods

  • Veaceslav Ursaki,
  • Tudor Braniste,
  • Victor Zalamai,
  • Emil Rusu,
  • Vladimir Ciobanu,
  • Vadim Morari,
  • Daniel Podgornii,
  • Pier Carlo Ricci,
  • Rainer Adelung and
  • Ion Tiginyanu

Beilstein J. Nanotechnol. 2024, 15, 490–499, doi:10.3762/bjnano.15.44

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  • oxide nanotube networks, by atomic layer deposition [20]. Another aeromaterial, so called aerographite, has been produced by a one-step chemical vapor deposition process with a simultaneous and complete removal of the template material consisting of highly porous 3D networks built from interconnected
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Published 02 May 2024

Superconducting spin valve effect in Co/Pb/Co heterostructures with insulating interlayers

  • Andrey A. Kamashev,
  • Nadir N. Garif’yanov,
  • Aidar A. Validov,
  • Vladislav Kataev,
  • Alexander S. Osin,
  • Yakov V. Fominov and
  • Ilgiz A. Garifullin

Beilstein J. Nanotechnol. 2024, 15, 457–464, doi:10.3762/bjnano.15.41

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  • the magnetization of the Co1 layer. The layers were deposited using electron beam evaporation (Co, Pb) and AC sputtering (Si3N4). The deposition setup had a load-lock station with vacuum shutters, allowing one to transfer the sample holder without breaking the ultrahigh vacuum in the deposition
  • layer to oxygen atmosphere at 100 mbar for two hours. Next, Co1 was deposited in the main deposition chamber at a vacuum pressure of the order of 10−9 mbar on top of the CoOx layer. The I1 layer was formed on the surface of Co1 in a similar way as described above in an oxygen atmosphere of ≈10−2 mbar
  • its deposition, thereby, forming an insulating magnetic interlayer at the S/F interface. We consider an oxidation of the Pb layer to be unlikely because it was deposited at a low substrate temperature and exposed to a very low atmospheric pressure for a very short time, as specified above. According
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Published 25 Apr 2024

Sidewall angle tuning in focused electron beam-induced processing

  • Sangeetha Hari,
  • Willem F. van Dorp,
  • Johannes J. L. Mulders,
  • Piet H. F. Trompenaars,
  • Pieter Kruit and
  • Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

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  • ., Delftechpark 37j, 2628 XJ, Delft, Netherlands Thermo Fisher Scientific, Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands 10.3762/bjnano.15.40 Abstract Structures fabricated using focused electron beam-induced deposition (FEBID) have sloped sidewalls because of the very nature of the deposition process. For
  • distance to the electron beam focus. The interaction of the incident and scattered electrons with the substrate and adsorbed precursor layer causes the dissociation of the precursor molecules. This results in either deposition of solid precursor fragments (focused electron beam-induced deposition, FEBID
  • precursor used, a point exposure then results in either a Gaussian shaped deposit (FEBID) or in a Gaussian shaped pit (FEBIE), assuming that the deposition/etching process is proportional to the number of available electrons. In addition, it is assumed that the substrate will not be etched by the FEBIE
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Published 23 Apr 2024

Heat-induced morphological changes in silver nanowires deposited on a patterned silicon substrate

  • Elyad Damerchi,
  • Sven Oras,
  • Edgars Butanovs,
  • Allar Liivlaid,
  • Mikk Antsov,
  • Boris Polyakov,
  • Annamarija Trausa,
  • Veronika Zadin,
  • Andreas Kyritsakis,
  • Loïc Vidal,
  • Karine Mougin,
  • Siim Pikker and
  • Sergei Vlassov

Beilstein J. Nanotechnol. 2024, 15, 435–446, doi:10.3762/bjnano.15.39

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  • from 300 °C, the first clear signs of diffusion in NWs appeared in the form of splitting at the places where NWs were partly broken during deposition (Figure 3). In addition, fusion at the intersections of two or more NWs (Supporting Information File 1, Figure S1) was observed, in agreement with other
  • over several holes etched in a Si substrate. Heating schemes used for heat treatment of Ag NWs. TR stands for room temperature. Δt1 = 10 min is a heat treatment time, Δt2 ≈ 1 h is the rest time. a) Ag NWs deformed after deposition onto a Si substrate. b) Splitting of the Ag NWs at the bending areas
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Published 22 Apr 2024

Classification and application of metal-based nanoantioxidants in medicine and healthcare

  • Nguyen Nhat Nam,
  • Nguyen Khoi Song Tran,
  • Tan Tai Nguyen,
  • Nguyen Ngoc Trai,
  • Nguyen Phuong Thuy,
  • Hoang Dang Khoa Do,
  • Nhu Hoa Thi Tran and
  • Kieu The Loan Trinh

Beilstein J. Nanotechnol. 2024, 15, 396–415, doi:10.3762/bjnano.15.36

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  • treatments. Recently, Wang et al. developed multifunctional Au/Ag nanodots (Au/AgNDs) as “pilot light” for real-time guided surgery (Figure 5) [170]. The authors proved that Au/AgNDs enhanced the deposition of ionizing radiation energy, increased intracellular ROS generation, and significantly improved
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Published 12 Apr 2024

On the mechanism of piezoresistance in nanocrystalline graphite

  • Sandeep Kumar,
  • Simone Dehm and
  • Ralph Krupke

Beilstein J. Nanotechnol. 2024, 15, 376–384, doi:10.3762/bjnano.15.34

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  • transparent strain sensors. So far, the growth of specific grain boundaries in graphene has not been reported. Also, most research activities aim at the chemical vapor deposition (CVD) synthesis of monocrystalline graphene free of grain boundaries [10][11][12]. Methods to detect and visualize grain boundaries
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Published 08 Apr 2024

Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar+ ion beam: a comparative study

  • Indra Sulania,
  • Harpreet Sondhi,
  • Tanuj Kumar,
  • Sunil Ojha,
  • G R Umapathy,
  • Ambuj Mishra,
  • Ambuj Tripathi,
  • Richa Krishna,
  • Devesh Kumar Avasthi and
  • Yogendra Kumar Mishra

Beilstein J. Nanotechnol. 2024, 15, 367–375, doi:10.3762/bjnano.15.33

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  • to induce that type of energy deposition in the Ge lattice. This way, the defects can be produced and the substrate can be amorphized. The roughness and growth exponents have been deduced from the RMS surface roughness and power spectral density data to understand the mechanism of ripple formation on
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Published 05 Apr 2024

Modulated critical currents of spin-transfer torque-induced resistance changes in NiCu/Cu multilayered nanowires

  • Mengqi Fu,
  • Roman Hartmann,
  • Julian Braun,
  • Sergej Andreev,
  • Torsten Pietsch and
  • Elke Scheer

Beilstein J. Nanotechnol. 2024, 15, 360–366, doi:10.3762/bjnano.15.32

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  • was patterned to build the top electrode by thermal evaporation at a large deposition rate (>3 Å/s) to ensure quick and continuous film formation and, thus, to efficiently avoid Al to be deposited into the pores. Therefore, only the nanowires the top of which have reached the upper surface of the AAO
  • STT-induced features can be interpreted as asynchronous changes of the magnetization direction of different NiCu layers as well as spin accumulation at different interfaces. (a) SEM image after nanowire deposition and surface polishing. The bright dots represent the deposited nanowires the tops of
  • magnetic fields. Supporting Information See Supporting Information File 1 for a detailed description of the setups of AAO template preparation and electrolytic nanowire deposition, an estimation of the thickness of NiCu and Cu layers and the current density in the measured device, a detailed description
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Published 03 Apr 2024

Controllable physicochemical properties of WOx thin films grown under glancing angle

  • Rupam Mandal,
  • Aparajita Mandal,
  • Alapan Dutta,
  • Rengasamy Sivakumar,
  • Sanjeev Kumar Srivastava and
  • Tapobrata Som

Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31

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  • fabricating WOx-based optoelectronic devices, including photovoltaic cells. Keywords: annealing; glancing angle sputter deposition; heterojunction; tungsten oxide; work function; Introduction Tungsten oxide (WOx; x ≤ 3) is a popular transition-metal oxide for various optoelectronic devices because of its
  • . In this regard, radio frequency (rf) sputter deposition is one of the preferred choices as an industry-compatible method to grow WOx thin films [2][19][20][21]. Apart from thin films, nanostructured metal oxides generally possess superior electrochemical properties compared to their bulk counterparts
  • . In this respect, the use of glancing angle deposition (GLAD) to produce high-aspect-ratio nanostructures has certain advantages in terms of a wide range of structural possibilities (such as screws and helical or columnar structures) and reduced complexity (no templates involved) [26]. In addition
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Published 02 Apr 2024

Determining by Raman spectroscopy the average thickness and N-layer-specific surface coverages of MoS2 thin films with domains much smaller than the laser spot size

  • Felipe Wasem Klein,
  • Jean-Roch Huntzinger,
  • Vincent Astié,
  • Damien Voiry,
  • Romain Parret,
  • Houssine Makhlouf,
  • Sandrine Juillaguet,
  • Jean-Manuel Decams,
  • Sylvie Contreras,
  • Périne Landois,
  • Ahmed-Azmi Zahab,
  • Jean-Louis Sauvajol and
  • Matthieu Paillet

Beilstein J. Nanotechnol. 2024, 15, 279–296, doi:10.3762/bjnano.15.26

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  • injection pulsed-pressure chemical vapor deposition (DLI-PP-CVD). Such samples are constituted of nanoflakes (with a lateral size of typically 50 nm, i.e., well below the laser spot size), with possibly a distribution of thicknesses and twist angles between stacked layers. As an essential preliminary, we
  • first reassess the applicability of different Raman criteria to determine the thicknesses (or layer number, N) of MoS2 flakes from measurements performed on reference samples, namely well-characterized mechanically exfoliated or standard chemical vapor deposition MoS2 large flakes deposited on 90 ± 6 nm
  • , where atomic layers are arranged in such way that the stacking between two adjacent layers corresponds to a twist angle of θ = 60°, and any Mo atom is sitting on top of two S atoms of the adjacent layers [18][19]. However, during the synthesis process (e.g., chemical vapor deposition (CVD) synthesis) or
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Published 07 Mar 2024
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